JP2024538857A5 - - Google Patents
Info
- Publication number
- JP2024538857A5 JP2024538857A5 JP2023571649A JP2023571649A JP2024538857A5 JP 2024538857 A5 JP2024538857 A5 JP 2024538857A5 JP 2023571649 A JP2023571649 A JP 2023571649A JP 2023571649 A JP2023571649 A JP 2023571649A JP 2024538857 A5 JP2024538857 A5 JP 2024538857A5
- Authority
- JP
- Japan
- Prior art keywords
- cell
- illumination
- illumination beam
- overlay measurement
- beam distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/411,539 | 2021-08-25 | ||
| US17/411,539 US11531275B1 (en) | 2021-08-25 | 2021-08-25 | Parallel scatterometry overlay metrology |
| PCT/US2022/040824 WO2023027947A1 (en) | 2021-08-25 | 2022-08-19 | Parallel scatterometry overlay metrology |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2024538857A JP2024538857A (ja) | 2024-10-24 |
| JP2024538857A5 true JP2024538857A5 (https=) | 2025-05-27 |
| JP7705482B2 JP7705482B2 (ja) | 2025-07-09 |
Family
ID=84492602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023571649A Active JP7705482B2 (ja) | 2021-08-25 | 2022-08-19 | 並列散乱計測オーバーレイ計測 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11531275B1 (https=) |
| EP (1) | EP4323751A4 (https=) |
| JP (1) | JP7705482B2 (https=) |
| KR (1) | KR20240047335A (https=) |
| CN (1) | CN117480377B (https=) |
| TW (1) | TW202309599A (https=) |
| WO (1) | WO2023027947A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12111580B2 (en) * | 2021-03-11 | 2024-10-08 | Kla Corporation | Optical metrology utilizing short-wave infrared wavelengths |
| US11841621B2 (en) * | 2021-10-29 | 2023-12-12 | KLA Corporation CA | Moiré scatterometry overlay |
| JP2024098435A (ja) * | 2023-01-10 | 2024-07-23 | キオクシア株式会社 | 計測装置、及び、計測方法 |
| US20240302751A1 (en) * | 2023-03-09 | 2024-09-12 | Kla Corporation | Multi-overlay stacked grating metrology target |
| US12411420B2 (en) * | 2023-09-29 | 2025-09-09 | Kla Corporation | Small in-die target design for overlay measurement |
| US12373936B2 (en) | 2023-12-08 | 2025-07-29 | Kla Corporation | System and method for overlay metrology using a phase mask |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6710876B1 (en) * | 2000-08-14 | 2004-03-23 | Kla-Tencor Technologies Corporation | Metrology system using optical phase |
| US7440105B2 (en) | 2002-12-05 | 2008-10-21 | Kla-Tencor Technologies Corporation | Continuously varying offset mark and methods of determining overlay |
| US7349105B2 (en) | 2004-09-01 | 2008-03-25 | Intel Corporation | Method and apparatus for measuring alignment of layers in photolithographic processes |
| US9223227B2 (en) * | 2011-02-11 | 2015-12-29 | Asml Netherlands B.V. | Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method |
| US9429856B1 (en) | 2013-01-21 | 2016-08-30 | Kla-Tencor Corporation | Detectable overlay targets with strong definition of center locations |
| US10048132B2 (en) * | 2016-07-28 | 2018-08-14 | Kla-Tencor Corporation | Simultaneous capturing of overlay signals from multiple targets |
| US10371626B2 (en) | 2016-08-17 | 2019-08-06 | Kla-Tencor Corporation | System and method for generating multi-channel tunable illumination from a broadband source |
| US10551749B2 (en) | 2017-01-04 | 2020-02-04 | Kla-Tencor Corporation | Metrology targets with supplementary structures in an intermediate layer |
| US10444161B2 (en) * | 2017-04-05 | 2019-10-15 | Kla-Tencor Corporation | Systems and methods for metrology with layer-specific illumination spectra |
| KR20200004381A (ko) * | 2017-05-08 | 2020-01-13 | 에이에스엠엘 네델란즈 비.브이. | 구조체를 측정하는 방법, 검사 장치, 리소그래피 시스템 및 디바이스 제조 방법 |
| US10401738B2 (en) * | 2017-08-02 | 2019-09-03 | Kla-Tencor Corporation | Overlay metrology using multiple parameter configurations |
| US10510623B2 (en) * | 2017-12-27 | 2019-12-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Overlay error and process window metrology |
| US11175593B2 (en) * | 2018-04-26 | 2021-11-16 | Asml Netherlands B.V. | Alignment sensor apparatus for process sensitivity compensation |
| US11281111B2 (en) * | 2018-08-28 | 2022-03-22 | Kla-Tencor Corporation | Off-axis illumination overlay measurement using two-diffracted orders imaging |
| JP7124205B2 (ja) * | 2018-08-29 | 2022-08-23 | エーエスエムエル ホールディング エヌ．ブイ． | コンパクトなアライメントセンサ配置 |
| US11118903B2 (en) | 2018-10-17 | 2021-09-14 | Kla Corporation | Efficient illumination shaping for scatterometry overlay |
| US11073768B2 (en) | 2019-06-26 | 2021-07-27 | Kla Corporation | Metrology target for scanning metrology |
| US11256177B2 (en) | 2019-09-11 | 2022-02-22 | Kla Corporation | Imaging overlay targets using Moiré elements and rotational symmetry arrangements |
| US10969697B1 (en) * | 2019-10-18 | 2021-04-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Overlay metrology tool and methods of performing overlay measurements |
| CN115004113B (zh) | 2020-01-29 | 2026-03-24 | Asml荷兰有限公司 | 量测方法和用于测量衬底上的周期性结构的装置 |
| US11662562B2 (en) | 2020-02-09 | 2023-05-30 | Kla Corporation | Broadband illumination tuning |
| US11300405B2 (en) * | 2020-08-03 | 2022-04-12 | Kla Corporation | Grey-mode scanning scatterometry overlay metrology |
| US11428642B2 (en) * | 2021-01-04 | 2022-08-30 | Kla Corporation | Scanning scatterometry overlay measurement |
-
2021
- 2021-08-25 US US17/411,539 patent/US11531275B1/en active Active
-
2022
- 2022-06-30 TW TW111124424A patent/TW202309599A/zh unknown
- 2022-08-19 EP EP22861914.4A patent/EP4323751A4/en active Pending
- 2022-08-19 WO PCT/US2022/040824 patent/WO2023027947A1/en not_active Ceased
- 2022-08-19 JP JP2023571649A patent/JP7705482B2/ja active Active
- 2022-08-19 CN CN202280038375.XA patent/CN117480377B/zh active Active
- 2022-08-19 KR KR1020237042491A patent/KR20240047335A/ko active Pending
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