JP2023526864A5 - - Google Patents
Info
- Publication number
- JP2023526864A5 JP2023526864A5 JP2022571783A JP2022571783A JP2023526864A5 JP 2023526864 A5 JP2023526864 A5 JP 2023526864A5 JP 2022571783 A JP2022571783 A JP 2022571783A JP 2022571783 A JP2022571783 A JP 2022571783A JP 2023526864 A5 JP2023526864 A5 JP 2023526864A5
- Authority
- JP
- Japan
- Prior art keywords
- overlay
- tool according
- illumination
- control zones
- measurement tool
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063028568P | 2020-05-22 | 2020-05-22 | |
| US63/028,568 | 2020-05-22 | ||
| US17/068,328 | 2020-10-12 | ||
| US17/068,328 US11346657B2 (en) | 2020-05-22 | 2020-10-12 | Measurement modes for overlay |
| PCT/US2021/032655 WO2021236470A1 (en) | 2020-05-22 | 2021-05-17 | Measurement modes for overlay |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023526864A JP2023526864A (ja) | 2023-06-23 |
| JP2023526864A5 true JP2023526864A5 (https=) | 2024-03-18 |
| JP7527400B2 JP7527400B2 (ja) | 2024-08-02 |
Family
ID=78607884
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022571783A Active JP7527400B2 (ja) | 2020-05-22 | 2021-05-17 | オーバーレイ計測ツールおよび方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11346657B2 (https=) |
| EP (1) | EP4115172A4 (https=) |
| JP (1) | JP7527400B2 (https=) |
| KR (1) | KR102789381B1 (https=) |
| CN (1) | CN115552228B (https=) |
| TW (1) | TWI862840B (https=) |
| WO (1) | WO2021236470A1 (https=) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10705435B2 (en) | 2018-01-12 | 2020-07-07 | Globalfoundries Inc. | Self-referencing and self-calibrating interference pattern overlay measurement |
| US12104891B1 (en) * | 2019-08-12 | 2024-10-01 | Nikon Corporation | Spatially filtered talbot interferometer for wafer distortion measurement |
| US11346657B2 (en) * | 2020-05-22 | 2022-05-31 | Kla Corporation | Measurement modes for overlay |
| JP7510280B2 (ja) * | 2020-06-02 | 2024-07-03 | キヤノン株式会社 | 検出器、インプリント装置および物品製造方法 |
| US11686576B2 (en) | 2020-06-04 | 2023-06-27 | Kla Corporation | Metrology target for one-dimensional measurement of periodic misregistration |
| US20220189023A1 (en) * | 2020-12-10 | 2022-06-16 | FEV Group GmbH | Systems, methods and computer program products for detecting individuals with fever in view of acute infection of the individual |
| US11460783B2 (en) * | 2021-01-07 | 2022-10-04 | Kla Corporation | System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target |
| US12111580B2 (en) | 2021-03-11 | 2024-10-08 | Kla Corporation | Optical metrology utilizing short-wave infrared wavelengths |
| US11841621B2 (en) * | 2021-10-29 | 2023-12-12 | KLA Corporation CA | Moiré scatterometry overlay |
| KR102875946B1 (ko) * | 2021-11-27 | 2025-10-23 | 케이엘에이 코포레이션 | 회절 기반 오버레이 오차 계측을 위한 개선된 타겟 |
| US11796925B2 (en) * | 2022-01-03 | 2023-10-24 | Kla Corporation | Scanning overlay metrology using overlay targets having multiple spatial frequencies |
| CN114354627B (zh) * | 2022-01-04 | 2022-11-22 | 浙江大学 | 一种用于表面缺陷检测的环形均匀准直照明装置及方法 |
| US12032300B2 (en) * | 2022-02-14 | 2024-07-09 | Kla Corporation | Imaging overlay with mutually coherent oblique illumination |
| US12487190B2 (en) | 2022-03-30 | 2025-12-02 | Kla Corporation | System and method for isolation of specific fourier pupil frequency in overlay metrology |
| US12422363B2 (en) | 2022-03-30 | 2025-09-23 | Kla Corporation | Scanning scatterometry overlay metrology |
| JP2024014030A (ja) * | 2022-07-21 | 2024-02-01 | キヤノン株式会社 | 検出装置、リソグラフィー装置および物品製造方法 |
| US20240110780A1 (en) * | 2022-09-30 | 2024-04-04 | Kla Corporation | Mosaic overlay targets |
| KR102546552B1 (ko) * | 2022-11-14 | 2023-06-22 | (주)오로스테크놀로지 | 오버레이 계측 장치의 동작을 제어하는 데이터를 저장하기 위한 데이터 구조를 기록한 컴퓨터 판독 가능 저장 매체 및 이를 위한 오버레이 계측 장치 |
| US12235588B2 (en) | 2023-02-16 | 2025-02-25 | Kla Corporation | Scanning overlay metrology with high signal to noise ratio |
| JP2024127783A (ja) * | 2023-03-09 | 2024-09-20 | レーザーテック株式会社 | 照明装置及び照明方法 |
| US12504697B2 (en) | 2023-06-02 | 2025-12-23 | Kla Corporation | Single grab pupil landscape via broadband illumination |
| KR102742571B1 (ko) * | 2023-06-26 | 2024-12-16 | (주) 오로스테크놀로지 | 필터 조립체 및 이를 구비한 오버레이 측정 장치 |
| US12360463B2 (en) * | 2023-09-26 | 2025-07-15 | Tokyo Electron Limited | Fiber bundle based optical spot size selector |
| US20250139814A1 (en) * | 2023-11-01 | 2025-05-01 | Kla Corporation | Overlay mark design enabling large overlay measurement |
| US12373936B2 (en) | 2023-12-08 | 2025-07-29 | Kla Corporation | System and method for overlay metrology using a phase mask |
| US20250306477A1 (en) * | 2024-03-27 | 2025-10-02 | Kla Corporation | Single grab pupil landscape via outside the objective lens broadband illumination |
| US20250314973A1 (en) * | 2024-04-09 | 2025-10-09 | Kla Corporation | METHODS FOR MEASUREMENT OF rAIM |
| US20260023269A1 (en) * | 2024-07-22 | 2026-01-22 | Kla Corporation | Dark field imaging system with twice-diffracted light for overlay metrology |
| US20260064017A1 (en) * | 2024-09-05 | 2026-03-05 | Kla Corporation | Systems and methods for dual-conjugate imaging for overlay metrology |
| CN121541419A (zh) * | 2026-01-19 | 2026-02-17 | 中国科学院光电技术研究所 | 多工况补偿器参数计算方法、系统、介质和程序产品 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07297101A (ja) * | 1994-04-22 | 1995-11-10 | Nikon Corp | 投影露光装置 |
| US5805290A (en) * | 1996-05-02 | 1998-09-08 | International Business Machines Corporation | Method of optical metrology of unresolved pattern arrays |
| JPH11287616A (ja) * | 1998-03-31 | 1999-10-19 | Nikon Corp | 2光束生成装置及び位置検出装置 |
| AU2003252135A1 (en) | 2002-07-26 | 2004-02-16 | Massachusetts Institute Of Technology | Optical imaging using a pupil filter and coordinated illumination polarisation |
| US7283209B2 (en) * | 2004-07-09 | 2007-10-16 | Carl Zeiss Smt Ag | Illumination system for microlithography |
| US7528941B2 (en) * | 2006-06-01 | 2009-05-05 | Kla-Tencor Technolgies Corporation | Order selected overlay metrology |
| NL1036857A1 (nl) | 2008-04-21 | 2009-10-22 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
| US8248617B2 (en) * | 2008-04-22 | 2012-08-21 | Zygo Corporation | Interferometer for overlay measurements |
| KR101003532B1 (ko) | 2008-08-06 | 2010-12-28 | (주)다미화학 | 탈모의 예방, 치료, 또는 육모용 조성물 |
| KR20120058572A (ko) * | 2009-08-24 | 2012-06-07 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법 및 장치, 리소그래피 장치, 리소그래피 처리 셀 및 메트롤로지 타겟들을 포함하는 기판 |
| CN103201682B (zh) * | 2010-11-12 | 2015-06-17 | Asml荷兰有限公司 | 量测方法和设备、光刻系统和器件制造方法 |
| NL2008936A (en) * | 2011-07-28 | 2013-01-29 | Asml Netherlands Bv | Illumination source for use in inspection methods and/or lithography inspection and lithographic apparatus and inspection method. |
| WO2015009739A1 (en) * | 2013-07-18 | 2015-01-22 | Kla-Tencor Corporation | Illumination configurations for scatterometry measurements |
| US9719920B2 (en) * | 2013-07-18 | 2017-08-01 | Kla-Tencor Corporation | Scatterometry system and method for generating non-overlapping and non-truncated diffraction images |
| CN105807573B (zh) | 2014-12-31 | 2017-12-29 | 上海微电子装备(集团)股份有限公司 | 用于套刻误差检测的装置和方法 |
| CN112859540B (zh) * | 2015-05-19 | 2024-10-18 | 科磊股份有限公司 | 成像计量目标及方法 |
| US10216096B2 (en) * | 2015-08-14 | 2019-02-26 | Kla-Tencor Corporation | Process-sensitive metrology systems and methods |
| TWI656409B (zh) * | 2015-09-09 | 2019-04-11 | 美商克萊譚克公司 | 基於輔助電磁場之引入之一階散射測量疊加之新方法 |
| US10101676B2 (en) * | 2015-09-23 | 2018-10-16 | KLA—Tencor Corporation | Spectroscopic beam profile overlay metrology |
| EP3422103A1 (en) | 2017-06-26 | 2019-01-02 | ASML Netherlands B.V. | Method of determining a performance parameter of a process |
| US10401738B2 (en) | 2017-08-02 | 2019-09-03 | Kla-Tencor Corporation | Overlay metrology using multiple parameter configurations |
| US10677588B2 (en) * | 2018-04-09 | 2020-06-09 | Kla-Tencor Corporation | Localized telecentricity and focus optimization for overlay metrology |
| EP3575875A1 (en) * | 2018-05-31 | 2019-12-04 | ASML Netherlands B.V. | Measurement apparatus and method of measuring a target |
| US11281111B2 (en) * | 2018-08-28 | 2022-03-22 | Kla-Tencor Corporation | Off-axis illumination overlay measurement using two-diffracted orders imaging |
| US11118903B2 (en) | 2018-10-17 | 2021-09-14 | Kla Corporation | Efficient illumination shaping for scatterometry overlay |
| US11933717B2 (en) * | 2019-09-27 | 2024-03-19 | Kla Corporation | Sensitive optical metrology in scanning and static modes |
| US11346657B2 (en) * | 2020-05-22 | 2022-05-31 | Kla Corporation | Measurement modes for overlay |
-
2020
- 2020-10-12 US US17/068,328 patent/US11346657B2/en active Active
-
2021
- 2021-05-17 KR KR1020227045266A patent/KR102789381B1/ko active Active
- 2021-05-17 JP JP2022571783A patent/JP7527400B2/ja active Active
- 2021-05-17 EP EP21808030.7A patent/EP4115172A4/en active Pending
- 2021-05-17 CN CN202180032424.4A patent/CN115552228B/zh active Active
- 2021-05-17 WO PCT/US2021/032655 patent/WO2021236470A1/en not_active Ceased
- 2021-05-21 TW TW110118397A patent/TWI862840B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2023526864A5 (https=) | ||
| JP6934879B2 (ja) | ハイパースペクトルイメージング計量システム及び方法 | |
| US6563567B1 (en) | Method and apparatus for illuminating a surface using a projection imaging apparatus | |
| US7547874B2 (en) | Single axis illumination for multi-axis imaging system | |
| TWI564539B (zh) | 光學系統、用於其中之照射控制之方法及非暫時性電腦可讀媒體 | |
| KR100891340B1 (ko) | 투영 노광 장치 | |
| EP0500393B1 (en) | Imaging method for manufacture of microdevices | |
| JP2021521418A5 (https=) | ||
| JP2022546849A5 (https=) | ||
| US12032300B2 (en) | Imaging overlay with mutually coherent oblique illumination | |
| EP1014196A2 (en) | Method and system of illumination for a projection optical apparatus | |
| JP2003524175A (ja) | 波面検出装置 | |
| JP6370626B2 (ja) | 照明光学系、照明装置、及び照明光学素子 | |
| JP2022509599A5 (https=) | ||
| KR20250005042A (ko) | 다수의 조명 파라미터 및 분리된 이미징을 사용한 다방향 오버레이 계측 | |
| US20150124073A1 (en) | Illumination optical system and microscope | |
| CN119901683B (zh) | 一种晶圆明暗场缺陷检测装置 | |
| TWI882997B (zh) | 測量系統與使光繞射的方法 | |
| US10801890B1 (en) | Measurement system and a method of diffracting light | |
| JP2024095727A (ja) | 光源装置、計測装置、露光装置、および計測方法 | |
| US5523846A (en) | Apparatus for detecting marks formed on a sample surface | |
| US6707537B2 (en) | Projection exposure system | |
| KR20220056244A (ko) | 측정 시스템 및 격자 패턴 어레이 | |
| JP2015184619A5 (https=) | ||
| JP2005510861A (ja) | 投影照明システムの照明角度分布の特性化 |