JP2021521418A5 - - Google Patents
Info
- Publication number
- JP2021521418A5 JP2021521418A5 JP2020555097A JP2020555097A JP2021521418A5 JP 2021521418 A5 JP2021521418 A5 JP 2021521418A5 JP 2020555097 A JP2020555097 A JP 2020555097A JP 2020555097 A JP2020555097 A JP 2020555097A JP 2021521418 A5 JP2021521418 A5 JP 2021521418A5
- Authority
- JP
- Japan
- Prior art keywords
- overlay
- alignment
- weighing system
- imaging system
- images
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/948,941 US10677588B2 (en) | 2018-04-09 | 2018-04-09 | Localized telecentricity and focus optimization for overlay metrology |
| US15/948,941 | 2018-04-09 | ||
| PCT/US2019/025917 WO2019199585A1 (en) | 2018-04-09 | 2019-04-05 | Localized telecentricity and focus optimization for overlay metrology |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021521418A JP2021521418A (ja) | 2021-08-26 |
| JP2021521418A5 true JP2021521418A5 (https=) | 2022-04-08 |
| JP7085642B2 JP7085642B2 (ja) | 2022-06-16 |
Family
ID=68096386
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020555097A Active JP7085642B2 (ja) | 2018-04-09 | 2019-04-05 | オーバレイ計量向けの局所的テレセントリシティ及び合焦最適化 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10677588B2 (https=) |
| EP (1) | EP3762900B1 (https=) |
| JP (1) | JP7085642B2 (https=) |
| KR (1) | KR102448698B1 (https=) |
| CN (1) | CN111971712B (https=) |
| IL (1) | IL277841B2 (https=) |
| SG (1) | SG11202005972UA (https=) |
| TW (1) | TWI781312B (https=) |
| WO (1) | WO2019199585A1 (https=) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10444161B2 (en) * | 2017-04-05 | 2019-10-15 | Kla-Tencor Corporation | Systems and methods for metrology with layer-specific illumination spectra |
| US11703464B2 (en) | 2018-07-28 | 2023-07-18 | Bruker Technologies Ltd. | Small-angle x-ray scatterometry |
| US11281111B2 (en) * | 2018-08-28 | 2022-03-22 | Kla-Tencor Corporation | Off-axis illumination overlay measurement using two-diffracted orders imaging |
| US12104891B1 (en) * | 2019-08-12 | 2024-10-01 | Nikon Corporation | Spatially filtered talbot interferometer for wafer distortion measurement |
| CN113124751B (zh) * | 2019-12-31 | 2022-07-29 | 上海微电子装备(集团)股份有限公司 | 一种散射测量装置及散射测量方法 |
| US11481922B2 (en) * | 2020-04-07 | 2022-10-25 | Kla Corporation | Online navigational drift correction for metrology measurements |
| US11604149B2 (en) * | 2020-04-23 | 2023-03-14 | Kla Corporation | Metrology methods and optical schemes for measurement of misregistration by using hatched target designs |
| US11302030B2 (en) * | 2020-05-14 | 2022-04-12 | Kla Corporation | System, method, and target for wafer alignment |
| US11346657B2 (en) * | 2020-05-22 | 2022-05-31 | Kla Corporation | Measurement modes for overlay |
| CN113865503A (zh) * | 2020-06-30 | 2021-12-31 | 得力富企业股份有限公司 | 形心检测装置 |
| KR102461662B1 (ko) * | 2020-07-02 | 2022-11-02 | (주)오로스 테크놀로지 | 오버레이 측정장치 |
| US11244474B1 (en) | 2020-10-01 | 2022-02-08 | Kla Corporation | Sample positioning system and method |
| US11556738B2 (en) * | 2020-10-01 | 2023-01-17 | Kla Corporation | System and method for determining target feature focus in image-based overlay metrology |
| US11899375B2 (en) * | 2020-11-20 | 2024-02-13 | Kla Corporation | Massive overlay metrology sampling with multiple measurement columns |
| US11428642B2 (en) * | 2021-01-04 | 2022-08-30 | Kla Corporation | Scanning scatterometry overlay measurement |
| US12111580B2 (en) * | 2021-03-11 | 2024-10-08 | Kla Corporation | Optical metrology utilizing short-wave infrared wavelengths |
| US11592755B2 (en) * | 2021-03-31 | 2023-02-28 | Kla Corporation | Enhancing performance of overlay metrology |
| US20220341725A1 (en) * | 2021-04-26 | 2022-10-27 | Quality Vision International Inc. | Non-invasive alignment method and system for imager-illuminator optical measurement machines |
| US20220357674A1 (en) * | 2021-05-04 | 2022-11-10 | Kla Corporation | Oblique illumination for overlay metrology |
| CN117836722A (zh) * | 2021-08-20 | 2024-04-05 | Asml荷兰有限公司 | 用于不均匀表面的补偿光学系统、量测系统、光刻设备及其方法 |
| US11781999B2 (en) | 2021-09-05 | 2023-10-10 | Bruker Technologies Ltd. | Spot-size control in reflection-based and scatterometry-based X-ray metrology systems |
| CN115877664A (zh) * | 2021-09-27 | 2023-03-31 | 北京超弦存储器研究院 | 高精度光刻套刻精度测量单元 |
| US11861824B1 (en) * | 2022-02-03 | 2024-01-02 | Kla Corporation | Reference image grouping in overlay metrology |
| US12032300B2 (en) * | 2022-02-14 | 2024-07-09 | Kla Corporation | Imaging overlay with mutually coherent oblique illumination |
| KR102524462B1 (ko) * | 2022-03-28 | 2023-04-21 | (주)오로스 테크놀로지 | 오버레이 측정장치 |
| US12249059B2 (en) | 2022-03-31 | 2025-03-11 | Bruker Technologies Ltd. | Navigation accuracy using camera coupled with detector assembly |
| TW202405584A (zh) * | 2022-04-07 | 2024-02-01 | 美商科磊股份有限公司 | 特別高之目標計量 |
| KR102526522B1 (ko) * | 2022-11-02 | 2023-04-27 | (주)오로스테크놀로지 | 포커스를 제어하는 오버레이 계측 장치 및 방법과 이를 위한 프로그램 |
| KR102576639B1 (ko) | 2022-11-09 | 2023-09-08 | (주)오로스테크놀로지 | 초점 이동을 제어하는 오버레이 계측 장치 및 방법과 이를 위한 프로그램 저장 매체 |
| US20240167813A1 (en) * | 2022-11-23 | 2024-05-23 | Kla Corporation | System and method for suppression of tool induced shift in scanning overlay metrology |
| KR102844370B1 (ko) * | 2022-12-07 | 2025-08-08 | (주) 오로스테크놀로지 | 업샘플링을 이용한 오버레이 측정 방법 및 장치와, 이를 이용한 반도체 소자의 제조 방법 |
| KR102550408B1 (ko) * | 2023-02-14 | 2023-07-03 | (주)오로스 테크놀로지 | 오버레이 측정장치 및 방법 |
| US12235588B2 (en) * | 2023-02-16 | 2025-02-25 | Kla Corporation | Scanning overlay metrology with high signal to noise ratio |
| KR102898111B1 (ko) * | 2023-03-15 | 2025-12-09 | (주) 오로스테크놀로지 | 오버레이 측정 장치의 최적화 방법 및 이를 수행하는 오버레이 측정 장치 |
| KR102617147B1 (ko) * | 2023-07-14 | 2023-12-27 | (주)오로스 테크놀로지 | 오버레이 계측 장치 및 오버레이 계측 장치의 교정방법 |
| US12487533B2 (en) | 2024-01-25 | 2025-12-02 | Kla Corporation | Amplitude asymmetry measurements in overlay metrology |
| CN119758682B (zh) * | 2024-12-24 | 2025-11-18 | 中国科学院光电技术研究所 | 一种多波长叠栅条纹阵列标记对准调平系统及方法 |
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|---|---|---|---|---|
| JPH096017A (ja) * | 1995-06-22 | 1997-01-10 | Nikon Corp | アライメント装置 |
| KR20010075605A (ko) * | 1998-11-06 | 2001-08-09 | 오노 시게오 | 노광방법 및 노광장치 |
| IL130874A (en) * | 1999-07-09 | 2002-12-01 | Nova Measuring Instr Ltd | System and method for measuring pattern structures |
| KR100827741B1 (ko) * | 2000-07-17 | 2008-05-07 | 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 | 임프린트 리소그래피 공정을 위한 자동 유체 분배 방법 및시스템 |
| US20030002043A1 (en) * | 2001-04-10 | 2003-01-02 | Kla-Tencor Corporation | Periodic patterns and technique to control misalignment |
| US6678046B2 (en) * | 2001-08-28 | 2004-01-13 | Therma-Wave, Inc. | Detector configurations for optical metrology |
| US20040032581A1 (en) * | 2002-01-15 | 2004-02-19 | Mehrdad Nikoonahad | Systems and methods for inspection of specimen surfaces |
| US7804994B2 (en) | 2002-02-15 | 2010-09-28 | Kla-Tencor Technologies Corporation | Overlay metrology and control method |
| WO2007008742A1 (en) * | 2005-07-08 | 2007-01-18 | Electro Scientific Industries, Inc. | Optimizing use and performance of optical systems implemented with telecentric on-axis dark field illumination |
| KR20180088924A (ko) * | 2005-11-18 | 2018-08-07 | 케이엘에이-텐코 코포레이션 | 검사 데이터와 조합하여 설계 데이터를 활용하는 방법 및 시스템 |
| WO2007098453A2 (en) | 2006-02-17 | 2007-08-30 | Litel Instruments | Method and apparatus for determining focus and source telecentricity |
| US7714996B2 (en) * | 2007-01-23 | 2010-05-11 | 3i Systems Corporation | Automatic inspection system for flat panel substrate |
| US8175831B2 (en) * | 2007-04-23 | 2012-05-08 | Kla-Tencor Corp. | Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers |
| US8111376B2 (en) * | 2007-05-30 | 2012-02-07 | Kla-Tencor Corporation | Feedforward/feedback litho process control of stress and overlay |
| NL2004400A (en) * | 2009-04-09 | 2010-10-12 | Asml Holding Nv | Tunable wavelength illumination system. |
| KR20120058572A (ko) * | 2009-08-24 | 2012-06-07 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법 및 장치, 리소그래피 장치, 리소그래피 처리 셀 및 메트롤로지 타겟들을 포함하는 기판 |
| AU2009230797B2 (en) * | 2009-10-28 | 2011-06-09 | Canon Kabushiki Kaisha | Focus finding and alignment using a split linear mask |
| CN102834777B (zh) * | 2010-02-23 | 2016-03-09 | Asml荷兰有限公司 | 光刻设备和器件制造方法 |
| CN103201682B (zh) * | 2010-11-12 | 2015-06-17 | Asml荷兰有限公司 | 量测方法和设备、光刻系统和器件制造方法 |
| US8248591B2 (en) * | 2010-11-18 | 2012-08-21 | Quality Vision International, Inc. | Through-the-lens illuminator for optical comparator |
| US9400246B2 (en) * | 2011-10-11 | 2016-07-26 | Kla-Tencor Corporation | Optical metrology tool equipped with modulated illumination sources |
| US9228943B2 (en) * | 2011-10-27 | 2016-01-05 | Kla-Tencor Corporation | Dynamically adjustable semiconductor metrology system |
| CN103814429A (zh) * | 2012-05-22 | 2014-05-21 | 科磊股份有限公司 | 具有正交底层虚拟填充的叠盖目标 |
| GB2504970A (en) * | 2012-08-15 | 2014-02-19 | Swan Thomas & Co Ltd | Optical device and methods to reduce cross-talk |
| US10242290B2 (en) * | 2012-11-09 | 2019-03-26 | Kla-Tencor Corporation | Method, system, and user interface for metrology target characterization |
| US9341769B2 (en) * | 2012-12-17 | 2016-05-17 | Kla-Tencor Corporation | Spectral control system |
| US9575008B2 (en) * | 2014-02-12 | 2017-02-21 | ASA Corporation | Apparatus and method for photographing glass in multiple layers |
| US10152654B2 (en) * | 2014-02-20 | 2018-12-11 | Kla-Tencor Corporation | Signal response metrology for image based overlay measurements |
| NL2014941A (en) * | 2014-07-16 | 2016-04-12 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product. |
| WO2016078862A1 (en) * | 2014-11-21 | 2016-05-26 | Asml Netherlands B.V. | Metrology method and apparatus |
| WO2016083076A1 (en) * | 2014-11-26 | 2016-06-02 | Asml Netherlands B.V. | Metrology method, computer product and system |
| CN112859540B (zh) | 2015-05-19 | 2024-10-18 | 科磊股份有限公司 | 成像计量目标及方法 |
| KR102128488B1 (ko) * | 2015-12-09 | 2020-07-01 | 에이에스엠엘 홀딩 엔.브이. | 플렉시블 일루미네이터 |
| US10585357B2 (en) | 2015-12-28 | 2020-03-10 | Asml Netherlands B.V. | Alternative target design for metrology using modulation techniques |
| JP6896702B2 (ja) * | 2016-03-10 | 2021-06-30 | 浜松ホトニクス株式会社 | レーザ光照射装置及びレーザ光照射方法 |
| US10422508B2 (en) * | 2016-03-28 | 2019-09-24 | Kla-Tencor Corporation | System and method for spectral tuning of broadband light sources |
| US10018919B2 (en) | 2016-05-29 | 2018-07-10 | Kla-Tencor Corporation | System and method for fabricating metrology targets oriented with an angle rotated with respect to device features |
| US10371626B2 (en) * | 2016-08-17 | 2019-08-06 | Kla-Tencor Corporation | System and method for generating multi-channel tunable illumination from a broadband source |
| US11815347B2 (en) * | 2016-09-28 | 2023-11-14 | Kla-Tencor Corporation | Optical near-field metrology |
| US10444161B2 (en) * | 2017-04-05 | 2019-10-15 | Kla-Tencor Corporation | Systems and methods for metrology with layer-specific illumination spectra |
| US10817999B2 (en) * | 2017-07-18 | 2020-10-27 | Kla Corporation | Image-based overlay metrology and monitoring using through-focus imaging |
-
2018
- 2018-04-09 US US15/948,941 patent/US10677588B2/en active Active
-
2019
- 2019-04-05 WO PCT/US2019/025917 patent/WO2019199585A1/en not_active Ceased
- 2019-04-05 IL IL277841A patent/IL277841B2/en unknown
- 2019-04-05 KR KR1020207032174A patent/KR102448698B1/ko active Active
- 2019-04-05 JP JP2020555097A patent/JP7085642B2/ja active Active
- 2019-04-05 EP EP19785061.3A patent/EP3762900B1/en active Active
- 2019-04-05 CN CN201980023057.4A patent/CN111971712B/zh active Active
- 2019-04-05 SG SG11202005972UA patent/SG11202005972UA/en unknown
- 2019-04-08 TW TW108112069A patent/TWI781312B/zh active
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