JP2024513341A5 - - Google Patents
Info
- Publication number
- JP2024513341A5 JP2024513341A5 JP2023557388A JP2023557388A JP2024513341A5 JP 2024513341 A5 JP2024513341 A5 JP 2024513341A5 JP 2023557388 A JP2023557388 A JP 2023557388A JP 2023557388 A JP2023557388 A JP 2023557388A JP 2024513341 A5 JP2024513341 A5 JP 2024513341A5
- Authority
- JP
- Japan
- Prior art keywords
- images
- target feature
- cameras
- symmetry
- variation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024050417A JP7725645B2 (ja) | 2021-03-31 | 2024-03-26 | オーバレイ計量の性能拡張 |
| JP2025060950A JP2025096344A (ja) | 2021-03-31 | 2025-04-02 | 光学検査装置及び計量方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/219,869 US11592755B2 (en) | 2021-03-31 | 2021-03-31 | Enhancing performance of overlay metrology |
| US17/219,869 | 2021-03-31 | ||
| PCT/US2021/039472 WO2022211835A1 (en) | 2021-03-31 | 2021-06-29 | Enhancing performance of overlay metrology |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024050417A Division JP7725645B2 (ja) | 2021-03-31 | 2024-03-26 | オーバレイ計量の性能拡張 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2024513341A JP2024513341A (ja) | 2024-03-25 |
| JP2024513341A5 true JP2024513341A5 (https=) | 2024-04-09 |
| JP7579988B2 JP7579988B2 (ja) | 2024-11-08 |
Family
ID=83450225
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023557388A Active JP7579988B2 (ja) | 2021-03-31 | 2021-06-29 | オーバレイ計量の性能拡張 |
| JP2024050417A Active JP7725645B2 (ja) | 2021-03-31 | 2024-03-26 | オーバレイ計量の性能拡張 |
| JP2025060950A Pending JP2025096344A (ja) | 2021-03-31 | 2025-04-02 | 光学検査装置及び計量方法 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024050417A Active JP7725645B2 (ja) | 2021-03-31 | 2024-03-26 | オーバレイ計量の性能拡張 |
| JP2025060950A Pending JP2025096344A (ja) | 2021-03-31 | 2025-04-02 | 光学検査装置及び計量方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US11592755B2 (https=) |
| JP (3) | JP7579988B2 (https=) |
| KR (3) | KR20240038171A (https=) |
| CN (2) | CN118311056B (https=) |
| TW (3) | TW202530684A (https=) |
| WO (1) | WO2022211835A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102524462B1 (ko) * | 2022-03-28 | 2023-04-21 | (주)오로스 테크놀로지 | 오버레이 측정장치 |
| KR102554833B1 (ko) * | 2023-02-14 | 2023-07-13 | (주)오로스 테크놀로지 | 오버레이 계측 장치 및 오버레이 계측 방법 |
| KR102898111B1 (ko) * | 2023-03-15 | 2025-12-09 | (주) 오로스테크놀로지 | 오버레이 측정 장치의 최적화 방법 및 이를 수행하는 오버레이 측정 장치 |
| US20240337953A1 (en) * | 2023-04-04 | 2024-10-10 | Kla Corporation | System and method for tracking real-time position for scanning overlay metrology |
| KR102615980B1 (ko) * | 2023-06-09 | 2023-12-21 | (주)오로스 테크놀로지 | 오버레이 계측 장치 및 오버레이 계측 방법 |
| US12411420B2 (en) * | 2023-09-29 | 2025-09-09 | Kla Corporation | Small in-die target design for overlay measurement |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08241844A (ja) * | 1995-03-06 | 1996-09-17 | Hitachi Ltd | 相対位置検出装置および方法ならびに露光方法 |
| US7541201B2 (en) * | 2000-08-30 | 2009-06-02 | Kla-Tencor Technologies Corporation | Apparatus and methods for determining overlay of structures having rotational or mirror symmetry |
| US7317531B2 (en) * | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
| JP2005156487A (ja) | 2003-11-28 | 2005-06-16 | Hitachi High-Technologies Corp | 重ね合わせ誤差測定方法、重ね合わせ誤差測定装置、及び半導体デバイスの製造方法 |
| US7684039B2 (en) | 2005-11-18 | 2010-03-23 | Kla-Tencor Technologies Corporation | Overlay metrology using the near infra-red spectral range |
| NL2007425A (en) * | 2010-11-12 | 2012-05-15 | Asml Netherlands Bv | Metrology method and apparatus, and device manufacturing method. |
| US9223227B2 (en) * | 2011-02-11 | 2015-12-29 | Asml Netherlands B.V. | Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method |
| JP5659073B2 (ja) * | 2011-04-22 | 2015-01-28 | 株式会社ジャパンディスプレイ | タッチ検出器付き表示パネル、および電子機器 |
| US9709903B2 (en) * | 2011-11-01 | 2017-07-18 | Kla-Tencor Corporation | Overlay target geometry for measuring multiple pitches |
| US8860941B2 (en) | 2012-04-27 | 2014-10-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Tool induced shift reduction determination for overlay metrology |
| WO2014062972A1 (en) | 2012-10-18 | 2014-04-24 | Kla-Tencor Corporation | Symmetric target design in scatterometry overlay metrology |
| US9189705B2 (en) | 2013-08-08 | 2015-11-17 | JSMSW Technology LLC | Phase-controlled model-based overlay measurement systems and methods |
| SG11201609566VA (en) | 2014-06-02 | 2016-12-29 | Asml Netherlands Bv | Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing method |
| US10151986B2 (en) * | 2014-07-07 | 2018-12-11 | Kla-Tencor Corporation | Signal response metrology based on measurements of proxy structures |
| KR102235615B1 (ko) | 2014-07-29 | 2021-04-02 | 삼성전자주식회사 | 노광 공정 계측용 기판 타겟 및 노광 공정 계측 방법과 이를 이용한 집적회로 소자의 제조 방법 |
| JP6421237B2 (ja) * | 2014-08-29 | 2018-11-07 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジー方法、ターゲット、及び基板 |
| JP2017183354A (ja) | 2016-03-28 | 2017-10-05 | 株式会社デンソー | 半導体装置の製造装置および半導体装置の製造方法 |
| US10451412B2 (en) * | 2016-04-22 | 2019-10-22 | Kla-Tencor Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
| WO2018015179A1 (en) * | 2016-07-21 | 2018-01-25 | Asml Netherlands B.V. | Method of measuring a target, substrate, metrology apparatus, and lithographic apparatus |
| KR102259091B1 (ko) * | 2016-11-10 | 2021-06-01 | 에이에스엠엘 네델란즈 비.브이. | 스택 차이를 이용한 설계 및 교정 |
| EP3336605A1 (en) * | 2016-12-15 | 2018-06-20 | ASML Netherlands B.V. | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method |
| CN110249268B (zh) * | 2017-02-02 | 2021-08-24 | Asml荷兰有限公司 | 量测方法和设备以及关联的计算机产品 |
| KR20200004381A (ko) * | 2017-05-08 | 2020-01-13 | 에이에스엠엘 네델란즈 비.브이. | 구조체를 측정하는 방법, 검사 장치, 리소그래피 시스템 및 디바이스 제조 방법 |
| EP3444674A1 (en) * | 2017-08-14 | 2019-02-20 | ASML Netherlands B.V. | Method and apparatus to determine a patterning process parameter |
| US10510623B2 (en) | 2017-12-27 | 2019-12-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Overlay error and process window metrology |
| WO2019129485A1 (en) * | 2017-12-29 | 2019-07-04 | Asml Netherlands B.V. | Method and device for determining adjustments to sensitivity parameters |
| CN111615667A (zh) * | 2018-01-17 | 2020-09-01 | Asml荷兰有限公司 | 测量目标的方法和量测设备 |
| WO2019182637A1 (en) * | 2018-03-19 | 2019-09-26 | Kla-Tencor Corporation | Overlay measurement using multiple wavelengths |
| US10677588B2 (en) * | 2018-04-09 | 2020-06-09 | Kla-Tencor Corporation | Localized telecentricity and focus optimization for overlay metrology |
| WO2020123014A1 (en) * | 2018-12-14 | 2020-06-18 | Kla Corporation | Per-site residuals analysis for accurate metrology measurements |
| KR102273278B1 (ko) | 2019-09-10 | 2021-07-07 | (주)오로스 테크놀로지 | 오버레이 측정장치 |
| US11300405B2 (en) | 2020-08-03 | 2022-04-12 | Kla Corporation | Grey-mode scanning scatterometry overlay metrology |
-
2021
- 2021-03-31 US US17/219,869 patent/US11592755B2/en active Active
- 2021-05-31 TW TW114108803A patent/TW202530684A/zh unknown
- 2021-05-31 TW TW113111136A patent/TWI880687B/zh active
- 2021-05-31 TW TW110119628A patent/TWI861408B/zh active
- 2021-06-29 CN CN202410419802.XA patent/CN118311056B/zh active Active
- 2021-06-29 KR KR1020247008786A patent/KR20240038171A/ko active Pending
- 2021-06-29 WO PCT/US2021/039472 patent/WO2022211835A1/en not_active Ceased
- 2021-06-29 KR KR1020237030056A patent/KR102785530B1/ko active Active
- 2021-06-29 KR KR1020257008905A patent/KR102944397B1/ko active Active
- 2021-06-29 CN CN202180095179.1A patent/CN116964438B/zh active Active
- 2021-06-29 JP JP2023557388A patent/JP7579988B2/ja active Active
-
2023
- 2023-02-27 US US18/114,451 patent/US12001148B2/en active Active
-
2024
- 2024-03-26 JP JP2024050417A patent/JP7725645B2/ja active Active
-
2025
- 2025-04-02 JP JP2025060950A patent/JP2025096344A/ja active Pending
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