KR102812583B1 - 온 더 플라이 산란계측 오버레이 계측 타겟 - Google Patents

온 더 플라이 산란계측 오버레이 계측 타겟 Download PDF

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KR102812583B1
KR102812583B1 KR1020237021572A KR20237021572A KR102812583B1 KR 102812583 B1 KR102812583 B1 KR 102812583B1 KR 1020237021572 A KR1020237021572 A KR 1020237021572A KR 20237021572 A KR20237021572 A KR 20237021572A KR 102812583 B1 KR102812583 B1 KR 102812583B1
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pattern elements
sample
overlay
sample layer
measurement
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Korean (ko)
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KR20230116841A (ko
Inventor
유리 파스코버
이타이 지도르
유발 루바쉐프스키
블라디미르 레빈스키
알렉산더 볼프만
요람 유지엘
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케이엘에이 코포레이션
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70681—Metrology strategies
    • G03F7/70683—Mark designs

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020237021572A 2020-12-11 2021-11-30 온 더 플라이 산란계측 오버레이 계측 타겟 Active KR102812583B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17/119,536 US11378394B1 (en) 2020-12-11 2020-12-11 On-the-fly scatterometry overlay metrology target
US17/119,536 2020-12-11
PCT/US2021/061296 WO2022125340A1 (en) 2020-12-11 2021-11-30 On-the-fly scatterometry overlay metrology target

Publications (2)

Publication Number Publication Date
KR20230116841A KR20230116841A (ko) 2023-08-04
KR102812583B1 true KR102812583B1 (ko) 2025-05-23

Family

ID=81942344

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237021572A Active KR102812583B1 (ko) 2020-12-11 2021-11-30 온 더 플라이 산란계측 오버레이 계측 타겟

Country Status (7)

Country Link
US (1) US11378394B1 (https=)
EP (1) EP4251980A4 (https=)
JP (1) JP7569938B2 (https=)
KR (1) KR102812583B1 (https=)
CN (1) CN116583742A (https=)
TW (1) TWI884321B (https=)
WO (1) WO2022125340A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12032300B2 (en) 2022-02-14 2024-07-09 Kla Corporation Imaging overlay with mutually coherent oblique illumination
US12422363B2 (en) 2022-03-30 2025-09-23 Kla Corporation Scanning scatterometry overlay metrology
US12487190B2 (en) 2022-03-30 2025-12-02 Kla Corporation System and method for isolation of specific fourier pupil frequency in overlay metrology
US12235588B2 (en) 2023-02-16 2025-02-25 Kla Corporation Scanning overlay metrology with high signal to noise ratio
US12560548B2 (en) 2023-09-06 2026-02-24 Kla Corporation Spectral angular metrology
US12373936B2 (en) 2023-12-08 2025-07-29 Kla Corporation System and method for overlay metrology using a phase mask

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7068833B1 (en) 2000-08-30 2006-06-27 Kla-Tencor Corporation Overlay marks, methods of overlay mark design and methods of overlay measurements
US7541201B2 (en) 2000-08-30 2009-06-02 Kla-Tencor Technologies Corporation Apparatus and methods for determining overlay of structures having rotational or mirror symmetry
US20030002043A1 (en) 2001-04-10 2003-01-02 Kla-Tencor Corporation Periodic patterns and technique to control misalignment
US7440105B2 (en) * 2002-12-05 2008-10-21 Kla-Tencor Technologies Corporation Continuously varying offset mark and methods of determining overlay
WO2004053426A1 (en) * 2002-12-05 2004-06-24 Kla-Tencor Technologies Corporation Apparatus and methods for detecting overlay errors using scatterometry
US7671990B1 (en) * 2006-07-28 2010-03-02 Kla-Tencor Technologies Corporation Cross hatched metrology marks and associated method of use
KR101652133B1 (ko) * 2008-09-29 2016-08-29 케이엘에이-텐코어 코오포레이션 계측 시스템의 조명 서브시스템들, 계측 시스템들 및 계측 측정들을 위한 표본을 조명하기 위한 방법들
US9927718B2 (en) * 2010-08-03 2018-03-27 Kla-Tencor Corporation Multi-layer overlay metrology target and complimentary overlay metrology measurement systems
KR101185992B1 (ko) 2011-01-03 2012-09-26 에스케이하이닉스 주식회사 오버레이 모니터링 패턴 및 이를 이용한 반도체 소자의 정렬도 측정방법
EP3779598B1 (en) 2011-04-06 2022-12-21 Kla-Tencor Corporation Method for providing a set of process tool correctables
US9709903B2 (en) * 2011-11-01 2017-07-18 Kla-Tencor Corporation Overlay target geometry for measuring multiple pitches
NL2011816A (en) * 2012-11-30 2014-06-04 Asml Netherlands Bv Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing method.
US9885961B1 (en) * 2013-05-29 2018-02-06 Kla-Tencor Corporation Partly disappearing targets
WO2014194095A1 (en) 2013-05-30 2014-12-04 Kla-Tencor Corporation Combined imaging and scatterometry metrology
US9214317B2 (en) 2013-06-04 2015-12-15 Kla-Tencor Corporation System and method of SEM overlay metrology
TWI648515B (zh) 2013-11-15 2019-01-21 美商克萊譚克公司 計量目標及其計量量測、目標設計檔案、計量方法及以電腦為基礎之設備
US9784690B2 (en) * 2014-05-12 2017-10-10 Kla-Tencor Corporation Apparatus, techniques, and target designs for measuring semiconductor parameters
WO2015196168A1 (en) 2014-06-21 2015-12-23 Kla-Tencor Corporation Compound imaging metrology targets
CN105511238B (zh) 2014-09-26 2017-11-03 中芯国际集成电路制造(上海)有限公司 光刻对准标记结构及形成方法、半导体结构的形成方法
WO2016078862A1 (en) 2014-11-21 2016-05-26 Asml Netherlands B.V. Metrology method and apparatus
WO2017176314A1 (en) * 2016-04-04 2017-10-12 Kla-Tencor Corporation Process compatibility improvement by fill factor modulation
CN109075090B (zh) 2016-06-27 2020-11-06 科磊股份有限公司 用于测量图案放置及图案大小的设备及方法及其计算机程序
US11248905B2 (en) * 2017-08-16 2022-02-15 Kla-Tencor Corporation Machine learning in metrology measurements
US10705435B2 (en) 2018-01-12 2020-07-07 Globalfoundries Inc. Self-referencing and self-calibrating interference pattern overlay measurement
KR102637420B1 (ko) * 2019-03-25 2024-02-15 케이엘에이 코포레이션 계측에 사용하기 위한 개선된 자체 모아레 격자 설계

Also Published As

Publication number Publication date
CN116583742A (zh) 2023-08-11
US20220187062A1 (en) 2022-06-16
WO2022125340A1 (en) 2022-06-16
EP4251980A4 (en) 2024-11-13
KR20230116841A (ko) 2023-08-04
US11378394B1 (en) 2022-07-05
JP7569938B2 (ja) 2024-10-18
TW202240323A (zh) 2022-10-16
EP4251980A1 (en) 2023-10-04
TWI884321B (zh) 2025-05-21
JP2023553053A (ja) 2023-12-20

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