JP2023180018A - 感光性樹脂組成物、硬化膜、ディスプレイ構成要素および表示装置 - Google Patents

感光性樹脂組成物、硬化膜、ディスプレイ構成要素および表示装置 Download PDF

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Publication number
JP2023180018A
JP2023180018A JP2022093056A JP2022093056A JP2023180018A JP 2023180018 A JP2023180018 A JP 2023180018A JP 2022093056 A JP2022093056 A JP 2022093056A JP 2022093056 A JP2022093056 A JP 2022093056A JP 2023180018 A JP2023180018 A JP 2023180018A
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JP
Japan
Prior art keywords
component
light
acid
cured film
photosensitive resin
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022093056A
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English (en)
Japanese (ja)
Inventor
航平 岩井
Kohei Iwai
悠樹 小野
Yuki Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Chemical and Materials Co Ltd
Original Assignee
Nippon Steel Chemical and Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Chemical and Materials Co Ltd filed Critical Nippon Steel Chemical and Materials Co Ltd
Priority to JP2022093056A priority Critical patent/JP2023180018A/ja
Priority to KR1020230071834A priority patent/KR20230168971A/ko
Priority to CN202310668513.9A priority patent/CN117192898A/zh
Priority to TW112121275A priority patent/TW202349036A/zh
Publication of JP2023180018A publication Critical patent/JP2023180018A/ja
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)
JP2022093056A 2022-06-08 2022-06-08 感光性樹脂組成物、硬化膜、ディスプレイ構成要素および表示装置 Pending JP2023180018A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2022093056A JP2023180018A (ja) 2022-06-08 2022-06-08 感光性樹脂組成物、硬化膜、ディスプレイ構成要素および表示装置
KR1020230071834A KR20230168971A (ko) 2022-06-08 2023-06-02 감광성 수지 조성물, 경화막, 디스플레이 구성 요소 및 표시 장치
CN202310668513.9A CN117192898A (zh) 2022-06-08 2023-06-07 感旋光性树脂组合物、硬化膜、显示器构成要素及显示装置
TW112121275A TW202349036A (zh) 2022-06-08 2023-06-07 感光性樹脂組成物、硬化膜、顯示器構成要素及顯示裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022093056A JP2023180018A (ja) 2022-06-08 2022-06-08 感光性樹脂組成物、硬化膜、ディスプレイ構成要素および表示装置

Publications (1)

Publication Number Publication Date
JP2023180018A true JP2023180018A (ja) 2023-12-20

Family

ID=88983947

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022093056A Pending JP2023180018A (ja) 2022-06-08 2022-06-08 感光性樹脂組成物、硬化膜、ディスプレイ構成要素および表示装置

Country Status (4)

Country Link
JP (1) JP2023180018A (ko)
KR (1) KR20230168971A (ko)
CN (1) CN117192898A (ko)
TW (1) TW202349036A (ko)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6318699B2 (ja) 2014-02-27 2018-05-09 凸版印刷株式会社 黒色感光性樹脂組成物、ブラックマトリクス、ブラックマトリクス基板、カラーフィルタ、液晶表示装置及び有機エレクトロルミネッセンス表示装置

Also Published As

Publication number Publication date
TW202349036A (zh) 2023-12-16
KR20230168971A (ko) 2023-12-15
CN117192898A (zh) 2023-12-08

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