JP2023171299A - 化合物及びそれを含むフォトレジスト組成物 - Google Patents

化合物及びそれを含むフォトレジスト組成物 Download PDF

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Publication number
JP2023171299A
JP2023171299A JP2023079328A JP2023079328A JP2023171299A JP 2023171299 A JP2023171299 A JP 2023171299A JP 2023079328 A JP2023079328 A JP 2023079328A JP 2023079328 A JP2023079328 A JP 2023079328A JP 2023171299 A JP2023171299 A JP 2023171299A
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JP
Japan
Prior art keywords
substituted
unsubstituted
group
photoresist composition
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023079328A
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English (en)
Japanese (ja)
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JP2023171299A5 (https=
Inventor
リー ツイ
Li Cui
アカド エマド
Aqad Emad
インジェ ツェン
Yinjie Cen
エイ．ヘルゼル コナー
A Hoelzel Connor
エフ．キャメロン ジェームズ
F Cameron James
ジョン グン パク
Jon Gun Paku
エム．コーリー スザンヌ
M Coley Suzanne
チョン－ボン イ
Choong-Bong Lee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials International LLC
Original Assignee
Rohm and Haas Electronic Materials LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Electronic Materials LLC filed Critical Rohm and Haas Electronic Materials LLC
Publication of JP2023171299A publication Critical patent/JP2023171299A/ja
Publication of JP2023171299A5 publication Critical patent/JP2023171299A5/ja
Priority to JP2025114059A priority Critical patent/JP2025160221A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/16—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C317/22—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/78—Benzoic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/84—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring
    • C07C69/92—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring with etherified hydroxyl groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/06—Systems containing only non-condensed rings with a five-membered ring
    • C07C2601/08—Systems containing only non-condensed rings with a five-membered ring the ring being saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/16—Systems containing only non-condensed rings with a six-membered ring the ring being unsaturated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2023079328A 2022-05-20 2023-05-12 化合物及びそれを含むフォトレジスト組成物 Pending JP2023171299A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025114059A JP2025160221A (ja) 2022-05-20 2025-07-04 化合物及びそれを含むフォトレジスト組成物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17/749,880 2022-05-20
US17/749,880 US20240019779A1 (en) 2022-05-20 2022-05-20 Compounds and photoresist compositions including the same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025114059A Division JP2025160221A (ja) 2022-05-20 2025-07-04 化合物及びそれを含むフォトレジスト組成物

Publications (2)

Publication Number Publication Date
JP2023171299A true JP2023171299A (ja) 2023-12-01
JP2023171299A5 JP2023171299A5 (https=) 2024-11-25

Family

ID=88768838

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2023079328A Pending JP2023171299A (ja) 2022-05-20 2023-05-12 化合物及びそれを含むフォトレジスト組成物
JP2025114059A Pending JP2025160221A (ja) 2022-05-20 2025-07-04 化合物及びそれを含むフォトレジスト組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025114059A Pending JP2025160221A (ja) 2022-05-20 2025-07-04 化合物及びそれを含むフォトレジスト組成物

Country Status (5)

Country Link
US (1) US20240019779A1 (https=)
JP (2) JP2023171299A (https=)
KR (1) KR102896403B1 (https=)
CN (1) CN117088795A (https=)
TW (1) TW202346253A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025197401A1 (ja) * 2024-03-22 2025-09-25 Jsr株式会社 感放射線性組成物及びレジストパターン形成方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240393689A1 (en) * 2023-05-26 2024-11-28 Dupont Electronic Materials International, Llc Compounds, monomers, polymers, photoresist compositions and pattern formation methods

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09258435A (ja) * 1996-03-22 1997-10-03 Fuji Photo Film Co Ltd ポジ型感光性組成物
JPH10310642A (ja) * 1997-03-10 1998-11-24 Shin Etsu Chem Co Ltd 新規高分子シリコーン化合物、化学増幅ポジ型レジスト材料及びパターン形成方法
JP2006154818A (ja) * 2004-11-24 2006-06-15 Rohm & Haas Electronic Materials Llc フォトレジスト組成物
JP2009241418A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
JP2013001811A (ja) * 2011-06-16 2013-01-07 Hitachi Chemical Co Ltd 電子部品用樹脂組成物及び電子部品装置
JP2018527418A (ja) * 2015-06-24 2018-09-20 常州強力電子新材料股▲分▼有限公司ＣＨＡＮＧＺＨＯＵ ＴＲＯＮＬＹ ＮＥＷ ＥＬＥＣＴＲＯＮＩＣ ＭＡＴＥＲＩＡＬＳ Ｃｏ．， Ｌｔｄ． Ｕｖ−ｌｅｄ光硬化用の増感剤及びその製造方法ならびに使用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1842742B (zh) * 2003-08-28 2010-05-12 日立化成工业株式会社 感光性树脂组合物、使用该组合物的感光性元件、抗蚀剂图案的形成方法及印刷电路板的制造方法以及光固化物的去除方法
JP4691461B2 (ja) * 2006-03-13 2011-06-01 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
US7566527B2 (en) * 2007-06-27 2009-07-28 International Business Machines Corporation Fused aromatic structures and methods for photolithographic applications
KR20120044349A (ko) * 2009-07-31 2012-05-07 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 조성물 및 그것을 사용한 패턴 형성 방법
JP2011180304A (ja) * 2010-02-26 2011-09-15 Fujifilm Corp フォトマスクブランクス、フォトマスク及びその製造方法
JP2012063728A (ja) * 2010-09-17 2012-03-29 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物、並びに、該組成物を用いたレジスト膜及びパターン形成方法
WO2016076205A1 (ja) * 2014-11-14 2016-05-19 Jsr株式会社 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
WO2018180049A1 (ja) * 2017-03-30 2018-10-04 Jsr株式会社 感放射線性組成物及びレジストパターン形成方法
CN111440115B (zh) * 2020-04-29 2022-03-29 中山大学 光敏性功能联苯二胺的制备方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09258435A (ja) * 1996-03-22 1997-10-03 Fuji Photo Film Co Ltd ポジ型感光性組成物
JPH10310642A (ja) * 1997-03-10 1998-11-24 Shin Etsu Chem Co Ltd 新規高分子シリコーン化合物、化学増幅ポジ型レジスト材料及びパターン形成方法
JP2006154818A (ja) * 2004-11-24 2006-06-15 Rohm & Haas Electronic Materials Llc フォトレジスト組成物
JP2009241418A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
JP2013001811A (ja) * 2011-06-16 2013-01-07 Hitachi Chemical Co Ltd 電子部品用樹脂組成物及び電子部品装置
JP2018527418A (ja) * 2015-06-24 2018-09-20 常州強力電子新材料股▲分▼有限公司ＣＨＡＮＧＺＨＯＵ ＴＲＯＮＬＹ ＮＥＷ ＥＬＥＣＴＲＯＮＩＣ ＭＡＴＥＲＩＡＬＳ Ｃｏ．， Ｌｔｄ． Ｕｖ−ｌｅｄ光硬化用の増感剤及びその製造方法ならびに使用

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025197401A1 (ja) * 2024-03-22 2025-09-25 Jsr株式会社 感放射線性組成物及びレジストパターン形成方法

Also Published As

Publication number Publication date
US20240019779A1 (en) 2024-01-18
CN117088795A (zh) 2023-11-21
JP2025160221A (ja) 2025-10-22
KR20230162552A (ko) 2023-11-28
KR102896403B1 (ko) 2025-12-04
TW202346253A (zh) 2023-12-01

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