JP2023171299A5 - - Google Patents
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- Publication number
- JP2023171299A5 JP2023171299A5 JP2023079328A JP2023079328A JP2023171299A5 JP 2023171299 A5 JP2023171299 A5 JP 2023171299A5 JP 2023079328 A JP2023079328 A JP 2023079328A JP 2023079328 A JP2023079328 A JP 2023079328A JP 2023171299 A5 JP2023171299 A5 JP 2023171299A5
- Authority
- JP
- Japan
- Prior art keywords
- unsubstituted
- substituted
- hydrogen
- heteroaryl
- aryl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000001072 heteroaryl group Chemical group 0.000 description 2
- 125000006651 (C3-C20) cycloalkyl group Chemical group 0.000 description 1
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000004366 heterocycloalkenyl group Chemical group 0.000 description 1
- 125000000592 heterocycloalkyl group Chemical group 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025114059A JP2025160221A (ja) | 2022-05-20 | 2025-07-04 | 化合物及びそれを含むフォトレジスト組成物 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/749,880 | 2022-05-20 | ||
| US17/749,880 US20240019779A1 (en) | 2022-05-20 | 2022-05-20 | Compounds and photoresist compositions including the same |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025114059A Division JP2025160221A (ja) | 2022-05-20 | 2025-07-04 | 化合物及びそれを含むフォトレジスト組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023171299A JP2023171299A (ja) | 2023-12-01 |
| JP2023171299A5 true JP2023171299A5 (https=) | 2024-11-25 |
Family
ID=88768838
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023079328A Pending JP2023171299A (ja) | 2022-05-20 | 2023-05-12 | 化合物及びそれを含むフォトレジスト組成物 |
| JP2025114059A Pending JP2025160221A (ja) | 2022-05-20 | 2025-07-04 | 化合物及びそれを含むフォトレジスト組成物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025114059A Pending JP2025160221A (ja) | 2022-05-20 | 2025-07-04 | 化合物及びそれを含むフォトレジスト組成物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240019779A1 (https=) |
| JP (2) | JP2023171299A (https=) |
| KR (1) | KR102896403B1 (https=) |
| CN (1) | CN117088795A (https=) |
| TW (1) | TW202346253A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240393689A1 (en) * | 2023-05-26 | 2024-11-28 | Dupont Electronic Materials International, Llc | Compounds, monomers, polymers, photoresist compositions and pattern formation methods |
| WO2025197401A1 (ja) * | 2024-03-22 | 2025-09-25 | Jsr株式会社 | 感放射線性組成物及びレジストパターン形成方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09258435A (ja) * | 1996-03-22 | 1997-10-03 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
| JP3666550B2 (ja) * | 1997-03-10 | 2005-06-29 | 信越化学工業株式会社 | 新規高分子シリコーン化合物、化学増幅ポジ型レジスト材料及びパターン形成方法 |
| CN1842742B (zh) * | 2003-08-28 | 2010-05-12 | 日立化成工业株式会社 | 感光性树脂组合物、使用该组合物的感光性元件、抗蚀剂图案的形成方法及印刷电路板的制造方法以及光固化物的去除方法 |
| US20060172223A1 (en) * | 2004-11-24 | 2006-08-03 | Rohm And Haas Electronic Materials Llc | Photoresist compositions |
| JP4691461B2 (ja) * | 2006-03-13 | 2011-06-01 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| US7566527B2 (en) * | 2007-06-27 | 2009-07-28 | International Business Machines Corporation | Fused aromatic structures and methods for photolithographic applications |
| JP5137661B2 (ja) * | 2008-03-31 | 2013-02-06 | 富士フイルム株式会社 | レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法 |
| KR20120044349A (ko) * | 2009-07-31 | 2012-05-07 | 후지필름 가부시키가이샤 | 감활성광선성 또는 감방사선성 조성물 및 그것을 사용한 패턴 형성 방법 |
| JP2011180304A (ja) * | 2010-02-26 | 2011-09-15 | Fujifilm Corp | フォトマスクブランクス、フォトマスク及びその製造方法 |
| JP2012063728A (ja) * | 2010-09-17 | 2012-03-29 | Fujifilm Corp | 感活性光線性又は感放射線性樹脂組成物、並びに、該組成物を用いたレジスト膜及びパターン形成方法 |
| JP5682470B2 (ja) * | 2011-06-16 | 2015-03-11 | 日立化成株式会社 | 電子部品用樹脂組成物及び電子部品装置 |
| WO2016076205A1 (ja) * | 2014-11-14 | 2016-05-19 | Jsr株式会社 | 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子 |
| CN104991418B (zh) * | 2015-06-24 | 2019-09-24 | 常州强力电子新材料股份有限公司 | 一种用于uv-led光固化的增感剂及其制备方法和应用 |
| WO2018180049A1 (ja) * | 2017-03-30 | 2018-10-04 | Jsr株式会社 | 感放射線性組成物及びレジストパターン形成方法 |
| CN111440115B (zh) * | 2020-04-29 | 2022-03-29 | 中山大学 | 光敏性功能联苯二胺的制备方法 |
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2022
- 2022-05-20 US US17/749,880 patent/US20240019779A1/en active Pending
-
2023
- 2023-05-12 JP JP2023079328A patent/JP2023171299A/ja active Pending
- 2023-05-17 TW TW112118273A patent/TW202346253A/zh unknown
- 2023-05-18 CN CN202310561110.4A patent/CN117088795A/zh active Pending
- 2023-05-18 KR KR1020230064261A patent/KR102896403B1/ko active Active
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2025
- 2025-07-04 JP JP2025114059A patent/JP2025160221A/ja active Pending