JP2023051872A5 - - Google Patents
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- Publication number
- JP2023051872A5 JP2023051872A5 JP2022157205A JP2022157205A JP2023051872A5 JP 2023051872 A5 JP2023051872 A5 JP 2023051872A5 JP 2022157205 A JP2022157205 A JP 2022157205A JP 2022157205 A JP2022157205 A JP 2022157205A JP 2023051872 A5 JP2023051872 A5 JP 2023051872A5
- Authority
- JP
- Japan
- Prior art keywords
- unsubstituted
- substituted
- ring
- linking group
- divalent linking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000005647 linker group Chemical group 0.000 claims 14
- 229910052739 hydrogen Inorganic materials 0.000 claims 11
- 239000001257 hydrogen Substances 0.000 claims 11
- 125000000217 alkyl group Chemical group 0.000 claims 10
- 125000006651 (C3-C20) cycloalkyl group Chemical group 0.000 claims 9
- 125000000592 heterocycloalkyl group Chemical group 0.000 claims 9
- 150000002431 hydrogen Chemical class 0.000 claims 9
- 125000003118 aryl group Chemical group 0.000 claims 8
- 125000001072 heteroaryl group Chemical group 0.000 claims 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 3
- 229920002554 vinyl polymer Polymers 0.000 claims 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 125000004404 heteroalkyl group Chemical group 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 2
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 125000000392 cycloalkenyl group Chemical group 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 125000004366 heterocycloalkenyl group Chemical group 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000000686 lactone group Chemical group 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025022768A JP2025072641A (ja) | 2021-09-30 | 2025-02-14 | フォトレジスト組成物及びパターン形成方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/490,738 US12085854B2 (en) | 2021-09-30 | 2021-09-30 | Photoresist compositions and pattern formation methods |
| US17/490,738 | 2021-09-30 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025022768A Division JP2025072641A (ja) | 2021-09-30 | 2025-02-14 | フォトレジスト組成物及びパターン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023051872A JP2023051872A (ja) | 2023-04-11 |
| JP2023051872A5 true JP2023051872A5 (https=) | 2024-07-16 |
Family
ID=85750567
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022157205A Pending JP2023051872A (ja) | 2021-09-30 | 2022-09-30 | フォトレジスト組成物及びパターン形成方法 |
| JP2025022768A Pending JP2025072641A (ja) | 2021-09-30 | 2025-02-14 | フォトレジスト組成物及びパターン形成方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025022768A Pending JP2025072641A (ja) | 2021-09-30 | 2025-02-14 | フォトレジスト組成物及びパターン形成方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US12085854B2 (https=) |
| JP (2) | JP2023051872A (https=) |
| KR (1) | KR102847004B1 (https=) |
| TW (1) | TW202315916A (https=) |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4189323A (en) | 1977-04-25 | 1980-02-19 | Hoechst Aktiengesellschaft | Radiation-sensitive copying composition |
| US6406828B1 (en) | 2000-02-24 | 2002-06-18 | Shipley Company, L.L.C. | Polymer and photoresist compositions |
| US6627391B1 (en) * | 2000-08-16 | 2003-09-30 | International Business Machines Corporation | Resist compositions containing lactone additives |
| JP5448651B2 (ja) | 2009-08-31 | 2014-03-19 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物、及びそれを用いたパターン形成方法 |
| JP2011074365A (ja) | 2009-09-02 | 2011-04-14 | Sumitomo Chemical Co Ltd | 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法 |
| JP6260531B2 (ja) * | 2012-05-17 | 2018-01-17 | Jsr株式会社 | 酸拡散制御剤、感放射線性樹脂組成物及びレジストパターン形成方法 |
| JP6028716B2 (ja) * | 2013-11-05 | 2016-11-16 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP2015094898A (ja) | 2013-11-13 | 2015-05-18 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置および有機ｅｌ表示装置 |
| JP6782102B2 (ja) * | 2015-06-26 | 2020-11-11 | 住友化学株式会社 | レジスト組成物 |
| JP6579044B2 (ja) | 2015-06-30 | 2019-09-25 | 信越化学工業株式会社 | レジスト組成物及びパターン形成方法 |
| US20200209743A1 (en) * | 2018-12-31 | 2020-07-02 | Rohm And Haas Electronic Materials Llc | Composition for preparing thick film photorest, thick film photoresist, and process of preparing the same |
-
2021
- 2021-09-30 US US17/490,738 patent/US12085854B2/en active Active
-
2022
- 2022-09-28 TW TW111136710A patent/TW202315916A/zh unknown
- 2022-09-29 KR KR1020220124472A patent/KR102847004B1/ko active Active
- 2022-09-30 JP JP2022157205A patent/JP2023051872A/ja active Pending
-
2025
- 2025-02-14 JP JP2025022768A patent/JP2025072641A/ja active Pending
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