KR102896403B1 - 화합물 및 이를 포함하는 포토레지스트 조성물 - Google Patents

화합물 및 이를 포함하는 포토레지스트 조성물

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Publication number
KR102896403B1
KR102896403B1 KR1020230064261A KR20230064261A KR102896403B1 KR 102896403 B1 KR102896403 B1 KR 102896403B1 KR 1020230064261 A KR1020230064261 A KR 1020230064261A KR 20230064261 A KR20230064261 A KR 20230064261A KR 102896403 B1 KR102896403 B1 KR 102896403B1
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KR
South Korea
Prior art keywords
substituted
unsubstituted
group
chemical formula
photoresist composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020230064261A
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English (en)
Korean (ko)
Other versions
KR20230162552A (ko
Inventor
리 추이
에머드 아퀘드
윈지에 첸
코너 에이. 호엘젤
제임스 에프. 카메론
종 근 박
수잔 엠. 콜리
충-봉 이
Original Assignee
듀폰 일렉트로닉 머티어리얼즈 인터내셔널, 엘엘씨
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Application filed by 듀폰 일렉트로닉 머티어리얼즈 인터내셔널, 엘엘씨 filed Critical 듀폰 일렉트로닉 머티어리얼즈 인터내셔널, 엘엘씨
Publication of KR20230162552A publication Critical patent/KR20230162552A/ko
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/16—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C317/22—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/78—Benzoic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/84—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring
    • C07C69/92—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring with etherified hydroxyl groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/06—Systems containing only non-condensed rings with a five-membered ring
    • C07C2601/08—Systems containing only non-condensed rings with a five-membered ring the ring being saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/16—Systems containing only non-condensed rings with a six-membered ring the ring being unsaturated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020230064261A 2022-05-20 2023-05-18 화합물 및 이를 포함하는 포토레지스트 조성물 Active KR102896403B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17/749,880 2022-05-20
US17/749,880 US20240019779A1 (en) 2022-05-20 2022-05-20 Compounds and photoresist compositions including the same

Publications (2)

Publication Number Publication Date
KR20230162552A KR20230162552A (ko) 2023-11-28
KR102896403B1 true KR102896403B1 (ko) 2025-12-04

Family

ID=88768838

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020230064261A Active KR102896403B1 (ko) 2022-05-20 2023-05-18 화합물 및 이를 포함하는 포토레지스트 조성물

Country Status (5)

Country Link
US (1) US20240019779A1 (https=)
JP (2) JP2023171299A (https=)
KR (1) KR102896403B1 (https=)
CN (1) CN117088795A (https=)
TW (1) TW202346253A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240393689A1 (en) * 2023-05-26 2024-11-28 Dupont Electronic Materials International, Llc Compounds, monomers, polymers, photoresist compositions and pattern formation methods
WO2025197401A1 (ja) * 2024-03-22 2025-09-25 Jsr株式会社 感放射線性組成物及びレジストパターン形成方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100768364B1 (ko) * 2003-08-28 2007-10-17 히다치 가세고교 가부시끼가이샤 감광성 수지 조성물, 이것을 이용한 감광성 엘리먼트,레지스트 패턴의 형성방법 및 프린트 배선판의 제조방법 및광경화물의 제거방법
JP2009241418A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
CN111440115A (zh) * 2020-04-29 2020-07-24 中山大学 光敏性功能联苯二胺的制备方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09258435A (ja) * 1996-03-22 1997-10-03 Fuji Photo Film Co Ltd ポジ型感光性組成物
JP3666550B2 (ja) * 1997-03-10 2005-06-29 信越化学工業株式会社 新規高分子シリコーン化合物、化学増幅ポジ型レジスト材料及びパターン形成方法
US20060172223A1 (en) * 2004-11-24 2006-08-03 Rohm And Haas Electronic Materials Llc Photoresist compositions
JP4691461B2 (ja) * 2006-03-13 2011-06-01 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
US7566527B2 (en) * 2007-06-27 2009-07-28 International Business Machines Corporation Fused aromatic structures and methods for photolithographic applications
KR20120044349A (ko) * 2009-07-31 2012-05-07 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 조성물 및 그것을 사용한 패턴 형성 방법
JP2011180304A (ja) * 2010-02-26 2011-09-15 Fujifilm Corp フォトマスクブランクス、フォトマスク及びその製造方法
JP2012063728A (ja) * 2010-09-17 2012-03-29 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物、並びに、該組成物を用いたレジスト膜及びパターン形成方法
JP5682470B2 (ja) * 2011-06-16 2015-03-11 日立化成株式会社 電子部品用樹脂組成物及び電子部品装置
WO2016076205A1 (ja) * 2014-11-14 2016-05-19 Jsr株式会社 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
CN104991418B (zh) * 2015-06-24 2019-09-24 常州强力电子新材料股份有限公司 一种用于uv-led光固化的增感剂及其制备方法和应用
WO2018180049A1 (ja) * 2017-03-30 2018-10-04 Jsr株式会社 感放射線性組成物及びレジストパターン形成方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100768364B1 (ko) * 2003-08-28 2007-10-17 히다치 가세고교 가부시끼가이샤 감광성 수지 조성물, 이것을 이용한 감광성 엘리먼트,레지스트 패턴의 형성방법 및 프린트 배선판의 제조방법 및광경화물의 제거방법
JP2009241418A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
CN111440115A (zh) * 2020-04-29 2020-07-24 中山大学 光敏性功能联苯二胺的制备方法

Also Published As

Publication number Publication date
US20240019779A1 (en) 2024-01-18
CN117088795A (zh) 2023-11-21
JP2025160221A (ja) 2025-10-22
KR20230162552A (ko) 2023-11-28
JP2023171299A (ja) 2023-12-01
TW202346253A (zh) 2023-12-01

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