TW202346253A - 化合物和包含其的光阻劑組成物 - Google Patents

化合物和包含其的光阻劑組成物 Download PDF

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Publication number
TW202346253A
TW202346253A TW112118273A TW112118273A TW202346253A TW 202346253 A TW202346253 A TW 202346253A TW 112118273 A TW112118273 A TW 112118273A TW 112118273 A TW112118273 A TW 112118273A TW 202346253 A TW202346253 A TW 202346253A
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TW
Taiwan
Prior art keywords
substituted
unsubstituted
group
alkyl
photoresist composition
Prior art date
Application number
TW112118273A
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English (en)
Chinese (zh)
Inventor
崔莉
伊馬德 阿克德
岑寅杰
康尼爾Ａ 霍爾澤爾
詹姆士Ｆ 卡麥隆
朴鍾根
蘇珊Ｍ 科萊
李忠奉
Original Assignee
美商羅門哈斯電子材料有限公司
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Application filed by 美商羅門哈斯電子材料有限公司 filed Critical 美商羅門哈斯電子材料有限公司
Publication of TW202346253A publication Critical patent/TW202346253A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/16—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C317/22—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/78—Benzoic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/84—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring
    • C07C69/92—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring with etherified hydroxyl groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/06—Systems containing only non-condensed rings with a five-membered ring
    • C07C2601/08—Systems containing only non-condensed rings with a five-membered ring the ring being saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/16—Systems containing only non-condensed rings with a six-membered ring the ring being unsaturated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW112118273A 2022-05-20 2023-05-17 化合物和包含其的光阻劑組成物 TW202346253A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17/749,880 2022-05-20
US17/749,880 US20240019779A1 (en) 2022-05-20 2022-05-20 Compounds and photoresist compositions including the same

Publications (1)

Publication Number Publication Date
TW202346253A true TW202346253A (zh) 2023-12-01

Family

ID=88768838

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112118273A TW202346253A (zh) 2022-05-20 2023-05-17 化合物和包含其的光阻劑組成物

Country Status (5)

Country Link
US (1) US20240019779A1 (https=)
JP (2) JP2023171299A (https=)
KR (1) KR102896403B1 (https=)
CN (1) CN117088795A (https=)
TW (1) TW202346253A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240393689A1 (en) * 2023-05-26 2024-11-28 Dupont Electronic Materials International, Llc Compounds, monomers, polymers, photoresist compositions and pattern formation methods
WO2025197401A1 (ja) * 2024-03-22 2025-09-25 Jsr株式会社 感放射線性組成物及びレジストパターン形成方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09258435A (ja) * 1996-03-22 1997-10-03 Fuji Photo Film Co Ltd ポジ型感光性組成物
JP3666550B2 (ja) * 1997-03-10 2005-06-29 信越化学工業株式会社 新規高分子シリコーン化合物、化学増幅ポジ型レジスト材料及びパターン形成方法
CN1842742B (zh) * 2003-08-28 2010-05-12 日立化成工业株式会社 感光性树脂组合物、使用该组合物的感光性元件、抗蚀剂图案的形成方法及印刷电路板的制造方法以及光固化物的去除方法
US20060172223A1 (en) * 2004-11-24 2006-08-03 Rohm And Haas Electronic Materials Llc Photoresist compositions
JP4691461B2 (ja) * 2006-03-13 2011-06-01 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
US7566527B2 (en) * 2007-06-27 2009-07-28 International Business Machines Corporation Fused aromatic structures and methods for photolithographic applications
JP5137661B2 (ja) * 2008-03-31 2013-02-06 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
KR20120044349A (ko) * 2009-07-31 2012-05-07 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 조성물 및 그것을 사용한 패턴 형성 방법
JP2011180304A (ja) * 2010-02-26 2011-09-15 Fujifilm Corp フォトマスクブランクス、フォトマスク及びその製造方法
JP2012063728A (ja) * 2010-09-17 2012-03-29 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物、並びに、該組成物を用いたレジスト膜及びパターン形成方法
JP5682470B2 (ja) * 2011-06-16 2015-03-11 日立化成株式会社 電子部品用樹脂組成物及び電子部品装置
WO2016076205A1 (ja) * 2014-11-14 2016-05-19 Jsr株式会社 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
CN104991418B (zh) * 2015-06-24 2019-09-24 常州强力电子新材料股份有限公司 一种用于uv-led光固化的增感剂及其制备方法和应用
WO2018180049A1 (ja) * 2017-03-30 2018-10-04 Jsr株式会社 感放射線性組成物及びレジストパターン形成方法
CN111440115B (zh) * 2020-04-29 2022-03-29 中山大学 光敏性功能联苯二胺的制备方法

Also Published As

Publication number Publication date
US20240019779A1 (en) 2024-01-18
CN117088795A (zh) 2023-11-21
JP2025160221A (ja) 2025-10-22
KR20230162552A (ko) 2023-11-28
JP2023171299A (ja) 2023-12-01
KR102896403B1 (ko) 2025-12-04

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