JP2023160441A5 - - Google Patents
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- JP2023160441A5 JP2023160441A5 JP2022070826A JP2022070826A JP2023160441A5 JP 2023160441 A5 JP2023160441 A5 JP 2023160441A5 JP 2022070826 A JP2022070826 A JP 2022070826A JP 2022070826 A JP2022070826 A JP 2022070826A JP 2023160441 A5 JP2023160441 A5 JP 2023160441A5
- Authority
- JP
- Japan
- Prior art keywords
- particles
- article according
- porous layer
- inorganic
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000002245 particle Substances 0.000 claims 37
- 239000010410 layer Substances 0.000 claims 21
- 239000011248 coating agent Substances 0.000 claims 14
- 238000000576 coating method Methods 0.000 claims 14
- 239000010954 inorganic particle Substances 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 11
- 239000007788 liquid Substances 0.000 claims 9
- 238000003384 imaging method Methods 0.000 claims 7
- 230000003287 optical effect Effects 0.000 claims 7
- 229910052814 silicon oxide Inorganic materials 0.000 claims 6
- 239000011230 binding agent Substances 0.000 claims 5
- 239000012530 fluid Substances 0.000 claims 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 4
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 claims 4
- 239000007787 solid Substances 0.000 claims 4
- 239000002346 layers by function Substances 0.000 claims 3
- 239000011164 primary particle Substances 0.000 claims 3
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 claims 2
- 229910001632 barium fluoride Inorganic materials 0.000 claims 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims 2
- 229910001634 calcium fluoride Inorganic materials 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- -1 silicon oxide compound Chemical class 0.000 claims 2
- 239000003021 water soluble solvent Substances 0.000 claims 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 claims 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 claims 1
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 claims 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 claims 1
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 claims 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 1
- 230000003667 anti-reflective effect Effects 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 229940116333 ethyl lactate Drugs 0.000 claims 1
- 229920002313 fluoropolymer Polymers 0.000 claims 1
- 239000004811 fluoropolymer Substances 0.000 claims 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 claims 1
- 150000002484 inorganic compounds Chemical class 0.000 claims 1
- 229910010272 inorganic material Inorganic materials 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000011163 secondary particle Substances 0.000 claims 1
- 239000002356 single layer Substances 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022070826A JP2023160441A (ja) | 2022-04-22 | 2022-04-22 | 無機粒子を含む多孔質層を有する物品および無機粒子を含む多孔質層を形成するための塗工液 |
| EP23167716.2A EP4266089B1 (en) | 2022-04-22 | 2023-04-13 | Article including porous layer containing inorganic particles, and coating liquid for forming porous layer containing inorganic particles |
| US18/301,802 US20230339817A1 (en) | 2022-04-22 | 2023-04-17 | Article including porous layer containing inorganic particles,and coating liquid for forming porous layer containinginorganic particles |
| CN202310416725.8A CN116931137A (zh) | 2022-04-22 | 2023-04-18 | 包括含无机颗粒的多孔层的制品以及用于形成含无机颗粒的多孔层的涂布液 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022070826A JP2023160441A (ja) | 2022-04-22 | 2022-04-22 | 無機粒子を含む多孔質層を有する物品および無機粒子を含む多孔質層を形成するための塗工液 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023160441A JP2023160441A (ja) | 2023-11-02 |
| JP2023160441A5 true JP2023160441A5 (enExample) | 2025-04-02 |
Family
ID=86282507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022070826A Pending JP2023160441A (ja) | 2022-04-22 | 2022-04-22 | 無機粒子を含む多孔質層を有する物品および無機粒子を含む多孔質層を形成するための塗工液 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20230339817A1 (enExample) |
| EP (1) | EP4266089B1 (enExample) |
| JP (1) | JP2023160441A (enExample) |
| CN (1) | CN116931137A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118993714B (zh) * | 2024-08-07 | 2025-10-21 | 湖北省中耐新材科技有限公司 | 一种微孔低导热复合硅砖及其制备方法 |
| CN120081382B (zh) * | 2025-03-03 | 2025-12-05 | 天合光能股份有限公司 | 一种多层二氧化硅纳米粒子及其制备方法、减反射膜和太阳能电池 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101959619B (zh) * | 2008-02-29 | 2014-12-24 | 住友化学株式会社 | 层叠体的制造方法 |
| JP7152130B2 (ja) * | 2015-09-07 | 2022-10-12 | 日東電工株式会社 | 低屈折率層、積層フィルム、低屈折率層の製造方法、積層フィルムの製造方法、光学部材および画像表示装置 |
| JP2018145339A (ja) | 2017-03-08 | 2018-09-20 | 三菱マテリアル株式会社 | 低屈折率膜形成用液組成物及びこれを用いた低屈折率膜の形成方法 |
| JP7118614B2 (ja) * | 2017-03-10 | 2022-08-16 | キヤノン株式会社 | 光学部材、撮像装置、及び光学部材の製造方法 |
| US11069729B2 (en) * | 2018-05-01 | 2021-07-20 | Canon Kabushiki Kaisha | Photoelectric conversion device, and equipment |
| US12077467B2 (en) * | 2020-09-25 | 2024-09-03 | Canon Kabushiki Kaisha | Member with porous layer and coating liquid for forming porous layer |
-
2022
- 2022-04-22 JP JP2022070826A patent/JP2023160441A/ja active Pending
-
2023
- 2023-04-13 EP EP23167716.2A patent/EP4266089B1/en active Active
- 2023-04-17 US US18/301,802 patent/US20230339817A1/en active Pending
- 2023-04-18 CN CN202310416725.8A patent/CN116931137A/zh active Pending
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