JP2023015123A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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Abstract
Description
近年の表示装置においては、さらなる高精細化の要望が高まり、一画素のサイズが縮小する一方で配線の本数が増加する傾向にある。このため、各画素において、表示に寄与する開口部の縮小により、輝度の低下を招くおそれがある。このような輝度の低下を補うために、照明装置の輝度を増加させると、消費電力の増加を招く。
酸化物半導体層と、前記酸化物半導体層の一部を覆う保護金属層と、前記酸化物半導体層及び前記保護金属層を覆う第1無機絶縁膜と、前記第1無機絶縁膜上に設けられたゲート電極と、前記第1無機絶縁膜上に設けられ、前記ゲート電極を覆う第2無機絶縁膜と、前記第1無機絶縁膜及び前記第2無機絶縁膜を貫通した第1開口部において前記保護金属層に接する第1接続電極と、前記第2無機絶縁膜上に設けられ、前記第1接続電極を覆う第1有機絶縁膜と、前記第1有機絶縁膜を貫通した第2開口部において前記第1接続電極に接する第2接続電極と、前記第1有機絶縁膜上に設けられ、前記第2接続電極を覆う第2有機絶縁膜と、前記第2有機絶縁膜を貫通した第3開口部において前記第2接続電極に接する第3接続電極と、前記第2有機絶縁膜上に設けられ、前記第3接続電極を覆う第3無機絶縁膜と、前記第3無機絶縁膜を貫通した第4開口部において前記第3接続電極に接する画素電極と、を備え、前記第2開口部は、前記第1開口部の上に位置している、表示装置が提供される。
本実施形態によれば、
絶縁基板と、前記絶縁基板上の酸化物半導体層と、前記酸化物半導体層を覆う第1無機絶縁膜と、前記第1無機絶縁膜上に設けられたゲート電極と、を備えた半導体装置であって、第2無機絶縁膜は、前記第1無機絶縁膜上に設けられ且つ前記ゲート電極を覆い、第1開口は、前記第1無機絶縁膜及び前記第2無機絶縁膜を貫通し、第1有機絶縁膜は、前記第2無機絶縁膜上に設けられ、第2開口は、前記第1有機絶縁膜を貫通し前記第1開口と重なり、第2有機絶縁膜は、前記第1有機絶縁膜上に設けられ、第3開口は、前記第2有機絶縁膜を貫通し、第3無機絶縁膜は、前記第2有機絶縁膜上に設けられ、第4開口は、前記第3無機絶縁膜を貫通する、半導体装置が提供される。
第1接続電極CN1は、絶縁膜15の上に設けられ、絶縁膜14及び15を貫通した第1開口部OP1において保護金属層PMAに接している。絶縁膜16は、絶縁膜15の上に設けられ、第1接続電極CN1を覆っている。第2接続電極CN2は、絶縁膜16の上に設けられ、絶縁膜16を貫通した第2開口部OP2において第1接続電極CN1に接している。第2開口部OP2は、第1開口部OP1の直上に位置している。
絶縁膜17は、絶縁膜16の上に設けられ、第2接続電極CN2を覆っている。第3接続電極CN3は、絶縁膜17の上に設けられ、絶縁膜17を貫通した第3開口部OP3において第2接続電極CN2に接している。絶縁膜18は、絶縁膜17の上に設けられ、第3接続電極CN3を覆っている。画素電極PEは、絶縁膜18の上に設けられ、絶縁膜18を貫通した第4開口部OP4において第3接続電極CN3に接している。第4開口部OP4は、第3開口部OP3の直上に位置している。
絶縁基板20は、絶縁基板10と同様に、ガラス基板や樹脂基板などの光透過性を有する基板である。遮光層BM及びカラーフィルタ層CFは、絶縁基板20と第1基板SUB1との間に設けられている。遮光層BMは、第3方向Zにおいて、ゲート電極GEを含む走査線G1、酸化物半導体層SC1、保護金属層PMA、第1接続電極CN1、第2接続電極CN2、及び、第3接続電極CN3に重畳するように設けられている。一方で、遮光層BMは、共通電極CEと画素電極PEとが重畳する領域には設けられていない。
オーバーコート層OCは、カラーフィルタ層CFを覆っている。配向膜AL2は、オーバーコート層OCを覆っている。配向膜AL1及び配向膜AL2は、例えば、水平配向性を呈する材料によって形成されている。
金属配線M2は、絶縁膜16の上に設けられている。絶縁膜17は、絶縁膜16の上に設けられ、金属配線M2を覆っている。共通電極CEは、絶縁膜17の上に設けられ、絶縁膜17を貫通した開口部OP12において金属配線M2に接している。これにより、共通電極CEは、金属配線M2と電気的に接続される。
ソース電極SE2及びドレイン電極DE2は、絶縁膜15の上に設けられ、絶縁膜16によって覆われている。ソース電極SE2は、絶縁膜12乃至15を貫通した開口部OP21において、半導体層SC2に接している。ドレイン電極DE2は、絶縁膜12乃至15を貫通した開口部OP21において、半導体層SC2に接している。ソース電極SE2及びドレイン電極DE2は、図4に示した第1接続電極CN1と同一層に位置し、第1接続電極CN1と同一材料によって形成されている。
このような第2スイッチング素子SW2の直上には、絶縁膜16乃至18及び配向膜AL1が設けられている。
LC…液晶層 BM…遮光層 PE…画素電極 CE…共通電極
SW1…第1スイッチング素子 SC1…酸化物半導体層 PMA…保護金属層
CN1…第1接続電極 CN2…第2接続電極 CN3…第3接続電極
OP1…第1開口部 OP2…第2開口部 OP3…第3開口部 OP4…第4開口部
GE…ゲート電極 M1…金属配線 M2…金属配線
Claims (6)
- 絶縁基板と、
前記絶縁基板上の酸化物半導体層と、
前記酸化物半導体層を覆う第1無機絶縁膜と、
前記第1無機絶縁膜上に設けられたゲート電極と、を備えた半導体装置であって、
第2無機絶縁膜は、前記第1無機絶縁膜上に設けられ且つ前記ゲート電極を覆い、
第1開口は、前記第1無機絶縁膜及び前記第2無機絶縁膜を貫通し、
第1有機絶縁膜は、前記第2無機絶縁膜上に設けられ、
第2開口は、前記第1有機絶縁膜を貫通し前記第1開口と重なり、
第2有機絶縁膜は、前記第1有機絶縁膜上に設けられ、
第3開口は、前記第2有機絶縁膜を貫通し、
第3無機絶縁膜は、前記第2有機絶縁膜上に設けられ、
第4開口は、前記第3無機絶縁膜を貫通する、半導体装置。 - 平面視において、前記第1開口部を規定する第1エッジの全周は、前記第2開口部を規定する第2エッジの内側に位置している、請求項1に記載の半導体装置。
- 前記第2有機絶縁膜は、前記第1有機絶縁膜より薄い、請求項1に記載の半導体装置。
- 前記第3開口部は、前記ゲート電極と前記第2開口部との間に位置している、請求項1に記載の半導体装置。
- 平面視において、前記第3開口部を規定する第3エッジの全周は、前記第4開口部を規定する第4エッジの内側に位置している、請求項1に記載の半導体装置。
- 前記第4開口の一部は、前記第2開口と平面視で重なる、請求項1に記載の半導体装置。
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