JP2022127448A - 赤外線検出器および赤外線検出器を備えたガスセンサ - Google Patents
赤外線検出器および赤外線検出器を備えたガスセンサ Download PDFInfo
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- 238000006243 chemical reaction Methods 0.000 claims abstract description 70
- 239000006096 absorbing agent Substances 0.000 claims abstract description 67
- 239000000758 substrate Substances 0.000 claims abstract description 51
- 230000001629 suppression Effects 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims description 92
- 239000002184 metal Substances 0.000 claims description 92
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 claims description 42
- 229920000620 organic polymer Polymers 0.000 claims description 17
- 239000002861 polymer material Substances 0.000 claims description 17
- 230000005855 radiation Effects 0.000 claims description 5
- 239000011810 insulating material Substances 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 198
- 239000007789 gas Substances 0.000 description 53
- 238000010521 absorption reaction Methods 0.000 description 33
- 239000000463 material Substances 0.000 description 25
- 238000001514 detection method Methods 0.000 description 13
- 239000010931 gold Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- -1 SiO 2 ) Chemical compound 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 11
- 239000000470 constituent Substances 0.000 description 9
- 238000007740 vapor deposition Methods 0.000 description 9
- 229910000809 Alumel Inorganic materials 0.000 description 8
- 230000002708 enhancing effect Effects 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 229910001179 chromel Inorganic materials 0.000 description 7
- 239000011651 chromium Substances 0.000 description 7
- 230000005284 excitation Effects 0.000 description 7
- 239000012790 adhesive layer Substances 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 239000009719 polyimide resin Substances 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 238000005566 electron beam evaporation Methods 0.000 description 4
- 238000001745 non-dispersive infrared spectroscopy Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 239000000806 elastomer Substances 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 229920001807 Urea-formaldehyde Polymers 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Chemical compound O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- LGPPATCNSOSOQH-UHFFFAOYSA-N 1,1,2,3,4,4-hexafluorobuta-1,3-diene Chemical compound FC(F)=C(F)C(F)=C(F)F LGPPATCNSOSOQH-UHFFFAOYSA-N 0.000 description 1
- YBMDPYAEZDJWNY-UHFFFAOYSA-N 1,2,3,3,4,4,5,5-octafluorocyclopentene Chemical compound FC1=C(F)C(F)(F)C(F)(F)C1(F)F YBMDPYAEZDJWNY-UHFFFAOYSA-N 0.000 description 1
- 229910004250 CaCoO Inorganic materials 0.000 description 1
- 229910001006 Constantan Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 240000001973 Ficus microcarpa Species 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910002665 PbTe Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910018503 SF6 Inorganic materials 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910007657 ZnSb Inorganic materials 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 1
- 150000001463 antimony compounds Chemical class 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000003331 infrared imaging Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical compound [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000011895 specific detection Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 description 1
- 150000003498 tellurium compounds Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910001868 water Inorganic materials 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- 229910006585 β-FeSi Inorganic materials 0.000 description 1
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
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Abstract
Description
実施例の赤外線検出器として、図2に示される赤外線検出器1を作製した。作製した赤外線検出器1の各構成要素の作製条件は、以下の通りであった。
赤外線吸収体3:
金属微細構造層31:Au(構成材料)、1000nm(金属微細構造体31aの直径)、50nm(膜厚)、電子線リソグラフィー+抵抗加熱蒸着(成膜方法)
誘電体層32:SiO2(構成材料)、100nm(膜厚)、電子ビーム蒸着(成膜方法)
接着層A1:Cr(構成材料)、5nm(膜厚)、抵抗加熱蒸着(成膜方法)
金属層33:Au(構成材料)、200nm(膜厚)、抵抗加熱蒸着(成膜方法)
接着層A2:Cr(構成材料)、5nm(膜厚)、抵抗加熱蒸着(成膜方法)
絶縁層6:SiO2(構成材料)、60nm(膜厚)、電子ビーム蒸着(成膜方法)
熱電変換層4:クロメル(クロメル電極41用材料)およびアルメル(アルメル電極42用材料)、200nm(膜厚)、電子ビーム蒸着(成膜方法)
熱伝導抑制層5:ポリイミド樹脂(真空重合法で作製したポリイミド樹脂、または株式会社IST製Pyre-M.L.)(構成材料)、3000nm(膜厚)、スピンコート(成膜方法)
基板2:シリコン基板(厚さ:0.7mm)
実施例の赤外線検出器1に赤外線を照射したときに熱電変換層4に生じた起電力(電圧)を測定した結果を図3に示す。用いた赤外線は、タングステンフィラメント型光源から放射された広い波長領域の赤外線を含む熱放射赤外線で、その放射強度は、1.0mW/srであった。赤外線は、赤外線検出器1の表面に対して略垂直に照射した。熱電変換層4に生じた起電力は、ポテンショスタットによって測定した。図3は、メカニカル光学シャッターによって5秒毎に赤外線をON/OFFしたときに熱電変換層4に生じた起電力(電圧)の変化を示している。図3を参照すると、赤外線のON/OFFに対応して電圧が変化していることから、赤外線検出器1では、赤外線を吸収することによって熱が発生し、その熱によって熱電変換層4に起電力が発生していることが分かる。特に、図3では、赤外線のON/OFFのタイミングにおいて電圧が急激に変化しており、赤外線をON/OFFしてから約0.3秒程度で安定した電圧を示している。それに対して、同じ条件で測定した比較例の赤外線検出器の応答特性を示す図4を参照すると、赤外線をON/OFFしてから電圧が緩やかに変化して約20秒以上経過してようやく所定の電圧まで達している。このことから、本実施形態の赤外線検出器1では、比較例の赤外線検出器と比べて、高い応答速度が得られていることが分かる。
2 基板
3 赤外線吸収体
31 金属微細構造層
31a 金属微細構造体
32 誘電体層
33 金属層
4 熱電変換層
41 クロメル電極
42 アルメル電極
5 熱伝導抑制層
6 絶縁層
A1、A2 接着層
L 赤外線
M ガス検知器
M1 操作部
M2 表示部
N ガスセンサ
N1 筐体
N2 赤外線光源
N3 反射構造体
N4 回路部
V 内部空間
Claims (7)
- 基板と、
前記基板上に設けられ、赤外線を吸収して熱を発する赤外線吸収体と、
前記基板と前記赤外線吸収体との間に設けられ、前記赤外線吸収体からの熱を電気量に変換する熱電変換層と
を備える赤外線検出器であって、
前記赤外線検出器が、
前記基板と前記熱電変換層との間に設けられ、前記基板と前記熱電変換層との間の熱伝導を抑制する熱伝導抑制層と、
前記熱電変換層と前記赤外線吸収体との間に設けられ、前記熱電変換層と前記赤外線吸収体との間を電気的に絶縁する絶縁層と
をさらに備える、
赤外線検出器。 - 前記赤外線吸収体が、
前記赤外線を吸収して局在表面プラズモン共鳴を生じさせ得る金属微細構造層と、
前記金属微細構造層の下層に設けられる誘電体層と、
前記金属微細構造層との間で前記誘電体層を挟み込むように前記誘電体層の下層に設けられる金属層と
を備える、
請求項1に記載の赤外線検出器。 - 前記熱伝導抑制層が、耐熱性有機高分子材料を含む、
請求項1または2に記載の赤外線検出器。 - 前記熱伝導抑制層が、500nm以上、5000nm以下の膜厚を有する、
請求項1~3のいずれか1項に記載の赤外線検出器。 - 前記絶縁層が、無機絶縁材料を含む、
請求項1~4のいずれか1項に記載の赤外線検出器。 - 前記絶縁層が、50nm以上、100nm以下の膜厚を有する、
請求項1~5のいずれか1項に記載の赤外線検出器。 - 請求項1~6のいずれか1項に記載の赤外線検出器を備えたガスセンサ。
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JP2000298060A (ja) * | 1999-04-14 | 2000-10-24 | Murata Mfg Co Ltd | 赤外線センサ及びその製造方法 |
JP2001255203A (ja) * | 2000-03-10 | 2001-09-21 | Nec Corp | 熱分離構造を有する熱型赤外線検出器 |
JP2008232896A (ja) * | 2007-03-22 | 2008-10-02 | Toyohashi Univ Of Technology | 薄膜赤外線検出素子およびその製造方法 |
JP2020134337A (ja) * | 2019-02-20 | 2020-08-31 | 国立大学法人横浜国立大学 | 赤外線吸収体および赤外線吸収体を備えるガスセンサ |
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JPH0590647A (ja) * | 1991-09-30 | 1993-04-09 | Hamamatsu Photonics Kk | 赤外線検出装置 |
JP2006170956A (ja) * | 2004-12-20 | 2006-06-29 | Canon Inc | 赤外線検出装置、半導体基板、およびそれらの製造方法 |
JP2007051915A (ja) * | 2005-08-17 | 2007-03-01 | Matsushita Electric Works Ltd | 赤外線センサ |
JP6095856B2 (ja) * | 2015-02-09 | 2017-03-15 | 三菱電機株式会社 | 電磁波検出器、及びガス分析装置 |
JP6918591B2 (ja) * | 2017-06-16 | 2021-08-11 | 株式会社豊田中央研究所 | 電磁波検出器およびその製造方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2000298060A (ja) * | 1999-04-14 | 2000-10-24 | Murata Mfg Co Ltd | 赤外線センサ及びその製造方法 |
JP2001255203A (ja) * | 2000-03-10 | 2001-09-21 | Nec Corp | 熱分離構造を有する熱型赤外線検出器 |
JP2008232896A (ja) * | 2007-03-22 | 2008-10-02 | Toyohashi Univ Of Technology | 薄膜赤外線検出素子およびその製造方法 |
JP2020134337A (ja) * | 2019-02-20 | 2020-08-31 | 国立大学法人横浜国立大学 | 赤外線吸収体および赤外線吸収体を備えるガスセンサ |
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