JP2022118024A5 - - Google Patents
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- JP2022118024A5 JP2022118024A5 JP2022087516A JP2022087516A JP2022118024A5 JP 2022118024 A5 JP2022118024 A5 JP 2022118024A5 JP 2022087516 A JP2022087516 A JP 2022087516A JP 2022087516 A JP2022087516 A JP 2022087516A JP 2022118024 A5 JP2022118024 A5 JP 2022118024A5
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- JP
- Japan
- Prior art keywords
- water
- polishing
- less
- polishing composition
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
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- LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 3
- OTIXUSNHAKOJBX-UHFFFAOYSA-N 1-(aziridin-1-yl)ethanone Chemical compound CC(=O)N1CC1 OTIXUSNHAKOJBX-UHFFFAOYSA-N 0.000 description 3
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| KR102330030B1 (ko) * | 2013-03-19 | 2021-11-24 | 가부시키가이샤 후지미인코퍼레이티드 | 연마용 조성물, 연마용 조성물 제조 방법 및 연마용 조성물 조제용 키트 |
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| US10748778B2 (en) * | 2015-02-12 | 2020-08-18 | Fujimi Incorporated | Method for polishing silicon wafer and surface treatment composition |
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| JP6856535B2 (ja) * | 2015-10-23 | 2021-04-07 | ニッタ・デュポン株式会社 | 研磨用組成物 |
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| JP6929239B2 (ja) * | 2018-03-30 | 2021-09-01 | 株式会社フジミインコーポレーテッド | 研磨用組成物および研磨方法 |
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| EP3950876A4 (en) * | 2019-03-26 | 2022-11-02 | Fujimi Incorporated | POLISHING COMPOSITION |
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