JP2022023646A5 - - Google Patents

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Publication number
JP2022023646A5
JP2022023646A5 JP2020126729A JP2020126729A JP2022023646A5 JP 2022023646 A5 JP2022023646 A5 JP 2022023646A5 JP 2020126729 A JP2020126729 A JP 2020126729A JP 2020126729 A JP2020126729 A JP 2020126729A JP 2022023646 A5 JP2022023646 A5 JP 2022023646A5
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JP
Japan
Prior art keywords
scanning
substrate
exposure
adjustment mechanism
region
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JP2020126729A
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English (en)
Japanese (ja)
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JP7550559B2 (ja
JP2022023646A (ja
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Priority to JP2020126729A priority Critical patent/JP7550559B2/ja
Priority claimed from JP2020126729A external-priority patent/JP7550559B2/ja
Priority to KR1020210094010A priority patent/KR102860264B1/ko
Priority to CN202511164139.4A priority patent/CN120722674A/zh
Priority to CN202110847346.5A priority patent/CN113985702B/zh
Publication of JP2022023646A publication Critical patent/JP2022023646A/ja
Publication of JP2022023646A5 publication Critical patent/JP2022023646A5/ja
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Publication of JP7550559B2 publication Critical patent/JP7550559B2/ja
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JP2020126729A 2020-07-27 2020-07-27 走査露光装置、走査露光方法および物品製造方法 Active JP7550559B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2020126729A JP7550559B2 (ja) 2020-07-27 2020-07-27 走査露光装置、走査露光方法および物品製造方法
KR1020210094010A KR102860264B1 (ko) 2020-07-27 2021-07-19 주사 노광장치, 주사 노광방법 및 물품 제조 방법
CN202511164139.4A CN120722674A (zh) 2020-07-27 2021-07-27 扫描曝光装置、扫描曝光方法以及物品制造方法
CN202110847346.5A CN113985702B (zh) 2020-07-27 2021-07-27 扫描曝光装置、扫描曝光方法以及物品制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020126729A JP7550559B2 (ja) 2020-07-27 2020-07-27 走査露光装置、走査露光方法および物品製造方法

Publications (3)

Publication Number Publication Date
JP2022023646A JP2022023646A (ja) 2022-02-08
JP2022023646A5 true JP2022023646A5 (enExample) 2023-08-03
JP7550559B2 JP7550559B2 (ja) 2024-09-13

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JP2020126729A Active JP7550559B2 (ja) 2020-07-27 2020-07-27 走査露光装置、走査露光方法および物品製造方法

Country Status (3)

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JP (1) JP7550559B2 (enExample)
KR (1) KR102860264B1 (enExample)
CN (2) CN113985702B (enExample)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5777724A (en) * 1994-08-24 1998-07-07 Suzuki; Kazuaki Exposure amount control device
JPH08255739A (ja) * 1995-03-16 1996-10-01 Nikon Corp 露光装置
KR100422887B1 (ko) 1995-03-16 2005-02-02 가부시키가이샤 니콘 노광장치및방법
AU6853698A (en) * 1997-04-18 1998-11-13 Nikon Corporation Method and device for exposure control, method and device for exposure, and method of manufacture of device
JP2000277408A (ja) * 1999-03-23 2000-10-06 Nikon Corp 露光装置および露光方法
US20090203320A1 (en) * 2008-02-07 2009-08-13 Qualcomm Incorporated Asynchronous interference management based on timeslot overlap
JP5451222B2 (ja) * 2009-07-10 2014-03-26 キヤノン株式会社 露光装置及びその制御方法、デバイス製造方法
JP2013104934A (ja) * 2011-11-11 2013-05-30 Tokyo Electron Ltd 露光装置及び露光方法
JP6243616B2 (ja) 2013-03-26 2017-12-06 キヤノン株式会社 露光装置および物品の製造方法
JP2017053888A (ja) 2015-09-07 2017-03-16 キヤノン株式会社 露光方法および露光装置、ならびに物品の製造方法
JP2018010105A (ja) 2016-07-13 2018-01-18 キヤノン株式会社 露光装置、露光方法、および物品製造方法
CN110431487B (zh) * 2017-03-17 2021-08-10 株式会社尼康 照明装置及方法、曝光装置及方法、以及元件制造方法

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