JP2021521332A5 - - Google Patents

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Publication number
JP2021521332A5
JP2021521332A5 JP2020555785A JP2020555785A JP2021521332A5 JP 2021521332 A5 JP2021521332 A5 JP 2021521332A5 JP 2020555785 A JP2020555785 A JP 2020555785A JP 2020555785 A JP2020555785 A JP 2020555785A JP 2021521332 A5 JP2021521332 A5 JP 2021521332A5
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Japan
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reaction gas
zone
gas distribution
injector block
distribution outlets
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JP2020555785A
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English (en)
Japanese (ja)
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JP2021521332A (ja
JPWO2019200312A5 (https=
JP7495882B2 (ja
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Priority claimed from PCT/US2019/027312 external-priority patent/WO2019200312A1/en
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JP2020555785A 2018-04-13 2019-04-12 マルチゾーンインジェクターブロックを備える化学蒸着装置 Active JP7495882B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862657255P 2018-04-13 2018-04-13
US62/657,255 2018-04-13
PCT/US2019/027312 WO2019200312A1 (en) 2018-04-13 2019-04-12 Chemical vapor deposition apparatus with multi-zone injector block

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JP2021521332A JP2021521332A (ja) 2021-08-26
JPWO2019200312A5 JPWO2019200312A5 (https=) 2022-06-20
JP2021521332A5 true JP2021521332A5 (https=) 2022-06-20
JP7495882B2 JP7495882B2 (ja) 2024-06-05

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JP2020555785A Active JP7495882B2 (ja) 2018-04-13 2019-04-12 マルチゾーンインジェクターブロックを備える化学蒸着装置

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US (1) US12584223B2 (https=)
JP (1) JP7495882B2 (https=)
CN (2) CN110373653B (https=)
DE (1) DE112019001953T5 (https=)
TW (2) TWM597506U (https=)
WO (1) WO2019200312A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7256135B2 (ja) * 2017-06-23 2023-04-11 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング 選択的な膜成長のための原子層堆積の方法
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US11225716B2 (en) * 2019-11-27 2022-01-18 Tokyo Electron Limited Internally cooled multi-hole injectors for delivery of process chemicals

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