JP2021114585A - 基板洗浄装置及び基板洗浄方法 - Google Patents
基板洗浄装置及び基板洗浄方法 Download PDFInfo
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- JP2021114585A JP2021114585A JP2020007677A JP2020007677A JP2021114585A JP 2021114585 A JP2021114585 A JP 2021114585A JP 2020007677 A JP2020007677 A JP 2020007677A JP 2020007677 A JP2020007677 A JP 2020007677A JP 2021114585 A JP2021114585 A JP 2021114585A
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- substrate
- cleaning member
- cleaning
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- wafer
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- 238000004140 cleaning Methods 0.000 title claims abstract description 211
- 239000000758 substrate Substances 0.000 title claims abstract description 76
- 238000000034 method Methods 0.000 title claims description 14
- 230000002093 peripheral effect Effects 0.000 claims abstract description 86
- 239000012535 impurity Substances 0.000 abstract description 11
- 239000002245 particle Substances 0.000 abstract description 6
- 235000012431 wafers Nutrition 0.000 description 103
- 230000007246 mechanism Effects 0.000 description 23
- 239000007788 liquid Substances 0.000 description 19
- 230000003028 elevating effect Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 3
- 238000007664 blowing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Images
Classifications
-
- B08B1/32—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools, brushes, or analogous members
-
- B08B1/10—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/02—Devices for holding articles during cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
Abstract
Description
例えば前記した回転基台12については、アーム状の基台やスライドする基台として構成してもよい。要は中央洗浄部材60と周辺洗浄部材70を所定の中央洗浄位置、周辺洗浄位置に移動できる構成のものであればよい。
2 吸着パッド
3 スピンチャック
4 アンダーカップ
5 パッド支持部
6 梁部
7 ベルト
10 洗浄機構
11、54 洗浄液ノズル
12 回転基台
31 アッパーカップ
60 中央洗浄部材
70 周辺洗浄部材
100 制御部
W ウエハ
Claims (9)
- 円形の基板の面に対して洗浄部材を当接させて、前記基板と洗浄部材とを相対的に回転させて前記面を洗浄する基板洗浄装置であって、
前記洗浄部材における前記面との接触領域は、基板中心側から基板周辺側に向けて放射状に広がっている、基板洗浄装置。 - 前記洗浄部材の前記接触領域は平面視で扇形である、請求項1に記載の基板洗浄装置。
- 前記洗浄部材の周長率は、15%以上である、請求項1〜2のいずれか一項に記載の基板洗浄装置。
- 前記洗浄部材は、前記基板の中央部と接触させる中央洗浄部材と、前記基板の周辺部と接触させる周辺洗浄部材とを有する、請求項1〜3のいずれか一項に記載の基板洗浄装置。
- 前記洗浄部材の前記接触領域には溝が形成されている、請求項1〜4のいずれか一項に記載の基板洗浄装置。
- 前記洗浄部材は、前記基板の中央部と接触させる中央洗浄部材と、前記基板の周辺部と接触させる周辺洗浄部材とを有し、
前記中央洗浄部材と前記周辺洗浄部材における前記基板との接触領域には、各々溝部が形成され、
前記周辺洗浄部材の溝は、前記中央洗浄部材の溝よりも大きい、
請求項1〜3のいずれか一項に記載の基板洗浄装置。 - 円形の基板の面に対して洗浄部材を当接させて前記基板と洗浄部材とを相対的に回転させて前記面を洗浄する基板洗浄方法であって、
前記洗浄部材は、前記基板の中央部と接触させる中央洗浄部材と、前記基板の周辺部と接触させる周辺洗浄部材とを有し、
前記中央洗浄部材と前記周辺洗浄部材の各接触領域は、基板中心側から基板周辺側に向けて放射状に広がっている形状を有し、
前記基板の面に接触する前記洗浄部材を前記基板の被洗浄面に当接させながら、前記洗浄部材と前記基板とを相対的に回転すること、
前記中央洗浄部材で前記基板の中央部分を洗浄すること、
その後前記周辺洗浄部材で、前記基板の周辺部分を洗浄すること、
を含む基板洗浄方法。 - 前記中央洗浄部材の接触領域は平面視で扇形であり、当該扇形の中心となる部分は、前記基板の中心から偏心している、請求項7に記載の基板洗浄方法。
- 前記周辺洗浄部材の接触領域は平面視で扇形であり、当該扇形の中心となる部分は、前記基板の中心から偏心している、請求項7に記載の基板洗浄方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020007677A JP7402698B2 (ja) | 2020-01-21 | 2020-01-21 | 基板洗浄装置及び基板洗浄方法 |
KR1020210003280A KR20210094464A (ko) | 2020-01-21 | 2021-01-11 | 기판 세정 장치 및 기판 세정 방법 |
TW110100927A TW202138071A (zh) | 2020-01-21 | 2021-01-11 | 基板洗淨裝置及基板洗淨方法 |
CN202110029564.8A CN113223982A (zh) | 2020-01-21 | 2021-01-11 | 基片清洗装置和基片清洗方法 |
US17/152,870 US11554389B2 (en) | 2020-01-21 | 2021-01-20 | Substrate cleaning apparatus and substrate cleaning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020007677A JP7402698B2 (ja) | 2020-01-21 | 2020-01-21 | 基板洗浄装置及び基板洗浄方法 |
Publications (2)
Publication Number | Publication Date |
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JP2021114585A true JP2021114585A (ja) | 2021-08-05 |
JP7402698B2 JP7402698B2 (ja) | 2023-12-21 |
Family
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JP2020007677A Active JP7402698B2 (ja) | 2020-01-21 | 2020-01-21 | 基板洗浄装置及び基板洗浄方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US11554389B2 (ja) |
JP (1) | JP7402698B2 (ja) |
KR (1) | KR20210094464A (ja) |
CN (1) | CN113223982A (ja) |
TW (1) | TW202138071A (ja) |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5738567A (en) * | 1996-08-20 | 1998-04-14 | Micron Technology, Inc. | Polishing pad for chemical-mechanical planarization of a semiconductor wafer |
JP2000237700A (ja) | 1999-02-23 | 2000-09-05 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置 |
JP2000260740A (ja) | 1999-03-12 | 2000-09-22 | Disco Abrasive Syst Ltd | スピンナー洗浄装置 |
JP2001009387A (ja) | 1999-06-29 | 2001-01-16 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置 |
JP2002177911A (ja) | 2000-12-14 | 2002-06-25 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置および基板洗浄方法 |
US7094695B2 (en) * | 2002-08-21 | 2006-08-22 | Micron Technology, Inc. | Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization |
EP1635960A2 (en) * | 2003-06-06 | 2006-03-22 | P.C.T. Systems, Inc. | Method and apparatus to process substrates with megasonic energy |
CN101308766B (zh) | 2003-06-24 | 2010-06-09 | 兰姆研究股份公司 | 湿处理盘状基片的部件和方法 |
US9987666B2 (en) * | 2006-01-20 | 2018-06-05 | Naura Akrion Inc. | Composite transducer apparatus and system for processing a substrate and method of constructing the same |
JP5466638B2 (ja) * | 2007-07-05 | 2014-04-09 | エーシーエム リサーチ (シャンハイ) インコーポレーテッド | 半導体基板を洗浄する装置及び方法 |
US9796000B2 (en) * | 2011-07-04 | 2017-10-24 | Product Systems Incorporated | Uniform fluid manifold for acoustic transducer |
US9953847B2 (en) * | 2013-09-10 | 2018-04-24 | Taiwan Semiconductor Manufacturing Company Ltd. | Apparatus and method for cleaning |
CN112091809B (zh) * | 2014-10-03 | 2022-11-29 | 株式会社荏原制作所 | 处理组件及处理方法 |
US11752529B2 (en) * | 2015-05-15 | 2023-09-12 | Acm Research (Shanghai) Inc. | Method for cleaning semiconductor wafers |
-
2020
- 2020-01-21 JP JP2020007677A patent/JP7402698B2/ja active Active
-
2021
- 2021-01-11 TW TW110100927A patent/TW202138071A/zh unknown
- 2021-01-11 CN CN202110029564.8A patent/CN113223982A/zh active Pending
- 2021-01-11 KR KR1020210003280A patent/KR20210094464A/ko unknown
- 2021-01-20 US US17/152,870 patent/US11554389B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN113223982A (zh) | 2021-08-06 |
US20210220878A1 (en) | 2021-07-22 |
US11554389B2 (en) | 2023-01-17 |
JP7402698B2 (ja) | 2023-12-21 |
KR20210094464A (ko) | 2021-07-29 |
TW202138071A (zh) | 2021-10-16 |
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