JP2021110905A5 - - Google Patents

Download PDF

Info

Publication number
JP2021110905A5
JP2021110905A5 JP2020004671A JP2020004671A JP2021110905A5 JP 2021110905 A5 JP2021110905 A5 JP 2021110905A5 JP 2020004671 A JP2020004671 A JP 2020004671A JP 2020004671 A JP2020004671 A JP 2020004671A JP 2021110905 A5 JP2021110905 A5 JP 2021110905A5
Authority
JP
Japan
Prior art keywords
light
optical system
projection optical
exposure
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020004671A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021110905A (ja
JP7453790B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2020004671A priority Critical patent/JP7453790B2/ja
Priority claimed from JP2020004671A external-priority patent/JP7453790B2/ja
Priority to TW109141705A priority patent/TWI836164B/zh
Priority to KR1020200181556A priority patent/KR102800583B1/ko
Priority to CN202110037169.4A priority patent/CN113126448B/zh
Publication of JP2021110905A publication Critical patent/JP2021110905A/ja
Publication of JP2021110905A5 publication Critical patent/JP2021110905A5/ja
Application granted granted Critical
Publication of JP7453790B2 publication Critical patent/JP7453790B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2020004671A 2020-01-15 2020-01-15 露光装置、および物品の製造方法 Active JP7453790B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2020004671A JP7453790B2 (ja) 2020-01-15 2020-01-15 露光装置、および物品の製造方法
TW109141705A TWI836164B (zh) 2020-01-15 2020-11-27 曝光裝置及物品的製造方法
KR1020200181556A KR102800583B1 (ko) 2020-01-15 2020-12-23 노광 장치, 및 물품의 제조 방법
CN202110037169.4A CN113126448B (zh) 2020-01-15 2021-01-12 曝光装置和物品的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020004671A JP7453790B2 (ja) 2020-01-15 2020-01-15 露光装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2021110905A JP2021110905A (ja) 2021-08-02
JP2021110905A5 true JP2021110905A5 (enExample) 2023-01-17
JP7453790B2 JP7453790B2 (ja) 2024-03-21

Family

ID=76772241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020004671A Active JP7453790B2 (ja) 2020-01-15 2020-01-15 露光装置、および物品の製造方法

Country Status (4)

Country Link
JP (1) JP7453790B2 (enExample)
KR (1) KR102800583B1 (enExample)
CN (1) CN113126448B (enExample)
TW (1) TWI836164B (enExample)

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3448614B2 (ja) * 1993-08-12 2003-09-22 株式会社ニコン 投影露光方法、走査型投影露光装置、及び素子製造方法
JP3459742B2 (ja) * 1996-01-17 2003-10-27 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
JPH10289864A (ja) * 1997-04-11 1998-10-27 Nikon Corp 投影露光装置
AU6853598A (en) * 1997-04-18 1998-11-13 Nikon Corporation Aligner, exposure method using the aligner, and method of manufacture of circuitdevice
JP3421922B2 (ja) * 2000-02-22 2003-06-30 富士写真光機株式会社 アライメント変動測定装置
JP2005294608A (ja) * 2004-04-01 2005-10-20 Nikon Corp 放電光源ユニット、照明光学装置、露光装置および露光方法
JP4844835B2 (ja) * 2004-09-14 2011-12-28 株式会社ニコン 補正方法及び露光装置
US7508489B2 (en) * 2004-12-13 2009-03-24 Carl Zeiss Smt Ag Method of manufacturing a miniaturized device
US7307262B2 (en) * 2004-12-23 2007-12-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TW200745771A (en) * 2006-02-17 2007-12-16 Nikon Corp Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
US7999939B2 (en) * 2007-08-17 2011-08-16 Asml Holding N.V. Real time telecentricity measurement
DE102008004762A1 (de) * 2008-01-16 2009-07-30 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung
US20100165309A1 (en) * 2008-07-10 2010-07-01 Nikon Corporation Deformation measuring apparatus, exposure apparatus, jig for the deformation measuring apparatus, position measuring method and device fabricating method
TW201227178A (en) * 2010-11-02 2012-07-01 Nikon Corp Liquid supply apparatus, liquid supply method, management apparatus, management method, exposure apparatus, exposure method, device fabricating system, device fabricating method, program and recording medium
JP2014135368A (ja) * 2013-01-09 2014-07-24 Canon Inc 露光装置、計測方法及びデバイスの製造方法
JP2017072678A (ja) * 2015-10-06 2017-04-13 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法
JP2017172678A (ja) * 2016-03-23 2017-09-28 Ntn株式会社 極低温環境用転がり軸受

Similar Documents

Publication Publication Date Title
KR101782336B1 (ko) 검사 장치 및 검사 방법
KR101452243B1 (ko) 노광장치 및 노광장치의 노광방법
JP2785146B2 (ja) 自動焦点調整制御装置
US10036968B2 (en) Control method of movable body, exposure method, device manufacturing method, movable body apparatus, and exposure apparatus
JP2011040548A5 (enExample)
JP2011145232A5 (enExample)
KR101678070B1 (ko) 마스크리스 노광장치 및 그 제어방법
US20160070175A1 (en) Detection apparatus, measurement apparatus, exposure apparatus, method of manufacturing article, and measurement method
US8081292B2 (en) Exposure system and method of manufacturing a semiconductor device
US9041907B2 (en) Drawing device and drawing method
JP2765422B2 (ja) 露光装置及びそれを用いた半導体素子の製造方法
US9746789B2 (en) Exposure apparatus, and method of manufacturing article
KR20140014509A (ko) 노광 장치의 높이 센서 및 이를 이용한 웨이퍼 고저 측량 방법
KR101017203B1 (ko) 반도체 노광공정에서의 웨이퍼 변형 감지 장치 및 방법
US20150192867A1 (en) Lithography apparatus, lithography method, and method of manufacturing article
US20110123934A1 (en) Scanning exposure apparatus
JP2021110905A5 (enExample)
US9904170B2 (en) Reticle transmittance measurement method, projection exposure method using the same, and projection exposure device
US8094289B2 (en) Scanning exposure apparatus and device manufacturing method
KR100719367B1 (ko) 반도체 제조 장치 및 웨이퍼 가공 방법
WO2006104173A1 (ja) 光量調整方法、画像記録方法及び装置
JP6321386B2 (ja) 露光装置および露光方法
US8300209B2 (en) Exposure method, exposure apparatus, and device manufacturing method
JP2020190654A5 (enExample)
JP2020003737A (ja) 露光装置および物品の製造方法