JP2021020992A - 酸分解性樹脂の製造方法 - Google Patents
酸分解性樹脂の製造方法 Download PDFInfo
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- JP2021020992A JP2021020992A JP2019137212A JP2019137212A JP2021020992A JP 2021020992 A JP2021020992 A JP 2021020992A JP 2019137212 A JP2019137212 A JP 2019137212A JP 2019137212 A JP2019137212 A JP 2019137212A JP 2021020992 A JP2021020992 A JP 2021020992A
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- acid
- resin
- decomposable resin
- polymerization
- metal ion
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- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
[1] 酸分解性樹脂を含む樹脂溶液を準備する工程と、
酸性陽イオン交換体を有機溶媒によって洗浄して、洗浄後に排出される有機溶媒中の水分含有量が400ppm以下になるまで低減する工程と、
前記洗浄したイオン交換体に前記樹脂溶液を通液して、金属イオン含有量を低減する工程と、
を含む、酸分解性樹脂の製造方法。
[2] 前記酸分解性樹脂が、アセタール構造またはヘミアセタール構造を有する、[1]に記載の製造方法。
[3] 前記カチオン性イオン交換体が、交換基として強酸性陽イオン交換基を有する、[1]または[2]に記載の製造方法。
[4] 前記樹脂溶液が、酸分解性樹脂の重合反応溶液である、[1]〜[3]のいずれかに記載の製造方法。
[5] 前記通液後の酸分解性樹脂中の金属イオン含有量が50ppb以下である、[1]〜[4]のいずれかに記載の製造方法。
本発明の酸分解性樹脂の製造方法は、酸分解性樹脂溶液を準備する工程と、酸性陽イオン交換体を洗浄する工程と、洗浄したイオン交換体に酸分解性樹脂溶液を通液する工程とを含むものである。なお、酸分解性樹脂溶液を準備する工程および酸性陽イオン交換体を洗浄する工程は、それらの順序は特に限定されず、いずれが先に行われてもよい。
本工程は、酸分解性樹脂を含む溶液を準備する工程である。本発明で用いる酸分解性樹脂は、酸の作用により分解し易い官能基や構造を有するものである。このような酸分解性樹脂としては、アセタール構造やヘミアセタール構造を有するものが挙げられる。アセタール構造やヘミアセタール構造は、ポリマー主鎖に含まれても良いし、あるいはポリマー側鎖に含まれていても良い。これらの構造を有する酸分解性樹脂であれば、その他の構造は特に限定されず、通液工程のために有機溶媒に溶解できるものであればよい。
本工程は、酸性陽イオン交換体を有機溶媒により洗浄して、酸性陽イオン交換体中の水分含有量を低減させる工程である。洗浄方法は、酸性イオン交換体がフィルターであればフィルターに有機溶媒を通液する、また、粒状のイオン交換樹脂であればカラム等に充填し有機溶媒を通液する、などの方法がある。酸性陽イオン交換体は、通常、市販の状態では、一定量(約1000ppm程度)の水分含有量を有している。本発明においては、有機溶媒によって酸性陽イオン交換体を洗浄して、洗浄後に排出される有機溶媒中の水分含有量が400ppm以下、好ましくは350ppm以下、より好ましくは300ppm以下にまで低減する。
なお、酸性陽イオン交換体中の水分含有量は従来公知の方法によって測定することができる。例えば、カールフィッシャー法にて測定することができる。
本工程は、上記で洗浄したイオン交換体に準備した樹脂溶液を通液して、酸分解性樹脂中の金属イオン含有量を低減する工程である。本発明においては、水分含有量を上記範囲にまで低減した酸性陽イオン交換体を用いることで、酸分解性樹脂であっても、酸性陽イオン交換体の交換基による分解や脱保護の影響を受けずに、酸分解性樹脂中の金属イオン含有量を低減することができる。
なお、これらの含有量は、ICP質量分析法により測定することができる。
なお、本発明において、酸分解性樹脂の重量平均分子量(Mw)は、GPC(ゲルパーミエーションクロマトグラフィー)による測定値であり、後述する測定条件にて測定することができる。
下記で合成した樹脂の重量平均分子量(Mw)は、ポリスチレンを標準品としてGPC(ゲルパーミエーションクロマトグラフィー)により測定した。固形分2質量%に溶解して分析用試料を調製した。装置への試料注入量は50μlとした。
測定装置:東ソー社製「HPLC−8320GPC」
検出器:示差屈折率(RI)検出器
カラム:Shodex GPC LF804×3(昭和電工社製)
溶離液:テトラヒドロフラン
流速:1.0mL/分
温度:40℃
検量線:ポリスチレン標準サンプル(東ソー社製)を用いて作成
下記で合成した樹脂のアセタール基の保護率は13C−NMRで分析した。樹脂溶液2gとCr(III)アセチルアセトナート0.1gを、重アセトン1.0gに溶解して分析用試料を調製した。
装置:ブルカー製「AVANCE400」
核種:13C
測定法:インバースゲートデカップリング
積算回数:6000回
測定チューブ径:10mmφ
下記で合成した樹脂の通液前後の金属イオン(ナトリウムイオン、カリウムイオン、カルシウムイオン、鉄イオン)濃度をICP質量分析法により測定した。
ICP質量分析装置:アジレント・テクノロジー(株)製「Agilent7500cs」
酸性陽イオン交換体を洗浄した際に排出される有機溶媒中の水分含有量をカールフィッシャー法にて測定した。
カールフィッシャー装置:平沼産業製 AQ−2200
電解液:HYDRANAL クローマットAK
対電極:HYDRANAL クローマットCG−K
温度計、冷却管及び撹拌装置を備えたナスフラスコにプロピレングリコールメチルエーテルアセテート(以下、PGMEAと記載する)537部、10質量%メタンスルホン酸(PGMEA溶液)を4.0部、純水2.7部を加え、5℃に冷却した。続いて、該ナスフラスコに、ジエチレングリコールモノビニルエーテル(以下、DEGVと記載する)540部を2時間掛けて滴下した。滴下終了後、25℃に昇温をして4時間熟成し、反応を行った。反応終了後、PGMEA330部を重合反応溶液に投入して、希釈をおこなった。その後、弱塩基性イオン交換樹脂であるアンバーリストB20−HG・DRY(オルガノ社製)37.2部で約6時間掛けてイオン交換を行い、酸触媒(メタンスルホン酸)の除去を行った。得られた樹脂溶液から酸分解性樹脂をサンプリングし、重量平均分子量(Mw)および金属イオン濃度を測定した。
上記反応により以下の式で表される重合体が得られた。
実施例1と同条件で反応を行い、酸触媒(メタンスルホン酸)の除去を行って、樹脂溶液を得た。得られた樹脂溶液から酸分解性樹脂をサンプリングし、重量平均分子量(Mw)および金属イオン濃度を測定した。
温度計、冷却管及び撹拌装置を備えたナスフラスコにHPS−H10K(丸善石油化学製、Mw=10,000、パラヒドロキシスチレンホモポリマー、30質量%PGMEA溶液)266部、10質量%トリフルオロ酢酸(PGMEA溶液)を1.9部、PGMEA42部を加え、40℃に昇温した。続いて、該ナスフラスコに、エチルビニルエーテル19.5部、PGMEA18.6部を混合した溶液を30分間掛けて滴下した。滴下終了後、40℃で4時間熟成し、反応を行った。反応終了後、PGMEA42部を反応溶液に投入して、希釈をおこなった。その後、アンバーリストB20−HG・DRY(オルガノ社製)3.7部で約6時間掛けてイオン交換を行い、酸触媒(トリフルオロ酢酸)の除去を行った。得られた樹脂溶液から酸分解性樹脂をサンプリングし、重量平均分子量(Mw)、アセタール基の保護率、および金属イオン濃度を測定した。
上記反応により以下の式で表される重合体が得られた。
温度計、冷却管及び撹拌装置を備えたナスフラスコに1−(ブトキシ)エチルメタクリレート(以下、BEMAと記載する)152部、ジメチル−2,2’−アゾビスイソブチレートを9.2部、メチルエチルケトン350部を加え、還流条件で4時間熟成し反応を行った。反応終了後、メタノール1596部、純水154部の混合溶液に滴下して酸分解性樹脂を析出させた。続いて、ろ過を行い、回収した樹脂をPGMEA1000部に溶解させた。得られた樹脂溶液から酸分解性樹脂をサンプリングし、重量平均分子量(Mw)、アセタール基の保護率、および金属イオン濃度を測定した。
上記反応により以下の式で表される重合体が得られた。
実施例1と同条件で反応を行い、酸触媒の除去を行って、樹脂溶液を得た。得られた樹脂溶液から酸分解性樹脂をサンプリングし、重量平均分子量(Mw)を測定した。
実施例3と同条件で反応を行い、酸触媒の除去を行って、樹脂溶液を得た。得られた樹脂溶液から酸分解性樹脂をサンプリングし、重量平均分子量(Mw)およびアセタール基の保護率を測定した。
実施例4と同条件で反応を行い、酸触媒の除去を行って、樹脂溶液を得た。得られた樹脂溶液から酸分解性樹脂をサンプリングし、重量平均分子量(Mw)およびアセタール基の保護率を測定した。
一方、比較例1〜3で得られた酸分解性樹脂は、イオン交換体への通液の前後で重量平均分子量(Mw)やアセタール基の保護率が低下しており、酸分解性樹脂の一部分解が認められた。
Claims (5)
- 酸分解性樹脂を含む樹脂溶液を準備する工程と、
酸性陽イオン交換体を有機溶媒によって洗浄して、洗浄後に排出される有機溶媒中の水分含有量が400ppm以下になるまで低減する工程と、
前記洗浄した酸性陽イオン交換体に前記樹脂溶液を通液して、金属イオン含有量を低減する工程と、
を含む、酸分解性樹脂の製造方法。 - 前記酸分解性樹脂が、アセタール構造またはヘミアセタール構造を有する、請求項1に記載の製造方法。
- 前記酸性陽イオン交換体が、交換基として強酸性陽イオン交換基を有する、請求項1または2に記載の製造方法。
- 前記樹脂溶液が、酸分解性樹脂の重合反応溶液である、請求項1〜3のいずれか一項に記載の製造方法。
- 前記通液後の酸分解性樹脂中の金属イオン含有量が50ppb以下である、請求項1〜4のいずれか一項に記載の製造方法。
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US5446125A (en) | 1991-04-01 | 1995-08-29 | Ocg Microelectronic Materials, Inc. | Method for removing metal impurities from resist components |
JP2771075B2 (ja) | 1991-09-03 | 1998-07-02 | オリン・マイクロエレクトロニツク・ケミカルズ・インコーポレイテツド | レジスト成分からの金属不純物除去方法 |
SG48902A1 (en) * | 1991-12-18 | 1998-05-18 | Hoechst Celanese Corp | Metal ion reduction in novolak resins |
US6090526A (en) | 1996-09-13 | 2000-07-18 | Shipley Company, L.L.C. | Polymers and photoresist compositions |
TW536666B (en) * | 1998-02-02 | 2003-06-11 | Clariant Int Ltd | Process for producing a photoresist composition having a reduced tendency to produce particles |
US6159653A (en) | 1998-04-14 | 2000-12-12 | Arch Specialty Chemicals, Inc. | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations |
US20030235777A1 (en) * | 2001-12-31 | 2003-12-25 | Shipley Company, L.L.C. | Phenolic polymers, methods for synthesis thereof and photoresist compositions comprising same |
JP4245596B2 (ja) | 2002-04-01 | 2009-03-25 | ダイセル化学工業株式会社 | フォトレジスト用高分子化合物 |
KR100979871B1 (ko) | 2002-04-01 | 2010-09-02 | 다이셀 가가꾸 고교 가부시끼가이샤 | ArF 엑시머 레이저 레지스트용 중합체 용액의 제조 방법 |
JP5225139B2 (ja) | 2009-02-19 | 2013-07-03 | 三菱レイヨン株式会社 | フォトリソグラフィ用高分子化合物の金属イオン不純物除去方法 |
JP5914241B2 (ja) | 2012-08-07 | 2016-05-11 | 株式会社ダイセル | 高分子化合物の製造方法、高分子化合物、及びフォトレジスト用樹脂組成物 |
JP6349943B2 (ja) * | 2014-05-13 | 2018-07-04 | 三菱ケミカル株式会社 | 化合物の精製方法、及び高分子化合物の製造方法 |
JP6886592B2 (ja) | 2016-12-15 | 2021-06-16 | Dic株式会社 | レジスト用感光性樹脂組成物の製造方法 |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010235653A (ja) * | 2009-03-30 | 2010-10-21 | Nippon Soda Co Ltd | 重合体の製造方法 |
JP2021001124A (ja) * | 2019-06-20 | 2021-01-07 | オルガノ株式会社 | 非水溶媒の精製方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024195673A1 (ja) * | 2023-03-17 | 2024-09-26 | 丸善石油化学株式会社 | 重合体の製造方法 |
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