JP2020537335A5 - - Google Patents

Download PDF

Info

Publication number
JP2020537335A5
JP2020537335A5 JP2020518622A JP2020518622A JP2020537335A5 JP 2020537335 A5 JP2020537335 A5 JP 2020537335A5 JP 2020518622 A JP2020518622 A JP 2020518622A JP 2020518622 A JP2020518622 A JP 2020518622A JP 2020537335 A5 JP2020537335 A5 JP 2020537335A5
Authority
JP
Japan
Prior art keywords
type layer
group
junction
semiconductor device
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020518622A
Other languages
English (en)
Japanese (ja)
Other versions
JP7212437B2 (ja
JP2020537335A (ja
Filing date
Publication date
Priority claimed from US15/784,384 external-priority patent/US10158039B1/en
Application filed filed Critical
Publication of JP2020537335A publication Critical patent/JP2020537335A/ja
Publication of JP2020537335A5 publication Critical patent/JP2020537335A5/ja
Application granted granted Critical
Publication of JP7212437B2 publication Critical patent/JP7212437B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2020518622A 2017-10-16 2018-09-21 半導体デバイス、その製造方法および半導体製造システム Active JP7212437B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/784,384 2017-10-16
US15/784,384 US10158039B1 (en) 2017-10-16 2017-10-16 Heterojunction diode having a narrow bandgap semiconductor
PCT/IB2018/057288 WO2019077424A1 (en) 2017-10-16 2018-09-21 HETEROJUNCTION DIODE HAVING A NARROW PROHIBITED BAND SEMICONDUCTOR

Publications (3)

Publication Number Publication Date
JP2020537335A JP2020537335A (ja) 2020-12-17
JP2020537335A5 true JP2020537335A5 (https=) 2021-02-04
JP7212437B2 JP7212437B2 (ja) 2023-01-25

Family

ID=64604839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020518622A Active JP7212437B2 (ja) 2017-10-16 2018-09-21 半導体デバイス、その製造方法および半導体製造システム

Country Status (6)

Country Link
US (1) US10158039B1 (https=)
JP (1) JP7212437B2 (https=)
CN (1) CN111213246B (https=)
DE (1) DE112018004549T5 (https=)
GB (1) GB2580827B (https=)
WO (1) WO2019077424A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111952385B (zh) * 2020-08-21 2022-08-02 中国科学院长春光学精密机械与物理研究所 一种二维材料极化激元与异质结结合的红外光探测器
WO2024004520A1 (ja) 2022-06-30 2024-01-04 パナソニックIpマネジメント株式会社 二次電池用負極材料、および、二次電池
CN116344659A (zh) * 2023-01-09 2023-06-27 中国科学院半导体研究所 红外光电器件及其制备方法与硅基光电集成芯片

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3498140B2 (ja) * 2001-01-25 2004-02-16 独立行政法人産業技術総合研究所 半導体発光素子
EP2115782A1 (en) 2007-01-30 2009-11-11 Solasta, Inc. Photovoltaic cell and method of making thereof
US20100116329A1 (en) 2008-06-09 2010-05-13 Fitzgerald Eugene A Methods of forming high-efficiency solar cell structures
US8293628B2 (en) 2009-05-28 2012-10-23 Technion Research & Development Foundation Ltd. Strain-controlled atomic layer epitaxy, quantum wells and superlattices prepared thereby and uses thereof
US7928389B1 (en) 2009-08-20 2011-04-19 Hrl Laboratories, Llc Wide bandwidth infrared detector and imager
CN101866999B (zh) * 2010-05-19 2012-09-05 中国科学院半导体研究所 制作ZnO基异质结发光二极管的方法
JP5392414B2 (ja) * 2010-09-13 2014-01-22 株式会社村田製作所 フォトダイオード、及び紫外線センサ
FR2982079A1 (fr) 2011-10-28 2013-05-03 Commissariat Energie Atomique Imageur cmos utbb
JP2013102093A (ja) * 2011-11-09 2013-05-23 Stanley Electric Co Ltd 半導体素子の製造方法及び半導体素子
CN102394263A (zh) * 2011-11-22 2012-03-28 中国科学院半导体研究所 增强n-ZnO/AlN/p-GaN发光二极管的电致发光性能的方法
EA201201245A1 (ru) 2012-09-14 2013-07-30 Ооо "Лед Микросенсор Нт" Способ изготовления гетероструктур (варианты) для среднего ик-диапазона, гетероструктура (варианты) и светодиод и фотодиод на основе этой гетероструктуры
JP6177515B2 (ja) * 2012-10-31 2017-08-09 富士フイルム株式会社 半導体膜、半導体膜の製造方法、太陽電池、発光ダイオード、薄膜トランジスタ、および、電子デバイス
JP2014225597A (ja) * 2013-05-17 2014-12-04 日本碍子株式会社 光起電力素子
US9673252B1 (en) 2014-08-13 2017-06-06 Lockheed Martin Corporation Field-assisted infrared detector with unipolar barrier
US9324813B2 (en) * 2014-09-30 2016-04-26 International Business Machines Corporation Doped zinc oxide as N+ layer for semiconductor devices
US9581760B2 (en) * 2015-01-26 2017-02-28 Advalue Photonics, Inc. Rare-earth doped gain fibers
US9653570B2 (en) * 2015-02-12 2017-05-16 International Business Machines Corporation Junction interlayer dielectric for reducing leakage current in semiconductor devices
US9748412B2 (en) * 2015-06-01 2017-08-29 International Business Machines Corporation Highly responsive III-V photodetectors using ZnO:Al as N-type emitter
US10439106B2 (en) * 2015-06-30 2019-10-08 International Business Machines Corporation Light emitting diode with ZnO emitter

Similar Documents

Publication Publication Date Title
TWI518751B (zh) 成分元素濃度漸變分佈之載子通道及其製作方法
KR102704086B1 (ko) 태양전지
JP2020537335A5 (https=)
US11217709B2 (en) Graphene-semiconductor heterojunction photodetector and method of manufacturing the same
JP2020098929A (ja) 太陽電池及びその製造方法
JP2018521502A (ja) 誘起結合を有するバックコンタクト型光電池
GB2580827A (en) Heterojunction Diode having a narrow bandgap semiconductor
JP2020053523A5 (https=)
KR20190127528A (ko) 광 센서
US20110215434A1 (en) Thin-film photoelectric conversion device and method of manufacturing thin-film photoelectric conversion device
KR20100094224A (ko) 태양전지 및 이의 제조방법
US20160133475A1 (en) Preparation method of a germanium-based schottky junction
KR101030447B1 (ko) 이종접합 실리콘 태양전지와 그 제조방법
US8785219B1 (en) Optoelectronic semiconductor device and the manufacturing method thereof
US20150122321A1 (en) Solar cell
KR20180101679A (ko) 실리콘 태양전지 및 이를 제조하는 방법
KR101665863B1 (ko) 정류 다이오드 및 그 제조방법
CN108198758B (zh) 一种垂直结构的氮化镓功率二极管器件及其制作方法
CN104115278B (zh) 太阳能电池及其制造方法
US20130062606A1 (en) Thin film transistor and method of manufacturing the same
WO2014067378A1 (zh) 具有反射电极的发光装置
KR20140109523A (ko) 태양 전지 및 그 제조 방법
TW201327855A (zh) 太陽能電池
JPWO2020229826A5 (https=)
KR101693590B1 (ko) 간접 밴드갭 반도체 전기발광소자 및 이의 제조방법