JP2020528548A - 真空チャンバの清浄度を監視する清浄度モニタおよび方法 - Google Patents
真空チャンバの清浄度を監視する清浄度モニタおよび方法 Download PDFInfo
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Abstract
Description
本出願は、あらゆる目的で内容全体が参照により本明細書に組み込まれている、2017年7月18日出願の米国特許出願第15/653,299号からの優先権を主張する。
Claims (15)
- 真空チャンバの清浄度を監視する清浄度モニタであって、
前記真空チャンバ内の環境を監視し、前記環境の内容物を示す検出信号を生成するように構成された質量分析計であり、前記検出信号の第1のサブセットが、有機分子の存在を示す、質量分析計と、
凝集期間中に、前記真空チャンバ内に存在する有機分子を凝集させ、解放期間中に、前記質量分析計への前記有機分子のサブセットの解放を誘起するように構成された分子凝集および解放ユニットと、
前記検出信号に基づいて、前記真空チャンバの前記清浄度を判定するように構成された分析器とを備える清浄度モニタ。 - 前記分子凝集および解放ユニットが、前記分子凝集および解放器の分子凝集器に熱的に結合された加熱素子を備える、請求項1に記載の清浄度モニタ。
- 前記分子凝集および解放ユニットが、前記分子凝集および解放器の分子凝集器に電気的に結合された分子解放器を備え、前記分子解放器が、前記分子凝集器に電流を流し、それによって前記分子凝集器を加熱するように構成される、請求項1に記載の清浄度モニタ。
- 前記分子凝集および解放ユニットが、螺旋形の導電体を備える、請求項1に記載の清浄度モニタ。
- 前記分子凝集および解放ユニットが、螺旋形の絶縁体を備える、請求項1に記載の清浄度モニタ。
- 前記分子凝集および解放ユニットが、平滑でない板を備える、請求項1に記載の清浄度モニタ。
- 前記解放期間中に前記凝集分子の伝播に影響を与える流量制御ユニットを備える、請求項1に記載の清浄度モニタ。
- 前記流量制御ユニットが、前記凝集分子を前記質量分析計の方へ誘導するポンプを備える、請求項7に記載の清浄度モニタ。
- 前記分子凝集および解放ユニットが、前記質量分析計への前記有機分子の前記サブセットの前記解放を誘起するための所与の解放プロセスを適用するように構成され、前記清浄度モニタが、前記分子凝集および解放ユニットより前記有機分子に対して低い露出を有する疑似分子凝集および解放ユニットをさらに備え、前記疑似分子凝集および解放ユニットが、前記所与の解放プロセスを適用するように構成される、請求項1に記載の清浄度モニタ。
- 前記疑似分子凝集および解放器を含む前記真空チャンバ内の空間を監視するように構成された追加の質量分析計を備える、請求項9に記載の清浄度モニタ。
- 前記検出信号の第2のサブセットが、前記有機分子のうちのいくつかの存在を示さず、前記分析器が、前記検出信号の前記第1のサブセットと第2のサブセットとの比較に基づいて、前記真空チャンバの前記清浄度を判定するように構成される、請求項1に記載の清浄度モニタ。
- 前記検出信号の前記第2のサブセットが、前記解放期間前、または前記解放期間後の事前定義された期間後に得られる、請求項11に記載の清浄度モニタ。
- 前記凝集期間が、前記解放期間より長い、請求項1に記載の清浄度モニタ。
- 真空チャンバの清浄度を監視する方法であって、
凝集期間中、前記真空チャンバ内に位置決めされた分子凝集および解放ユニットによって、前記真空チャンバ内に存在する有機分子を凝集させることと、
解放期間中、前記分子凝集および解放器によって、質量分析計への前記有機分子のサブセットの解放を誘起することと、
前記真空チャンバ内の環境を監視すること、および前記環境の内容物を示す検出信号を生成することであり、前記検出信号の第1のサブセットが、前記有機分子の前記サブセットの存在を示す、監視および生成することと、
前記検出信号に基づいて、前記真空チャンバの前記清浄度を判定することとを含む方法。 - 前記検出信号を監視および生成することが、前記質量分析計によって行われ、前記判定することが、分析器によって行われる、請求項14に記載の方法。
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US15/653,299 US10217621B2 (en) | 2017-07-18 | 2017-07-18 | Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber |
US15/653,299 | 2017-07-18 | ||
PCT/US2018/042154 WO2019018240A1 (en) | 2017-07-18 | 2018-07-13 | CLEANING MONITORING DEVICE AND METHOD FOR MONITORING THE CLEANLINESS OF A VACUUM CHAMBER |
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US11049704B1 (en) * | 2020-05-20 | 2021-06-29 | Applied Materials Israel Ltd. | Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber |
US11199401B1 (en) | 2020-09-03 | 2021-12-14 | Applied Materials Israel Ltd. | End-point detection for similar adjacent materials |
US11598633B2 (en) | 2021-07-19 | 2023-03-07 | Applied Materials Israel Ltd. | Analyzing a buried layer of a sample |
US12033831B2 (en) | 2021-08-23 | 2024-07-09 | Applied Materials Israel Ltd. | Analyzing a sidewall of hole milled in a sample to determine thickness of a buried layer |
US11694934B2 (en) | 2021-09-21 | 2023-07-04 | Applied Materials Israel Ltd. | FIB delayering endpoint detection by monitoring sputtered materials using RGA |
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JP2007271293A (ja) * | 2006-03-30 | 2007-10-18 | National Institute Of Advanced Industrial & Technology | 目的物質の吸着方法および吸着装置 |
JP2012021775A (ja) * | 2010-07-12 | 2012-02-02 | Hitachi Ltd | 微小試料分析装置及び方法 |
JP2013543969A (ja) * | 2010-10-25 | 2013-12-09 | コーニンクレッカ フィリップス エヌ ヴェ | 真空環境における分子汚染の解析 |
JP2014525139A (ja) * | 2011-06-23 | 2014-09-25 | ダイナミック マイクロシステムズ セミコンダクター イクイップメント ゲーエムベーハー | 半導体クリーニングシステム及び半導体清浄方法 |
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CN116930384A (zh) | 2023-10-24 |
TW201919090A (zh) | 2019-05-16 |
CN111316414B (zh) | 2023-06-16 |
KR102554490B1 (ko) | 2023-07-12 |
CN116930384B (zh) | 2024-03-22 |
US20190027354A1 (en) | 2019-01-24 |
KR102626189B1 (ko) | 2024-01-18 |
JP7218345B2 (ja) | 2023-02-06 |
KR20230109777A (ko) | 2023-07-20 |
CN111316414A (zh) | 2020-06-19 |
US10217621B2 (en) | 2019-02-26 |
KR20200022042A (ko) | 2020-03-02 |
TWI783009B (zh) | 2022-11-11 |
WO2019018240A1 (en) | 2019-01-24 |
TW202307915A (zh) | 2023-02-16 |
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