JP2020522026A5 - - Google Patents

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JP2020522026A5
JP2020522026A5 JP2019566818A JP2019566818A JP2020522026A5 JP 2020522026 A5 JP2020522026 A5 JP 2020522026A5 JP 2019566818 A JP2019566818 A JP 2019566818A JP 2019566818 A JP2019566818 A JP 2019566818A JP 2020522026 A5 JP2020522026 A5 JP 2020522026A5
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surface profile
height
profile
filling material
modulated
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JP2019566818A
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JP2020522026A (ja
JP7379775B2 (ja
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Priority claimed from FI20175506A external-priority patent/FI128574B/en
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JP2019566818A 2017-06-02 2018-05-18 高さ変調式回折マスタプレート及びその製造方法 Active JP7379775B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20175506A FI128574B (en) 2017-06-02 2017-06-02 Height-modulated diffractive master plate and process for its manufacture
FI20175506 2017-06-02
PCT/FI2018/050379 WO2018220270A1 (en) 2017-06-02 2018-05-18 Height-modulated diffractive master plate and method of manufacturing thereof

Publications (3)

Publication Number Publication Date
JP2020522026A JP2020522026A (ja) 2020-07-27
JP2020522026A5 true JP2020522026A5 (enExample) 2021-06-17
JP7379775B2 JP7379775B2 (ja) 2023-11-15

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JP2019566818A Active JP7379775B2 (ja) 2017-06-02 2018-05-18 高さ変調式回折マスタプレート及びその製造方法

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US (1) US11391870B2 (enExample)
EP (1) EP3631536B1 (enExample)
JP (1) JP7379775B2 (enExample)
CN (1) CN111033325B (enExample)
FI (1) FI128574B (enExample)
WO (1) WO2018220270A1 (enExample)

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US10690821B1 (en) * 2018-12-14 2020-06-23 Applied Materials, Inc. Methods of producing slanted gratings
US11669012B2 (en) * 2020-02-21 2023-06-06 Applied Materials, Inc. Maskless lithography method to fabricate topographic substrate
CN115698778A (zh) * 2020-06-03 2023-02-03 应用材料公司 波导光栅的梯度密封
CN115803686A (zh) * 2020-06-25 2023-03-14 奇跃公司 用于头戴式显示器的目镜及其制造方法
US11709422B2 (en) 2020-09-17 2023-07-25 Meta Platforms Technologies, Llc Gray-tone lithography for precise control of grating etch depth
US20220082739A1 (en) * 2020-09-17 2022-03-17 Facebook Technologies, Llc Techniques for manufacturing variable etch depth gratings using gray-tone lithography
FI130396B (fi) * 2020-09-23 2023-08-10 Dispelix Oy Optinen aaltojohde lisätyn todellisuuden näyttölaitteeseen
US12259552B2 (en) * 2020-12-17 2025-03-25 Google Llc Spatial variance along waveguide incoupler
US12442961B1 (en) 2021-07-23 2025-10-14 Apple Inc. Methods of forming holographic gratings for optical systems
EP4609237A1 (en) * 2022-10-27 2025-09-03 Applied Materials, Inc. Inkjet gradient index material to modulate grating diffraction efficiency

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US3669673A (en) * 1970-10-23 1972-06-13 Rca Corp Recording of a continuous tone focused image on a diffraction grating
US3944420A (en) * 1974-05-22 1976-03-16 Rca Corporation Generation of permanent phase holograms and relief patterns in durable media by chemical etching
JPS52125348A (en) * 1976-05-13 1977-10-21 Rca Corp Composite focused hologram record
JPH1078667A (ja) * 1996-09-04 1998-03-24 Ebara Corp 微細加工方法
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JPH1131863A (ja) * 1997-07-11 1999-02-02 Hitachi Ltd 回折格子の製造方法及びそれを用いて製造した半導体レーザ及びそれを用いた光応用システム
CA2214927A1 (en) 1997-10-31 1999-04-30 Pin Long Methods for making phase masks with spatial variable first order efficiency for fiber bragg grating fabrication
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JP2002189112A (ja) 2000-12-22 2002-07-05 Canon Inc 回折光学素子の製造方法、回折光学素子の製造方法によって製造したことを特徴とする回折光学素子製造用金型、回折光学素子、および該回折光学素子を有する光学系、光学機器、露光装置、デバイス製造方法、デバイス
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