JP7379775B2 - 高さ変調式回折マスタプレート及びその製造方法 - Google Patents
高さ変調式回折マスタプレート及びその製造方法 Download PDFInfo
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- JP7379775B2 JP7379775B2 JP2019566818A JP2019566818A JP7379775B2 JP 7379775 B2 JP7379775 B2 JP 7379775B2 JP 2019566818 A JP2019566818 A JP 2019566818A JP 2019566818 A JP2019566818 A JP 2019566818A JP 7379775 B2 JP7379775 B2 JP 7379775B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 38
- 238000000034 method Methods 0.000 claims description 80
- 239000000463 material Substances 0.000 claims description 72
- 239000000945 filler Substances 0.000 claims description 47
- 239000000758 substrate Substances 0.000 claims description 43
- 230000000737 periodic effect Effects 0.000 claims description 23
- 238000005530 etching Methods 0.000 claims description 10
- 230000009977 dual effect Effects 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 description 19
- 238000001459 lithography Methods 0.000 description 12
- 238000000609 electron-beam lithography Methods 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 210000001747 pupil Anatomy 0.000 description 4
- 238000001039 wet etching Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
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- 239000010409 thin film Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000003190 augmentative effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
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- 238000010894 electron beam technology Methods 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/44—Grating systems; Zone plate systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1828—Diffraction gratings having means for producing variable diffraction
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
- B29D11/00769—Producing diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/0101—Head-up displays characterised by optical features
- G02B2027/0123—Head-up displays characterised by optical features comprising devices increasing the field of view
- G02B2027/0125—Field-of-view increase by wavefront division
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B2027/0178—Eyeglass type
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20175506A FI128574B (en) | 2017-06-02 | 2017-06-02 | Height-modulated diffractive master plate and process for its manufacture |
| FI20175506 | 2017-06-02 | ||
| PCT/FI2018/050379 WO2018220270A1 (en) | 2017-06-02 | 2018-05-18 | Height-modulated diffractive master plate and method of manufacturing thereof |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020522026A JP2020522026A (ja) | 2020-07-27 |
| JP2020522026A5 JP2020522026A5 (enExample) | 2021-06-17 |
| JP7379775B2 true JP7379775B2 (ja) | 2023-11-15 |
Family
ID=64455234
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019566818A Active JP7379775B2 (ja) | 2017-06-02 | 2018-05-18 | 高さ変調式回折マスタプレート及びその製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11391870B2 (enExample) |
| EP (1) | EP3631536B1 (enExample) |
| JP (1) | JP7379775B2 (enExample) |
| CN (1) | CN111033325B (enExample) |
| FI (1) | FI128574B (enExample) |
| WO (1) | WO2018220270A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10690821B1 (en) * | 2018-12-14 | 2020-06-23 | Applied Materials, Inc. | Methods of producing slanted gratings |
| US11669012B2 (en) * | 2020-02-21 | 2023-06-06 | Applied Materials, Inc. | Maskless lithography method to fabricate topographic substrate |
| CN115698778A (zh) * | 2020-06-03 | 2023-02-03 | 应用材料公司 | 波导光栅的梯度密封 |
| CN115803686A (zh) * | 2020-06-25 | 2023-03-14 | 奇跃公司 | 用于头戴式显示器的目镜及其制造方法 |
| US11709422B2 (en) | 2020-09-17 | 2023-07-25 | Meta Platforms Technologies, Llc | Gray-tone lithography for precise control of grating etch depth |
| US20220082739A1 (en) * | 2020-09-17 | 2022-03-17 | Facebook Technologies, Llc | Techniques for manufacturing variable etch depth gratings using gray-tone lithography |
| FI130396B (fi) * | 2020-09-23 | 2023-08-10 | Dispelix Oy | Optinen aaltojohde lisätyn todellisuuden näyttölaitteeseen |
| US12259552B2 (en) * | 2020-12-17 | 2025-03-25 | Google Llc | Spatial variance along waveguide incoupler |
| US12442961B1 (en) | 2021-07-23 | 2025-10-14 | Apple Inc. | Methods of forming holographic gratings for optical systems |
| EP4609237A1 (en) * | 2022-10-27 | 2025-09-03 | Applied Materials, Inc. | Inkjet gradient index material to modulate grating diffraction efficiency |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001511906A (ja) | 1997-02-14 | 2001-08-14 | アンスティテュ ナシィオナル ドオプティック | 回折効率が空間的に可変なフェーズマスク |
| CN1797199A (zh) | 2004-12-22 | 2006-07-05 | 中国科学院光电技术研究所 | 移动灰阶掩模微纳结构成形方法 |
| JP2007212575A (ja) | 2006-02-07 | 2007-08-23 | Ricoh Co Ltd | 光回折素子、光線走査方法、光線走査装置及び画像形成装置 |
| US20160033784A1 (en) | 2014-07-30 | 2016-02-04 | Tapani Levola | Optical Components |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3669673A (en) * | 1970-10-23 | 1972-06-13 | Rca Corp | Recording of a continuous tone focused image on a diffraction grating |
| US3944420A (en) * | 1974-05-22 | 1976-03-16 | Rca Corporation | Generation of permanent phase holograms and relief patterns in durable media by chemical etching |
| JPS52125348A (en) * | 1976-05-13 | 1977-10-21 | Rca Corp | Composite focused hologram record |
| JPH1078667A (ja) * | 1996-09-04 | 1998-03-24 | Ebara Corp | 微細加工方法 |
| JPH1131863A (ja) * | 1997-07-11 | 1999-02-02 | Hitachi Ltd | 回折格子の製造方法及びそれを用いて製造した半導体レーザ及びそれを用いた光応用システム |
| CA2214927A1 (en) | 1997-10-31 | 1999-04-30 | Pin Long | Methods for making phase masks with spatial variable first order efficiency for fiber bragg grating fabrication |
| US6534221B2 (en) | 1998-03-28 | 2003-03-18 | Gray Scale Technologies, Inc. | Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics |
| JP2002189112A (ja) | 2000-12-22 | 2002-07-05 | Canon Inc | 回折光学素子の製造方法、回折光学素子の製造方法によって製造したことを特徴とする回折光学素子製造用金型、回折光学素子、および該回折光学素子を有する光学系、光学機器、露光装置、デバイス製造方法、デバイス |
| US8317321B2 (en) * | 2007-07-03 | 2012-11-27 | Pixeloptics, Inc. | Multifocal lens with a diffractive optical power region |
| US9791623B2 (en) * | 2009-11-30 | 2017-10-17 | Board Of Regents, The University Of Texas System | Multilevel leaky-mode resonant optical devices |
| US9400432B2 (en) * | 2010-10-28 | 2016-07-26 | National University Of Singapore | Lithography method and apparatus |
| CN103901520B (zh) * | 2014-04-23 | 2016-07-06 | 中国科学技术大学 | 一种顶角90°三角形槽阶梯光栅的制作方法 |
| JPWO2016185602A1 (ja) * | 2015-05-21 | 2018-03-08 | ナルックス株式会社 | 回折光学素子 |
| US9885870B2 (en) * | 2016-04-25 | 2018-02-06 | Microsoft Technology Licensing, Llc | Diffractive optical elements with analog modulations and switching |
| CN105785493B (zh) * | 2016-05-09 | 2019-01-22 | 深圳市华星光电技术有限公司 | 金属光栅偏光片及其制作方法 |
| US10649141B1 (en) * | 2018-04-23 | 2020-05-12 | Facebook Technologies, Llc | Gratings with variable etch heights for waveguide displays |
-
2017
- 2017-06-02 FI FI20175506A patent/FI128574B/en active IP Right Grant
-
2018
- 2018-05-18 US US16/618,178 patent/US11391870B2/en active Active
- 2018-05-18 WO PCT/FI2018/050379 patent/WO2018220270A1/en not_active Ceased
- 2018-05-18 EP EP18809747.1A patent/EP3631536B1/en active Active
- 2018-05-18 CN CN201880038493.4A patent/CN111033325B/zh active Active
- 2018-05-18 JP JP2019566818A patent/JP7379775B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001511906A (ja) | 1997-02-14 | 2001-08-14 | アンスティテュ ナシィオナル ドオプティック | 回折効率が空間的に可変なフェーズマスク |
| CN1797199A (zh) | 2004-12-22 | 2006-07-05 | 中国科学院光电技术研究所 | 移动灰阶掩模微纳结构成形方法 |
| JP2007212575A (ja) | 2006-02-07 | 2007-08-23 | Ricoh Co Ltd | 光回折素子、光線走査方法、光線走査装置及び画像形成装置 |
| US20160033784A1 (en) | 2014-07-30 | 2016-02-04 | Tapani Levola | Optical Components |
Also Published As
| Publication number | Publication date |
|---|---|
| US11391870B2 (en) | 2022-07-19 |
| FI128574B (en) | 2020-08-14 |
| EP3631536A4 (en) | 2021-03-10 |
| EP3631536B1 (en) | 2024-08-07 |
| CN111033325A (zh) | 2020-04-17 |
| JP2020522026A (ja) | 2020-07-27 |
| CN111033325B (zh) | 2022-01-11 |
| WO2018220270A1 (en) | 2018-12-06 |
| EP3631536C0 (en) | 2024-08-07 |
| FI20175506A1 (en) | 2018-12-03 |
| US20200110206A1 (en) | 2020-04-09 |
| EP3631536A1 (en) | 2020-04-08 |
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