FI128574B - Height-modulated diffractive master plate and process for its manufacture - Google Patents

Height-modulated diffractive master plate and process for its manufacture Download PDF

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Publication number
FI128574B
FI128574B FI20175506A FI20175506A FI128574B FI 128574 B FI128574 B FI 128574B FI 20175506 A FI20175506 A FI 20175506A FI 20175506 A FI20175506 A FI 20175506A FI 128574 B FI128574 B FI 128574B
Authority
FI
Finland
Prior art keywords
height
surface profile
filling material
profile
modulated
Prior art date
Application number
FI20175506A
Other languages
English (en)
Finnish (fi)
Swedish (sv)
Other versions
FI20175506A1 (en
Inventor
Jussi Rahomäki
Ismo Vartiainen
Original Assignee
Dispelix Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dispelix Oy filed Critical Dispelix Oy
Priority to FI20175506A priority Critical patent/FI128574B/en
Priority to US16/618,178 priority patent/US11391870B2/en
Priority to CN201880038493.4A priority patent/CN111033325B/zh
Priority to EP18809747.1A priority patent/EP3631536B1/en
Priority to PCT/FI2018/050379 priority patent/WO2018220270A1/en
Priority to JP2019566818A priority patent/JP7379775B2/ja
Publication of FI20175506A1 publication Critical patent/FI20175506A1/en
Application granted granted Critical
Publication of FI128574B publication Critical patent/FI128574B/en

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B29D11/00769—Producing diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/44—Grating systems; Zone plate systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1828—Diffraction gratings having means for producing variable diffraction
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G02B2027/0123—Head-up displays characterised by optical features comprising devices increasing the field of view
    • G02B2027/0125—Field-of-view increase by wavefront division
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B2027/0178—Eyeglass type

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FI20175506A 2017-06-02 2017-06-02 Height-modulated diffractive master plate and process for its manufacture FI128574B (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FI20175506A FI128574B (en) 2017-06-02 2017-06-02 Height-modulated diffractive master plate and process for its manufacture
US16/618,178 US11391870B2 (en) 2017-06-02 2018-05-18 Height-modulated diffractive master plate and method of manufacturing thereof
CN201880038493.4A CN111033325B (zh) 2017-06-02 2018-05-18 经高度调制的衍射母板及其制造方法
EP18809747.1A EP3631536B1 (en) 2017-06-02 2018-05-18 Height-modulated diffractive master plate and method of manufacturing thereof
PCT/FI2018/050379 WO2018220270A1 (en) 2017-06-02 2018-05-18 Height-modulated diffractive master plate and method of manufacturing thereof
JP2019566818A JP7379775B2 (ja) 2017-06-02 2018-05-18 高さ変調式回折マスタプレート及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20175506A FI128574B (en) 2017-06-02 2017-06-02 Height-modulated diffractive master plate and process for its manufacture

Publications (2)

Publication Number Publication Date
FI20175506A1 FI20175506A1 (en) 2018-12-03
FI128574B true FI128574B (en) 2020-08-14

Family

ID=64455234

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20175506A FI128574B (en) 2017-06-02 2017-06-02 Height-modulated diffractive master plate and process for its manufacture

Country Status (6)

Country Link
US (1) US11391870B2 (enExample)
EP (1) EP3631536B1 (enExample)
JP (1) JP7379775B2 (enExample)
CN (1) CN111033325B (enExample)
FI (1) FI128574B (enExample)
WO (1) WO2018220270A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10690821B1 (en) * 2018-12-14 2020-06-23 Applied Materials, Inc. Methods of producing slanted gratings
US11669012B2 (en) * 2020-02-21 2023-06-06 Applied Materials, Inc. Maskless lithography method to fabricate topographic substrate
CN115698778A (zh) * 2020-06-03 2023-02-03 应用材料公司 波导光栅的梯度密封
CN115803686A (zh) * 2020-06-25 2023-03-14 奇跃公司 用于头戴式显示器的目镜及其制造方法
US11709422B2 (en) 2020-09-17 2023-07-25 Meta Platforms Technologies, Llc Gray-tone lithography for precise control of grating etch depth
US20220082739A1 (en) * 2020-09-17 2022-03-17 Facebook Technologies, Llc Techniques for manufacturing variable etch depth gratings using gray-tone lithography
FI130396B (fi) * 2020-09-23 2023-08-10 Dispelix Oy Optinen aaltojohde lisätyn todellisuuden näyttölaitteeseen
US12259552B2 (en) * 2020-12-17 2025-03-25 Google Llc Spatial variance along waveguide incoupler
US12442961B1 (en) 2021-07-23 2025-10-14 Apple Inc. Methods of forming holographic gratings for optical systems
EP4609237A1 (en) * 2022-10-27 2025-09-03 Applied Materials, Inc. Inkjet gradient index material to modulate grating diffraction efficiency

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3669673A (en) * 1970-10-23 1972-06-13 Rca Corp Recording of a continuous tone focused image on a diffraction grating
US3944420A (en) * 1974-05-22 1976-03-16 Rca Corporation Generation of permanent phase holograms and relief patterns in durable media by chemical etching
JPS52125348A (en) * 1976-05-13 1977-10-21 Rca Corp Composite focused hologram record
JPH1078667A (ja) * 1996-09-04 1998-03-24 Ebara Corp 微細加工方法
CA2197706A1 (en) * 1997-02-14 1998-08-14 Peter Ehbets Method of fabricating apodized phase mask
JPH1131863A (ja) * 1997-07-11 1999-02-02 Hitachi Ltd 回折格子の製造方法及びそれを用いて製造した半導体レーザ及びそれを用いた光応用システム
CA2214927A1 (en) 1997-10-31 1999-04-30 Pin Long Methods for making phase masks with spatial variable first order efficiency for fiber bragg grating fabrication
US6534221B2 (en) 1998-03-28 2003-03-18 Gray Scale Technologies, Inc. Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics
JP2002189112A (ja) 2000-12-22 2002-07-05 Canon Inc 回折光学素子の製造方法、回折光学素子の製造方法によって製造したことを特徴とする回折光学素子製造用金型、回折光学素子、および該回折光学素子を有する光学系、光学機器、露光装置、デバイス製造方法、デバイス
CN1797199A (zh) * 2004-12-22 2006-07-05 中国科学院光电技术研究所 移动灰阶掩模微纳结构成形方法
JP2007212575A (ja) * 2006-02-07 2007-08-23 Ricoh Co Ltd 光回折素子、光線走査方法、光線走査装置及び画像形成装置
US8317321B2 (en) * 2007-07-03 2012-11-27 Pixeloptics, Inc. Multifocal lens with a diffractive optical power region
US9791623B2 (en) * 2009-11-30 2017-10-17 Board Of Regents, The University Of Texas System Multilevel leaky-mode resonant optical devices
US9400432B2 (en) * 2010-10-28 2016-07-26 National University Of Singapore Lithography method and apparatus
CN103901520B (zh) * 2014-04-23 2016-07-06 中国科学技术大学 一种顶角90°三角形槽阶梯光栅的制作方法
US20160033784A1 (en) 2014-07-30 2016-02-04 Tapani Levola Optical Components
JPWO2016185602A1 (ja) * 2015-05-21 2018-03-08 ナルックス株式会社 回折光学素子
US9885870B2 (en) * 2016-04-25 2018-02-06 Microsoft Technology Licensing, Llc Diffractive optical elements with analog modulations and switching
CN105785493B (zh) * 2016-05-09 2019-01-22 深圳市华星光电技术有限公司 金属光栅偏光片及其制作方法
US10649141B1 (en) * 2018-04-23 2020-05-12 Facebook Technologies, Llc Gratings with variable etch heights for waveguide displays

Also Published As

Publication number Publication date
US11391870B2 (en) 2022-07-19
EP3631536A4 (en) 2021-03-10
EP3631536B1 (en) 2024-08-07
CN111033325A (zh) 2020-04-17
JP2020522026A (ja) 2020-07-27
CN111033325B (zh) 2022-01-11
JP7379775B2 (ja) 2023-11-15
WO2018220270A1 (en) 2018-12-06
EP3631536C0 (en) 2024-08-07
FI20175506A1 (en) 2018-12-03
US20200110206A1 (en) 2020-04-09
EP3631536A1 (en) 2020-04-08

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