JP2020520477A5 - - Google Patents
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- JP2020520477A5 JP2020520477A5 JP2019563374A JP2019563374A JP2020520477A5 JP 2020520477 A5 JP2020520477 A5 JP 2020520477A5 JP 2019563374 A JP2019563374 A JP 2019563374A JP 2019563374 A JP2019563374 A JP 2019563374A JP 2020520477 A5 JP2020520477 A5 JP 2020520477A5
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- JP
- Japan
- Prior art keywords
- diffraction
- diffraction structure
- projection exposure
- correction surface
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003287 optical effect Effects 0.000 claims description 9
- 230000005855 radiation Effects 0.000 claims description 9
- 238000000034 method Methods 0.000 claims 14
- 210000001747 pupil Anatomy 0.000 claims 8
- 238000005286 illumination Methods 0.000 claims 6
- 238000003384 imaging method Methods 0.000 claims 6
- 238000001228 spectrum Methods 0.000 claims 4
- 230000000007 visual effect Effects 0.000 claims 4
- 230000001419 dependent effect Effects 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 238000002834 transmittance Methods 0.000 claims 3
- 230000005670 electromagnetic radiation Effects 0.000 claims 1
- 230000000873 masking effect Effects 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 238000012634 optical imaging Methods 0.000 claims 1
Images
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102017208340.9 | 2017-05-17 | ||
| DE102017208340.9A DE102017208340A1 (de) | 2017-05-17 | 2017-05-17 | Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission |
| PCT/EP2018/062201 WO2018210691A1 (en) | 2017-05-17 | 2018-05-11 | Projection exposure method and projection lens with setting of the pupil transmission |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020520477A JP2020520477A (ja) | 2020-07-09 |
| JP2020520477A5 true JP2020520477A5 (enExample) | 2021-07-26 |
| JP7245173B2 JP7245173B2 (ja) | 2023-03-23 |
Family
ID=62152567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019563374A Active JP7245173B2 (ja) | 2017-05-17 | 2018-05-11 | 瞳透過率の設定による投影露光方法および投影レンズ |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US11143967B2 (enExample) |
| JP (1) | JP7245173B2 (enExample) |
| DE (1) | DE102017208340A1 (enExample) |
| TW (1) | TWI802572B (enExample) |
| WO (1) | WO2018210691A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102017208340A1 (de) | 2017-05-17 | 2018-11-22 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission |
| JP7446068B2 (ja) * | 2019-09-03 | 2024-03-08 | キヤノン株式会社 | 露光装置、および、物品の製造方法 |
| DE102020116091A1 (de) * | 2019-10-30 | 2021-05-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Abstimmbare beleuchtungsvorrichtung fürlithographiesysteme |
| DE102019131327A1 (de) * | 2019-11-20 | 2021-05-20 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren zur Messung von Substraten für die Halbleiterlithographie |
| KR102847325B1 (ko) * | 2020-07-07 | 2025-08-14 | 삼성전자주식회사 | 퓨필 이미지 기반 패턴 균일도 측정 장치와 방법, 및 그 측정 방법을 이용한 마스크 제조방법 |
| CN116710847A (zh) | 2021-01-19 | 2023-09-05 | 卡尔蔡司Smt有限责任公司 | 设置投射曝光系统的方法、投射曝光方法以及用于微光刻的投射曝光系统 |
| DE102021205328B3 (de) * | 2021-05-26 | 2022-09-29 | Carl Zeiss Smt Gmbh | Verfahren zur Bestimmung einer Abbildungsqualität eines optischen Systems bei Beleuchtung mit Beleuchtungslicht innerhalb einer zu vermessenden Pupille und Metrologiesystem dafür |
| US12386251B2 (en) | 2023-01-20 | 2025-08-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and system to introduce bright field imaging at stitching area of high-NA EUV exposure |
| TWI848645B (zh) * | 2023-03-31 | 2024-07-11 | 上儀股份有限公司 | 雷射熱加工系統 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2248491B (en) | 1986-12-04 | 1992-09-02 | Schneider Metal Mfg | A method of making ice cubes |
| US5614990A (en) * | 1994-08-31 | 1997-03-25 | International Business Machines Corporation | Illumination tailoring system using photochromic filter |
| JP3459773B2 (ja) * | 1998-06-24 | 2003-10-27 | キヤノン株式会社 | 投影露光装置及びデバイスの製造方法 |
| US6118577A (en) * | 1998-08-06 | 2000-09-12 | Euv, L.L.C | Diffractive element in extreme-UV lithography condenser |
| US6262795B1 (en) * | 1998-08-28 | 2001-07-17 | Philip Semiconductors, Inc. | Apparatus and method for the improvement of illumination uniformity in photolithographic systems |
| US6545829B1 (en) * | 2000-08-21 | 2003-04-08 | Micron Technology, Inc. | Method and device for improved lithographic critical dimension control |
| DE10123230A1 (de) | 2001-05-12 | 2002-11-28 | Zeiss Carl | Diffraktives optisches Element sowie optische Anordnung mit einem diffraktiven optischen Element |
| DE10218989A1 (de) | 2002-04-24 | 2003-11-06 | Zeiss Carl Smt Ag | Projektionsverfahren und Projektionssystem mit optischer Filterung |
| KR101150037B1 (ko) | 2004-01-14 | 2012-07-02 | 칼 짜이스 에스엠티 게엠베하 | 반사굴절식 투영 대물렌즈 |
| JP4913041B2 (ja) | 2004-06-04 | 2012-04-11 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 強度変化の補償を伴う投影系及びそのための補償素子 |
| DE102006028242A1 (de) | 2005-07-07 | 2007-01-18 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| GB2428491A (en) | 2005-07-18 | 2007-01-31 | Zeiss Carl Smt Ag | Catadioptric Optical System with Diffractive Optical Element |
| US20070121090A1 (en) | 2005-11-30 | 2007-05-31 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8169703B1 (en) * | 2006-09-06 | 2012-05-01 | Lightsmyth Technologies Inc. | Monolithic arrays of diffraction gratings |
| US7947412B2 (en) | 2007-03-29 | 2011-05-24 | Micron Technology, Inc. | Reduced lens heating methods, apparatus, and systems |
| EP2188673A1 (en) * | 2007-08-03 | 2010-05-26 | Carl Zeiss SMT AG | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate |
| DE102007043896A1 (de) | 2007-09-14 | 2009-04-02 | Carl Zeiss Smt Ag | Mikrooptik zur Messung der Position eines Luftbildes |
| ATE532105T1 (de) * | 2007-12-21 | 2011-11-15 | Zeiss Carl Smt Gmbh | Beleuchtungsmethode |
| DE102008054737A1 (de) | 2008-01-10 | 2009-07-16 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage sowie Objektiv hierfür |
| US7855776B2 (en) | 2008-03-26 | 2010-12-21 | Qimonda Ag | Methods of compensating lens heating, lithographic projection system and photo mask |
| JP5070316B2 (ja) * | 2010-05-11 | 2012-11-14 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マスク |
| US9372413B2 (en) * | 2011-04-15 | 2016-06-21 | Asml Netherlands B.V. | Optical apparatus for conditioning a radiation beam for use by an object, lithography apparatus and method of manufacturing devices |
| US8609302B2 (en) | 2011-08-22 | 2013-12-17 | Micron Technology, Inc. | Lithography methods, methods for forming patterning tools and patterning tools |
| DE102011084152A1 (de) * | 2011-10-07 | 2013-04-11 | Carl Zeiss Smt Gmbh | Verfahren zur Einstellung der Intensitätsverteilung in einem optischen System einer mikrolithographischen Projektionsbelichtungsanlage, sowie optisches System |
| JP6315343B2 (ja) * | 2012-02-21 | 2018-04-25 | カール ツァイス エスエムエス リミテッド | 光学系の少なくとも1つの欠陥を補償する方法 |
| DE102012202675A1 (de) | 2012-02-22 | 2013-01-31 | Carl Zeiss Smt Gmbh | Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik |
| DE102012204704A1 (de) * | 2012-03-23 | 2013-09-26 | Carl Zeiss Smt Gmbh | Messvorrichtung zum Vermessen einer Abbildungsgüte eines EUV-Objektives |
| DE102013205568A1 (de) * | 2013-03-28 | 2014-03-06 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsbelichtungsanlage mit einem variablen Transmissionsfilter |
| WO2015007298A1 (en) * | 2013-07-17 | 2015-01-22 | Carl Zeiss Smt Gmbh | Microlithographic apparatus and method of varying a light irradiance distribution |
| DE102013218991A1 (de) * | 2013-09-20 | 2015-03-26 | Carl Zeiss Smt Gmbh | Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems |
| DE102015223795A1 (de) | 2015-11-30 | 2016-01-28 | Carl Zeiss Smt Gmbh | Verfahren zum Bearbeiten eines optischen Elements |
| DE102017208340A1 (de) | 2017-05-17 | 2018-11-22 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission |
-
2017
- 2017-05-17 DE DE102017208340.9A patent/DE102017208340A1/de not_active Ceased
-
2018
- 2018-05-11 WO PCT/EP2018/062201 patent/WO2018210691A1/en not_active Ceased
- 2018-05-11 JP JP2019563374A patent/JP7245173B2/ja active Active
- 2018-05-16 TW TW107116619A patent/TWI802572B/zh active
-
2019
- 2019-11-12 US US16/681,348 patent/US11143967B2/en active Active
-
2021
- 2021-10-07 US US17/496,083 patent/US11906904B2/en active Active
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