DE102017208340A1 - Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission - Google Patents
Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission Download PDFInfo
- Publication number
- DE102017208340A1 DE102017208340A1 DE102017208340.9A DE102017208340A DE102017208340A1 DE 102017208340 A1 DE102017208340 A1 DE 102017208340A1 DE 102017208340 A DE102017208340 A DE 102017208340A DE 102017208340 A1 DE102017208340 A1 DE 102017208340A1
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- diffraction
- projection
- diffraction structures
- image
- field
- Prior art date
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Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Lasers (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102017208340.9A DE102017208340A1 (de) | 2017-05-17 | 2017-05-17 | Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission |
| PCT/EP2018/062201 WO2018210691A1 (en) | 2017-05-17 | 2018-05-11 | Projection exposure method and projection lens with setting of the pupil transmission |
| JP2019563374A JP7245173B2 (ja) | 2017-05-17 | 2018-05-11 | 瞳透過率の設定による投影露光方法および投影レンズ |
| TW107116619A TWI802572B (zh) | 2017-05-17 | 2018-05-16 | 校正方法 |
| US16/681,348 US11143967B2 (en) | 2017-05-17 | 2019-11-12 | Projection exposure method and projection lens with setting of the pupil transmission |
| US17/496,083 US11906904B2 (en) | 2017-05-17 | 2021-10-07 | Projection exposure method and projection lens with setting of the pupil transmission |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102017208340.9A DE102017208340A1 (de) | 2017-05-17 | 2017-05-17 | Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102017208340A1 true DE102017208340A1 (de) | 2018-11-22 |
Family
ID=62152567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102017208340.9A Ceased DE102017208340A1 (de) | 2017-05-17 | 2017-05-17 | Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US11143967B2 (enExample) |
| JP (1) | JP7245173B2 (enExample) |
| DE (1) | DE102017208340A1 (enExample) |
| TW (1) | TWI802572B (enExample) |
| WO (1) | WO2018210691A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102019131327A1 (de) * | 2019-11-20 | 2021-05-20 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren zur Messung von Substraten für die Halbleiterlithographie |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102017208340A1 (de) | 2017-05-17 | 2018-11-22 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission |
| JP7446068B2 (ja) * | 2019-09-03 | 2024-03-08 | キヤノン株式会社 | 露光装置、および、物品の製造方法 |
| DE102020116091A1 (de) * | 2019-10-30 | 2021-05-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Abstimmbare beleuchtungsvorrichtung fürlithographiesysteme |
| KR102847325B1 (ko) * | 2020-07-07 | 2025-08-14 | 삼성전자주식회사 | 퓨필 이미지 기반 패턴 균일도 측정 장치와 방법, 및 그 측정 방법을 이용한 마스크 제조방법 |
| KR20230130117A (ko) | 2021-01-19 | 2023-09-11 | 칼 짜이스 에스엠티 게엠베하 | 투영 노광 시스템을 설정하는 방법, 마이크로리소그래피용투영 노광 방법 및 투영 노광 시스템 |
| DE102021205328B3 (de) * | 2021-05-26 | 2022-09-29 | Carl Zeiss Smt Gmbh | Verfahren zur Bestimmung einer Abbildungsqualität eines optischen Systems bei Beleuchtung mit Beleuchtungslicht innerhalb einer zu vermessenden Pupille und Metrologiesystem dafür |
| US12386251B2 (en) | 2023-01-20 | 2025-08-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and system to introduce bright field imaging at stitching area of high-NA EUV exposure |
| TWI848645B (zh) * | 2023-03-31 | 2024-07-11 | 上儀股份有限公司 | 雷射熱加工系統 |
Citations (13)
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| GB2248491A (en) | 1986-12-04 | 1992-04-08 | Schneider Metal Mfg | Ice cube making |
| US5614990A (en) * | 1994-08-31 | 1997-03-25 | International Business Machines Corporation | Illumination tailoring system using photochromic filter |
| US6118577A (en) * | 1998-08-06 | 2000-09-12 | Euv, L.L.C | Diffractive element in extreme-UV lithography condenser |
| US20010026360A1 (en) * | 1998-08-28 | 2001-10-04 | Philips Semiconductors, Inc. | Method of illumination uniformity in photolithographic systems |
| US20020041369A1 (en) * | 2000-08-21 | 2002-04-11 | Boettiger Ulrich C. | Method and device for improved lithographic critical dimension control |
| EP1256821A2 (de) | 2001-05-12 | 2002-11-13 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Diffraktives optisches Element sowie optische Anordnung mit einem diffraktiven optischen Element |
| WO2003092256A2 (de) | 2002-04-24 | 2003-11-06 | Carl Zeiss Smt Ag | Projektionsverfahren und projektionssystem mit optischer filterung |
| WO2005069055A2 (en) | 2004-01-14 | 2005-07-28 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| DE102006028242A1 (de) | 2005-07-07 | 2007-01-18 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| US20080094599A1 (en) | 2004-06-04 | 2008-04-24 | Carl Zeiss Smt Ag | Projection System with Compensation of Intensity Variations and Compensation Element Therefor |
| US20120262688A1 (en) * | 2011-04-15 | 2012-10-18 | Asml Netherlands B.V. | Optical Apparatus for Conditioning a Radiation Beam for Use by an Object, Lithography Apparatus and Method of Manufacturing Devices |
| WO2013050198A1 (en) | 2011-10-07 | 2013-04-11 | Carl Zeiss Smt Gmbh | Method for setting the intensity distribution in an optical system of a microlithographic projection exposure apparatus, and optical system |
| DE102013205568A1 (de) * | 2013-03-28 | 2014-03-06 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsbelichtungsanlage mit einem variablen Transmissionsfilter |
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| JP3459773B2 (ja) * | 1998-06-24 | 2003-10-27 | キヤノン株式会社 | 投影露光装置及びデバイスの製造方法 |
| GB2428491A (en) | 2005-07-18 | 2007-01-31 | Zeiss Carl Smt Ag | Catadioptric Optical System with Diffractive Optical Element |
| US20070121090A1 (en) | 2005-11-30 | 2007-05-31 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8169703B1 (en) * | 2006-09-06 | 2012-05-01 | Lightsmyth Technologies Inc. | Monolithic arrays of diffraction gratings |
| US7947412B2 (en) | 2007-03-29 | 2011-05-24 | Micron Technology, Inc. | Reduced lens heating methods, apparatus, and systems |
| JP5462791B2 (ja) * | 2007-08-03 | 2014-04-02 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィのための投影対物系、投影露光装置、及び投影露光方法 |
| DE102007043896A1 (de) | 2007-09-14 | 2009-04-02 | Carl Zeiss Smt Ag | Mikrooptik zur Messung der Position eines Luftbildes |
| EP2238513B1 (en) | 2007-12-21 | 2011-11-02 | Carl Zeiss SMT GmbH | Illumination method |
| DE102008054737A1 (de) | 2008-01-10 | 2009-07-16 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage sowie Objektiv hierfür |
| US7855776B2 (en) | 2008-03-26 | 2010-12-21 | Qimonda Ag | Methods of compensating lens heating, lithographic projection system and photo mask |
| JP5070316B2 (ja) | 2010-05-11 | 2012-11-14 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マスク |
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| JP6315343B2 (ja) * | 2012-02-21 | 2018-04-25 | カール ツァイス エスエムエス リミテッド | 光学系の少なくとも１つの欠陥を補償する方法 |
| DE102012202675A1 (de) | 2012-02-22 | 2013-01-31 | Carl Zeiss Smt Gmbh | Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik |
| DE102012204704A1 (de) | 2012-03-23 | 2013-09-26 | Carl Zeiss Smt Gmbh | Messvorrichtung zum Vermessen einer Abbildungsgüte eines EUV-Objektives |
| WO2015007298A1 (en) | 2013-07-17 | 2015-01-22 | Carl Zeiss Smt Gmbh | Microlithographic apparatus and method of varying a light irradiance distribution |
| DE102013218991A1 (de) | 2013-09-20 | 2015-03-26 | Carl Zeiss Smt Gmbh | Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems |
| DE102015223795A1 (de) | 2015-11-30 | 2016-01-28 | Carl Zeiss Smt Gmbh | Verfahren zum Bearbeiten eines optischen Elements |
| DE102017208340A1 (de) | 2017-05-17 | 2018-11-22 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission |
-
2017
- 2017-05-17 DE DE102017208340.9A patent/DE102017208340A1/de not_active Ceased
-
2018
- 2018-05-11 JP JP2019563374A patent/JP7245173B2/ja active Active
- 2018-05-11 WO PCT/EP2018/062201 patent/WO2018210691A1/en not_active Ceased
- 2018-05-16 TW TW107116619A patent/TWI802572B/zh active
-
2019
- 2019-11-12 US US16/681,348 patent/US11143967B2/en active Active
-
2021
- 2021-10-07 US US17/496,083 patent/US11906904B2/en active Active
Patent Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2248491A (en) | 1986-12-04 | 1992-04-08 | Schneider Metal Mfg | Ice cube making |
| US5614990A (en) * | 1994-08-31 | 1997-03-25 | International Business Machines Corporation | Illumination tailoring system using photochromic filter |
| US6118577A (en) * | 1998-08-06 | 2000-09-12 | Euv, L.L.C | Diffractive element in extreme-UV lithography condenser |
| US20010026360A1 (en) * | 1998-08-28 | 2001-10-04 | Philips Semiconductors, Inc. | Method of illumination uniformity in photolithographic systems |
| US20020041369A1 (en) * | 2000-08-21 | 2002-04-11 | Boettiger Ulrich C. | Method and device for improved lithographic critical dimension control |
| US20050073746A1 (en) | 2001-05-12 | 2005-04-07 | Carl Zeiss Smt Ag | Diffractive optical element and also optical arrangement comprising a diffractive optical element |
| EP1256821A2 (de) | 2001-05-12 | 2002-11-13 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Diffraktives optisches Element sowie optische Anordnung mit einem diffraktiven optischen Element |
| WO2003092256A2 (de) | 2002-04-24 | 2003-11-06 | Carl Zeiss Smt Ag | Projektionsverfahren und projektionssystem mit optischer filterung |
| WO2005069055A2 (en) | 2004-01-14 | 2005-07-28 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| US20080094599A1 (en) | 2004-06-04 | 2008-04-24 | Carl Zeiss Smt Ag | Projection System with Compensation of Intensity Variations and Compensation Element Therefor |
| DE102006028242A1 (de) | 2005-07-07 | 2007-01-18 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| US20120262688A1 (en) * | 2011-04-15 | 2012-10-18 | Asml Netherlands B.V. | Optical Apparatus for Conditioning a Radiation Beam for Use by an Object, Lithography Apparatus and Method of Manufacturing Devices |
| WO2013050198A1 (en) | 2011-10-07 | 2013-04-11 | Carl Zeiss Smt Gmbh | Method for setting the intensity distribution in an optical system of a microlithographic projection exposure apparatus, and optical system |
| DE102011084152A1 (de) * | 2011-10-07 | 2013-04-11 | Carl Zeiss Smt Gmbh | Verfahren zur Einstellung der Intensitätsverteilung in einem optischen System einer mikrolithographischen Projektionsbelichtungsanlage, sowie optisches System |
| DE102013205568A1 (de) * | 2013-03-28 | 2014-03-06 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsbelichtungsanlage mit einem variablen Transmissionsfilter |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102019131327A1 (de) * | 2019-11-20 | 2021-05-20 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren zur Messung von Substraten für die Halbleiterlithographie |
Also Published As
| Publication number | Publication date |
|---|---|
| US20220026814A1 (en) | 2022-01-27 |
| TWI802572B (zh) | 2023-05-21 |
| JP2020520477A (ja) | 2020-07-09 |
| US20200081350A1 (en) | 2020-03-12 |
| WO2018210691A1 (en) | 2018-11-22 |
| JP7245173B2 (ja) | 2023-03-23 |
| TW201907446A (zh) | 2019-02-16 |
| US11906904B2 (en) | 2024-02-20 |
| US11143967B2 (en) | 2021-10-12 |
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