JP2020515858A - ガスパラメータを決定するセンサ - Google Patents
ガスパラメータを決定するセンサ Download PDFInfo
- Publication number
- JP2020515858A JP2020515858A JP2019553869A JP2019553869A JP2020515858A JP 2020515858 A JP2020515858 A JP 2020515858A JP 2019553869 A JP2019553869 A JP 2019553869A JP 2019553869 A JP2019553869 A JP 2019553869A JP 2020515858 A JP2020515858 A JP 2020515858A
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- Prior art keywords
- sensor
- ceramic
- ceramic heater
- heater
- partially
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- 239000000919 ceramic Substances 0.000 claims abstract description 176
- 238000004519 manufacturing process Methods 0.000 claims abstract description 17
- 238000010438 heat treatment Methods 0.000 claims description 29
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 21
- 239000000843 powder Substances 0.000 claims description 16
- 239000004071 soot Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 11
- 229910052697 platinum Inorganic materials 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 7
- 238000005245 sintering Methods 0.000 claims description 7
- 238000005259 measurement Methods 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 5
- 238000005516 engineering process Methods 0.000 claims description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 2
- 239000000395 magnesium oxide Substances 0.000 claims description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 239000010955 niobium Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- 238000007639 printing Methods 0.000 claims description 2
- 229910021332 silicide Inorganic materials 0.000 claims description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 239000004020 conductor Substances 0.000 description 17
- 239000000758 substrate Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 238000002485 combustion reaction Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- 238000009529 body temperature measurement Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- WYTGDNHDOZPMIW-RCBQFDQVSA-N alstonine Natural products C1=CC2=C3C=CC=CC3=NC2=C2N1C[C@H]1[C@H](C)OC=C(C(=O)OC)[C@H]1C2 WYTGDNHDOZPMIW-RCBQFDQVSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000007569 slipcasting Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
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- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
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- C04B35/58085—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicides
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- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/04—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of carbon-silicon compounds, carbon or silicon
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- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
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- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
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Abstract
Description
少なくとも1つのオールセラミックヒータと、
オールセラミックヒータの第1の側に少なくとも部分的に配置された少なくとも1つの第1のセンサ構造体と、備える。
オールセラミックヒータの第1の側に少なくとも部分的に配置された少なくとも1つの第1の絶縁層、かつ/または
オールセラミックヒータの第1の側とは反対側の第2の側に少なくとも部分的に配置された少なくとも1つの第2の絶縁層を備える。
第1のセンサ構造体に少なくとも部分的に配置された少なくとも1つの第1のセラミック中間層、かつ/または
第2のセンサ構造体に少なくとも部分的に配置された少なくとも1つの第2のセラミック中間層を有し、
この場合、第1および/または第2のセラミック中間層は、好適には酸化アルミニウムおよび/または酸化マグネシウムを含む。
第1のセラミック中間層に少なくとも部分的に配置された少なくとも1つの第1のカバー層、かつ/または
第2のセラミック中間層に少なくとも部分的に配置された少なくとも1つの第2のカバー層を有する。
少なくとも1つのオールセラミックヒータを提供するステップと、
少なくとも1つの第1のセンサ構造体を、オールセラミックヒータの第1の側に少なくとも部分的に被着させるステップと、
を含む。
少なくとも1つのオールセラミックヒータ3を提供するステップ1010と、
少なくとも1つの第1のセンサ構造体9を、オールセラミックヒータ3の第1の側に少なくとも部分的に被着させるステップ1015と、
を含む。
3,3’ オールセラミックヒータ
5a,5a’,5b,5b’ 電極
7,7’ 絶縁層
9,9’ センサ構造体
11,11’ セラミック中間層
13,13’ カバー層
15 第1の層
17,17’,17” 第2の層
19,19’,19” 第3の層
21,21’,21” 第4の層
23 第5の層
1000 センサを製造する方法
1005 製造するステップ
1010 提供するステップ
1015 被着させるステップ
Claims (15)
- センサ、特に高温センサであって、
少なくとも1つのオールセラミックヒータ(3,3’)と、
前記オールセラミックヒータ(3,3’)の第1の側に少なくとも部分的に配置された少なくとも1つの第1のセンサ構造体(9)と、
を備えているセンサ。 - 前記オールセラミックヒータ(3,3’)は、少なくとも1つの導電性のセラミックを有し、前記導電性のセラミックは、好適には、少なくとも2つの相互に別個の位置で電極(5a,5a’,5b,5b’)に接触接続し、さらに前記オールセラミックヒータ(3,3’)は、少なくとも1つの電気的絶縁性のセラミックを有し、前記電気的絶縁性のセラミックは、前記導電性のセラミックを少なくとも部分的に取り囲み、好適には完全に取り囲む、
請求項1記載のセンサ。 - 前記導電性のセラミックは、ケイ化物、炭酸塩および/または窒化物粉末、および、タングステン、タンタル、ニオブ、チタン、モリブデン、ジルコニウム、ハフニウム、バナジウムおよび/またはクロムのグループからの少なくとも1つの元素を含むセラミック粉末から形成されており、
前記電気的絶縁性のセラミックは、窒化ケイ素および/または窒化アルミニウムを含む熱伝導性のセラミック粉末から形成されている、
請求項2記載のセンサ。 - 前記オールセラミックヒータ(3,3’)は、0.3mmから3mmの間の厚さを有し、好適には0.5mmから1.5mmの間の厚さを有する、
請求項1から3までのいずれか1項記載のセンサ。 - 前記センサは、
前記オールセラミックヒータ(3,3’)の第1の側に少なくとも部分的に配置された少なくとも1つの第1の絶縁層(7)
および/または
前記オールセラミックヒータ(3,3’)の前記第1の側とは反対側の第2の側に少なくとも部分的に配置された少なくとも1つの第2の絶縁層(7’)
を備える、
請求項1から4までのいずれか1項記載のセンサ。 - 前記第1の絶縁層(7)および/または前記第2の絶縁層(7’)は、電気的絶縁性のセラミックを含む、
請求項5記載のセンサ。 - 前記オールセラミックヒータ(3,3’)の第1の側もしくは第2の側に配置された前記第1のセンサ構造体(9)および/または第2のセンサ構造体(9’)は、温度測定のための少なくとも1つの抵抗構造体を含み、特に蛇行形状の測定抵抗を含む、
請求項1から6までのいずれか1項記載のセンサ。 - 前記オールセラミックヒータ(3,3’)の第1の側もしくは第2の側に配置された前記第1のセンサ構造体(9)および/または第2のセンサ構造体(9’)は、煤粒子の堆積物の濃度を測定する少なくとも1つの櫛形構造体、IDK構造体を含む、
請求項1から7までのいずれか1項記載のセンサ。 - 前記オールセラミックヒータ(3,3’)の第1の側もしくは第2の側に配置された前記第1のセンサ構造体(9)および/または第2のセンサ構造体(9’)は、少なくとも1つの電気的加熱素子と、アネモメータ式測定用の少なくとも1つの温度センサと、を含む、
請求項1から8までのいずれか1項記載のセンサ。 - 前記第1のセンサ構造体(9)および/または第2のセンサ構造体(9’)は、少なくとも1つの白金材料を含む、
請求項1から9までのいずれか1項記載のセンサ。 - 前記センサは、
前記第1のセンサ構造体(9)に少なくとも部分的に配置された少なくとも1つの第1のセラミック中間層(11)
および/または
第2のセンサ構造体(9’)に少なくとも部分的に配置された少なくとも1つの第2のセラミック中間層(11’)
を有し、
前記第1および/または第2のセラミック中間層(11,11’)は、好適には酸化アルミニウムおよび/または酸化マグネシウムを含む、
請求項1から10までのいずれか1項記載のセンサ。 - 前記センサは、
前記第1のセラミック中間層(11)に少なくとも部分的に配置された少なくとも1つの第1のカバー層(13)
および/または
前記第2のセラミック中間層(11’)に少なくとも部分的に配置された少なくとも1つの第2のカバー層(13’)
を有する、
請求項11記載のセンサ。 - 特に自動車の排気システム内の、温度センサ、煤センサ、流量センサとしての、および/または、温度センサ、煤センサおよび/または流量センサからの組み合わせを含むマルチセンサとしての、
請求項1から12までのいずれか1項記載のセンサの使用。 - センサ、特に高温センサを製造する方法であって、前記方法は、
少なくとも1つのオールセラミックヒータ(3,3’)を提供するステップ(1010)と、
少なくとも1つの第1のセンサ構造体(9)を、前記オールセラミックヒータ(3,3’)の第1の側に少なくとも部分的に被着させるステップ(1015)と、
を含む方法。 - 前記提供するステップ(1010)は、導電性のセラミックと電気的絶縁性のセラミックとの共焼結を用いて前記オールセラミックヒータ(3,3’)を製造するステップ(1005)を含み、かつ/または、前記被着させるステップ(1015)は、特に薄膜技術において、白金材料を用いて第1の絶縁層(7)を印刷するステップを含む、
請求項14記載の方法。
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EP17171650.9A EP3404405A1 (de) | 2017-05-18 | 2017-05-18 | Sensor zur bestimmung von gasparametern |
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