JP2020514509A5 - - Google Patents
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- Publication number
- JP2020514509A5 JP2020514509A5 JP2019550834A JP2019550834A JP2020514509A5 JP 2020514509 A5 JP2020514509 A5 JP 2020514509A5 JP 2019550834 A JP2019550834 A JP 2019550834A JP 2019550834 A JP2019550834 A JP 2019550834A JP 2020514509 A5 JP2020514509 A5 JP 2020514509A5
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- masking
- composition according
- masking composition
- molecular weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022116140A JP7437455B2 (ja) | 2017-03-16 | 2022-07-21 | リソグラフィ用組成物及びそれの使用法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762472208P | 2017-03-16 | 2017-03-16 | |
| US62/472,208 | 2017-03-16 | ||
| PCT/EP2018/056322 WO2018167112A1 (en) | 2017-03-16 | 2018-03-14 | Lithographic compositions and methods of use thereof |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022116140A Division JP7437455B2 (ja) | 2017-03-16 | 2022-07-21 | リソグラフィ用組成物及びそれの使用法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2020514509A JP2020514509A (ja) | 2020-05-21 |
| JP2020514509A5 true JP2020514509A5 (enExample) | 2020-12-24 |
Family
ID=61655788
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019550834A Pending JP2020514509A (ja) | 2017-03-16 | 2018-03-14 | リソグラフィ用組成物及びそれの使用法 |
| JP2022116140A Active JP7437455B2 (ja) | 2017-03-16 | 2022-07-21 | リソグラフィ用組成物及びそれの使用法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022116140A Active JP7437455B2 (ja) | 2017-03-16 | 2022-07-21 | リソグラフィ用組成物及びそれの使用法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20200002568A1 (enExample) |
| EP (1) | EP3596155B1 (enExample) |
| JP (2) | JP2020514509A (enExample) |
| KR (1) | KR102456279B1 (enExample) |
| CN (1) | CN110418811B (enExample) |
| TW (1) | TWI806856B (enExample) |
| WO (1) | WO2018167112A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3997520B1 (en) * | 2019-07-08 | 2023-12-20 | Merck Patent GmbH | Rinse and method of use thereof for removing edge protection layers and residual metal hardmask components |
| TWI876020B (zh) | 2020-04-03 | 2025-03-11 | 美商蘭姆研究公司 | 處理光阻的方法、以及用於沉積薄膜的設備 |
| US12353129B2 (en) | 2021-12-27 | 2025-07-08 | Nanya Technology Corporation | Method for preparing semiconductor device structure including bevel etching process |
| US12176218B2 (en) | 2021-12-27 | 2024-12-24 | Nanya Technology Corporation | Bevel etching method |
| TWI799193B (zh) * | 2021-12-27 | 2023-04-11 | 南亞科技股份有限公司 | 斜角蝕刻方法及半導體元件結構的製備方法 |
| US12482664B2 (en) | 2023-02-03 | 2025-11-25 | Nanya Technology Corporation | Method of manufacturing semiconductor structure |
| US12482665B2 (en) * | 2023-02-03 | 2025-11-25 | Nanya Technology Corporation | Method of manufacturing semiconductor structure |
| JP2025027792A (ja) * | 2023-08-17 | 2025-02-28 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
| WO2025068373A1 (en) | 2023-09-29 | 2025-04-03 | Merck Patent Gmbh | Lithography compositions and methods of use thereof for sustainable and greener solutions for edge protection layers |
| WO2025101667A1 (en) * | 2023-11-10 | 2025-05-15 | Lam Research Corporation | Diffusion barriers to reduce queue-time effects in euv lithography |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5578676A (en) * | 1992-02-12 | 1996-11-26 | Flaim; Tony | Method for making polymers with intrinsic light-absorbing properties |
| US5234990A (en) * | 1992-02-12 | 1993-08-10 | Brewer Science, Inc. | Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography |
| JP2000176949A (ja) * | 1998-12-14 | 2000-06-27 | Sekisui Chem Co Ltd | ポリサルホン樹脂フィルムの製造方法 |
| US6420514B1 (en) * | 2000-07-12 | 2002-07-16 | Vision - Ease Lens, Inc. | Transparent polysulfone articles with reduced spurious coloration |
| US7264913B2 (en) * | 2002-11-21 | 2007-09-04 | Az Electronic Materials Usa Corp. | Antireflective compositions for photoresists |
| US20050260790A1 (en) * | 2004-05-24 | 2005-11-24 | Goodner Michael D | Substrate imprinting techniques |
| JP4831324B2 (ja) * | 2006-07-06 | 2011-12-07 | 日産化学工業株式会社 | スルホンを含有するレジスト下層膜形成組成物 |
| JP5297032B2 (ja) * | 2007-12-18 | 2013-09-25 | 株式会社ダイセル | 多孔質膜及びその製造方法 |
| US8137874B2 (en) * | 2008-01-23 | 2012-03-20 | International Business Machines Corporation | Organic graded spin on BARC compositions for high NA lithography |
| JP5920588B2 (ja) * | 2010-10-14 | 2016-05-18 | 日産化学工業株式会社 | ポリエーテル構造を含有する樹脂を含むリソグラフィー用レジスト下層膜形成組成物 |
| US8568958B2 (en) | 2011-06-21 | 2013-10-29 | Az Electronic Materials Usa Corp. | Underlayer composition and process thereof |
| JP2013032327A (ja) * | 2011-08-03 | 2013-02-14 | Nissan Chem Ind Ltd | ２以上のトリアジントリオン構造を有する化合物及びリソグラフィー用レジスト下層膜形成組成物 |
| EP2791200B1 (en) * | 2011-12-16 | 2016-03-16 | Solvay Specialty Polymers USA, LLC. | Epoxy resin compositions |
| JP5988438B2 (ja) | 2012-08-02 | 2016-09-07 | 東京エレクトロン株式会社 | 塗布処理方法及び塗布処理装置 |
| US9315636B2 (en) | 2012-12-07 | 2016-04-19 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds, their compositions and methods |
| US9201305B2 (en) | 2013-06-28 | 2015-12-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin-on compositions of soluble metal oxide carboxylates and methods of their use |
| US9296922B2 (en) | 2013-08-30 | 2016-03-29 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds as hardmasks and filling materials, their compositions and methods of use |
| US9409793B2 (en) | 2014-01-14 | 2016-08-09 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin coatable metallic hard mask compositions and processes thereof |
| US9499698B2 (en) | 2015-02-11 | 2016-11-22 | Az Electronic Materials (Luxembourg)S.A.R.L. | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
-
2018
- 2018-03-14 EP EP18711315.4A patent/EP3596155B1/en active Active
- 2018-03-14 WO PCT/EP2018/056322 patent/WO2018167112A1/en not_active Ceased
- 2018-03-14 KR KR1020197030345A patent/KR102456279B1/ko active Active
- 2018-03-14 JP JP2019550834A patent/JP2020514509A/ja active Pending
- 2018-03-14 US US16/484,362 patent/US20200002568A1/en not_active Abandoned
- 2018-03-14 CN CN201880017793.4A patent/CN110418811B/zh active Active
- 2018-03-16 TW TW107108946A patent/TWI806856B/zh active
-
2022
- 2022-07-21 JP JP2022116140A patent/JP7437455B2/ja active Active
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