JP2020189978A5 - - Google Patents
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- JP2020189978A5 JP2020189978A5 JP2020119480A JP2020119480A JP2020189978A5 JP 2020189978 A5 JP2020189978 A5 JP 2020189978A5 JP 2020119480 A JP2020119480 A JP 2020119480A JP 2020119480 A JP2020119480 A JP 2020119480A JP 2020189978 A5 JP2020189978 A5 JP 2020189978A5
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- JP
- Japan
- Prior art keywords
- hollow particles
- mass
- hollow
- carbon atoms
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002245 particle Substances 0.000 claims description 58
- 239000006185 dispersion Substances 0.000 claims description 14
- 125000004434 sulfur atom Chemical group 0.000 claims description 13
- 239000011347 resin Substances 0.000 claims description 12
- 229920005989 resin Polymers 0.000 claims description 12
- 229910052717 sulfur Inorganic materials 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 5
- 229920002554 vinyl polymer Polymers 0.000 claims description 5
- 238000005452 bending Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000002441 X-ray diffraction Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 238000002835 absorbance Methods 0.000 claims 4
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 238000004483 ATR-FTIR spectroscopy Methods 0.000 claims 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 238000000862 absorption spectrum Methods 0.000 claims 1
- 239000007822 coupling agent Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 33
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 21
- 125000004437 phosphorous atom Chemical group 0.000 description 11
- 229910052698 phosphorus Inorganic materials 0.000 description 9
- 239000000178 monomer Substances 0.000 description 7
- 125000004429 atom Chemical group 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000003566 oxetanyl group Chemical group 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- HLIQLHSBZXDKLV-UHFFFAOYSA-N 2-(2-hydroxyethoxy)-1-phenoxyethanol Chemical compound OCCOCC(O)OC1=CC=CC=C1 HLIQLHSBZXDKLV-UHFFFAOYSA-N 0.000 description 1
- -1 2-ethylhexyl Chemical group 0.000 description 1
- SKKHNUKNMQLBTJ-UHFFFAOYSA-N 3-bicyclo[2.2.1]heptanyl 2-methylprop-2-enoate Chemical compound C1CC2C(OC(=O)C(=C)C)CC1C2 SKKHNUKNMQLBTJ-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016182315 | 2016-09-16 | ||
| JP2016182315 | 2016-09-16 | ||
| JP2017035422 | 2017-02-27 | ||
| JP2017035422 | 2017-02-27 | ||
| JP2018539620A JP6736678B2 (ja) | 2016-09-16 | 2017-08-30 | 中空粒子及びその用途 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018539620A Division JP6736678B2 (ja) | 2016-09-16 | 2017-08-30 | 中空粒子及びその用途 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020189978A JP2020189978A (ja) | 2020-11-26 |
| JP2020189978A5 true JP2020189978A5 (enExample) | 2021-01-14 |
| JP6938729B2 JP6938729B2 (ja) | 2021-09-22 |
Family
ID=61619190
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018539620A Active JP6736678B2 (ja) | 2016-09-16 | 2017-08-30 | 中空粒子及びその用途 |
| JP2020119480A Active JP6938729B2 (ja) | 2016-09-16 | 2020-07-10 | 中空粒子及びその用途 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018539620A Active JP6736678B2 (ja) | 2016-09-16 | 2017-08-30 | 中空粒子及びその用途 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US11369935B2 (enExample) |
| EP (1) | EP3514192B8 (enExample) |
| JP (2) | JP6736678B2 (enExample) |
| KR (1) | KR102196243B1 (enExample) |
| CN (1) | CN109715694A (enExample) |
| TW (1) | TWI639627B (enExample) |
| WO (1) | WO2018051794A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102506017B1 (ko) * | 2018-03-14 | 2023-03-03 | 세키스이가세이힝코교가부시키가이샤 | 중공 입자, 그 제조 방법 및 그 용도 |
| JP7197563B2 (ja) * | 2018-03-14 | 2022-12-27 | 積水化成品工業株式会社 | 中空粒子分散体 |
| JP7145058B2 (ja) | 2018-12-07 | 2022-09-30 | 花王株式会社 | 塗膜の形成方法 |
| JP7452959B2 (ja) * | 2019-08-19 | 2024-03-19 | 東京応化工業株式会社 | カラーフィルターの製造方法、カラーフィルター、及び樹脂組成物 |
| JP2023022336A (ja) * | 2019-12-26 | 2023-02-15 | 富士フイルム株式会社 | 中空粒子、組成物、部材、中空粒子の製造方法 |
| JP7388235B2 (ja) | 2020-02-20 | 2023-11-29 | 味の素株式会社 | 樹脂組成物 |
| JP7431401B1 (ja) | 2022-12-08 | 2024-02-15 | ａｒｔｉｅｎｃｅ株式会社 | 低屈折率層形成用塗液、および反射防止フィルム |
| WO2025204624A1 (ja) * | 2024-03-28 | 2025-10-02 | 積水化成品工業株式会社 | 中空粒子及びその用途 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0350250A (ja) * | 1989-07-18 | 1991-03-04 | Japan Synthetic Rubber Co Ltd | ゴム組成物 |
| DE10000621A1 (de) * | 2000-01-10 | 2001-07-12 | Basf Ag | Niedrigviskose, formaldehydreduzierte Dispersionen von Mikrokapseln aus Melamin-Formaldehyd-Harzen |
| JP4448930B2 (ja) * | 2000-09-04 | 2010-04-14 | 財団法人新産業創造研究機構 | 中空高分子微粒子及びその製造法 |
| KR101238514B1 (ko) * | 2004-04-05 | 2013-02-28 | 세키스이가가쿠 고교가부시키가이샤 | 중공 수지 미립자, 유기·무기 하이브리드 미립자 및 중공수지 미립자의 제조 방법 |
| EP1875961B1 (en) * | 2005-04-07 | 2018-08-29 | Mitsui Chemicals, Inc. | Capsular fine particle comprising olefinic polymer |
| JP2007070484A (ja) * | 2005-09-07 | 2007-03-22 | Sekisui Chem Co Ltd | 中空微粒子及び複合材 |
| TWI422597B (zh) * | 2006-03-29 | 2014-01-11 | Kawamura Inst Chem Res | 中空聚合物粒子、著色中空聚合物粒子及彼等之製法 |
| US20090078156A1 (en) * | 2006-09-21 | 2009-03-26 | Ppg Industries Ohio, Inc. | Low temperature, moisture curable coating compositions and related methods |
| JP2009244684A (ja) * | 2008-03-31 | 2009-10-22 | Dainippon Printing Co Ltd | 反射防止積層体 |
| JP2010032719A (ja) | 2008-07-28 | 2010-02-12 | Sekisui Chem Co Ltd | 光学シート及びバックライトユニット |
| JP2010084018A (ja) | 2008-09-30 | 2010-04-15 | Sekisui Chem Co Ltd | 中空有機−無機ハイブリッド微粒子の製造方法及び中空有機−無機ハイブリッド微粒子 |
| JP5411477B2 (ja) | 2008-09-30 | 2014-02-12 | 積水化学工業株式会社 | 中空有機−無機ハイブリッド微粒子、反射防止性樹脂組成物、反射防止フィルム用コーティング剤、反射防止積層体及び反射防止フィルム |
| JP2013040232A (ja) * | 2011-08-11 | 2013-02-28 | Osaka Prefecture Univ | ヘッド−テイル型共重合体の中空ナノ微粒子 |
| KR20190084130A (ko) * | 2011-12-26 | 2019-07-15 | 다이니폰 인사츠 가부시키가이샤 | 방현성 필름, 편광판 및 화상 표시 장치 |
| JP6407513B2 (ja) * | 2013-09-24 | 2018-10-17 | 国立大学法人 東京大学 | 医療材料の表面修飾用ポリマー |
| WO2016111314A1 (ja) * | 2015-01-08 | 2016-07-14 | 積水化成品工業株式会社 | 中空粒子、その製造方法、その用途及びマイクロカプセル粒子の製造方法 |
| US10550280B2 (en) | 2015-01-08 | 2020-02-04 | Sekisui Plastics Co., Ltd. | Hollow particles, method for producing same, use thereof, and method for producing microcapsule particles |
| WO2017163439A1 (ja) * | 2016-03-22 | 2017-09-28 | 積水化成品工業株式会社 | 中空粒子及びその用途 |
-
2017
- 2017-08-30 JP JP2018539620A patent/JP6736678B2/ja active Active
- 2017-08-30 KR KR1020197007196A patent/KR102196243B1/ko active Active
- 2017-08-30 US US16/333,793 patent/US11369935B2/en active Active
- 2017-08-30 CN CN201780056734.3A patent/CN109715694A/zh active Pending
- 2017-08-30 WO PCT/JP2017/031241 patent/WO2018051794A1/ja not_active Ceased
- 2017-08-30 EP EP17850697.8A patent/EP3514192B8/en active Active
- 2017-09-05 TW TW106130294A patent/TWI639627B/zh active
-
2020
- 2020-07-10 JP JP2020119480A patent/JP6938729B2/ja active Active
-
2022
- 2022-05-26 US US17/825,251 patent/US20220288550A1/en not_active Abandoned
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