JP2020158724A - ゴム組成物及びゴム組成物を製造する方法 - Google Patents
ゴム組成物及びゴム組成物を製造する方法 Download PDFInfo
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- JP2020158724A JP2020158724A JP2019062525A JP2019062525A JP2020158724A JP 2020158724 A JP2020158724 A JP 2020158724A JP 2019062525 A JP2019062525 A JP 2019062525A JP 2019062525 A JP2019062525 A JP 2019062525A JP 2020158724 A JP2020158724 A JP 2020158724A
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- rubber
- rubber composition
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- additive
- polymerization
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- 239000005060 rubber Substances 0.000 title claims abstract description 135
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- 238000004519 manufacturing process Methods 0.000 title claims description 9
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- 239000000654 additive Substances 0.000 claims abstract description 55
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- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 13
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 13
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- 229910052710 silicon Inorganic materials 0.000 claims abstract description 10
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- 238000000034 method Methods 0.000 claims description 39
- 229920000642 polymer Polymers 0.000 claims description 23
- 150000001993 dienes Chemical class 0.000 claims description 15
- 239000000178 monomer Substances 0.000 claims description 14
- 229920003244 diene elastomer Polymers 0.000 claims description 10
- 238000002156 mixing Methods 0.000 claims description 10
- 125000003277 amino group Chemical group 0.000 claims description 7
- 238000010528 free radical solution polymerization reaction Methods 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
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- LMDZBCPBFSXMTL-UHFFFAOYSA-N 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide Chemical compound CCN=C=NCCCN(C)C LMDZBCPBFSXMTL-UHFFFAOYSA-N 0.000 description 4
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- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 3
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- ZCSHACFHMFHFKK-UHFFFAOYSA-N 2-methyl-1,3,5-trinitrobenzene;2,4,6-trinitro-1,3,5-triazinane Chemical compound [O-][N+](=O)C1NC([N+]([O-])=O)NC([N+]([O-])=O)N1.CC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O ZCSHACFHMFHFKK-UHFFFAOYSA-N 0.000 description 2
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
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- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
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- OLBVUFHMDRJKTK-UHFFFAOYSA-N [N].[O] Chemical compound [N].[O] OLBVUFHMDRJKTK-UHFFFAOYSA-N 0.000 description 2
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- 238000000921 elemental analysis Methods 0.000 description 1
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- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000006232 furnace black Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- IUJLOAKJZQBENM-UHFFFAOYSA-N n-(1,3-benzothiazol-2-ylsulfanyl)-2-methylpropan-2-amine Chemical compound C1=CC=C2SC(SNC(C)(C)C)=NC2=C1 IUJLOAKJZQBENM-UHFFFAOYSA-N 0.000 description 1
- DEQZTKGFXNUBJL-UHFFFAOYSA-N n-(1,3-benzothiazol-2-ylsulfanyl)cyclohexanamine Chemical compound C1CCCCC1NSC1=NC2=CC=CC=C2S1 DEQZTKGFXNUBJL-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- GVBMMNAPRZDGEY-UHFFFAOYSA-N n-[2-(diethylamino)ethyl]-2-methylprop-2-enamide Chemical compound CCN(CC)CCNC(=O)C(C)=C GVBMMNAPRZDGEY-UHFFFAOYSA-N 0.000 description 1
- HHSZSTNZSRJWAI-UHFFFAOYSA-N n-[2-(diethylamino)ethyl]-n,2-dimethylprop-2-enamide Chemical compound CCN(CC)CCN(C)C(=O)C(C)=C HHSZSTNZSRJWAI-UHFFFAOYSA-N 0.000 description 1
- CXSANWNPQKKNJO-UHFFFAOYSA-N n-[2-(diethylamino)ethyl]prop-2-enamide Chemical compound CCN(CC)CCNC(=O)C=C CXSANWNPQKKNJO-UHFFFAOYSA-N 0.000 description 1
- DCBBWYIVFRLKCD-UHFFFAOYSA-N n-[2-(dimethylamino)ethyl]-2-methylprop-2-enamide Chemical compound CN(C)CCNC(=O)C(C)=C DCBBWYIVFRLKCD-UHFFFAOYSA-N 0.000 description 1
- WDQKICIMIPUDBL-UHFFFAOYSA-N n-[2-(dimethylamino)ethyl]prop-2-enamide Chemical compound CN(C)CCNC(=O)C=C WDQKICIMIPUDBL-UHFFFAOYSA-N 0.000 description 1
- VNLHOYZHPQDOMS-UHFFFAOYSA-N n-[3-(diethylamino)propyl]-2-methylprop-2-enamide Chemical compound CCN(CC)CCCNC(=O)C(C)=C VNLHOYZHPQDOMS-UHFFFAOYSA-N 0.000 description 1
- GFOCCLOYMMHTIU-UHFFFAOYSA-N n-[3-(diethylamino)propyl]prop-2-enamide Chemical compound CCN(CC)CCCNC(=O)C=C GFOCCLOYMMHTIU-UHFFFAOYSA-N 0.000 description 1
- YXLZZTDZXAJJSK-UHFFFAOYSA-N n-[3-(dimethylamino)propyl]-n,2-dimethylprop-2-enamide Chemical compound CN(C)CCCN(C)C(=O)C(C)=C YXLZZTDZXAJJSK-UHFFFAOYSA-N 0.000 description 1
- JILYLRLSDROPIF-UHFFFAOYSA-N n-[4-(diethylamino)butyl]-2-methylprop-2-enamide Chemical compound CCN(CC)CCCCNC(=O)C(C)=C JILYLRLSDROPIF-UHFFFAOYSA-N 0.000 description 1
- WIHBGWZUKCXNDA-UHFFFAOYSA-N n-[4-(diethylamino)butyl]prop-2-enamide Chemical compound CCN(CC)CCCCNC(=O)C=C WIHBGWZUKCXNDA-UHFFFAOYSA-N 0.000 description 1
- LKZTYRFSAJOGIT-UHFFFAOYSA-N n-[4-(dimethylamino)butyl]-2-methylprop-2-enamide Chemical compound CN(C)CCCCNC(=O)C(C)=C LKZTYRFSAJOGIT-UHFFFAOYSA-N 0.000 description 1
- QYMUDOWMRHNHHP-UHFFFAOYSA-N n-[4-(dimethylamino)butyl]prop-2-enamide Chemical compound CN(C)CCCCNC(=O)C=C QYMUDOWMRHNHHP-UHFFFAOYSA-N 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- LGOPTUPXVVNJFH-UHFFFAOYSA-N pentadecanethioic s-acid Chemical compound CCCCCCCCCCCCCCC(O)=S LGOPTUPXVVNJFH-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- JPPLPDOXWBVPCW-UHFFFAOYSA-N s-(3-triethoxysilylpropyl) octanethioate Chemical compound CCCCCCCC(=O)SCCC[Si](OCC)(OCC)OCC JPPLPDOXWBVPCW-UHFFFAOYSA-N 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- QAZLUNIWYYOJPC-UHFFFAOYSA-M sulfenamide Chemical compound [Cl-].COC1=C(C)C=[N+]2C3=NC4=CC=C(OC)C=C4N3SCC2=C1C QAZLUNIWYYOJPC-UHFFFAOYSA-M 0.000 description 1
- 229940052367 sulfur,colloidal Drugs 0.000 description 1
- 238000005987 sulfurization reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- 229960002447 thiram Drugs 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- YFRLQYJXUZRYDN-UHFFFAOYSA-K trichloro(methyl)stannane Chemical compound C[Sn](Cl)(Cl)Cl YFRLQYJXUZRYDN-UHFFFAOYSA-K 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FBBATURSCRIBHN-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyldisulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSCCC[Si](OCC)(OCC)OCC FBBATURSCRIBHN-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L15/00—Compositions of rubber derivatives
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B60—VEHICLES IN GENERAL
- B60C—VEHICLE TYRES; TYRE INFLATION; TYRE CHANGING; CONNECTING VALVES TO INFLATABLE ELASTIC BODIES IN GENERAL; DEVICES OR ARRANGEMENTS RELATED TO TYRES
- B60C1/00—Tyres characterised by the chemical composition or the physical arrangement or mixture of the composition
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- C08C19/00—Chemical modification of rubber
- C08C19/22—Incorporating nitrogen atoms into the molecule
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- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
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Abstract
Description
6≦{4(δD1−δD2)2+(δP1−δP2)2+(δH1−δH2)2}0.5 (2)
(式中、δDは分散項、δPは極性項、δHは水素結合項を表す。)
本実施形態のゴム組成物は、ゴム成分、添加剤及び充填剤を含む。以下、ゴム組成物に含まれる各成分について説明する。
本実施形態の第1の態様に係るゴム組成物は、添加剤として、ケイ素原子、窒素原子及び酸素原子からなる群より選ばれる少なくとも1種の原子と、炭素原子とを含む化合物を含有する。化合物を構成するケイ素原子、窒素原子及び酸素原子の総数は、炭素原子数に対して0.27以上0.80以下であり、化合物のハンセン溶解度パラメータは、下記式(2)で表される関係を満足し、化合物の分子量は200以上15000以下である。式中、δDは分散項、δPは極性項、δHは水素結合項を表す。
6≦{4(δD1−δD2)2+(δP1−δP2)2+(δH1−δH2)2}0.5 (2)
A=(Si+N+O)/C (1)
B={4(δD1−δD2)2+(δP1−δP2)2+(δH1−δH2)2}0.5 (2)
本実施形態に係るゴム成分としては特に限定されない。ゴム成分は、ジエン系ゴムを含んでよい。ジエン系ゴムとは、共役2重結合を持つジエンモノマーを原料としたゴムを意味する。ジエン系ゴムとしては、例えば、天然ゴム、ポリイソプレンゴム、クロロプレンゴム、ポリブタジエンゴム、スチレン−ブタジエンゴム、エチレン−プロピレン−ジエンゴム、及びニトリルゴムが挙げられる。ゴム成分は、2種類以上を併用してもよい。
本実施形態に係る充填剤としては、例えば、シリカ、カーボンブラック、炭酸カルシウム、タルク、アルミナ、クレー、水酸化アルミニウム、及びマイカが挙げられる。これらは単独で又は2種以上組み合わせて用いてもよい。
本実施形態のゴム組成物は、加硫剤、加硫促進剤、加硫活性化剤、有機過酸化物、シランカップリング剤、伸展油、加工助剤、老化防止剤、滑剤等の成分を更に含んでよい。
本実施形態のゴム組成物を製造する方法は、上記ゴム成分と、上記添加剤とを混合する工程を備える。ゴム成分と添加剤とを混合する方法は、特に限定されず、例えば、下記方法(A)又は方法(B)であってもよい。
1.パラメータA、分子量及び重合度
添加剤のパラメータA、分子量及び重合度は、添加剤の構造をNMR法により決定し、得られた化学構造式を用いて算出した。
添加剤のパラメータBの計算には、チャールズハンセンらによって開発されたソフトウェア(Hansen Solubility Parameter in Practice(HSPiP))を用いた。計算にはNMR法により決定した構造を用いた。
JIS K6300(1994)に従って、100℃にてゴム組成物のムーニー粘度を測定した。ムーニー粘度の数値が小さいほど加工性に優れる。
加硫シートから幅1mm及び長さ40mmの短冊状の試験片を打ち抜き、試験に供した。測定は、粘弾性測定装置(上島製作所社製)によって、歪み1%及び周波数10Hzの条件下で、温度60℃での試験片の損失正接(tanδ(60℃))及び温度0℃での試験片の損失正接(tanδ(0℃))を測定した。tanδ(60℃)が小さいほど、省燃費性に優れ、tanδ(0℃)が大きいほど、グリップ性に優れる。
窒素雰囲気下、N−(3−ジメチルアミノプロピル)アクリルアミド55.23mmol、シクロヘキサン184.1mL、及びn−ブチルリチウム(n−BuLi)を55.23mmol含有するn−ヘキサン溶液を反応器に投入し、撹拌しながら、反応器内の温度を65℃に昇温し、同温度で混合物を15分間撹拌した。次いで、反応器内にメタノール3.36mLを添加し、反応器内の温度を常温に冷却し、N−(3−ジメチルアミノプロピル)アクリルアミドのオリゴマーを含む添加剤溶液A173.1gを得た。1H−NMRスペクトル分析の結果から、下記式(A)で表される化合物が含まれていることを確認した。N−(3−ジメチルアミノプロピル)アクリルアミドのオリゴマーの平均重合度は2.4であり、重合度から計算される添加剤の平均分子量は433.0であった。
(実施例1)
内容積30Lのステンレス製重合反応器内を洗浄、乾燥し、乾燥窒素で置換し、工業用ヘキサン(密度680kg/m3)15.3kg、1,3−ブタジエン912g、スチレン288g、テトラヒドロフラン9.1mL、エチレングリコールジエチルエーテル6.54mLを重合反応器内に投入した。次に、スカベンジャーとして少量のn−BuLiのヘキサン溶液を重合反応器内に投入した後、ピペリジン18.41mmolと、n−BuLiを18.14mmol含有するn−ヘキサン溶液とを投入して、30℃で重合を開始した。
内容積30Lのステンレス製重合反応器内を洗浄、乾燥し、乾燥窒素で置換し、工業用ヘキサン(密度680kg/m3)15.3kg、1,3−ブタジエン912g、スチレン288g、テトラヒドロフラン9.1mL、エチレングリコールジエチルエーテル6.54mLを重合反応器内に投入した。次に、スカベンジャーとして少量のn−BuLiのヘキサン溶液を重合反応器内に投入した後、ピペリジンを18.41mmolと、n−BuLiを18.14mmol含有するn−ヘキサン溶液を投入して、30℃で重合を開始した。
上記添加剤溶液Aを添加しなかった以外は、実施例1と同様にして、ゴム組成物を調製し、加硫シートを作製した。
添加剤溶液Aの代わりにN−(3−ジメチルアミノプロピル)アクリルアミド55.23mmol及びシクロヘキサン184.1mLを混合した添加剤溶液Bを用いた以外は、実施例1と同様にして、ゴム組成物を調製し、加硫シートを作製した。
内容積30Lのステンレス製重合反応器内を洗浄、乾燥し、乾燥窒素で置換し、工業用ヘキサン(密度680kg/m3)15.3kg、1,3−ブタジエン968g、スチレン334g、テトラヒドロフラン12.0mL、エチレングリコールジエチルエーテル4.15mLを重合反応器内に投入した。次に、スカベンジャーとして少量のn−BuLiのヘキサン溶液を重合反応器内に投入した後、ピペリジンを13.89mmolと、n−BuLiを18.52mmol含有するn−ヘキサン溶液を投入して、30℃で重合を開始した。
内容積20Lのステンレス製重合反応器内を洗浄、乾燥し、乾燥窒素で置換し、工業用ヘキサン(密度680kg/m3)10.2kg、1,3−ブタジエン504g、スチレン546g、テトラヒドロフラン6.07mL、エチレングリコールジエチルエーテル1.27mLを重合反応器内に投入した。次に、スカベンジャーとして少量のn−BuLiのヘキサン溶液を重合反応器内に投入した後、ピペリジンを3.16mmolと、n−BuLiを6.31mmol含有するn−ヘキサン溶液を投入して、30℃で重合を開始した。
内容積30Lのステンレス製重合反応器内を洗浄、乾燥し、乾燥窒素で置換し、工業用ヘキサン(密度680kg/m3)15.3kg、1,3−ブタジエン968g、スチレン334g、テトラヒドロフラン12.0mL、エチレングリコールジエチルエーテル4.15mLを重合反応器内に投入した。次に、スカベンジャーとして少量のn−BuLiのヘキサン溶液を重合反応器内に投入した後、ピペリジンを13.89mmolと、n−BuLiを18.52mmol含有するn−ヘキサン溶液を投入して、30℃で重合を開始した。
内容積20Lのステンレス製重合反応器内を洗浄、乾燥し、乾燥窒素で置換し、工業用ヘキサン(密度680kg/m3)10.2kg、1,3−ブタジエン504g、スチレン546g、テトラヒドロフラン6.07mL、エチレングリコールジエチルエーテル1.27mLを重合反応器内に投入した。次に、スカベンジャーとして少量のn−BuLiのヘキサン溶液を重合反応器内に投入した後、ピペリジンを3.16mmolと、n−BuLiを6.31mmol含有するn−ヘキサン溶液を投入して、30℃で重合を開始した。
窒素雰囲気下、1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミド55.23mmol、テトラヒドロフラン184.1mLを反応器に投入し、撹拌しながら−78℃に冷却した。次にn−BuLiを27.62mmol含有するn−ヘキサン溶液を反応器に投入し、撹拌しながら、反応器内の温度を25℃に昇温し、同温度で混合物を1時間撹拌した。次いで、反応器内にメタノール1.12mLを添加し、反応器内の温度を常温に冷却し、1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミドのオリゴマーを含む添加剤溶液C179.1gを得た。1H−NMRスペクトル分析の結果から、下記式(C)で表される化合物が含まれていることが確認された。1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミドのオリゴマーの平均重合度は2.0、平均重合度から計算される平均分子量は362.41であった。
ピペリジンを添加しないで重合反応溶液を作製し、重合反応溶液に添加剤溶液Aの代わりに、添加剤溶液Cを179.1g加えた以外は、実施例1と同様にして、組成物c1を得た。組成物c1を用いた以外は、実施例1と同様にして、ゴム組成物を調製し、加硫シートを作製した。
1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミドの代わりに(3−イソシアナトプロピル)トリメトキシシランを用いた以外は、添加剤溶液Cと同様にして、(3−イソシアナトプロピル)トリメトキシシランのオリゴマーを含む添加剤溶液Dを作製した。1H−NMRスペクトル分析の結果から、下記式(D)で表される化合物が含まれることが確認された。(3−イソシアナトプロピル)トリメトキシシランのオリゴマーの平均重合度は2.2、平均の重合度から計算される平均分子量は501.55であった。
ピペリジンを添加しないで重合反応溶液を作製し、重合反応溶液に添加剤溶液Aの代わりに、添加剤溶液Dを182.1g加えた以外は、実施例1と同様にして、組成物c2を得た。組成物c2を用いた以外は、実施例1と同様にして、ゴム組成物を調製し、加硫シートを作製した。
ピペリジンを添加しないで重合反応溶液を作製し、重合反応溶液に添加剤溶液Aを加えなかった以外は、実施例1と同様にして、組成物c3を得た。組成物c3を用いた以は、実施例1と同様にして、ゴム組成物を調製し、加硫シートを作製した。
Claims (10)
- ゴム成分、添加剤及び充填剤を含むゴム組成物であり、
前記添加剤は、ケイ素原子、窒素原子及び酸素原子からなる群より選ばれる少なくとも1種の原子と、炭素原子とを含む化合物を含有し、
前記化合物を構成するケイ素原子、窒素原子及び酸素原子の総数が、炭素原子数に対して0.27以上0.80以下であり、前記化合物のハンセン溶解度パラメータが下記式(2)で表される関係を満足し、前記化合物の分子量が200以上15000以下である、ゴム組成物。
6≦{4(δD1−δD2)2+(δP1−δP2)2+(δH1−δH2)2}0.5 (2)
(式中、δDは分散項、δPは極性項、δHは水素結合項を表す。) - 前記化合物が、アミノ基、シロキシ基、イミノ基、エーテル結合、エステル結合及びアミド結合からなる群より選択される少なくとも1種に基づく構造を有する、請求項1に記載のゴム組成物。
- 前記化合物が、3級アミノ基を有する、請求項1又は2に記載のゴム組成物。
- 前記ゴム成分が、ジエン系ゴムを含有する、請求項1〜3のいずれか一項に記載のゴム組成物。
- 前記ジエン系ゴムが、変性ジエン系ゴムである、請求項4に記載のゴム組成物。
- 前記ゴム成分が、ジエン系ゴムを含有する、請求項6に記載のゴム組成物。
- 前記ジエン系ゴムが、変性ジエン系ゴムである、請求項7に記載のゴム組成物。
- 請求項1〜8のいずれか一項に記載のゴム組成物を製造する方法であって、前記ゴム成分と、前記添加剤とを混合する工程を備える、方法。
- 請求項6〜8のいずれか一項に記載のゴム組成物を製造する方法であって、
重合反応器中で、溶液重合法にてジエン系ゴムを含む重合液を得る工程と、
前記重合液を含む重合反応器に、前記式(I)で表される単量体を添加して、前記単量体を重合して前記添加剤を調製する工程と、を有する方法。
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