JP2020153724A5 - - Google Patents

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Publication number
JP2020153724A5
JP2020153724A5 JP2019050689A JP2019050689A JP2020153724A5 JP 2020153724 A5 JP2020153724 A5 JP 2020153724A5 JP 2019050689 A JP2019050689 A JP 2019050689A JP 2019050689 A JP2019050689 A JP 2019050689A JP 2020153724 A5 JP2020153724 A5 JP 2020153724A5
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JP
Japan
Prior art keywords
ray
side arm
disposed
ray analyzer
sample
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JP2019050689A
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English (en)
Japanese (ja)
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JP7165400B2 (ja
JP2020153724A (ja
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Priority to JP2019050689A priority Critical patent/JP7165400B2/ja
Priority claimed from JP2019050689A external-priority patent/JP7165400B2/ja
Priority to EP20156330.1A priority patent/EP3712901B1/en
Priority to CN202010190202.2A priority patent/CN111735828B/zh
Priority to US16/823,929 priority patent/US11215571B2/en
Publication of JP2020153724A publication Critical patent/JP2020153724A/ja
Publication of JP2020153724A5 publication Critical patent/JP2020153724A5/ja
Application granted granted Critical
Publication of JP7165400B2 publication Critical patent/JP7165400B2/ja
Active legal-status Critical Current
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JP2019050689A 2019-03-19 2019-03-19 X線分析装置 Active JP7165400B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019050689A JP7165400B2 (ja) 2019-03-19 2019-03-19 X線分析装置
EP20156330.1A EP3712901B1 (en) 2019-03-19 2020-02-10 X-ray analysis apparatus
CN202010190202.2A CN111735828B (zh) 2019-03-19 2020-03-18 X射线分析装置
US16/823,929 US11215571B2 (en) 2019-03-19 2020-03-19 X-ray analysis apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019050689A JP7165400B2 (ja) 2019-03-19 2019-03-19 X線分析装置

Publications (3)

Publication Number Publication Date
JP2020153724A JP2020153724A (ja) 2020-09-24
JP2020153724A5 true JP2020153724A5 (enExample) 2021-05-20
JP7165400B2 JP7165400B2 (ja) 2022-11-04

Family

ID=69570515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019050689A Active JP7165400B2 (ja) 2019-03-19 2019-03-19 X線分析装置

Country Status (4)

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US (1) US11215571B2 (enExample)
EP (1) EP3712901B1 (enExample)
JP (1) JP7165400B2 (enExample)
CN (1) CN111735828B (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
WO2019236384A1 (en) 2018-06-04 2019-12-12 Sigray, Inc. Wavelength dispersive x-ray spectrometer
DE112019003777B4 (de) 2018-07-26 2025-09-11 Sigray, Inc. Röntgenreflexionsquelle mit hoher helligkeit
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
CN114729907B (zh) 2019-09-03 2023-05-23 斯格瑞公司 用于计算机层析x射线荧光成像的系统和方法
US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
WO2021237237A1 (en) 2020-05-18 2021-11-25 Sigray, Inc. System and method for x-ray absorption spectroscopy using a crystal analyzer and a plurality of detector elements
JP7640682B2 (ja) 2020-09-17 2025-03-05 シグレイ、インコーポレイテッド X線を用いた深さ分解計測および分析のためのシステムおよび方法
WO2022126071A1 (en) 2020-12-07 2022-06-16 Sigray, Inc. High throughput 3d x-ray imaging system using a transmission x-ray source
US12480892B2 (en) 2020-12-07 2025-11-25 Sigray, Inc. High throughput 3D x-ray imaging system using a transmission x-ray source
JP7687689B2 (ja) 2022-02-14 2025-06-03 株式会社リガク X線回折装置及び計測方法
US12360067B2 (en) 2022-03-02 2025-07-15 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
DE112023001408T5 (de) 2022-03-15 2025-02-13 Sigray, Inc. System und verfahren für die kompakte laminographie unter verwendung einer mikrofokus-transmissionsröntgenquelle und eines röntgendetektors mit variabler vergrösserung
CN119173759A (zh) 2022-05-02 2024-12-20 斯格瑞公司 X射线顺序阵列波长色散光谱仪
WO2024173256A1 (en) 2023-02-16 2024-08-22 Sigray, Inc. X-ray detector system with at least two stacked flat bragg diffractors
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources
WO2025101530A1 (en) 2023-11-07 2025-05-15 Sigray, Inc. System and method for x-ray absorption spectroscopy using spectral information from two orthogonal planes
US12429436B2 (en) 2024-01-08 2025-09-30 Sigray, Inc. X-ray analysis system with focused x-ray beam and non-x-ray microscope
WO2025155719A1 (en) 2024-01-18 2025-07-24 Sigray, Inc. Sequential array of x-ray imaging detectors
US12431256B2 (en) 2024-02-15 2025-09-30 Sigray, Inc. System and method for generating a focused x-ray beam

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US2380236A (en) * 1943-06-05 1945-07-10 Gen Electric X-ray camera
DE2933047C2 (de) * 1979-08-16 1982-12-30 Stoe & Cie. GmbH, 6100 Darmstadt Verfahren und Vorrichtung der Röntgendiffraktion
JPH0584850U (ja) * 1992-04-15 1993-11-16 理学電機株式会社 X線回折装置のゴニオメータ光軸調整治具
JPH05332956A (ja) * 1992-06-03 1993-12-17 Fujitsu Ltd X線分析装置
JP3471477B2 (ja) * 1995-03-17 2003-12-02 理学電機株式会社 X線装置用可変スリット装置
US6041098A (en) * 1997-02-03 2000-03-21 Touryanski; Alexander G. X-ray reflectometer
JPH11281595A (ja) 1998-03-30 1999-10-15 Jeol Ltd 全自動極点図形測定装置
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JP4367820B2 (ja) * 2001-03-28 2009-11-18 株式会社リガク X線反射率測定装置
JP3697246B2 (ja) * 2003-03-26 2005-09-21 株式会社リガク X線回折装置
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ITFI20050016A1 (it) * 2005-02-02 2006-08-03 Giovanni Berti Diffrattometro a centro variabile
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JP6656519B2 (ja) * 2016-06-15 2020-03-04 株式会社リガク X線回折装置

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