JP7165400B2 - Ｘ線分析装置 - Google Patents

Ｘ線分析装置 Download PDF

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Publication number
JP7165400B2
JP7165400B2 JP2019050689A JP2019050689A JP7165400B2 JP 7165400 B2 JP7165400 B2 JP 7165400B2 JP 2019050689 A JP2019050689 A JP 2019050689A JP 2019050689 A JP2019050689 A JP 2019050689A JP 7165400 B2 JP7165400 B2 JP 7165400B2
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ray
sample
slit
ray analysis
side arm
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Japanese (ja)
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JP2020153724A5 (enExample
JP2020153724A (ja
Inventor
剛 刑部
哲也 小澤
和樹 尾本
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Rigaku Corp
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Rigaku Corp
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Priority to JP2019050689A priority Critical patent/JP7165400B2/ja
Priority to EP20156330.1A priority patent/EP3712901A1/en
Priority to CN202010190202.2A priority patent/CN111735828B/zh
Priority to US16/823,929 priority patent/US11215571B2/en
Publication of JP2020153724A publication Critical patent/JP2020153724A/ja
Publication of JP2020153724A5 publication Critical patent/JP2020153724A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G01N23/20016—Goniometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G01N23/20025—Sample holders or supports therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/201—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring small-angle scattering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/316—Accessories, mechanical or electrical features collimators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/33—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts
    • G01N2223/3301—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts beam is modified for scan, e.g. moving collimator

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2019050689A 2019-03-19 2019-03-19 Ｘ線分析装置 Active JP7165400B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019050689A JP7165400B2 (ja) 2019-03-19 2019-03-19 Ｘ線分析装置
EP20156330.1A EP3712901A1 (en) 2019-03-19 2020-02-10 X-ray analysis apparatus
CN202010190202.2A CN111735828B (zh) 2019-03-19 2020-03-18 X射线分析装置
US16/823,929 US11215571B2 (en) 2019-03-19 2020-03-19 X-ray analysis apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019050689A JP7165400B2 (ja) 2019-03-19 2019-03-19 Ｘ線分析装置

Publications (3)

Publication Number Publication Date
JP2020153724A JP2020153724A (ja) 2020-09-24
JP2020153724A5 JP2020153724A5 (enExample) 2021-05-20
JP7165400B2 true JP7165400B2 (ja) 2022-11-04

Family

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Family Applications (1)

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JP2019050689A Active JP7165400B2 (ja) 2019-03-19 2019-03-19 Ｘ線分析装置

Country Status (4)

Country Link
US (1) US11215571B2 (enExample)
EP (1) EP3712901A1 (enExample)
JP (1) JP7165400B2 (enExample)
CN (1) CN111735828B (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US10989822B2 (en) 2018-06-04 2021-04-27 Sigray, Inc. Wavelength dispersive x-ray spectrometer
CN112470245B (zh) 2018-07-26 2025-03-18 斯格瑞公司 高亮度x射线反射源
DE112019004478T5 (de) 2018-09-07 2021-07-08 Sigray, Inc. System und verfahren zur röntgenanalyse mit wählbarer tiefe
CN114729907B (zh) 2019-09-03 2023-05-23 斯格瑞公司 用于计算机层析x射线荧光成像的系统和方法
US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
CN115667896B (zh) 2020-05-18 2024-06-21 斯格瑞公司 使用晶体分析器和多个检测元件的x射线吸收光谱的系统和方法
US11549895B2 (en) 2020-09-17 2023-01-10 Sigray, Inc. System and method using x-rays for depth-resolving metrology and analysis
US12480892B2 (en) 2020-12-07 2025-11-25 Sigray, Inc. High throughput 3D x-ray imaging system using a transmission x-ray source
KR20230109735A (ko) 2020-12-07 2023-07-20 시그레이, 아이엔씨. 투과 x-선 소스를 이용한 고처리량 3D x-선 이미징 시스템
JP7687689B2 (ja) 2022-02-14 2025-06-03 株式会社リガク Ｘ線回折装置及び計測方法
WO2023168204A1 (en) 2022-03-02 2023-09-07 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
WO2023177981A1 (en) 2022-03-15 2023-09-21 Sigray, Inc. System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector
CN119173759A (zh) 2022-05-02 2024-12-20 斯格瑞公司 X射线顺序阵列波长色散光谱仪
CN121013975A (zh) 2023-02-16 2025-11-25 斯格瑞公司 具有至少两个堆叠的平面布拉格衍射器的x射线探测器系统
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources
US12429437B2 (en) 2023-11-07 2025-09-30 Sigray, Inc. System and method for x-ray absorption spectroscopy using spectral information from two orthogonal planes
US12429436B2 (en) 2024-01-08 2025-09-30 Sigray, Inc. X-ray analysis system with focused x-ray beam and non-x-ray microscope
US12510677B2 (en) 2024-01-18 2025-12-30 Sigray, Inc. Sequential array of x-ray imaging detectors
US12431256B2 (en) 2024-02-15 2025-09-30 Sigray, Inc. System and method for generating a focused x-ray beam

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002286658A (ja) 2001-03-28 2002-10-03 Rigaku Corp Ｘ線反射率測定装置およびその方法
JP2006526138A (ja) 2003-05-31 2006-11-16 カウンシル・フォー・ザ・セントラル・ラボラトリー・オブ・ザ・リサーチ・カウンシルズ 検出器及び付随コリメータのアレイを具えたトモグラフィックエネルギー分散型ｘ線回折装置
JP2007017258A (ja) 2005-07-07 2007-01-25 Rigaku Corp 複合分析装置及び複合分析方法
JP2013098090A (ja) 2011-11-02 2013-05-20 Fujifilm Corp Ｘ線照射装置及びｘ線照射方法
JP2015102432A (ja) 2013-11-26 2015-06-04 株式会社リガク Ｘ線回折装置およびｘ線回折測定方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2380236A (en) * 1943-06-05 1945-07-10 Gen Electric X-ray camera
DE2933047C2 (de) * 1979-08-16 1982-12-30 Stoe & Cie. GmbH, 6100 Darmstadt Verfahren und Vorrichtung der Röntgendiffraktion
JPH0584850U (ja) * 1992-04-15 1993-11-16 理学電機株式会社 Ｘ線回折装置のゴニオメータ光軸調整治具
JPH05332956A (ja) * 1992-06-03 1993-12-17 Fujitsu Ltd Ｘ線分析装置
JP3471477B2 (ja) * 1995-03-17 2003-12-02 理学電機株式会社 Ｘ線装置用可変スリット装置
US6041098A (en) * 1997-02-03 2000-03-21 Touryanski; Alexander G. X-ray reflectometer
JPH11281595A (ja) 1998-03-30 1999-10-15 Jeol Ltd 全自動極点図形測定装置
JP3373803B2 (ja) * 1999-05-28 2003-02-04 科学技術振興事業団 コンビナトリアルｘ線回折装置
JP3697246B2 (ja) * 2003-03-26 2005-09-21 株式会社リガク Ｘ線回折装置
ITFI20050016A1 (it) * 2005-02-02 2006-08-03 Giovanni Berti Diffrattometro a centro variabile
US7406153B2 (en) * 2006-08-15 2008-07-29 Jordan Valley Semiconductors Ltd. Control of X-ray beam spot size
US7443952B2 (en) * 2006-10-06 2008-10-28 Rigaku Corporation X-ray diffraction measurement method and X-ray diffraction apparatus
US8102967B2 (en) * 2007-04-03 2012-01-24 Stresstech Oy Goniometer
JP5081556B2 (ja) * 2007-09-28 2012-11-28 株式会社リガク デバイシェラー光学系を備えたｘ線回折測定装置とそのためのｘ線回折測定方法
JP2016080450A (ja) * 2014-10-14 2016-05-16 キヤノン株式会社 ブロックスリット装置、およびそれを有するｘ線散乱測定装置
JP6656519B2 (ja) * 2016-06-15 2020-03-04 株式会社リガク Ｘ線回折装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002286658A (ja) 2001-03-28 2002-10-03 Rigaku Corp Ｘ線反射率測定装置およびその方法
JP2006526138A (ja) 2003-05-31 2006-11-16 カウンシル・フォー・ザ・セントラル・ラボラトリー・オブ・ザ・リサーチ・カウンシルズ 検出器及び付随コリメータのアレイを具えたトモグラフィックエネルギー分散型ｘ線回折装置
JP2007017258A (ja) 2005-07-07 2007-01-25 Rigaku Corp 複合分析装置及び複合分析方法
JP2013098090A (ja) 2011-11-02 2013-05-20 Fujifilm Corp Ｘ線照射装置及びｘ線照射方法
JP2015102432A (ja) 2013-11-26 2015-06-04 株式会社リガク Ｘ線回折装置およびｘ線回折測定方法

Also Published As

Publication number Publication date
CN111735828B (zh) 2024-12-20
JP2020153724A (ja) 2020-09-24
CN111735828A (zh) 2020-10-02
EP3712901A1 (en) 2020-09-23
US20200300789A1 (en) 2020-09-24
US11215571B2 (en) 2022-01-04

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