JP2020121359A - 加工装置 - Google Patents
加工装置 Download PDFInfo
- Publication number
- JP2020121359A JP2020121359A JP2019013838A JP2019013838A JP2020121359A JP 2020121359 A JP2020121359 A JP 2020121359A JP 2019013838 A JP2019013838 A JP 2019013838A JP 2019013838 A JP2019013838 A JP 2019013838A JP 2020121359 A JP2020121359 A JP 2020121359A
- Authority
- JP
- Japan
- Prior art keywords
- waterproof pan
- water
- cutting
- processing
- processing device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 80
- 238000009434 installation Methods 0.000 abstract description 4
- 238000005520 cutting process Methods 0.000 description 73
- 238000004140 cleaning Methods 0.000 description 23
- 235000012431 wafers Nutrition 0.000 description 22
- 239000004065 semiconductor Substances 0.000 description 21
- 238000001514 detection method Methods 0.000 description 5
- 238000007599 discharging Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 230000004323 axial length Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/01—Frames, beds, pillars or like members; Arrangement of ways
- B23Q1/015—Frames, beds, pillars
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0041—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing the workpiece being brought into contact with a suitably shaped rigid body which remains stationary during breaking
- B28D5/0047—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing the workpiece being brought into contact with a suitably shaped rigid body which remains stationary during breaking using fluid or gas pressure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q11/00—Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
- B23Q11/0042—Devices for removing chips
- B23Q11/0067—Devices for removing chips chip containers located under a machine or under a chip conveyor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q11/00—Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
- B23Q11/08—Protective coverings for parts of machine tools; Splash guards
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q11/00—Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
- B23Q11/10—Arrangements for cooling or lubricating tools or work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q11/00—Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
- B23Q11/12—Arrangements for cooling or lubricating parts of the machine
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
- B24B41/068—Table-like supports for panels, sheets or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0064—Devices for the automatic drive or the program control of the machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3043—Making grooves, e.g. cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Dicing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Auxiliary Devices For Machine Tools (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
4:防水パン
41:前壁
42、43:側壁
44:後壁
45:底壁
47:排水孔
6:脚部
60:基台
62:ねじ部
64:締め付けナット
10:切削装置
20:チャックテーブル(保持手段)
22:切削手段
24:切削ブレード
26:切削水供給手段
28:洗浄手段
50:排水手段
52:排水管
54:コック
70:漏水センサー
72:検知部
Claims (4)
- 加工装置であって、
被加工物を保持する保持手段と、該保持手段に保持された被加工物に加工水を供給しながら加工を施す加工手段と、を備え、
該加工装置の底部には、漏水を受け止める防水パンが固定されている加工装置。 - 該底部に配設される複数の脚部を備え、
該防水パンは、該脚部に渡り固定されている請求項1に記載の加工装置。 - 該防水パンは、その底壁が水平面に対して傾斜するように固定され、該防水パンに漏れ出た漏水は底壁の所定の低い位置に集められ、該所定の低い位置には、漏水センサーが配設される請求項1、又は2に記載の加工装置。
- 該防水パンの該所定の低い位置に対応する位置に排水手段が配設される請求項3に記載の加工装置。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019013838A JP7254538B2 (ja) | 2019-01-30 | 2019-01-30 | 加工装置 |
KR1020190176122A KR20200094634A (ko) | 2019-01-30 | 2019-12-27 | 가공 장치 |
SG10201913764UA SG10201913764UA (en) | 2019-01-30 | 2019-12-30 | Processing apparatus |
CN202010046262.7A CN111497042B (zh) | 2019-01-30 | 2020-01-16 | 加工装置 |
US16/745,614 US11691313B2 (en) | 2019-01-30 | 2020-01-17 | Processing apparatus including a water collection pan |
TW109101876A TWI803731B (zh) | 2019-01-30 | 2020-01-20 | 加工裝置 |
DE102020201107.9A DE102020201107A1 (de) | 2019-01-30 | 2020-01-30 | Bearbeitungsvorrichtung |
ATA50075/2020A AT522198B1 (de) | 2019-01-30 | 2020-01-30 | Verarbeitungsvorrichtung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019013838A JP7254538B2 (ja) | 2019-01-30 | 2019-01-30 | 加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020121359A true JP2020121359A (ja) | 2020-08-13 |
JP7254538B2 JP7254538B2 (ja) | 2023-04-10 |
Family
ID=71524371
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019013838A Active JP7254538B2 (ja) | 2019-01-30 | 2019-01-30 | 加工装置 |
Country Status (8)
Country | Link |
---|---|
US (1) | US11691313B2 (ja) |
JP (1) | JP7254538B2 (ja) |
KR (1) | KR20200094634A (ja) |
CN (1) | CN111497042B (ja) |
AT (1) | AT522198B1 (ja) |
DE (1) | DE102020201107A1 (ja) |
SG (1) | SG10201913764UA (ja) |
TW (1) | TWI803731B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7414493B2 (ja) | 2019-12-03 | 2024-01-16 | ファナック株式会社 | 工作機械 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI749829B (zh) * | 2020-10-27 | 2021-12-11 | 寅翊智造股份有限公司 | 全自動工件鈍化機之清潔裝置 |
US20230164952A1 (en) * | 2021-11-24 | 2023-05-25 | Microsoft Technology Licensing, Llc | Systems and methods for recovering fluid in immersion-cooled datacenters |
US11808664B1 (en) * | 2023-05-15 | 2023-11-07 | Corey Ryhorski | Moisture-detecting water source shutoff device |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01274734A (ja) * | 1988-04-28 | 1989-11-02 | Olympus Optical Co Ltd | 内視鏡洗浄消毒装置 |
JPH09207047A (ja) * | 1996-01-31 | 1997-08-12 | Ebara Corp | ポリッシング装置又は搬送・洗浄装置のドレンパン |
US6119736A (en) * | 1999-06-03 | 2000-09-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Vehicle for transporting wet objects |
US20060081014A1 (en) * | 2004-09-10 | 2006-04-20 | Lg Electronics Inc. | Washing apparatus |
JP2014220447A (ja) * | 2013-05-10 | 2014-11-20 | 株式会社ディスコ | 切削装置 |
Family Cites Families (19)
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DE29611638U1 (de) * | 1996-07-03 | 1996-09-12 | Löser, Robert, Oberhoffen | Spitzenlose Schleif-, Bürst-, und/oder Poliermaschine |
JP3654467B2 (ja) * | 1996-07-22 | 2005-06-02 | オークマ株式会社 | 水受け装置 |
KR101010689B1 (ko) * | 2004-02-06 | 2011-01-24 | 엘지전자 주식회사 | 세탁기용 받침대 |
EP2063014B1 (en) * | 2007-11-21 | 2013-09-18 | LG Electronics Inc. | Washing machine |
KR100971774B1 (ko) * | 2009-04-22 | 2010-07-21 | 주식회사 고명에너텍 | 폐온수를 이용한 폐열회수 장치 |
JP5417096B2 (ja) * | 2009-09-11 | 2014-02-12 | 株式会社東芝 | 加熱調理器 |
US8528126B2 (en) * | 2010-11-01 | 2013-09-10 | Khaled Abdullah M. Al-Mahnna | Apparatus and/or device for personal hygiene |
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JP5271393B2 (ja) * | 2011-07-20 | 2013-08-21 | 三星ダイヤモンド工業株式会社 | レーザスクライブ装置 |
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JP6253089B2 (ja) * | 2013-12-10 | 2017-12-27 | 株式会社ディスコ | 研削装置 |
TWI540011B (zh) * | 2013-12-12 | 2016-07-01 | Excetek Technologies Co Ltd | To open the door of the discharge processing machine tank |
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TWI797121B (zh) * | 2017-04-25 | 2023-04-01 | 美商維克儀器公司 | 半導體晶圓製程腔體 |
CN108942264A (zh) * | 2018-08-29 | 2018-12-07 | 苏州群志机械设备有限公司 | 一种一体式机床底座的排水结构 |
-
2019
- 2019-01-30 JP JP2019013838A patent/JP7254538B2/ja active Active
- 2019-12-27 KR KR1020190176122A patent/KR20200094634A/ko not_active Application Discontinuation
- 2019-12-30 SG SG10201913764UA patent/SG10201913764UA/en unknown
-
2020
- 2020-01-16 CN CN202010046262.7A patent/CN111497042B/zh active Active
- 2020-01-17 US US16/745,614 patent/US11691313B2/en active Active
- 2020-01-20 TW TW109101876A patent/TWI803731B/zh active
- 2020-01-30 AT ATA50075/2020A patent/AT522198B1/de active
- 2020-01-30 DE DE102020201107.9A patent/DE102020201107A1/de active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01274734A (ja) * | 1988-04-28 | 1989-11-02 | Olympus Optical Co Ltd | 内視鏡洗浄消毒装置 |
JPH09207047A (ja) * | 1996-01-31 | 1997-08-12 | Ebara Corp | ポリッシング装置又は搬送・洗浄装置のドレンパン |
US6119736A (en) * | 1999-06-03 | 2000-09-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Vehicle for transporting wet objects |
US20060081014A1 (en) * | 2004-09-10 | 2006-04-20 | Lg Electronics Inc. | Washing apparatus |
JP2014220447A (ja) * | 2013-05-10 | 2014-11-20 | 株式会社ディスコ | 切削装置 |
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JP7414493B2 (ja) | 2019-12-03 | 2024-01-16 | ファナック株式会社 | 工作機械 |
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US11691313B2 (en) | 2023-07-04 |
US20200238570A1 (en) | 2020-07-30 |
AT522198A2 (de) | 2020-09-15 |
AT522198A3 (de) | 2021-08-15 |
KR20200094634A (ko) | 2020-08-07 |
TWI803731B (zh) | 2023-06-01 |
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DE102020201107A1 (de) | 2020-07-30 |
CN111497042B (zh) | 2024-02-06 |
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AT522198B1 (de) | 2022-02-15 |
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