TWI265566B - Wafer protection system employed in chemical stations - Google Patents

Wafer protection system employed in chemical stations

Info

Publication number
TWI265566B
TWI265566B TW94130061A TW94130061A TWI265566B TW I265566 B TWI265566 B TW I265566B TW 94130061 A TW94130061 A TW 94130061A TW 94130061 A TW94130061 A TW 94130061A TW I265566 B TWI265566 B TW I265566B
Authority
TW
Taiwan
Prior art keywords
solvent
liquid feeding
conduit
post
solvent tank
Prior art date
Application number
TW94130061A
Other languages
Chinese (zh)
Other versions
TW200710969A (en
Inventor
San-Lung Chen
Ying-Fang Chen
Kuo-Zhang Chu
Mei-Lun Tseng
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW94130061A priority Critical patent/TWI265566B/en
Application granted granted Critical
Publication of TWI265566B publication Critical patent/TWI265566B/en
Publication of TW200710969A publication Critical patent/TW200710969A/en

Links

Landscapes

  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

Semiconductor wafers have a pattern of exposed metal layer, and ashed photoresist residue and/or post-etch residue thereon to be cleaned through the chemical wet station. Post-etch residue removing solvent such as EKC-270 is fed into the solvent tank through a first solvent valve and first liquid feeding conduit that connected to bottom of the solvent tank. A circulation conduit connects the solvent tank with the first liquid feeding conduit for circulating the post-etch residue removing solvent. A liquid feeding pump is connected with the first liquid feeding conduit. A liquid drain conduit and a drain valve are connected with bottom of the solvent tank. Replacement solvent such as EKC-800 is fed into the solvent tank through a second solvent valve and second liquid feeding conduit.
TW94130061A 2005-09-02 2005-09-02 Wafer protection system employed in chemical stations TWI265566B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW94130061A TWI265566B (en) 2005-09-02 2005-09-02 Wafer protection system employed in chemical stations

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW94130061A TWI265566B (en) 2005-09-02 2005-09-02 Wafer protection system employed in chemical stations

Publications (2)

Publication Number Publication Date
TWI265566B true TWI265566B (en) 2006-11-01
TW200710969A TW200710969A (en) 2007-03-16

Family

ID=38122249

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94130061A TWI265566B (en) 2005-09-02 2005-09-02 Wafer protection system employed in chemical stations

Country Status (1)

Country Link
TW (1) TWI265566B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102034679A (en) * 2009-09-25 2011-04-27 无锡华润上华半导体有限公司 Wafer cleaning method
CN112864050A (en) * 2020-12-24 2021-05-28 长江存储科技有限责任公司 Wafer cleaning device, control method, controller and system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102034679A (en) * 2009-09-25 2011-04-27 无锡华润上华半导体有限公司 Wafer cleaning method
CN102034679B (en) * 2009-09-25 2013-06-05 无锡华润上华半导体有限公司 Wafer cleaning method
CN112864050A (en) * 2020-12-24 2021-05-28 长江存储科技有限责任公司 Wafer cleaning device, control method, controller and system

Also Published As

Publication number Publication date
TW200710969A (en) 2007-03-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees