TWI265566B - Wafer protection system employed in chemical stations - Google Patents
Wafer protection system employed in chemical stationsInfo
- Publication number
- TWI265566B TWI265566B TW94130061A TW94130061A TWI265566B TW I265566 B TWI265566 B TW I265566B TW 94130061 A TW94130061 A TW 94130061A TW 94130061 A TW94130061 A TW 94130061A TW I265566 B TWI265566 B TW I265566B
- Authority
- TW
- Taiwan
- Prior art keywords
- solvent
- liquid feeding
- conduit
- post
- solvent tank
- Prior art date
Links
Landscapes
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Semiconductor wafers have a pattern of exposed metal layer, and ashed photoresist residue and/or post-etch residue thereon to be cleaned through the chemical wet station. Post-etch residue removing solvent such as EKC-270 is fed into the solvent tank through a first solvent valve and first liquid feeding conduit that connected to bottom of the solvent tank. A circulation conduit connects the solvent tank with the first liquid feeding conduit for circulating the post-etch residue removing solvent. A liquid feeding pump is connected with the first liquid feeding conduit. A liquid drain conduit and a drain valve are connected with bottom of the solvent tank. Replacement solvent such as EKC-800 is fed into the solvent tank through a second solvent valve and second liquid feeding conduit.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94130061A TWI265566B (en) | 2005-09-02 | 2005-09-02 | Wafer protection system employed in chemical stations |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94130061A TWI265566B (en) | 2005-09-02 | 2005-09-02 | Wafer protection system employed in chemical stations |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI265566B true TWI265566B (en) | 2006-11-01 |
TW200710969A TW200710969A (en) | 2007-03-16 |
Family
ID=38122249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW94130061A TWI265566B (en) | 2005-09-02 | 2005-09-02 | Wafer protection system employed in chemical stations |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI265566B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102034679A (en) * | 2009-09-25 | 2011-04-27 | 无锡华润上华半导体有限公司 | Wafer cleaning method |
CN112864050A (en) * | 2020-12-24 | 2021-05-28 | 长江存储科技有限责任公司 | Wafer cleaning device, control method, controller and system |
-
2005
- 2005-09-02 TW TW94130061A patent/TWI265566B/en not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102034679A (en) * | 2009-09-25 | 2011-04-27 | 无锡华润上华半导体有限公司 | Wafer cleaning method |
CN102034679B (en) * | 2009-09-25 | 2013-06-05 | 无锡华润上华半导体有限公司 | Wafer cleaning method |
CN112864050A (en) * | 2020-12-24 | 2021-05-28 | 长江存储科技有限责任公司 | Wafer cleaning device, control method, controller and system |
Also Published As
Publication number | Publication date |
---|---|
TW200710969A (en) | 2007-03-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |