JP2020088000A5 - - Google Patents

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Publication number
JP2020088000A5
JP2020088000A5 JP2018215456A JP2018215456A JP2020088000A5 JP 2020088000 A5 JP2020088000 A5 JP 2020088000A5 JP 2018215456 A JP2018215456 A JP 2018215456A JP 2018215456 A JP2018215456 A JP 2018215456A JP 2020088000 A5 JP2020088000 A5 JP 2020088000A5
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JP
Japan
Prior art keywords
substrate
roller
cleaning
edge
cleaning unit
Prior art date
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Application number
JP2018215456A
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English (en)
Japanese (ja)
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JP2020088000A (ja
JP7265858B2 (ja
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Application filed filed Critical
Priority claimed from JP2018215456A external-priority patent/JP7265858B2/ja
Priority to JP2018215456A priority Critical patent/JP7265858B2/ja
Priority to KR1020217014827A priority patent/KR102778937B1/ko
Priority to SG11202105091PA priority patent/SG11202105091PA/en
Priority to US17/294,212 priority patent/US12033847B2/en
Priority to CN201980075357.7A priority patent/CN113165142B/zh
Priority to PCT/JP2019/042773 priority patent/WO2020100609A1/ja
Priority to TW108140562A priority patent/TWI822901B/zh
Publication of JP2020088000A publication Critical patent/JP2020088000A/ja
Publication of JP2020088000A5 publication Critical patent/JP2020088000A5/ja
Publication of JP7265858B2 publication Critical patent/JP7265858B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2018215456A 2018-11-16 2018-11-16 洗浄モジュール、洗浄モジュールを備える基板処理装置と洗浄方法 Active JP7265858B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2018215456A JP7265858B2 (ja) 2018-11-16 2018-11-16 洗浄モジュール、洗浄モジュールを備える基板処理装置と洗浄方法
CN201980075357.7A CN113165142B (zh) 2018-11-16 2019-10-31 清洗组件及具备清洗组件的基板处理装置
SG11202105091PA SG11202105091PA (en) 2018-11-16 2019-10-31 Cleaning module, substrate processing apparatus including cleaning module, and cleaning method
US17/294,212 US12033847B2 (en) 2018-11-16 2019-10-31 Cleaning module, substrate processing apparatus including cleaning module, and cleaning method
KR1020217014827A KR102778937B1 (ko) 2018-11-16 2019-10-31 세정 모듈과, 세정 모듈을 구비하는 기판 처리 장치
PCT/JP2019/042773 WO2020100609A1 (ja) 2018-11-16 2019-10-31 洗浄モジュール、洗浄モジュールを備える基板処理装置と洗浄方法
TW108140562A TWI822901B (zh) 2018-11-16 2019-11-08 洗淨模組以及具備洗淨模組之基板處理裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018215456A JP7265858B2 (ja) 2018-11-16 2018-11-16 洗浄モジュール、洗浄モジュールを備える基板処理装置と洗浄方法

Publications (3)

Publication Number Publication Date
JP2020088000A JP2020088000A (ja) 2020-06-04
JP2020088000A5 true JP2020088000A5 (enExample) 2021-12-02
JP7265858B2 JP7265858B2 (ja) 2023-04-27

Family

ID=70730502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018215456A Active JP7265858B2 (ja) 2018-11-16 2018-11-16 洗浄モジュール、洗浄モジュールを備える基板処理装置と洗浄方法

Country Status (7)

Country Link
US (1) US12033847B2 (enExample)
JP (1) JP7265858B2 (enExample)
KR (1) KR102778937B1 (enExample)
CN (1) CN113165142B (enExample)
SG (1) SG11202105091PA (enExample)
TW (1) TWI822901B (enExample)
WO (1) WO2020100609A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12138732B2 (en) 2020-12-14 2024-11-12 Applied Materials, Inc. Polishing system apparatus and methods for defect reduction at a substrate edge
CN112976266A (zh) * 2021-03-04 2021-06-18 王仕英 一种陶瓷生产用胚体修复装置
JP7623225B2 (ja) * 2021-06-11 2025-01-28 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置
CN114887976B (zh) * 2022-05-25 2024-01-23 宁波芯丰精密科技有限公司 一种清洁装置
CN119609909A (zh) * 2024-08-06 2025-03-14 浙江创芯集成电路有限公司 晶圆研磨装置以及晶圆研磨设备

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2415580A1 (de) 1974-03-30 1975-10-02 Schleifenbaum & Steinmetz Verfahren zum reinigen von blechen und reinigungsmaschine zur durchfuehrung des verfahrens
JP3030796B2 (ja) * 1992-07-24 2000-04-10 東京エレクトロン株式会社 洗浄処理方法
US5861066A (en) 1996-05-01 1999-01-19 Ontrak Systems, Inc. Method and apparatus for cleaning edges of contaminated substrates
JP3577173B2 (ja) * 1996-09-09 2004-10-13 昭和電工株式会社 ディスク基板の洗浄ユニット及び連続洗浄装置
JPH10335279A (ja) 1997-05-30 1998-12-18 Shibaura Eng Works Co Ltd 洗浄装置
JP4843167B2 (ja) 2001-09-20 2011-12-21 株式会社東芝 ローラ清掃装置
JP2003151925A (ja) * 2001-11-12 2003-05-23 Yac Co Ltd ウェーハエッジ研磨処理装置
JP2003151943A (ja) * 2001-11-19 2003-05-23 Speedfam Clean System Co Ltd スクラブ洗浄装置
JP2003317703A (ja) 2002-04-24 2003-11-07 Sony Corp 電池およびその製造方法
JP3933670B2 (ja) * 2005-03-29 2007-06-20 東京エレクトロン株式会社 基板洗浄方法及び基板洗浄装置
JP2007317703A (ja) * 2006-05-23 2007-12-06 Fujifilm Corp ブラシ洗浄方法、半導体の製造方法及びブラシ洗浄装置
JP4858042B2 (ja) * 2006-09-26 2012-01-18 ミツミ電機株式会社 半導体基板の洗浄方法
KR100853378B1 (ko) * 2006-10-24 2008-08-21 주식회사 케이씨텍 대면적 기판의 접촉식 세정장치
JP5009253B2 (ja) * 2008-08-07 2012-08-22 東京エレクトロン株式会社 基板洗浄装置
SG10201906815XA (en) * 2014-08-26 2019-08-27 Ebara Corp Substrate processing apparatus
JP6910148B2 (ja) * 2017-01-13 2021-07-28 株式会社ディスコ ウエーハ洗浄装置

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