JP2020043866A - スフェロイド捕捉用挿入体 - Google Patents
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Abstract
Description
細胞培養アセンブリにおいて、
開口および天底を有する少なくとも1つのウェルを含む細胞培養容器、および
前記細胞培養容器の前記少なくとも1つのウェルの内部に収まる構造の挿入体であって、第1の開放端部、および開口を有する第2の端部を含み、該第1の開放端部および該第2の端部がそれらの間に空洞を画成している、挿入体、
を備え、
前記第2の端部が、10マイクロメートルから200マイクロメートルの範囲の平均細孔径を有する細孔を含む流体透過性メッシュを備える、細胞培養アセンブリ。
前記細胞培養容器が細胞培養表面を備え、該細胞培養表面が、マイクロウェルのアレイを有する基体から作られている、実施形態1に記載の細胞培養アセンブリ。
前記挿入体が、前記第1の開放端部から前記第2の端部まで延在する、側壁、または複数の支持体をさらに備える、実施形態1または2に記載の細胞培養アセンブリ。
前記側壁の少なくとも一部が前記メッシュを構成する、実施形態3に記載の細胞培養アセンブリ。
前記挿入体が前記第1の開放端部から延在する1つ以上のフランジをさらに備える、実施形態1から4いずれか1つに記載の細胞培養アセンブリ。
前記挿入体が、側壁から延在する1つ以上のフランジをさらに備える、実施形態5に記載の細胞培養アセンブリ。
前記ウェルが上縁をさらに画成し、前記挿入体の第1の開放端部が該ウェルの上縁に接触して、前記メッシュを前記天底からある距離に位置付ける、実施形態1から6いずれか1つに記載の細胞培養アセンブリ。
支持体をさらに備え、前記挿入体が該支持体と接触して、前記メッシュを前記天底からある距離に位置付ける、実施形態7に記載の細胞培養アセンブリ。
前記メッシュが、40マイクロメートル以下の平均細孔径を有する、実施形態1から8いずれか1つに記載の細胞培養アセンブリ。
前記ウェルが、前記開口から前記天底まで円錐形状を構成する、実施形態3から9いずれか1つに記載の細胞培養アセンブリ。
前記挿入体の内面の少なくとも一部が、該挿入体の内面に対する細胞接着を防ぐように処理または被覆されている、実施形態1から10いずれか1つに記載の細胞培養アセンブリ。
前記ウェルの内面の少なくとも一部が、該ウェルの内面に対する細胞接着を防ぐように処理または被覆されている、実施形態1から11いずれか1つに記載の細胞培養アセンブリ。
実施形態1から12いずれか1つに記載の細胞培養アセンブリ内でスフェロイド細胞を培養する方法であって、
ウェル内に挿入体を位置付ける工程、
該挿入体の空洞中に細胞および培地を入れる工程、および
細胞を前記挿入体のメッシュに通過させ、前記ウェルの天底と該挿入体のメッシュとの間の空間にスフェロイドを形成させる工程、
を有してなる方法。
110 基体
112 主面
113 構造化表面
115、515、525、615 ウェル
116、616 天底
118 上部開口
120 内面
125 マイクロウェル
130 スフェロイド
140 外面
150 ウェル挿入体
160、560 フレーム
161 第1の端部
162 第2の端部
163 支持体
164 開口
168 フランジ
170、570 流体透過性メッシュ
171 細孔
200 細胞
500 細胞培養アセンブリ、スフェロイド
Claims (14)
- 細胞培養アセンブリにおいて、
開口および天底を有する少なくとも1つのウェルを含む細胞培養容器、および
前記細胞培養容器の前記少なくとも1つのウェルの内部に収まる構造の挿入体であって、第1の開放端部、および開口を有する第2の端部を含み、該第1の開放端部および該第2の端部がそれらの間に空洞を画成している、挿入体、
を備え、
前記第2の端部が流体透過性メッシュを備え、
前記細胞培養容器が細胞培養表面を備え、該細胞培養表面が、マイクロウェルのアレイを有する基体から作られており、
前記ウェル中で培養される細胞は、マイクロウェルのアレイにおけるマイクロウェル中でスフェロイドを形成するように構成されており、
各マイクロウェルは、上部開口、側壁、およびガス透過性底を備え、前記底は細胞に非接着性である、細胞培養アセンブリ。 - 前記メッシュが、10マイクロメートルから200マイクロメートルの範囲の平均細孔径を有する細孔を含む、請求項1記載の細胞培養アセンブリ。
- 前記ウェルが、該ウェル内で培養された細胞が前記マイクロウェルのアレイ内にスフェロイドを形成するように構成されている、請求項1または2記載の細胞培養アセンブリ。
- 前記メッシュの細孔が、個々の細胞が該メッシュを通り抜けられるのを可能にし、前記マイクロウェルのアレイ内に形成されたスフェロイドが該メッシュを通り抜けるのを防ぐサイズのものである、請求項3記載の細胞培養アセンブリ。
- 前記挿入体が、前記第1の開放端部から前記第2の端部まで延在する、側壁、または複数の支持体をさらに備える、請求項1から4いずれか1項記載の細胞培養アセンブリ。
- 前記側壁の少なくとも一部が前記メッシュを構成する、請求項5記載の細胞培養アセンブリ。
- 前記挿入体が前記第1の開放端部から延在する1つ以上のフランジをさらに備える、請求項1から6いずれか1項記載の細胞培養アセンブリ。
- 前記ウェルが上縁をさらに画成し、前記挿入体の第1の開放端部が該ウェルの上縁に接触して、前記メッシュを前記天底からある距離に位置付ける、請求項1から7いずれか1項記載の細胞培養アセンブリ。
- 支持体をさらに備え、前記挿入体が該支持体と接触して、前記メッシュを前記天底からある距離に位置付ける、請求項8記載の細胞培養アセンブリ。
- 前記メッシュが、40マイクロメートル以下の平均細孔径を有する、請求項1から9いずれか1項記載の細胞培養アセンブリ。
- 前記ウェルが、前記開口から前記天底まで円錐形状を構成する、請求項1から9いずれか1項記載の細胞培養アセンブリ。
- 前記挿入体の内面の少なくとも一部が、該挿入体の内面に対する細胞接着を防ぐように処理または被覆されている、請求項1から11いずれか1項記載の細胞培養アセンブリ。
- 請求項1から12いずれか1つに記載の細胞培養アセンブリ内でスフェロイド細胞を培養する方法であって、
ウェル内に挿入体を位置付ける工程、
該挿入体の空洞中に細胞および培地を入れる工程、および
細胞を前記挿入体のメッシュに通過させ、前記ウェルの天底と該挿入体のメッシュとの間の空間にスフェロイドを形成させる工程、
を有してなる方法。 - 請求項1から12いずれか1つに記載の細胞培養アセンブリから培地を除去する方法であって、
ウェル内に挿入体を位置付ける工程、
該挿入体の空洞中に細胞および培地を入れる工程、
細胞を前記挿入体のメッシュに通過させ、前記ウェルの天底と該挿入体のメッシュとの間の空間にスフェロイドを形成させる工程、および
前記ウェルから前記挿入体の上より前記培地を除去する工程、
を有してなる方法。
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CN107109340B (zh) | 2021-10-22 |
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JP6832042B2 (ja) | 2021-02-24 |
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