JP2019534937A5 - - Google Patents

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Publication number
JP2019534937A5
JP2019534937A5 JP2017563294A JP2017563294A JP2019534937A5 JP 2019534937 A5 JP2019534937 A5 JP 2019534937A5 JP 2017563294 A JP2017563294 A JP 2017563294A JP 2017563294 A JP2017563294 A JP 2017563294A JP 2019534937 A5 JP2019534937 A5 JP 2019534937A5
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JP
Japan
Prior art keywords
crucible
storage chamber
heating
vapor deposition
top surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2017563294A
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English (en)
Japanese (ja)
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JP2019534937A (ja
Filing date
Publication date
Priority claimed from CN201610850525.3A external-priority patent/CN106191785B/zh
Application filed filed Critical
Publication of JP2019534937A publication Critical patent/JP2019534937A/ja
Publication of JP2019534937A5 publication Critical patent/JP2019534937A5/ja
Pending legal-status Critical Current

Links

JP2017563294A 2016-09-27 2017-06-21 坩堝、蒸着装置及び蒸着システム Pending JP2019534937A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201610850525.3 2016-09-27
CN201610850525.3A CN106191785B (zh) 2016-09-27 2016-09-27 坩埚、蒸镀装置及蒸镀系统
PCT/CN2017/089355 WO2018059019A1 (zh) 2016-09-27 2017-06-21 坩埚、蒸镀装置及蒸镀系统

Publications (2)

Publication Number Publication Date
JP2019534937A JP2019534937A (ja) 2019-12-05
JP2019534937A5 true JP2019534937A5 (enExample) 2020-06-25

Family

ID=57520791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017563294A Pending JP2019534937A (ja) 2016-09-27 2017-06-21 坩堝、蒸着装置及び蒸着システム

Country Status (4)

Country Link
US (1) US20180298487A1 (enExample)
JP (1) JP2019534937A (enExample)
CN (1) CN106191785B (enExample)
WO (1) WO2018059019A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106191785B (zh) * 2016-09-27 2018-09-18 京东方科技集团股份有限公司 坩埚、蒸镀装置及蒸镀系统
CN109722633B (zh) * 2017-10-31 2021-07-06 上海和辉光电股份有限公司 一种坩埚及蒸镀装置
CN109355628B (zh) * 2018-12-05 2020-01-21 深圳市华星光电技术有限公司 蒸镀坩埚

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2230792A (en) * 1989-04-21 1990-10-31 Secr Defence Multiple source physical vapour deposition.
US6237529B1 (en) * 2000-03-03 2001-05-29 Eastman Kodak Company Source for thermal physical vapor deposition of organic electroluminescent layers
CN102605194A (zh) * 2012-03-16 2012-07-25 葫芦岛锌业股份有限公司 一种真空蒸馏制备高纯锌的方法
CN203451609U (zh) * 2013-09-26 2014-02-26 京东方科技集团股份有限公司 一种蒸镀坩埚
CN203582959U (zh) * 2013-12-06 2014-05-07 京东方科技集团股份有限公司 一种蒸镀装置
JP6162625B2 (ja) * 2014-02-27 2017-07-12 株式会社日立製作所 結晶育成用るつぼおよびそれを備えた結晶育成装置ならびに結晶育成方法
CN104018122B (zh) * 2014-06-10 2016-04-20 京东方科技集团股份有限公司 一种收集装置
CN105755432B (zh) * 2016-04-13 2019-04-09 京东方科技集团股份有限公司 一种蒸镀罩和蒸镀设备
CN106191785B (zh) * 2016-09-27 2018-09-18 京东方科技集团股份有限公司 坩埚、蒸镀装置及蒸镀系统

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