CN106191785B - 坩埚、蒸镀装置及蒸镀系统 - Google Patents

坩埚、蒸镀装置及蒸镀系统 Download PDF

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Publication number
CN106191785B
CN106191785B CN201610850525.3A CN201610850525A CN106191785B CN 106191785 B CN106191785 B CN 106191785B CN 201610850525 A CN201610850525 A CN 201610850525A CN 106191785 B CN106191785 B CN 106191785B
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China
Prior art keywords
crucible
accommodating chamber
shape
heating
collector
Prior art date
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CN201610850525.3A
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English (en)
Chinese (zh)
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CN106191785A (zh
Inventor
张永峰
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Application filed by BOE Technology Group Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to CN201610850525.3A priority Critical patent/CN106191785B/zh
Publication of CN106191785A publication Critical patent/CN106191785A/zh
Priority to US15/580,123 priority patent/US20180298487A1/en
Priority to JP2017563294A priority patent/JP2019534937A/ja
Priority to PCT/CN2017/089355 priority patent/WO2018059019A1/zh
Application granted granted Critical
Publication of CN106191785B publication Critical patent/CN106191785B/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Crucibles And Fluidized-Bed Furnaces (AREA)
CN201610850525.3A 2016-09-27 2016-09-27 坩埚、蒸镀装置及蒸镀系统 Active CN106191785B (zh)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201610850525.3A CN106191785B (zh) 2016-09-27 2016-09-27 坩埚、蒸镀装置及蒸镀系统
US15/580,123 US20180298487A1 (en) 2016-09-27 2017-06-21 Crucible, evaporation device and evaporation apparatus
JP2017563294A JP2019534937A (ja) 2016-09-27 2017-06-21 坩堝、蒸着装置及び蒸着システム
PCT/CN2017/089355 WO2018059019A1 (zh) 2016-09-27 2017-06-21 坩埚、蒸镀装置及蒸镀系统

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610850525.3A CN106191785B (zh) 2016-09-27 2016-09-27 坩埚、蒸镀装置及蒸镀系统

Publications (2)

Publication Number Publication Date
CN106191785A CN106191785A (zh) 2016-12-07
CN106191785B true CN106191785B (zh) 2018-09-18

Family

ID=57520791

Family Applications (1)

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CN201610850525.3A Active CN106191785B (zh) 2016-09-27 2016-09-27 坩埚、蒸镀装置及蒸镀系统

Country Status (4)

Country Link
US (1) US20180298487A1 (enExample)
JP (1) JP2019534937A (enExample)
CN (1) CN106191785B (enExample)
WO (1) WO2018059019A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106191785B (zh) * 2016-09-27 2018-09-18 京东方科技集团股份有限公司 坩埚、蒸镀装置及蒸镀系统
CN109722633B (zh) * 2017-10-31 2021-07-06 上海和辉光电股份有限公司 一种坩埚及蒸镀装置
CN109355628B (zh) * 2018-12-05 2020-01-21 深圳市华星光电技术有限公司 蒸镀坩埚

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2230792A (en) * 1989-04-21 1990-10-31 Secr Defence Multiple source physical vapour deposition.
US6237529B1 (en) * 2000-03-03 2001-05-29 Eastman Kodak Company Source for thermal physical vapor deposition of organic electroluminescent layers
CN102605194A (zh) * 2012-03-16 2012-07-25 葫芦岛锌业股份有限公司 一种真空蒸馏制备高纯锌的方法
CN203451609U (zh) * 2013-09-26 2014-02-26 京东方科技集团股份有限公司 一种蒸镀坩埚
CN203582959U (zh) * 2013-12-06 2014-05-07 京东方科技集团股份有限公司 一种蒸镀装置
JP6162625B2 (ja) * 2014-02-27 2017-07-12 株式会社日立製作所 結晶育成用るつぼおよびそれを備えた結晶育成装置ならびに結晶育成方法
CN104018122B (zh) * 2014-06-10 2016-04-20 京东方科技集团股份有限公司 一种收集装置
CN105755432B (zh) * 2016-04-13 2019-04-09 京东方科技集团股份有限公司 一种蒸镀罩和蒸镀设备
CN106191785B (zh) * 2016-09-27 2018-09-18 京东方科技集团股份有限公司 坩埚、蒸镀装置及蒸镀系统

Also Published As

Publication number Publication date
US20180298487A1 (en) 2018-10-18
CN106191785A (zh) 2016-12-07
WO2018059019A1 (zh) 2018-04-05
JP2019534937A (ja) 2019-12-05

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