JP2019533174A5 - - Google Patents

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Publication number
JP2019533174A5
JP2019533174A5 JP2019538717A JP2019538717A JP2019533174A5 JP 2019533174 A5 JP2019533174 A5 JP 2019533174A5 JP 2019538717 A JP2019538717 A JP 2019538717A JP 2019538717 A JP2019538717 A JP 2019538717A JP 2019533174 A5 JP2019533174 A5 JP 2019533174A5
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JP
Japan
Prior art keywords
matrix array
array sensor
relative positions
electromagnetic wave
diffraction element
Prior art date
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Application number
JP2019538717A
Other languages
English (en)
Japanese (ja)
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JP7373399B2 (ja
JP2019533174A (ja
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Priority claimed from FR1659411A external-priority patent/FR3057064B1/fr
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Publication of JP2019533174A publication Critical patent/JP2019533174A/ja
Publication of JP2019533174A5 publication Critical patent/JP2019533174A5/ja
Application granted granted Critical
Publication of JP7373399B2 publication Critical patent/JP7373399B2/ja
Active legal-status Critical Current
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JP2019538717A 2016-09-30 2017-09-28 高精細度で電磁波を解析するための方法および装置 Active JP7373399B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1659411 2016-09-30
FR1659411A FR3057064B1 (fr) 2016-09-30 2016-09-30 Procede et dispositif d'analyse d'une onde electromagnetique en haute definition
PCT/EP2017/074674 WO2018060359A1 (fr) 2016-09-30 2017-09-28 Procede et dispositif d'analyse d'une onde electromagnetique en haute definition

Publications (3)

Publication Number Publication Date
JP2019533174A JP2019533174A (ja) 2019-11-14
JP2019533174A5 true JP2019533174A5 (enExample) 2022-12-28
JP7373399B2 JP7373399B2 (ja) 2023-11-02

Family

ID=58347452

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019538717A Active JP7373399B2 (ja) 2016-09-30 2017-09-28 高精細度で電磁波を解析するための方法および装置

Country Status (8)

Country Link
US (1) US11029214B2 (enExample)
EP (1) EP3519784A1 (enExample)
JP (1) JP7373399B2 (enExample)
KR (1) KR102617662B1 (enExample)
CN (1) CN109844474B (enExample)
CA (1) CA3037110A1 (enExample)
FR (1) FR3057064B1 (enExample)
WO (1) WO2018060359A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110160663B (zh) * 2019-05-17 2020-12-04 中国科学院上海光学精密机械研究所 一种高分辨率的近场波前测量装置和测量方法
JPWO2024257517A1 (enExample) * 2023-06-12 2024-12-19

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG74157A1 (en) * 1998-07-27 2000-07-18 Matsushita Electric Industrial Co Ltd Method and apparatus for evaluating aberrations of optical element for use with optical device
JP4167778B2 (ja) 1998-07-27 2008-10-22 松下電器産業株式会社 光学要素の収差評価方法
FR2795175B1 (fr) 1999-06-17 2001-07-27 Onera (Off Nat Aerospatiale) Interferometre optique achromatique, du type a sensibilite continument reglable
US6304330B1 (en) * 1999-10-06 2001-10-16 Metrolaser, Inc. Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
WO2003087945A2 (de) 2002-04-15 2003-10-23 Carl Zeiss Smt Ag Interferometrische messvorrichtung und projektionsbelichtungsanlage mit derartiger messvorrichtung
JP2004264347A (ja) * 2003-02-06 2004-09-24 Sumitomo Electric Ind Ltd 回折型光学部品およびそれを用いたレーザ加工装置
US6897961B2 (en) * 2003-03-19 2005-05-24 The Boeing Company Heterodyne lateral grating interferometric encoder
US7919741B1 (en) * 2007-12-18 2011-04-05 Lockheed Martin Corporation Indirect wave front sensing
FR2930336B1 (fr) * 2008-04-22 2010-05-14 Onera (Off Nat Aerospatiale) Procede, reseau de phase et dispositif d'analyse de surface d'onde d'un faisceau de lumiere
US7889356B2 (en) 2008-12-09 2011-02-15 Zygo Corporation Two grating lateral shearing wavefront sensor
WO2010146503A1 (en) * 2009-06-16 2010-12-23 Koninklijke Philips Electronics N. V. Correction method for differential phase contrast imaging
JP2011142279A (ja) 2010-01-08 2011-07-21 Nikon Corp 波面収差計測方法及び装置、並びに露光方法及び装置
CN103097925B (zh) * 2010-08-06 2016-04-13 旭硝子株式会社 衍射光学元件和计测装置
UA110726C2 (uk) * 2011-07-15 2016-02-10 Ераме Внутрішня камера електролізера марганцю з отворами відводу катодних газів, відповідний електролізер та спосіб
JP2013214637A (ja) 2012-04-03 2013-10-17 Nikon Corp 波面計測方法及び装置、並びに露光方法及び装置
CN102878922B (zh) * 2012-09-12 2014-12-03 哈尔滨工程大学 基于分光棱镜的三窗口共光路干涉检测装置及检测方法
CN102954842B (zh) * 2012-10-30 2014-09-10 哈尔滨工程大学 基于同步载频移相的共光路干涉检测装置与方法
CN104316204B (zh) * 2014-06-23 2017-12-19 西安工业大学 一种高精度的变频干涉的四步相移标定方法
JP2016163072A (ja) 2015-02-26 2016-09-05 キヤノン株式会社 画像処理装置、撮像装置、画像処理装置の制御方法およびプログラム

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