FR3057064B1 - Procede et dispositif d'analyse d'une onde electromagnetique en haute definition - Google Patents

Procede et dispositif d'analyse d'une onde electromagnetique en haute definition Download PDF

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Publication number
FR3057064B1
FR3057064B1 FR1659411A FR1659411A FR3057064B1 FR 3057064 B1 FR3057064 B1 FR 3057064B1 FR 1659411 A FR1659411 A FR 1659411A FR 1659411 A FR1659411 A FR 1659411A FR 3057064 B1 FR3057064 B1 FR 3057064B1
Authority
FR
France
Prior art keywords
electromagnetic wave
analysis
diffracted
high definition
diffractive element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1659411A
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English (en)
French (fr)
Other versions
FR3057064A1 (fr
Inventor
Benoit Wattellier
Anais Saintoyant
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Phasics SAS
Original Assignee
Phasics SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1659411A priority Critical patent/FR3057064B1/fr
Application filed by Phasics SAS filed Critical Phasics SAS
Priority to PCT/EP2017/074674 priority patent/WO2018060359A1/fr
Priority to KR1020197009361A priority patent/KR102617662B1/ko
Priority to EP17781047.0A priority patent/EP3519784A1/fr
Priority to CA3037110A priority patent/CA3037110A1/fr
Priority to US16/334,906 priority patent/US11029214B2/en
Priority to CN201780060780.0A priority patent/CN109844474B/zh
Priority to JP2019538717A priority patent/JP7373399B2/ja
Publication of FR3057064A1 publication Critical patent/FR3057064A1/fr
Application granted granted Critical
Publication of FR3057064B1 publication Critical patent/FR3057064B1/fr
Active legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J9/0215—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods by shearing interferometric methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J2009/002—Wavefront phase distribution
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J2009/0249—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods with modulation
    • G01J2009/0253—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods with modulation of wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
FR1659411A 2016-09-30 2016-09-30 Procede et dispositif d'analyse d'une onde electromagnetique en haute definition Active FR3057064B1 (fr)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FR1659411A FR3057064B1 (fr) 2016-09-30 2016-09-30 Procede et dispositif d'analyse d'une onde electromagnetique en haute definition
KR1020197009361A KR102617662B1 (ko) 2016-09-30 2017-09-28 고화질로 전자기파를 분석하기 위한 방법 및 장치
EP17781047.0A EP3519784A1 (fr) 2016-09-30 2017-09-28 Procede et dispositif d'analyse d'une onde electromagnetique en haute definition
CA3037110A CA3037110A1 (fr) 2016-09-30 2017-09-28 Procede et dispositif d'analyse d'une onde electromagnetique en haute definition
PCT/EP2017/074674 WO2018060359A1 (fr) 2016-09-30 2017-09-28 Procede et dispositif d'analyse d'une onde electromagnetique en haute definition
US16/334,906 US11029214B2 (en) 2016-09-30 2017-09-28 Method and device for analysing an electromagnetic wave in high definition
CN201780060780.0A CN109844474B (zh) 2016-09-30 2017-09-28 用于分析高清晰度电磁波的方法和设备
JP2019538717A JP7373399B2 (ja) 2016-09-30 2017-09-28 高精細度で電磁波を解析するための方法および装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1659411 2016-09-30
FR1659411A FR3057064B1 (fr) 2016-09-30 2016-09-30 Procede et dispositif d'analyse d'une onde electromagnetique en haute definition

Publications (2)

Publication Number Publication Date
FR3057064A1 FR3057064A1 (fr) 2018-04-06
FR3057064B1 true FR3057064B1 (fr) 2021-04-23

Family

ID=58347452

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1659411A Active FR3057064B1 (fr) 2016-09-30 2016-09-30 Procede et dispositif d'analyse d'une onde electromagnetique en haute definition

Country Status (8)

Country Link
US (1) US11029214B2 (enExample)
EP (1) EP3519784A1 (enExample)
JP (1) JP7373399B2 (enExample)
KR (1) KR102617662B1 (enExample)
CN (1) CN109844474B (enExample)
CA (1) CA3037110A1 (enExample)
FR (1) FR3057064B1 (enExample)
WO (1) WO2018060359A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110160663B (zh) * 2019-05-17 2020-12-04 中国科学院上海光学精密机械研究所 一种高分辨率的近场波前测量装置和测量方法
JPWO2024257517A1 (enExample) * 2023-06-12 2024-12-19

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG74157A1 (en) * 1998-07-27 2000-07-18 Matsushita Electric Industrial Co Ltd Method and apparatus for evaluating aberrations of optical element for use with optical device
JP4167778B2 (ja) 1998-07-27 2008-10-22 松下電器産業株式会社 光学要素の収差評価方法
FR2795175B1 (fr) 1999-06-17 2001-07-27 Onera (Off Nat Aerospatiale) Interferometre optique achromatique, du type a sensibilite continument reglable
US6304330B1 (en) * 1999-10-06 2001-10-16 Metrolaser, Inc. Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
WO2003087945A2 (de) 2002-04-15 2003-10-23 Carl Zeiss Smt Ag Interferometrische messvorrichtung und projektionsbelichtungsanlage mit derartiger messvorrichtung
JP2004264347A (ja) * 2003-02-06 2004-09-24 Sumitomo Electric Ind Ltd 回折型光学部品およびそれを用いたレーザ加工装置
US6897961B2 (en) * 2003-03-19 2005-05-24 The Boeing Company Heterodyne lateral grating interferometric encoder
US7919741B1 (en) * 2007-12-18 2011-04-05 Lockheed Martin Corporation Indirect wave front sensing
FR2930336B1 (fr) * 2008-04-22 2010-05-14 Onera (Off Nat Aerospatiale) Procede, reseau de phase et dispositif d'analyse de surface d'onde d'un faisceau de lumiere
US7889356B2 (en) 2008-12-09 2011-02-15 Zygo Corporation Two grating lateral shearing wavefront sensor
WO2010146503A1 (en) * 2009-06-16 2010-12-23 Koninklijke Philips Electronics N. V. Correction method for differential phase contrast imaging
JP2011142279A (ja) 2010-01-08 2011-07-21 Nikon Corp 波面収差計測方法及び装置、並びに露光方法及び装置
CN103097925B (zh) * 2010-08-06 2016-04-13 旭硝子株式会社 衍射光学元件和计测装置
UA110726C2 (uk) * 2011-07-15 2016-02-10 Ераме Внутрішня камера електролізера марганцю з отворами відводу катодних газів, відповідний електролізер та спосіб
JP2013214637A (ja) 2012-04-03 2013-10-17 Nikon Corp 波面計測方法及び装置、並びに露光方法及び装置
CN102878922B (zh) * 2012-09-12 2014-12-03 哈尔滨工程大学 基于分光棱镜的三窗口共光路干涉检测装置及检测方法
CN102954842B (zh) * 2012-10-30 2014-09-10 哈尔滨工程大学 基于同步载频移相的共光路干涉检测装置与方法
CN104316204B (zh) * 2014-06-23 2017-12-19 西安工业大学 一种高精度的变频干涉的四步相移标定方法
JP2016163072A (ja) 2015-02-26 2016-09-05 キヤノン株式会社 画像処理装置、撮像装置、画像処理装置の制御方法およびプログラム

Also Published As

Publication number Publication date
KR20190053205A (ko) 2019-05-17
FR3057064A1 (fr) 2018-04-06
EP3519784A1 (fr) 2019-08-07
CN109844474B (zh) 2021-10-15
WO2018060359A1 (fr) 2018-04-05
US20190285481A1 (en) 2019-09-19
JP7373399B2 (ja) 2023-11-02
KR102617662B1 (ko) 2023-12-22
US11029214B2 (en) 2021-06-08
CN109844474A (zh) 2019-06-04
JP2019533174A (ja) 2019-11-14
CA3037110A1 (fr) 2018-04-05

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