KR102617662B1 - 고화질로 전자기파를 분석하기 위한 방법 및 장치 - Google Patents

고화질로 전자기파를 분석하기 위한 방법 및 장치 Download PDF

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KR102617662B1
KR102617662B1 KR1020197009361A KR20197009361A KR102617662B1 KR 102617662 B1 KR102617662 B1 KR 102617662B1 KR 1020197009361 A KR1020197009361 A KR 1020197009361A KR 20197009361 A KR20197009361 A KR 20197009361A KR 102617662 B1 KR102617662 B1 KR 102617662B1
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matrix
array sensor
relative positions
electromagnetic wave
diffractive element
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Korean (ko)
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KR20190053205A (ko
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베노아 와트엘리에
아나이스 생투아양
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페식스
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J9/0215—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods by shearing interferometric methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J2009/002—Wavefront phase distribution
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J2009/0249—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods with modulation
    • G01J2009/0253—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods with modulation of wavelength

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
KR1020197009361A 2016-09-30 2017-09-28 고화질로 전자기파를 분석하기 위한 방법 및 장치 Active KR102617662B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1659411 2016-09-30
FR1659411A FR3057064B1 (fr) 2016-09-30 2016-09-30 Procede et dispositif d'analyse d'une onde electromagnetique en haute definition
PCT/EP2017/074674 WO2018060359A1 (fr) 2016-09-30 2017-09-28 Procede et dispositif d'analyse d'une onde electromagnetique en haute definition

Publications (2)

Publication Number Publication Date
KR20190053205A KR20190053205A (ko) 2019-05-17
KR102617662B1 true KR102617662B1 (ko) 2023-12-22

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KR1020197009361A Active KR102617662B1 (ko) 2016-09-30 2017-09-28 고화질로 전자기파를 분석하기 위한 방법 및 장치

Country Status (8)

Country Link
US (1) US11029214B2 (enExample)
EP (1) EP3519784A1 (enExample)
JP (1) JP7373399B2 (enExample)
KR (1) KR102617662B1 (enExample)
CN (1) CN109844474B (enExample)
CA (1) CA3037110A1 (enExample)
FR (1) FR3057064B1 (enExample)
WO (1) WO2018060359A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110160663B (zh) * 2019-05-17 2020-12-04 中国科学院上海光学精密机械研究所 一种高分辨率的近场波前测量装置和测量方法
JPWO2024257517A1 (enExample) * 2023-06-12 2024-12-19

Citations (2)

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JP2000105168A (ja) * 1998-07-27 2000-04-11 Matsushita Electric Ind Co Ltd 光学装置用光学要素の収差を評価する方法及び装置
JP2013214637A (ja) 2012-04-03 2013-10-17 Nikon Corp 波面計測方法及び装置、並びに露光方法及び装置

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SG74157A1 (en) * 1998-07-27 2000-07-18 Matsushita Electric Industrial Co Ltd Method and apparatus for evaluating aberrations of optical element for use with optical device
FR2795175B1 (fr) 1999-06-17 2001-07-27 Onera (Off Nat Aerospatiale) Interferometre optique achromatique, du type a sensibilite continument reglable
US6304330B1 (en) * 1999-10-06 2001-10-16 Metrolaser, Inc. Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
WO2003087945A2 (de) 2002-04-15 2003-10-23 Carl Zeiss Smt Ag Interferometrische messvorrichtung und projektionsbelichtungsanlage mit derartiger messvorrichtung
JP2004264347A (ja) * 2003-02-06 2004-09-24 Sumitomo Electric Ind Ltd 回折型光学部品およびそれを用いたレーザ加工装置
US6897961B2 (en) * 2003-03-19 2005-05-24 The Boeing Company Heterodyne lateral grating interferometric encoder
US7919741B1 (en) * 2007-12-18 2011-04-05 Lockheed Martin Corporation Indirect wave front sensing
FR2930336B1 (fr) * 2008-04-22 2010-05-14 Onera (Off Nat Aerospatiale) Procede, reseau de phase et dispositif d'analyse de surface d'onde d'un faisceau de lumiere
US7889356B2 (en) 2008-12-09 2011-02-15 Zygo Corporation Two grating lateral shearing wavefront sensor
WO2010146503A1 (en) * 2009-06-16 2010-12-23 Koninklijke Philips Electronics N. V. Correction method for differential phase contrast imaging
JP2011142279A (ja) 2010-01-08 2011-07-21 Nikon Corp 波面収差計測方法及び装置、並びに露光方法及び装置
CN103097925B (zh) * 2010-08-06 2016-04-13 旭硝子株式会社 衍射光学元件和计测装置
UA110726C2 (uk) * 2011-07-15 2016-02-10 Ераме Внутрішня камера електролізера марганцю з отворами відводу катодних газів, відповідний електролізер та спосіб
CN102878922B (zh) * 2012-09-12 2014-12-03 哈尔滨工程大学 基于分光棱镜的三窗口共光路干涉检测装置及检测方法
CN102954842B (zh) * 2012-10-30 2014-09-10 哈尔滨工程大学 基于同步载频移相的共光路干涉检测装置与方法
CN104316204B (zh) * 2014-06-23 2017-12-19 西安工业大学 一种高精度的变频干涉的四步相移标定方法
JP2016163072A (ja) 2015-02-26 2016-09-05 キヤノン株式会社 画像処理装置、撮像装置、画像処理装置の制御方法およびプログラム

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000105168A (ja) * 1998-07-27 2000-04-11 Matsushita Electric Ind Co Ltd 光学装置用光学要素の収差を評価する方法及び装置
JP2013214637A (ja) 2012-04-03 2013-10-17 Nikon Corp 波面計測方法及び装置、並びに露光方法及び装置

Also Published As

Publication number Publication date
KR20190053205A (ko) 2019-05-17
FR3057064A1 (fr) 2018-04-06
EP3519784A1 (fr) 2019-08-07
CN109844474B (zh) 2021-10-15
WO2018060359A1 (fr) 2018-04-05
US20190285481A1 (en) 2019-09-19
JP7373399B2 (ja) 2023-11-02
US11029214B2 (en) 2021-06-08
CN109844474A (zh) 2019-06-04
JP2019533174A (ja) 2019-11-14
CA3037110A1 (fr) 2018-04-05
FR3057064B1 (fr) 2021-04-23

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