JP2019519518A - オキシムエステル誘導体化合物、それを含む光重合開始剤及び感光性組成物 - Google Patents

オキシムエステル誘導体化合物、それを含む光重合開始剤及び感光性組成物 Download PDF

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Publication number
JP2019519518A
JP2019519518A JP2018560869A JP2018560869A JP2019519518A JP 2019519518 A JP2019519518 A JP 2019519518A JP 2018560869 A JP2018560869 A JP 2018560869A JP 2018560869 A JP2018560869 A JP 2018560869A JP 2019519518 A JP2019519518 A JP 2019519518A
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JP
Japan
Prior art keywords
photosensitive composition
hydroxy
butyl
oxime ester
ester derivative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018560869A
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English (en)
Japanese (ja)
Inventor
リ，ウォンジュン
オ，チュンリム
リ，デクラク
リ，ジェフン
チョ，ヨンイル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samyang Corp
Original Assignee
Samyang Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samyang Corp filed Critical Samyang Corp
Priority claimed from PCT/KR2017/005250 external-priority patent/WO2017200354A1/ko
Publication of JP2019519518A publication Critical patent/JP2019519518A/ja
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D279/00—Heterocyclic compounds containing six-membered rings having one nitrogen atom and one sulfur atom as the only ring hetero atoms
    • C07D279/10—1,4-Thiazines; Hydrogenated 1,4-thiazines
    • C07D279/14—1,4-Thiazines; Hydrogenated 1,4-thiazines condensed with carbocyclic rings or ring systems
    • C07D279/18—[b, e]-condensed with two six-membered rings
    • C07D279/22—[b, e]-condensed with two six-membered rings with carbon atoms directly attached to the ring nitrogen atom
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Nitrogen- Or Sulfur-Containing Heterocyclic Ring Compounds With Rings Of Six Or More Members (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
JP2018560869A 2016-05-19 2017-05-19 オキシムエステル誘導体化合物、それを含む光重合開始剤及び感光性組成物 Pending JP2019519518A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
KR20160061649 2016-05-19
KR10-2016-0061649 2016-05-19
KR10-2017-0054677 2017-04-27
KR1020170054677A KR101892086B1 (ko) 2016-05-19 2017-04-27 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물
PCT/KR2017/005250 WO2017200354A1 (ko) 2016-05-19 2017-05-19 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물

Related Child Applications (1)

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JP2020159106A Division JP7002617B2 (ja) 2016-05-19 2020-09-23 オキシムエステル誘導体化合物、それを含む光重合開始剤及び感光性組成物

Publications (1)

Publication Number Publication Date
JP2019519518A true JP2019519518A (ja) 2019-07-11

Family

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JP2018560869A Pending JP2019519518A (ja) 2016-05-19 2017-05-19 オキシムエステル誘導体化合物、それを含む光重合開始剤及び感光性組成物
JP2020159106A Active JP7002617B2 (ja) 2016-05-19 2020-09-23 オキシムエステル誘導体化合物、それを含む光重合開始剤及び感光性組成物

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Country Status (4)

Country Link
JP (2) JP2019519518A (https=)
KR (1) KR101892086B1 (https=)
CN (1) CN109153658B (https=)
TW (1) TWI644903B (https=)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021123631A (ja) * 2020-02-04 2021-08-30 アジア原紙株式会社 活性エネルギー線硬化型組成物
JP7219378B1 (ja) 2021-12-09 2023-02-08 東洋インキＳｃホールディングス株式会社 感光性着色組成物、光学フィルタ、画像表示装置、及び固体撮像素子
JP7397269B1 (ja) 2022-10-28 2023-12-13 東洋インキＳｃホールディングス株式会社 感光性組成物、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
JP7448757B1 (ja) 2022-10-27 2024-03-13 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
JP2024049908A (ja) * 2022-09-29 2024-04-10 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
WO2025011754A1 (en) 2023-07-10 2025-01-16 Basf Se Photocurable as well as thermally curable compositions suitable for low temperature curing
KR20250128958A (ko) 2022-12-26 2025-08-28 미쯔비시 케미컬 주식회사 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 컬러 필터, 화상 표시 장치, 및 경화물의 형성 방법

Families Citing this family (4)

* Cited by examiner, † Cited by third party
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KR102029733B1 (ko) * 2018-08-23 2019-10-08 주식회사 삼양사 감광성 수지 조성물
KR102547857B1 (ko) * 2020-12-31 2023-06-28 (주)켐이 페노티아진 화합물, 이를 포함하는 광중합 개시제 및 이를 포함하는 전자재료용 조성물
CN115109028B (zh) * 2022-08-29 2023-06-02 安庆师范大学 一种肟脂化合物及其制备方法及应用
CN119241469B (zh) * 2024-09-29 2025-08-15 武汉尚赛光电科技有限公司 一种光引发剂、光聚合组合物及其应用

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JP2008037930A (ja) * 2006-08-02 2008-02-21 Toyo Ink Mfg Co Ltd 光硬化型インクジェットインキ
JP2011252945A (ja) * 2010-05-31 2011-12-15 Fujifilm Corp 重合性組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、および固体撮像素子
KR20120009736A (ko) * 2010-07-21 2012-02-02 주식회사 엘지화학 광중합 개시제 및 이를 이용한 감광성 수지 조성물
WO2012132558A1 (ja) * 2011-03-25 2012-10-04 株式会社Adeka オキシムエステル化合物及び該化合物を含有する光重合開始剤
KR20130051320A (ko) * 2011-11-09 2013-05-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
JP2013142087A (ja) * 2012-01-12 2013-07-22 Hunet Plus Co Ltd 高感度オキシムエステル光重合開始剤及びこの化合物を含む光重合組成物
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WO2016008384A1 (zh) * 2014-07-15 2016-01-21 常州强力电子新材料股份有限公司 含肟酯类光引发剂的感光性组合物及其应用

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JP2008037930A (ja) * 2006-08-02 2008-02-21 Toyo Ink Mfg Co Ltd 光硬化型インクジェットインキ
JP2011252945A (ja) * 2010-05-31 2011-12-15 Fujifilm Corp 重合性組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、および固体撮像素子
KR20120009736A (ko) * 2010-07-21 2012-02-02 주식회사 엘지화학 광중합 개시제 및 이를 이용한 감광성 수지 조성물
WO2012132558A1 (ja) * 2011-03-25 2012-10-04 株式会社Adeka オキシムエステル化合物及び該化合物を含有する光重合開始剤
KR20130051320A (ko) * 2011-11-09 2013-05-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
JP2013142087A (ja) * 2012-01-12 2013-07-22 Hunet Plus Co Ltd 高感度オキシムエステル光重合開始剤及びこの化合物を含む光重合組成物
WO2015139601A1 (zh) * 2014-03-18 2015-09-24 常州强力先端电子材料有限公司 一种双肟酯类光引发剂及其制备方法和应用
WO2016008384A1 (zh) * 2014-07-15 2016-01-21 常州强力电子新材料股份有限公司 含肟酯类光引发剂的感光性组合物及其应用

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021123631A (ja) * 2020-02-04 2021-08-30 アジア原紙株式会社 活性エネルギー線硬化型組成物
JP7217977B2 (ja) 2020-02-04 2023-02-06 アジア原紙株式会社 活性エネルギー線硬化型組成物
JP2023033460A (ja) * 2020-02-04 2023-03-10 アジア原紙株式会社 活性エネルギー線硬化型組成物
JP7219378B1 (ja) 2021-12-09 2023-02-08 東洋インキＳｃホールディングス株式会社 感光性着色組成物、光学フィルタ、画像表示装置、及び固体撮像素子
JP2023085600A (ja) * 2021-12-09 2023-06-21 東洋インキＳｃホールディングス株式会社 感光性着色組成物、光学フィルタ、画像表示装置、及び固体撮像素子
JP2024049908A (ja) * 2022-09-29 2024-04-10 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
JP7448757B1 (ja) 2022-10-27 2024-03-13 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
JP2024063827A (ja) * 2022-10-27 2024-05-14 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
JP7397269B1 (ja) 2022-10-28 2023-12-13 東洋インキＳｃホールディングス株式会社 感光性組成物、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
JP2024064376A (ja) * 2022-10-28 2024-05-14 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
KR20250128958A (ko) 2022-12-26 2025-08-28 미쯔비시 케미컬 주식회사 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 컬러 필터, 화상 표시 장치, 및 경화물의 형성 방법
WO2025011754A1 (en) 2023-07-10 2025-01-16 Basf Se Photocurable as well as thermally curable compositions suitable for low temperature curing

Also Published As

Publication number Publication date
JP7002617B2 (ja) 2022-01-20
TWI644903B (zh) 2018-12-21
TW201808925A (zh) 2018-03-16
CN109153658A (zh) 2019-01-04
KR101892086B1 (ko) 2018-08-27
KR20170131218A (ko) 2017-11-29
CN109153658B (zh) 2022-11-22
JP2021011486A (ja) 2021-02-04

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