CN109153658B - 肟酯衍生化合物、包含其的光聚合引发剂和感光性组合物 - Google Patents

肟酯衍生化合物、包含其的光聚合引发剂和感光性组合物 Download PDF

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Publication number
CN109153658B
CN109153658B CN201780030503.5A CN201780030503A CN109153658B CN 109153658 B CN109153658 B CN 109153658B CN 201780030503 A CN201780030503 A CN 201780030503A CN 109153658 B CN109153658 B CN 109153658B
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China
Prior art keywords
photosensitive composition
alkyl
oxime ester
ester derivative
hydroxy
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CN201780030503.5A
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English (en)
Chinese (zh)
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CN109153658A (zh
Inventor
李元重
吴泉林
李得洛
李栽训
赵镛一
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Samyang Corp
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Samyang Corp
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Priority claimed from PCT/KR2017/005250 external-priority patent/WO2017200354A1/ko
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D279/00—Heterocyclic compounds containing six-membered rings having one nitrogen atom and one sulfur atom as the only ring hetero atoms
    • C07D279/10—1,4-Thiazines; Hydrogenated 1,4-thiazines
    • C07D279/14—1,4-Thiazines; Hydrogenated 1,4-thiazines condensed with carbocyclic rings or ring systems
    • C07D279/18—[b, e]-condensed with two six-membered rings
    • C07D279/22—[b, e]-condensed with two six-membered rings with carbon atoms directly attached to the ring nitrogen atom
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Nitrogen- Or Sulfur-Containing Heterocyclic Ring Compounds With Rings Of Six Or More Members (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
CN201780030503.5A 2016-05-19 2017-05-19 肟酯衍生化合物、包含其的光聚合引发剂和感光性组合物 Active CN109153658B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
KR20160061649 2016-05-19
KR10-2016-0061649 2016-05-19
KR10-2017-0054677 2017-04-27
KR1020170054677A KR101892086B1 (ko) 2016-05-19 2017-04-27 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물
PCT/KR2017/005250 WO2017200354A1 (ko) 2016-05-19 2017-05-19 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물

Publications (2)

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CN109153658A CN109153658A (zh) 2019-01-04
CN109153658B true CN109153658B (zh) 2022-11-22

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JP (2) JP2019519518A (https=)
KR (1) KR101892086B1 (https=)
CN (1) CN109153658B (https=)
TW (1) TWI644903B (https=)

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KR102029733B1 (ko) * 2018-08-23 2019-10-08 주식회사 삼양사 감광성 수지 조성물
JP7217977B2 (ja) * 2020-02-04 2023-02-06 アジア原紙株式会社 活性エネルギー線硬化型組成物
KR102547857B1 (ko) * 2020-12-31 2023-06-28 (주)켐이 페노티아진 화합물, 이를 포함하는 광중합 개시제 및 이를 포함하는 전자재료용 조성물
JP7219378B1 (ja) 2021-12-09 2023-02-08 東洋インキＳｃホールディングス株式会社 感光性着色組成物、光学フィルタ、画像表示装置、及び固体撮像素子
CN115109028B (zh) * 2022-08-29 2023-06-02 安庆师范大学 一种肟脂化合物及其制备方法及应用
JP2024049908A (ja) * 2022-09-29 2024-04-10 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
JP7448757B1 (ja) 2022-10-27 2024-03-13 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
JP7397269B1 (ja) 2022-10-28 2023-12-13 東洋インキＳｃホールディングス株式会社 感光性組成物、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
WO2024143067A1 (ja) 2022-12-26 2024-07-04 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、隔壁、有機電界発光素子、カラーフィルター、画像表示装置、及び硬化物の形成方法
KR20260035964A (ko) 2023-07-10 2026-03-13 바스프 에스이 저온 경화에 적합한 광경화성 및 열 경화성 조성물
CN119241469B (zh) * 2024-09-29 2025-08-15 武汉尚赛光电科技有限公司 一种光引发剂、光聚合组合物及其应用

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Also Published As

Publication number Publication date
JP7002617B2 (ja) 2022-01-20
TWI644903B (zh) 2018-12-21
TW201808925A (zh) 2018-03-16
CN109153658A (zh) 2019-01-04
KR101892086B1 (ko) 2018-08-27
KR20170131218A (ko) 2017-11-29
JP2019519518A (ja) 2019-07-11
JP2021011486A (ja) 2021-02-04

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