CN104698753B - 负性光敏性树脂组合物 - Google Patents
负性光敏性树脂组合物 Download PDFInfo
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- CN104698753B CN104698753B CN201410748626.0A CN201410748626A CN104698753B CN 104698753 B CN104698753 B CN 104698753B CN 201410748626 A CN201410748626 A CN 201410748626A CN 104698753 B CN104698753 B CN 104698753B
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- photosensitive resin
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- meth
- acrylate
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- 239000011342 resin composition Substances 0.000 title claims abstract description 48
- 150000001875 compounds Chemical class 0.000 claims abstract description 33
- 239000000203 mixture Substances 0.000 claims abstract description 26
- 229920001577 copolymer Polymers 0.000 claims abstract description 23
- 239000000178 monomer Substances 0.000 claims abstract description 15
- 239000003999 initiator Substances 0.000 claims abstract description 12
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 11
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 10
- 125000002723 alicyclic group Chemical group 0.000 claims abstract description 9
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 claims abstract description 9
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims abstract description 7
- 239000002904 solvent Substances 0.000 claims description 20
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 125000004122 cyclic group Chemical group 0.000 claims description 6
- FYYIUODUDSPAJQ-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 2-methylprop-2-enoate Chemical compound C1C(COC(=O)C(=C)C)CCC2OC21 FYYIUODUDSPAJQ-UHFFFAOYSA-N 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000002947 alkylene group Chemical group 0.000 claims description 3
- 150000002431 hydrogen Chemical class 0.000 claims description 3
- DPTGFYXXFXSRIR-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl prop-2-enoate Chemical compound C1C(COC(=O)C=C)CCC2OC21 DPTGFYXXFXSRIR-UHFFFAOYSA-N 0.000 claims description 2
- 230000014759 maintenance of location Effects 0.000 abstract description 14
- 239000000758 substrate Substances 0.000 abstract description 10
- 238000001029 thermal curing Methods 0.000 abstract description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 63
- -1 2-phenoxyethyl Chemical group 0.000 description 46
- 239000010408 film Substances 0.000 description 42
- 239000004094 surface-active agent Substances 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 6
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 238000013007 heat curing Methods 0.000 description 5
- 239000003505 polymerization initiator Substances 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 3
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- HSLFISVKRDQEBY-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)cyclohexane Chemical compound CC(C)(C)OOC1(OOC(C)(C)C)CCCCC1 HSLFISVKRDQEBY-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- LGJCFVYMIJLQJO-UHFFFAOYSA-N 1-dodecylperoxydodecane Chemical compound CCCCCCCCCCCCOOCCCCCCCCCCCC LGJCFVYMIJLQJO-UHFFFAOYSA-N 0.000 description 2
- BVQVLAIMHVDZEL-UHFFFAOYSA-N 1-phenyl-1,2-propanedione Chemical compound CC(=O)C(=O)C1=CC=CC=C1 BVQVLAIMHVDZEL-UHFFFAOYSA-N 0.000 description 2
- FZXRXKLUIMKDEL-UHFFFAOYSA-N 2-Methylpropyl propanoate Chemical compound CCC(=O)OCC(C)C FZXRXKLUIMKDEL-UHFFFAOYSA-N 0.000 description 2
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 2
- PTJWCLYPVFJWMP-UHFFFAOYSA-N 2-[[3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)COCC(CO)(CO)CO PTJWCLYPVFJWMP-UHFFFAOYSA-N 0.000 description 2
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- SEEVRZDUPHZSOX-WPWMEQJKSA-N [(e)-1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]ethylideneamino] acetate Chemical compound C=1C=C2N(CC)C3=CC=C(C(\C)=N\OC(C)=O)C=C3C2=CC=1C(=O)C1=CC=CC=C1C SEEVRZDUPHZSOX-WPWMEQJKSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 2
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- HGXJDMCMYLEZMJ-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOOC(=O)C(C)(C)C HGXJDMCMYLEZMJ-UHFFFAOYSA-N 0.000 description 1
- 229920003122 (meth)acrylate-based copolymer Polymers 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- VPBZZPOGZPKYKX-UHFFFAOYSA-N 1,2-diethoxypropane Chemical compound CCOCC(C)OCC VPBZZPOGZPKYKX-UHFFFAOYSA-N 0.000 description 1
- GJZFGDYLJLCGHT-UHFFFAOYSA-N 1,2-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(CC)C(CC)=CC=C3SC2=C1 GJZFGDYLJLCGHT-UHFFFAOYSA-N 0.000 description 1
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 1
- QWQFVUQPHUKAMY-UHFFFAOYSA-N 1,2-diphenyl-2-propoxyethanone Chemical compound C=1C=CC=CC=1C(OCCC)C(=O)C1=CC=CC=C1 QWQFVUQPHUKAMY-UHFFFAOYSA-N 0.000 description 1
- PVMMVWNXKOSPRB-UHFFFAOYSA-N 1,2-dipropoxypropane Chemical compound CCCOCC(C)OCCC PVMMVWNXKOSPRB-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- ZCCAOOJIWMTVGN-UHFFFAOYSA-N 1,6-diisocyanatohexane;[2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound O=C=NCCCCCCN=C=O.C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C ZCCAOOJIWMTVGN-UHFFFAOYSA-N 0.000 description 1
- QMGJMGFZLXYHCR-UHFFFAOYSA-N 1-(2-butoxypropoxy)butane Chemical compound CCCCOCC(C)OCCCC QMGJMGFZLXYHCR-UHFFFAOYSA-N 0.000 description 1
- FPZQYYXSOJSITC-UHFFFAOYSA-N 1-(4-chlorophenyl)pyrrole-2,5-dione Chemical compound C1=CC(Cl)=CC=C1N1C(=O)C=CC1=O FPZQYYXSOJSITC-UHFFFAOYSA-N 0.000 description 1
- BLLFPKZTBLMEFG-UHFFFAOYSA-N 1-(4-hydroxyphenyl)pyrrole-2,5-dione Chemical compound C1=CC(O)=CC=C1N1C(=O)C=CC1=O BLLFPKZTBLMEFG-UHFFFAOYSA-N 0.000 description 1
- HUDYANRNMZDQGA-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]ethanone Chemical compound CN(C)C1=CC=C(C(C)=O)C=C1 HUDYANRNMZDQGA-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 1
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 1
- VTRZMLZNHGCYLK-UHFFFAOYSA-N 1-ethenyl-2-(methoxymethyl)benzene Chemical compound COCC1=CC=CC=C1C=C VTRZMLZNHGCYLK-UHFFFAOYSA-N 0.000 description 1
- HDEWQSUXJCDXIX-UHFFFAOYSA-N 1-ethenyl-3-(methoxymethyl)benzene Chemical compound COCC1=CC=CC(C=C)=C1 HDEWQSUXJCDXIX-UHFFFAOYSA-N 0.000 description 1
- XVXKXOPCFWAOLN-UHFFFAOYSA-N 1-ethenyl-4-(methoxymethyl)benzene Chemical compound COCC1=CC=C(C=C)C=C1 XVXKXOPCFWAOLN-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- HLIQLHSBZXDKLV-UHFFFAOYSA-N 2-(2-hydroxyethoxy)-1-phenoxyethanol Chemical compound OCCOCC(O)OC1=CC=CC=C1 HLIQLHSBZXDKLV-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- SZTBMYHIYNGYIA-UHFFFAOYSA-N 2-chloroacrylic acid Chemical compound OC(=O)C(Cl)=C SZTBMYHIYNGYIA-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
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Abstract
本文批露了一种负性光敏性树脂组合物,其包括(A)共聚物,该共聚物包括(a1)衍生自烯键式不饱和羧酸,烯键式不饱和羧酸酸酐,或其混合物的结构单元,(a2)衍生自具有脂环族环氧基团的不饱和单体的结构单元,和(a3)衍生自烯键式不饱和化合物的结构单元,其不同于结构单元(a1)和(a2);(B)可聚合的不饱和化合物;(C)光聚合引发剂;和(D)具有通式(I)的硅烷偶联剂。所述光敏性树脂组合物可提供固化的膜,其在热固化步骤之后具有优异的保留率和改善的半色调边缘和分辨率,因为当在半色调图案中形成时,它具有优异的与基片的粘附,这可用作用于OLED和LCD的绝缘膜。
Description
技术领域
本发明涉及负性光敏性树脂组合物,具体来说,涉及负性光敏性树脂组合物,该光敏性树脂组合物用于形成用于有机发光二极管(OLED)和液晶显示器(LCD)的薄膜晶体管(TFT)阵列的中间层绝缘膜。
背景技术
正性和负性光敏性树脂组合物用于制造绝缘膜,其用于各种显示设备包括LCD、OLED等。
包含碱性-可溶树脂(或共聚物)和1,2-醌二叠氮化物(1,2-quinonediazide)化合物的常规正性树脂常常遭受褪色的问题,这是曝光之时、显影后烘烤或吸收了短波长的光例如UV射线造成的,这还可能产生导致在LCD中有不利残像(afterimage)的杂质。
因此,已通过提供负性光敏性树脂组合物来进行匡正这些问题的尝试,其形成在热固化步骤之后具有优异的透光率和敏感性的固化的膜。提出将包括碱性-可溶树脂的光敏性树脂组合物用作用于显示设备例如TFT LCD的有机绝缘膜,该树脂组合物包括衍生自(甲基)丙烯酸缩水甘油基酯和/或含脂环族环氧基团的不饱和化合物的结构单元(参见,韩国特许公开专利(Korean Laid-Open Patent Publication)2010-0099048和2012-0029319)。
尽管由这些常规的光敏性树脂组合物形成的固化的膜具有优异的透射率,但当在半色调图案中制备时,难以保持半色调边缘和它的分辨率,因为它和基片的粘附不足。
发明内容
因此,本发明的目的之一是提供负性光敏性树脂组合物以用于绝缘膜,其在热固化步骤之后具有优异的保留率以及改善的半色调边缘(half-tonemargin)和分辨率,因为当在半色调图案中制备时,它具有优异的与基片的粘附。
根据本发明的一方面,提供了光敏性树脂组合物,其包括:
(A)共聚物,其包括(a1)衍生自烯键式不饱和羧酸,烯键式不饱和羧酸酸酐,或其混合物的结构单元,(a2)衍生自具有脂环族环氧基团的不饱和单体的结构单元,和(a3)衍生自烯键式不饱和化合物的结构单元,其不同于结构单元(a1)和(a2);
(B)可聚合的不饱和化合物;
(C)光聚合引发剂;和
(D)硅烷偶联剂,其具有通式(I):
其中
R1各自独立地是氢、或直链、支链或环状C1-6烷基或C1-6烷氧基;
X,Y和Z各自独立地是直链、支链或环状C1-6烷基;和
n和a各自独立地为1-5的整数。
根据本发明的光敏性树脂组合物可提供固化的膜,其在热固化步骤之后具有优异的保留率和改善的半色调边缘和分辨率,因为当在半色调图案中制备时,它具有优异的与基片的粘附,这可用作用于OLED和LCD的绝缘膜。
具体实施方式
本发明的光敏性树脂组合物包括(A)共聚物,其包括(a1)衍生自烯键式不饱和羧酸,烯键式不饱和羧酸酸酐,或其混合物的结构单元,(a2)衍生自具有脂环族环氧基团的不饱和单体的结构单元,和(a3)衍生自烯键式不饱和化合物的结构单元,其不同于结构单元(a1)和(a2);(B)可聚合的不饱和化合物;(C)光聚合引发剂;和(D)硅烷偶联剂,其具有通式(I),和还可包括(E)表面活性剂和/或(F)溶剂,如有需要。
下面将更详细地描述本发明的技术特征。
(A)共聚物
本发明所用的共聚物包括(a1)衍生自烯键式不饱和羧酸,烯键式不饱和羧酸酸酐,或其混合物的结构单元,(a2)衍生自具有脂环族环氧基团的不饱和单体的结构单元,和(a3)衍生自烯键式不饱和化合物的结构单元,其不同于结构单元(a1)和(a2)。
(a1)衍生自烯键式不饱和羧酸,烯键式不饱和羧酸酸酐,或其混合物的结构单元
在本发明中,结构单元(a1)衍生自烯键式不饱和羧酸,烯键式不饱和羧酸酸酐,或其混合物。烯键式不饱和羧酸,烯键式不饱和羧酸酸酐是在分子中具有至少一个羧基的可聚合的不饱和单体。它们的示例不饱和一元羧酸例如(甲基)丙烯酸、巴豆酸、α-氯代丙烯酸、肉桂酸等;不饱和二元羧酸及其酸酐如顺丁烯二酸、顺丁烯二酸酐、反丁烯二酸、衣康酸、衣康酸酸酐、柠康酸酸酐、中康酸等;大于或等于三价的不饱和多元羧酸及其酸酐;以及大于或等于二价的多元羧酸的单[(甲基)丙烯酰氧基乙基]酯,例如琥珀酸单[2-(甲基)丙烯酰氧基乙基]酯和邻苯二甲酸单[2-(甲基)丙烯酰氧基乙基]酯等,但不限于此。衍生自上述示例化合物的单元可以单一化合物或者两种或两种以上的组合存在于共聚物中。就显影能力而言,(甲基)丙烯酸是优选的。
以构成共聚物的结构单元的总摩尔数为基准计,衍生自烯键式不饱和羧酸,烯键式不饱和羧酸酸酐,或其混合物的结构单元(a1)的量可为5-50摩尔%,优选地10-40摩尔%。在该量的范围内,树脂组合物易于形成具有良好显影能力的图案化的膜。
在本发明中,“(甲基)丙烯酰基”指“丙烯酰基”和/或“甲基丙烯酸酰基,”且“(甲基)丙烯酸酯”指“丙烯酸酯”和/或“甲基丙烯酸酯”。
(a2)衍生自具有脂环族环氧基团的不饱和单体的结构单元
在本发明中,结构单元(a2)衍生自具有脂环族环氧基团的不饱和单体,所述单体由通式(II)表示:
其中
R3是氢或C1-C4烷基;和
R2是C1-C4亚烷基。
优选地,在通式(II)中,R3是氢或甲基,具有脂环族环氧基团的不饱和单体可为丙烯酸3,4-环氧环己基甲基酯或者甲基丙烯酸3,4-环氧环己基甲基酯。
以构成共聚物的结构单元的总摩尔数为基准计,结构单元(a2)的量可为10-50摩尔%,优选地,15-45摩尔%。在该量范围内,组合物可具有良好的储存稳定性,且形成具有改善保留率的固化膜。
(a3)衍生自烯键式不饱和化合物的结构单元,其不同于结构单元(a1)和(a2)
在本发明中,结构单元(a3)衍生自烯键式不饱和化合物,其不同于结构单元(a1)和(a2)。它们的示例可包括含芳香环的烯键式不饱和化合物,例如(甲基)丙烯酸苯基酯,(甲基)丙烯酸苄基酯,(甲基)丙烯酸2-苯氧基乙基酯,(甲基)丙烯酸苯氧基二乙二醇酯,(甲基)丙烯酸对壬基苯氧基聚乙二醇酯,(甲基)丙烯酸对壬基苯氧基聚丙二醇酯,(甲基)丙烯酸三溴代苯基酯,苯乙烯,甲基苯乙烯,二甲基苯乙烯,三甲基苯乙烯,乙基苯乙烯,二乙基苯乙烯,三乙基苯乙烯,丙基苯乙烯,丁基苯乙烯,己基苯乙烯,庚基苯乙烯,辛基苯乙烯,氟代苯乙烯,氯代苯乙烯,溴代苯乙烯,碘代苯乙烯,甲氧基苯乙烯,乙氧基苯乙烯,丙氧基苯乙烯,对羟基-α-甲基苯乙烯,乙酰基苯乙烯,乙烯基甲苯,二乙烯基苯,乙烯基苯酚,邻乙烯基苄基甲基醚,间乙烯基苄基甲基醚,对乙烯基苄基甲基醚;不饱和羧酸酯,例如(甲基)丙烯酸甲酯,(甲基)丙烯酸乙基酯,(甲基)丙烯酸丁基酯,(甲基)丙烯酸二甲基氨基乙基酯、(甲基)丙烯酸异丁基酯,(甲基)丙烯酸叔丁基酯,(甲基)丙烯酸环己基酯,(甲基)丙烯酸乙基己基酯,(甲基)丙烯酸四氢糠基酯,(甲基)丙烯酸羟基乙基酯,(甲基)丙烯酸2-羟基丙基酯,(甲基)丙烯酸2-羟基-3-氯代丙基酯,(甲基)丙烯酸4-羟基丁基酯,(甲基)丙烯酸丙三醇酯,α-羟基甲基丙烯酸甲酯,α-羟基甲基丙烯酸乙基酯,α-羟基甲基丙烯酸丙基酯,α-羟基甲基丙烯酸丁基酯,(甲基)丙烯酸2-甲氧基乙基酯,(甲基)丙烯酸3-甲氧基丁基酯,(甲基)丙烯酸乙氧基二乙二醇酯,(甲基)丙烯酸甲氧基三乙二醇酯,(甲基)丙烯酸甲氧基三丙二醇酯,(甲基)丙烯酸聚(乙二醇)甲基醚酯,(甲基)丙烯酸四氟代丙基酯,(甲基)丙烯酸1,1,1,3,3,3-六氟代异丙基酯,(甲基)丙烯酸八氟代戊基酯,十七氟代癸基(甲基)丙烯酸酯、(甲基)丙烯酸异冰片基酯,(甲基)丙烯酸环戊二烷基酯,(甲基)丙烯酸环戊二烯基酯,(甲基)丙烯酸环戊二烷基氧基乙基酯,(甲基)丙烯酸环戊二烯基氧基乙基酯,(甲基)丙烯酸缩水甘油基酯,3,4-环氧丁基(甲基)丙烯酸酯,(甲基)丙烯酸4,5-环氧戊基酯,(甲基)丙烯酸5,6-环氧己基酯和(甲基)丙烯酸6,7-环氧庚基酯;具有N-乙烯基的叔胺,例如N-乙烯基吡咯烷酮,N-乙烯基咔唑和N-乙烯基吗啉;不饱和醚,例如乙烯基甲基醚和乙烯基乙基醚;和N-苯基马来酰亚胺,N-(4-氯代苯基)马来酰亚胺,N-(4-羟基苯基)马来酰亚胺和N-环己基马来酰亚胺。衍生自上述示例化合物的结构单元可以单一化合物或者两种或两种以上的组合存在。
以构成共聚物的结构单元的总摩尔数为基准计,结构单元(a3)的量可为5-70摩尔%,优选地15-65摩尔%。在该量的范围内,组合物的涂覆能力将显著增强,因为容易控制碱性-可溶树脂的反应性,并增加树脂在水性碱性溶液中的溶解度。
本发明的共聚物可通过在反应器中加入分子量调节剂,聚合引发剂,溶剂和提供结构单元(a1)、(a2)和(a3)的各化合物,将氮气引入反应器并在缓慢搅拌下对混合物进行聚合来制备。当使用凝胶渗透色谱(GPC,洗脱剂:四氢呋喃)参比聚苯乙烯来测定时,这样制备的共聚物重均分子量(Mw)的范围是500-50,000,优选地3,000-30,000。在该范围内,组合物具有理想的与基片的粘附、物理和化学性质和粘度。
分子量调节剂可为硫醇例如丁基硫醇,辛基硫醇,月桂基硫醇等,或者α-甲基苯乙烯二聚体,但不限于此。
聚合引发剂可为偶氮化合物例如2,2'-偶氮二异丁腈,2,2'-偶氮二(2,4-二甲基戊腈),2,2'-偶氮二(4-甲氧基-2,4-二甲基戊腈)等,过氧化苯甲酰,月桂基过氧化物,过氧新戊酸叔丁酯或1,1-二(叔丁基过氧基)环己烷,但不限于此。上述示例化合物的聚合引发剂可单独使用,或者两种或两种以上组合使用。
此外,溶剂可以是任何在制造共聚物时常用的常规溶剂,优选地是3-甲氧基丙酸甲酯或者丙二醇单甲基醚乙酸酯(PGMEA)。
所用的共聚物的量可为1-90重量%,优选15-75重量%,以排除溶剂的光敏性树脂组合物的总重量为基准计。在该范围内,组合物将形成图案化的膜,其在显影之后具有良好的形状和改善的性质例如耐热性。
(B)可聚合的不饱和化合物;
本发明的可聚合的不饱和化合物可为通过聚合引发剂聚合的任意化合物,且可为具有至少一个烯键式不饱和双键的丙烯酸或甲基丙烯酸的单官能度或多官能度酯化合物。对于耐化学性而言,具有至少两个官能度的多官能度化合物是优选的。
可聚合的不饱和化合物可选自下组:二(甲基)丙烯酸乙二醇酯,二(甲基)丙烯酸丙二醇酯,二(甲基)丙烯酸二乙二醇酯,三乙二醇二(甲基)丙烯酸酯,二(甲基)丙烯酸1,6-己二醇酯,二(甲基)丙烯酸聚乙二醇酯,二(甲基)丙烯酸聚丙二醇酯,三(甲基)丙烯酸丙三醇酯,三(甲基)丙烯酸三羟甲基丙烷酯,三(甲基)丙烯酸季戊四醇酯,三(甲基)丙烯酸季戊四醇酯和琥珀酸的单酯,四(甲基)丙烯酸季戊四醇酯,五(甲基)丙烯酸二季戊四醇酯,六(甲基)丙烯酸二季戊四醇酯,三(甲基)丙烯酸二季戊四醇酯和琥珀酸的单酯,己内酯改性的六(甲基)丙烯酸二季戊四醇酯,季戊四醇三丙烯酸酯六亚甲基二异氰酸酯(季戊四醇三丙烯酸酯和六亚甲基异氰酸酯的反应物),七(甲基)丙烯酸三季戊四醇酯,八(甲基)丙烯酸三季戊四醇酯,环氧丙烯酸酯,双酚A环氧丙烯酸酯,双酚A二丙烯酸酯,2,2-二-4-丙烯酰氧基聚乙氧基苯基丙烷和乙二醇单甲醚丙烯酸酯,但不限于此。
除了上述示例以外,可聚合的单体可以是多官能度氨基甲酸酯丙烯酸酯化合物,其由具有直链亚烷基、脂环族结构和至少两种异氰酸酯基团的化合物,以及具有至少一种羟基、3,4或5个丙烯酰氧基和/或甲基丙烯酰氧基的化合物的反应来获得,但不限于此。
示例的市售可聚合的不饱和化合物可包括单官能度(甲基)丙烯酸酯,例如AronixM-101,M-111,M-114(由东亚合成有限公司(Toagosei Co.,Ltd.)制造),AKAYARAD TC-110S,TC-120S(由日本化药有限公司(Nippon Kayaku Co.,Ltd.)制造),V-158,V-2311(由大阪友希化药工业有限公司(Osaka Yuki Kayaku Kogyo Co.,Ltd.)制造)等;双官能度(甲基)丙烯酸酯,例如Aronix M-210,M-240,M-6200(由东亚合成有限公司(Toagosei Co.,Ltd.)制造),KAYARAD HDDA,HX-220,R-604(由日本化药有限公司(Nippon Kayaku Co.,Ltd.)制造),V260,V312,V335 HP(由大阪友希化药工业有限公司(Osaka Yuki KayakuKogyo Co.,Ltd.)制造)等;大于或等于三官能度(甲基)丙烯酸酯包括Aronix M-309,M-400,M-403,M-405,M-450,M-7100,M-8030,M-8060,TO-1382(由东亚合成有限公司(Toagosei Co.,Ltd.)制造),KAYARAD TMPTA,DPHA,DPHA-40H,DPCA-20,DPCA-30,DPCA-60,DPCA-120(由日本化药有限公司(Nippon Kayaku Co.,Ltd.)制造),V-295,V-300,V-360,V-GPT,V-3PA,V-400,V-802(由大阪友希化药工业有限公司(Osaka Yuki Kayaku Kogyo Co.,Ltd.)制造)等。
这些可聚合的不饱和化合物可以单独使用,或者两种或更多种组合使用。
所用的可聚合的不饱和化合物的量可为1-80重量%,优选5-50重量%,以排除溶剂的光敏性树脂组合物的总重量为基准计。在该量的范围内,树脂组合物易于形成具有高敏感度和良好保留率的图案化的膜。
(C)光聚合引发剂
本发明的光聚合引发剂是当暴露于辐射例如可见光射线,紫外射线,深-紫外辐射等时能产生活性物质以用于引发单体聚合的化合物。光聚合引发剂可以是自由基引发剂,它没有具体限定但可选自下组:苯乙酮化合物,二苯甲酮化合物,苯偶姻化合物,苯甲酰基化合物,呫吨酮(xanthone)化合物,三嗪化合物,卤代甲基噁二唑化合物,洛粉碱(lophione)二聚体及其混合物。
光聚合引发剂的具体示例包括,但不限于:2,2'-偶氮二异丁腈,2,2'-偶氮二(2,4-二甲基戊腈),2,2'-偶氮二(4-甲氧基-2,4-二甲基戊腈),过氧化苯甲酰,月桂基过氧化物,过氧新戊酸叔丁酯,1,1-二(叔丁基过氧基)环己烷,对二甲基氨基苯乙酮,2-苄基-2-(二甲基氨基)-1-[4-(4-吗啉基)苯基]-1-丁酮,2-羟基-2-甲基-1-苯基-丙烷-1-酮,苄基二甲基缩醛,二苯甲酮,苯偶姻丙基醚,二乙基噻吨酮(thioxanthone),2,4-双(三氯代甲基)-6-对甲氧基苯基-仲三嗪,2-茋(stilbene)-4,6-双-三氯代甲基-仲三嗪,2-三氯代甲基-5-三苯乙烯基-1,3,4-噁二唑,9-苯基吖啶(acridine),3-甲基-5-氨基-((仲三嗪-2-基)氨基)-3-苯基香豆素(coumarin),2-(邻氯代苯基)-4,5-二苯基咪唑基二聚体,1-苯基-1,2-丙二酮(propadione)-2-(邻乙氧基羰基)肟,1-[4-(苯硫基)苯基]-辛烷-1,2-二酮-2-(O-苯甲酰基肟),1-〔9-乙基-6-(2-甲基苯甲酰基)-9.H.-咔唑-3-基〕-乙烷-1-酮肟-O-乙酸酯,邻苯甲酰基-4'-(苯巯基)苯甲酰基-己基-酮肟(ketoxime),2,4,6-三甲基苯基羰基-二苯基膦基氧化物(diphenylphosphonyloxide),六氟偶磷-三烷基苯基锍盐,2-巯基苯并咪唑,2,2'-苯并噻唑基二硫化物及其混合物。此外,优选地用于高敏感度的一种或更多种肟化合物如下述文献所述:KR 2004-0007700,KR 2005-0084149,KR 2008-0083650,KR2008-0080208,KR 2007-0044062,KR 2007-0091110,KR 2007-0044753,KR 2009-0009991,KR 2009-0093933,KR 2010-0097658,KR 2011-0059525,KR 2011-0091742,KR 2011-0026467,KR 2011-0015683,WO 10/102502和WO 10/133077。市售的光聚合引发剂的具体示例包括OXE-01(巴斯夫(BASF)),OXE-02(巴斯夫),N-1919(艾迪科(ADEKA)),NCI-930(艾迪科),NCI-831(艾迪科)等。
所用的光聚合的引发剂的量可为0.1-20重量%,优选0.5-15重量%,以排除溶剂的光敏性树脂组合物的总重量为基准计。在该范围内,当暴露于光时,树脂组合物可充分固化,由此形成具有高保留率和改善的硬度的图案化的膜。
(D)硅烷偶联剂,其具有通式(I):
硅烷偶联剂用通式(I)表示:
其中
R1各自独立地是氢、或直链、支链或环状C1-6烷基或C1-6烷氧基;
X,Y和Z各自独立地是直链、支链或环状C1-6烷基;
n和a各自独立地为1-5的整数。
优选地,在通式(I)中,R1是氢;a是1;X,Y和Z是甲基;且n是3。即,通式(I)的化合物优选地是N-苯基氨基丙基三甲氧基硅烷。
所用通式(I)的硅烷偶联剂的量可为0.001-1重量%,优选地0.01-0.5重量%,以排除溶剂的光敏性树脂组合物的总重量为基准计。在上述范围内,组合物将具有高的与基片的粘附,和制备保持理想的半色调边缘和分辨率却不损失图案并具有改善的可加工性的图案化的膜。
还可包括其它添加剂例如(E)表面活性剂和/或(F)溶剂,从而改善光敏性树脂组合物的性质。
(E)表面活性剂
本发明的光敏性树脂组合物还可包括表面活性剂,从而增强它的涂覆能力和防止形成缺陷。
没有限制表面活性剂,但优选地是氟-表面活性剂、硅基表面活性剂、非离子表面活性剂等。由BYK公司制造的BYK 333因为其分散能力是优选的。
示例的表面活性剂包括氟-或硅-基表面活性剂例如BM-1000,BM-1100(由BM化学有限公司(BM CHEMIE Co.,Ltd.)制造),Megapack F142 D,Megapack F172,MegapackF173,Megapack F183,F-470,F-471,F-475,F-482,F-489(由大日本油墨化学工业有限公司(Dai Nippon Ink Chemical Kogyo Co.,Ltd.)制造),Florad FC-135,Florad FC-170C,Florad FC-430,Florad FC-431(由住友3M有限公司(Sumitomo 3M Ltd.)制造),Sufron S-112,Sufron S-113,Sufron S-131,Sufron S-141,Sufron S-145,Sufron S-382,SufronSC-101,Sufron SC-102,Sufron SC-103,Sufron SC-104,Sufron SC-105,Sufron SC-106(由旭硝子玻璃有限公司(Asahi Glass Co.,Ltd.)制造),Eftop EF301,Eftop 303,Eftop352(由西纳基大化成有限公司(Shinakida Kasei Co.,Ltd.)制造),SH-28PA,SH-190,SH-193,SZ-6032,SF-8428,DC-57,DC-190(由东丽硅有限公司(Toray Silicon Co.,Ltd.)制造),DC3PA,DC7PA,SH11PA,SH21PA,SH8400,FZ-2100,FZ-2110,FZ-2122,FZ-2222,FZ-2233(由道康宁东丽硅有限公司(Dow Corning Toray Silicon Co.,Ltd.)制造),TSF-4440,TSF-4300,TSF-4445,TSF-4446,TSF-4460,TSF-4452(由GE东芝硅有限公司(GE ToshibaSilicon Co.,Ltd.)制造),和BYK-333(由BYK有限公司(BYK Co.,Ltd.)制造);非离子表面活性剂例如聚氧乙烯烷基醚,包括聚氧乙烯月桂基醚,聚氧乙烯硬脂酰基醚,聚氧乙烯油酰基醚等,聚氧乙烯芳基醚,包括聚氧乙烯辛基苯基醚,聚氧乙烯壬基苯基醚等,和聚氧乙烯二烷基酯包括聚氧乙烯二月桂基酯,聚氧乙烯二硬脂酸酯等;和有机硅氧烷聚合物KP341(由信越化学有限公司(Shin-Etsu Chemical Co.,Ltd.)制造),(甲基)丙烯酸酯-基共聚物Polyflow No.57,95(柯艾于吉化学有限公司(Kyoei Yuji Chemical Co.,Ltd.))等。它们可以单独使用,或者两种或更多种组合使用。
所用的表面活性剂的量可为0.001-1重量%,优选0.01-0.5重量%,以排除溶剂的光敏性树脂组合物的总重量为基准计。在该范围内,这种组合物可方便地涂覆。
此外,可以包括其他添加剂,如抗氧化剂,稳定剂,自由基清除剂等,直到不劣化光敏树脂组合物的物理性质的程度。
(F)溶剂
本发明的光敏性树脂组合物可通过将上述组分在溶剂中混合来制备成液体组合物。
本技术领域所公知的、能与光敏性树脂组合物的上述组分相容但不与之反应的任意溶剂,都可用于制备所述光敏性树脂组合物。
示例的溶剂可包括但不限于:乙二醇单烷基醚乙酸酯,例如乙二醇单甲基醚乙酸酯和乙二醇单乙基醚乙酸酯;丙二醇单烷基醚,例如丙二醇单甲基醚、丙二醇单乙基醚、丙二醇单丙基醚、和丙二醇单丁基醚;丙二醇二烷基醚,例如丙二醇二甲基醚、丙二醇二乙基醚、丙二醇二丙基醚和丙二醇二丁基醚;二丙二醇二烷基醚,例如二丙二醇二甲基醚;丙二醇单烷基醚乙酸酯,例如丙二醇单甲基醚乙酸酯、丙二醇单乙基醚乙酸酯、丙二醇单丙基醚乙酸酯和丙二醇单丁基醚乙酸酯;溶纤剂,例如乙基溶纤剂和丁基溶纤剂;卡必醇,例如丁基卡必醇;乳酸酯,例如乳酸甲酯、乳酸乙酯、乳酸正丙酯和乳酸异丙酯;脂族羧酸酯,例如乙酸乙酯、乙酸正丙酯、乙酸异丙酯、乙酸正丁酯、乙酸异丁酯、乙酸正戊酯、乙酸异戊酯、丙酸异丙酯、丙酸正丁酯和丙酸异丁酯;酯,例如3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、丙酮酸甲酯和丙酮酸乙酯;芳族烃,例如甲苯和二甲苯;酮,例如2-庚酮、3-庚酮、4-庚酮和环己酮;酰胺,例如N-二甲基甲酰胺、N-甲基乙酰胺、N,N-二甲基乙酰胺和N-甲基吡咯烷酮;以及内酯,例如γ-丁内酯及其混合物。这些溶剂也可以单独使用,或者两种或更多种组合地使用。
没有具体限定光敏性树脂组合物中溶剂的量。为了组合物的涂覆能力和稳定性,可以下述量包含有机溶剂从而以组合物的总重量为基准计,所述组合物的固含量为5-70重量%,优选10-55重量%。
固含量指本发明的树脂组合物中包括的溶剂以外的组分的含量。
可通过将光敏性树脂组合物施涂到基片然后进行固化步骤来形成绝缘膜。这样制备的绝缘膜可用作电子组件。
此外,用光敏性树脂组合物制备的绝缘膜可用于OLED或LCD。
绝缘膜可通过本技术领域所公知的常规方法来制备。例如,可用旋涂方法将光敏性树脂组合物涂覆到硅基片上;在例如60-130℃的温度下进行预烘烤60-130秒以除去溶剂;使用具有所需图案的光掩模进行曝光;使用显影剂例如氢氧化四甲铵(TMAH)进行显影,以在涂覆膜上形成图案。然后,对这样制备的图案化的涂覆膜在150-300℃的温度下进行热固化(即,后烘烤)10分钟到5小时,以制备所需的绝缘膜。
可在200-450纳米的波长范围和10-100mJ/cm2的曝光强度下进行曝光。
从光敏性树脂组合物获得的绝缘膜在热固化步骤之后,显示优异的保留率以及改善的半色调边缘和分辨率。因此,它可有效地用作用于OLED和LCD的绝缘膜。
下面将参照一些实施例更详细地描述本发明。但是,这些实施例用于对本发明进行详细说明,而不是来对本发明的范围进行限制。
在下面的实施例中,通过凝胶渗透色谱(GPC)使用聚苯乙烯标准物来测定重均分子量。
制备实施例1:制备共聚物(A-1)
将2.5重量份的作为分子量调节剂的辛基硫醇、2重量份的作为聚合引发剂的2,2'-偶氮二(2,4-二甲基戊腈)、100重量份的丙二醇单甲醚乙酸酯和100重量份的包括苯乙烯(50摩尔%),甲基丙烯酸3,4-环氧环己基甲基酯(20摩尔%),甲基丙烯酸甲酯(5摩尔%),甲基丙烯酸(25摩尔%)的单体混合物加入安装了冷凝器和搅拌器的三颈烧瓶。在氮气气氛下,将混合物的温度升高到60℃,缓慢搅拌并维持5小时进行聚合以制备共聚物(A-1)的溶液,该共聚物的重均分子量(Mw)为6050。
制备实施例2~4:制备共聚物(A-2)到(A-4)
为了制备共聚物(A-2)到(A-4),重复制备实施例1的步骤,但使用下文表1所列的组分和量。
[表1]
St:苯乙烯
METHB:甲基丙烯酸3,4-环氧环己基甲基酯
GMA:甲基丙烯酸缩水甘油基酯
MMA:甲基丙烯酸甲酯
MAA:甲基丙烯酸
实施例1
将下述物质加入反应器:(A-1)2.294重量份(基于固体含量)在制备实施例1中所获得的共聚物;(B-1)1.160重量份(基于固体含量)六丙烯酸二季戊四醇酯,其作为可聚合的不饱和化合物;0.300重量份(基于固体含量)OXE-02(巴斯夫公司(BASF)),其作为光聚合引发剂;0.010重量份(基于固体含量)FZ-2122(道康宁东丽硅有限公司(Dow CorningToray Silicon Co.,Ltd.)),其作为表面活性剂;(D-1)0.005重量份(基于固体含量)N-苯基氨基丙基三甲氧基硅烷,其作为硅烷偶联剂;和丙二醇单甲醚乙酸酯(PGMEA),其作为溶剂且用量使得混合物的固含量为20重量%。使用振荡器将混合物预混合2小时,以制备液相光敏性树脂组合物。
实施例2-6和比较例1-3
根据实施例1的步骤制备光敏性树脂组合物,但使用下文表2所列的组分和量。
[表2]
(B-1):六丙烯酸二季戊四醇酯(DPHA,日本化药有限公司(Nippon Kayaku Co.,Ltd.))
(B-2):丙烯酸环氧酯(R-551,日本化药有限公司(Nippon Kayaku Co.,Ltd.))
(B-3):二丙烯酸双酚A酯(A-BPE-4,新中村化学有限公司(Shin-NakamuraChemical Co.,Ltd.))
(B-4):2,2-双-4-丙烯酰氧基聚乙氧基苯基丙烷(A-BPE-20,新中村化学有限公司(Shin-Nakamura Chemical Co.,Ltd.))
(D-1):N-苯基氨基丙基三甲氧基硅烷
(D-2):3-缩水甘油氧基丙基三甲氧基硅烷
(D-3):3-异氰酸根合丙基三甲氧基硅烷(3-isocyanatopropyltrimethoxysilane)
将在实施例1到6和比较例1到3中所获得的光敏性树脂组合物形成为膜。测试这样形成的膜来评估它们在热固化步骤后的保留率、透射率和半色调残留厚度和线条分辨率。结果示于下表3。
[制备固化的膜]
使用旋涂机,将各光敏性树脂组合物涂覆到玻璃基片上。将涂覆的基片在105℃下预烘烤90秒,以形成厚度为4.0微米的涂覆膜。不使用掩模,将膜暴露于发送自定位器(aligner)(型号:MA6)的光,其波长范围为200nm-450nm,且基于365纳米的波长的曝光强度为20mJ/cm2。使用2.38重量%的氢氧化四甲基铵的水性溶液(作为显影剂)在23℃下进行显影60秒,然后用纯净水洗涤1分钟。这个过程只留下孔和线条图案,同时去除不需要的部分。然后,将这样获得的膜在对流烘箱中于230℃下后烘烤30分钟,来制备固化膜图案。
(1)热固化步骤之后的保留率(%)
用非接触式厚度测量设备(型号:Nanospec.6500)来测量各固化膜的厚度。根据下述公式来计算各固化膜的保留率(%)。热固化步骤之后的保留率越大,膜性质越好。
热固化之后的保留率(%)=(后烘烤之后的膜厚度/初始膜厚(4微米))×100
(2)透射率(%)
用紫外可见光谱仪测量各固化膜在波长为400纳米处的透射率。
(3)半色调残留厚度(埃)和线条分辨率(分辨率)(μm)
为了进行对各固化膜图案的半色调测量,使用掩模重复上述的“制备固化膜)的步骤,其能在曝光时调节各段的光透射率。在光学显微镜下观察这样获得的半色调图案的最小线条尺寸,来测量半色调线条分辨率。用非接触式厚度测量设备(型号:Nanospec.6500)来测量半色调残留厚度。
半色调加工边缘是良好的,因为半色调线条分辨率较低且半色调残留厚度与全色调的残留厚度(3.5(±0.2)μm)相比较低。
[表3]
如上文的表3所示,从实施例1到6的树脂组合物制备的固化膜包括根据本发明的共聚物和硅烷偶联剂,且在热固化步骤之后显示改善的总体保留率。特别是,和从比较例1到3的树脂组合物制备的固化膜相比,它们显示显著改善的半色调边缘和分辨率。因此,从本发明的树脂组合物获得的固化膜可有效地用于制备用于OLED或LCD的绝缘膜。
Claims (5)
1.一种光敏性树脂组合物,其包含:
(A)共聚物,其包括(a1)衍生自烯键式不饱和羧酸,烯键式不饱和羧酸酸酐,或其混合物的结构单元,(a2)衍生自具有脂环族环氧基团的不饱和单体的结构单元,和(a3)衍生自烯键式不饱和化合物的结构单元,其不同于结构单元(a1)和(a2);
(B)可聚合的不饱和化合物;
(C)光聚合引发剂;和
(D)具有通式(I)的硅烷偶联剂:
其中
R1各自独立地是氢、或直链、支链或环状C1-6烷基或C1-6烷氧基;
X,Y和Z各自独立地是直链、支链或环状C1-6烷基;和
n和a各自独立地为1-5的整数,
其中所述光敏性树脂组合物包括0.01-0.5重量%的通式(I)的硅烷偶联剂,以排除溶剂的光敏性树脂组合物的总重量为基准计。
2.如权利要求1所述的光敏性树脂组合物,其特征在于,所述具有通式(I)的硅烷偶联剂是N-苯基氨基丙基三甲氧基硅烷。
4.如权利要求3所述的光敏性树脂组合物,其特征在于,所述由通式(II)表示的单体是丙烯酸3,4-环氧环己基甲基酯或者甲基丙烯酸3,4-环氧环己基甲基酯。
5.如权利要求1所述的光敏性树脂组合物,其特征在于,以构成共聚物的结构单元的总摩尔数为基准计,所述共聚物(A)分别包括5-50摩尔%、10-50摩尔%和5-70摩尔%的结构单元(a1)、(a2)和(a3)。
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