JP2019513664A - 銅−セラミック複合材 - Google Patents
銅−セラミック複合材 Download PDFInfo
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- JP2019513664A JP2019513664A JP2018544125A JP2018544125A JP2019513664A JP 2019513664 A JP2019513664 A JP 2019513664A JP 2018544125 A JP2018544125 A JP 2018544125A JP 2018544125 A JP2018544125 A JP 2018544125A JP 2019513664 A JP2019513664 A JP 2019513664A
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- 239000000919 ceramic Substances 0.000 title claims abstract description 161
- 239000002131 composite material Substances 0.000 title claims abstract description 62
- 239000002245 particle Substances 0.000 claims abstract description 200
- 239000010949 copper Substances 0.000 claims abstract description 163
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 124
- 239000000758 substrate Substances 0.000 claims abstract description 117
- 229910052802 copper Inorganic materials 0.000 claims abstract description 106
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 71
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 68
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 53
- 238000000576 coating method Methods 0.000 claims abstract description 44
- 239000011248 coating agent Substances 0.000 claims abstract description 37
- 238000000034 method Methods 0.000 claims description 44
- 238000009826 distribution Methods 0.000 description 54
- 239000011889 copper foil Substances 0.000 description 20
- 229910052751 metal Inorganic materials 0.000 description 16
- 239000002184 metal Substances 0.000 description 16
- 230000035939 shock Effects 0.000 description 16
- 239000010410 layer Substances 0.000 description 10
- 230000008859 change Effects 0.000 description 8
- 238000005457 optimization Methods 0.000 description 8
- 238000001878 scanning electron micrograph Methods 0.000 description 8
- 238000005530 etching Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000010561 standard procedure Methods 0.000 description 6
- 238000013459 approach Methods 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- 230000006872 improvement Effects 0.000 description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 description 5
- 238000000879 optical micrograph Methods 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 3
- 239000005751 Copper oxide Substances 0.000 description 3
- 229910000431 copper oxide Inorganic materials 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000005496 eutectics Effects 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 229910052596 spinel Inorganic materials 0.000 description 2
- 239000011029 spinel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- JRBRVDCKNXZZGH-UHFFFAOYSA-N alumane;copper Chemical compound [AlH3].[Cu] JRBRVDCKNXZZGH-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
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Abstract
Description
− 酸化アルミニウムを含有するセラミック基板、
− セラミック基板上に存在する銅又は銅合金からなる被膜、
を有する銅−セラミック複合材であって、
酸化アルミニウムの粒子がそれぞれ、最大直径dK,max、dK,maxの長さを半分にする箇所においてdK,maxに直交する直径dK,ortho、及び形状係数(Formfaktor)RK(Al2O3)=dK,ortho/dK,maxを有し、酸化アルミニウムが、酸化アルミニウムの粒子の形状係数RK(Al2O3)の算術平均として決定される平均粒子形状係数Ra(Al2O3)を有し、
銅又は銅合金の粒子がそれぞれ、最大直径dK,max、dK,maxの長さを半分にする箇所においてdK,maxに直交する直径dK,ortho、及び形状係数RK(Cu)=dK,ortho/dK,maxを有し、銅又は銅合金が、銅又は銅合金の粒子の形状係数RK(Cu)の算術平均として決定される平均粒子形状係数Ra(Cu)を有し、
酸化アルミニウム及び銅又は銅合金の平均粒子形状係数が、以下の条件:
0.5≦Ra(Al2O3)/Ra(Cu)≦2.0
を満たす、上記銅−セラミック複合材によって達成される。
0.5≦Ra(Al2O3)/Ra(Cu)≦2.0
を満たす場合に、銅−セラミック複合材の耐熱衝撃性が向上し得ることが見いだされた。
本発明によれば、銅接着強度の向上とは、銅−セラミック複合材に対する銅の接着強度、すなわち銅−セラミック複合材のセラミック表面から、接合された銅箔を剥がすために必要とされる力が増大することをいう。例示的な測定方法は、DE102004012231B4から当業者に公知である(DE102004012231B4の図2及び3)。
4.0≧(d95−d5)/d50≧0.5
を満たすように選択することが好ましい。
− 酸化銅層がその表面に形成されるように銅箔を酸化する工程、
− 酸化銅層を有する銅箔をセラミック基板上に積層する工程、
− 1083℃未満の温度(例えば1065〜1080℃の範囲内の温度)まで複合材を加熱する工程、
− 室温まで冷却する工程。
9.5≧(d95−d5)/d50≧0.7
を満たすように選択されることが好ましい。
dmin(Al2O3)のdmax(Cu)に対する比及びdmax(Al2O3)のdmin(Cu)に対する比は、下記の条件(i)及び(ii):
(i) dmin(Al2O3)/dmax(Cu)≧1×10−5及び
(ii) 2.5≧dmax(Al2O3)/dmin(Cu)
を満たす。
(i) dmin(Al2O3)/dmax(Cu)≧0.001及び
(ii) 1.5≧dmax(Al2O3)/dmin(Cu)、
を満たし、
最も好ましくは下記の条件(i)及び(ii):
(i) dmin(Al2O3)/dmax(Cu)≧0.002及び
(ii) 1.0≧dmax(Al2O3)/dmin(Cu)
を満たす。
(i) 0.005≧dmin(Al2O3)/dmax(Cu)≧0.002及び
(ii) 1.0≧dmax(Al2O3)/dmin(Cu)≧0.05、
である。
0.7≦S(Al2O3)/S(Cu)≦1.4
を満たす。
0.74≦S(Al2O3)/S(Cu)≦1.35、
を満たし、
さらにより好ましくは以下の条件
0.80≦S(Al2O3)/S(Cu)≦1.25
を満たす。
セラミック基板の表面の走査型電子顕微鏡写真(SEM画像)を撮影する。研磨片の形態の特別な試験片の製造は不要である。前もって銅で被覆しエッチングで露出させたセラミック基板の箇所で、SEM画像を撮影する。
(被覆された基板表面に平行な)銅又は銅合金からなる被膜の表面の光学顕微鏡写真を撮影する。研磨片の形態の特別な試験片の製造は不要である。
酸化アルミニウム
粒径分布の決定において使用したSEM画像を用いる。
その最長寸法dK,maxを決定する。続いて、dK,maxに直交する粒子直径dK,orthoを、dK,maxの長さを半分にする箇所において決定する。個々の粒子の形状係数RKは、dK,orthoのdK,maxに対する比によって求められ、すなわちRK=dK,ortho/dK,maxである。
これを、楕円形粒子構造を有する粒子について図3に模式的に示す。粒子の形状がその2次元投影図上で円に近づくほど、粒子の形状係数は1.0の値に近づく。したがって形状係数はまた、粒子の円形度(Kreisfoermigkeit)/円磨度(rundheit)の尺度でもある。
粒径分布の決定において使用した光学顕微鏡写真を用いる。
この目的のために、セラミック基板をまず支持体上に配置し、続いて、上側、すなわち支持体に向いていない側を銅箔で被覆する。熱の作用の結果としてセラミック基板のこの側が金属層に接合され、その後、得られた構成物を冷却する。
続いて基板を裏返し、第2の接合工程において、同じように基板のもう一方の側に金属層、すなわち銅箔を設ける。
銅−セラミック複合材1、以下「K−K−V1」(本発明による)
銅−セラミック複合材2、以下「K−K−V2」(比較試験片)
銅−セラミック複合材3、以下「K−K−V3」(比較試験片)
セラミック基板の厚さ:0.38mm;
セラミック基板の長さ×幅:190×140mm2
図6は、K−K−V1の銅被膜の表面の光学顕微鏡写真を示し、これを用いて銅粒子構造を決定した。
銅−セラミック基板の耐熱衝撃性を決定するために、単基板を大型基板から取り出した。単基板を、当業者に公知の装置において以下の通り構成された温度変化サイクルに供した:
− 150℃で(好ましくは温度変化キャビネットの第1のチャンバ内で)15分間保管
− −40℃(マイナス40℃)で(好ましくは温度変化キャビネットの第2のチャンバ内で)15分間保管、
− 一方のチャンバから他方のチャンバ中へ輸送するための移行時間が15秒。
その最長寸法dK,maxを決定する。続いて、dK,maxに直交する粒子直径dK,orthoを、dK,maxの長さを半分にする箇所において決定する。個々の粒子の形状係数RKは、dK,orthoのdK,maxに対する比によって求められ、すなわちRK=dK,ortho/dK,maxである。
これを、楕円形粒子構造を有する粒子について図1に模式的に示す。粒子の形状がその2次元投影図上で円に近づくほど、粒子の形状係数は1.0の値に近づく。したがって形状係数はまた、粒子の円形度(Kreisfoermigkeit)/円磨度(rundheit)の尺度でもある。
[その他] [0090]の補正は、出願時の明細書における「図3」の記載を「図1」に正したものである。[0017]及び[0043]の記載並びに図面の図1及び図3より、上記「図3」の記載が誤りであり、「図1」と訂正すべきことは明らかであると思料する。
Claims (9)
- − 酸化アルミニウムを含有するセラミック基板、
− 前記セラミック基板上に存在する銅又は銅合金からなる被膜
を有する銅−セラミック複合材であって、
酸化アルミニウムの粒子がそれぞれ、最大直径dKmax、dK,maxの長さを半分にする箇所においてdK,maxに直交する直径dK,ortho、及び形状係数RK(Al2O3)=dK,ortho/dK,maxを有し、酸化アルミニウムが、酸化アルミニウムの粒子の形状係数RK(Al2O3)の算術平均として決定される平均粒子形状係数Ra(Al2O3)を有し、
銅又は銅合金の粒子がそれぞれ、最大直径dK,max、dK,maxの長さを半分にする箇所においてdK,maxに直交する直径dK,ortho、及び形状係数RK(Cu)=dK,ortho/dK,maxを有し、銅又は銅合金が、銅又は銅合金の粒子の形状係数RK(Cu)の算術平均として決定される平均粒子形状係数Ra(Cu)を有し、
酸化アルミニウム及び銅又は銅合金の平均粒子形状係数が、以下の条件:
0.5≦Ra(Al2O3)/Ra(Cu)≦2.0
を満たす、上記銅−セラミック複合材。 - 銅又は銅合金が、10μm以上300μm以下の範囲内、より好ましくは15μm以上250μm以下の範囲内、さらにより好ましくは20μm以上210μm以下の範囲内の粒径を有する、請求項1に記載の銅−セラミック複合材。
- 酸化アルミニウムが、0.01μm以上25μm以下の範囲内、より好ましくは0.3μm以上23μm以下の範囲内、さらにより好ましくは0.5μm以上20μm以下の範囲内の粒径を有する、請求項1又は2に記載の銅−セラミック複合材。
- 酸化アルミニウムの平均粒子形状係数の、銅又は銅合金の平均粒子形状係数に対する比が、0.75〜1.50の範囲内、より好ましくは0.80〜1.20の範囲内である、請求項1から3のいずれか1項に記載の銅−セラミック複合材。
- 前記セラミック基板が、少なくとも65重量%の量の酸化アルミニウムを含有する、請求項1から4のいずれか1項に記載の銅−セラミック複合材。
- 銅又は銅合金からなる前記被膜が、DCB法によって前記セラミック基板に設けられる、請求項1から5のいずれか1項に記載の銅−セラミック複合材。
- 銅又は銅合金からなる前記被膜が、少なくとも部分的に、電気的接触領域を形成するための構造を有する、請求項1から6のいずれか1項に記載の銅−セラミック複合材。
- 銅又は銅合金からなる前記被膜が、その面積の少なくとも70%にわたって0.2〜1.2mmの範囲内の厚さを有し、かつ/又は、前記セラミック基板が、その面積の少なくとも70%にわたって0.2〜1.2mmの範囲内の厚さを有する、請求項1から7のいずれか1項に記載の銅−セラミック複合材。
- 請求項1から8のいずれか1項に記載の少なくとも1種の銅−セラミック複合材と、1又は2以上のボンディングワイヤとを有するモジュール。
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