JP2019508509A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2019508509A5 JP2019508509A5 JP2018527104A JP2018527104A JP2019508509A5 JP 2019508509 A5 JP2019508509 A5 JP 2019508509A5 JP 2018527104 A JP2018527104 A JP 2018527104A JP 2018527104 A JP2018527104 A JP 2018527104A JP 2019508509 A5 JP2019508509 A5 JP 2019508509A5
- Authority
- JP
- Japan
- Prior art keywords
- composition
- ion
- solvent
- metal salt
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims 27
- 239000002904 solvent Substances 0.000 claims 14
- 229910052751 metal Inorganic materials 0.000 claims 13
- 239000002184 metal Substances 0.000 claims 13
- -1 fluorinated alkyl acetate ion Chemical compound 0.000 claims 12
- 239000003381 stabilizer Substances 0.000 claims 9
- 150000002596 lactones Chemical class 0.000 claims 8
- 150000003839 salts Chemical class 0.000 claims 7
- 150000002500 ions Chemical class 0.000 claims 6
- 238000000034 method Methods 0.000 claims 6
- 239000012266 salt solution Substances 0.000 claims 6
- 239000000654 additive Substances 0.000 claims 5
- FKOASGGZYSYPBI-UHFFFAOYSA-K bis(trifluoromethylsulfonyloxy)alumanyl trifluoromethanesulfonate Chemical compound [Al+3].[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F FKOASGGZYSYPBI-UHFFFAOYSA-K 0.000 claims 4
- 229910021645 metal ion Inorganic materials 0.000 claims 4
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- 239000000243 solution Substances 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- 239000003054 catalyst Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 239000003431 cross linking reagent Substances 0.000 claims 2
- 229910052733 gallium Inorganic materials 0.000 claims 2
- 229910052735 hafnium Inorganic materials 0.000 claims 2
- 229910052738 indium Inorganic materials 0.000 claims 2
- 229920000592 inorganic polymer Polymers 0.000 claims 2
- 229910052750 molybdenum Inorganic materials 0.000 claims 2
- 229920000620 organic polymer Polymers 0.000 claims 2
- 239000004094 surface-active agent Substances 0.000 claims 2
- 239000013008 thixotropic agent Substances 0.000 claims 2
- 229910052718 tin Inorganic materials 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
- 229910052721 tungsten Inorganic materials 0.000 claims 2
- 239000000080 wetting agent Substances 0.000 claims 2
- 229910052725 zinc Inorganic materials 0.000 claims 2
- 229910052726 zirconium Inorganic materials 0.000 claims 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 claims 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 1
- 229910002651 NO3 Inorganic materials 0.000 claims 1
- HZSIFDFXFAXICF-UHFFFAOYSA-N acetolactone Chemical compound O=C1CO1 HZSIFDFXFAXICF-UHFFFAOYSA-N 0.000 claims 1
- 150000001298 alcohols Chemical class 0.000 claims 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 claims 1
- VEZXCJBBBCKRPI-UHFFFAOYSA-N beta-propiolactone Chemical compound O=C1CCO1 VEZXCJBBBCKRPI-UHFFFAOYSA-N 0.000 claims 1
- FJYDXYVSFFWRER-UHFFFAOYSA-K bis[(2,2,2-trifluoroacetyl)oxy]alumanyl 2,2,2-trifluoroacetate Chemical compound FC(F)(F)C(=O)O[Al](OC(=O)C(F)(F)F)OC(=O)C(F)(F)F FJYDXYVSFFWRER-UHFFFAOYSA-K 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 125000005594 diketone group Chemical group 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 238000001704 evaporation Methods 0.000 claims 1
- 230000008020 evaporation Effects 0.000 claims 1
- 238000001914 filtration Methods 0.000 claims 1
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 150000002576 ketones Chemical class 0.000 claims 1
- UJVRJBAUJYZFIX-UHFFFAOYSA-N nitric acid;oxozirconium Chemical compound [Zr]=O.O[N+]([O-])=O.O[N+]([O-])=O UJVRJBAUJYZFIX-UHFFFAOYSA-N 0.000 claims 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 claims 1
- 229960000380 propiolactone Drugs 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 229910000349 titanium oxysulfate Inorganic materials 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/978,232 | 2015-12-22 | ||
| US14/978,232 US10241409B2 (en) | 2015-12-22 | 2015-12-22 | Materials containing metal oxides, processes for making same, and processes for using same |
| PCT/EP2016/081970 WO2017108822A1 (en) | 2015-12-22 | 2016-12-20 | Materials containing metal oxides, processes for making same, and processes for using same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019508509A JP2019508509A (ja) | 2019-03-28 |
| JP2019508509A5 true JP2019508509A5 (https=) | 2020-02-06 |
| JP6838063B2 JP6838063B2 (ja) | 2021-03-03 |
Family
ID=57838322
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018527104A Active JP6838063B2 (ja) | 2015-12-22 | 2016-12-20 | 金属酸化物を含有する材料、その製造方法及びその使用方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10241409B2 (https=) |
| EP (1) | EP3394675B1 (https=) |
| JP (1) | JP6838063B2 (https=) |
| KR (1) | KR102324679B1 (https=) |
| CN (1) | CN108139673B (https=) |
| IL (1) | IL257619A (https=) |
| TW (1) | TWI689555B (https=) |
| WO (1) | WO2017108822A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3360933A1 (de) * | 2017-02-08 | 2018-08-15 | Evonik Degussa GmbH | Direkt-strukturierbare formulierungen auf der basis von metalloxid-prekursoren zur herstellung oxidischer schichten |
| US20210109451A1 (en) * | 2019-10-11 | 2021-04-15 | Merck Patent Gmbh | Spin-on metal oxide materials of high etch resistance useful in image reversal technique and related semiconductor manufacturing processes |
| WO2024128013A1 (ja) * | 2022-12-16 | 2024-06-20 | Jsr株式会社 | レジスト下層膜形成用組成物、半導体基板の製造方法、レジスト下層膜の形成方法及び金属化合物の製造方法 |
| WO2025178071A1 (ja) * | 2024-02-21 | 2025-08-28 | 株式会社巴川コーポレーション | ドライエッチングマスク用組成物 |
| WO2025263501A1 (ja) * | 2024-06-19 | 2025-12-26 | Jsr株式会社 | 半導体基板の製造方法及び膜形成用組成物 |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4646707A (en) | 1981-03-30 | 1987-03-03 | Pfefferle William C | Method of operating catalytic ignition engines and apparatus therefor |
| US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| DE69125634T2 (de) | 1990-01-30 | 1998-01-02 | Wako Pure Chem Ind Ltd | Chemisch verstärktes Photolack-Material |
| US5843624A (en) | 1996-03-08 | 1998-12-01 | Lucent Technologies Inc. | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
| US6808859B1 (en) | 1996-12-31 | 2004-10-26 | Hyundai Electronics Industries Co., Ltd. | ArF photoresist copolymers |
| US6952504B2 (en) | 2001-12-21 | 2005-10-04 | Neophotonics Corporation | Three dimensional engineering of planar optical structures |
| US8568684B2 (en) | 2000-10-17 | 2013-10-29 | Nanogram Corporation | Methods for synthesizing submicron doped silicon particles |
| US6599631B2 (en) | 2001-01-26 | 2003-07-29 | Nanogram Corporation | Polymer-inorganic particle composites |
| US20090075083A1 (en) | 1997-07-21 | 2009-03-19 | Nanogram Corporation | Nanoparticle production and corresponding structures |
| US7384680B2 (en) | 1997-07-21 | 2008-06-10 | Nanogram Corporation | Nanoparticle-based power coatings and corresponding structures |
| US6849334B2 (en) | 2001-08-17 | 2005-02-01 | Neophotonics Corporation | Optical materials and optical devices |
| US6849377B2 (en) | 1998-09-23 | 2005-02-01 | E. I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| JP3383838B2 (ja) * | 1999-02-25 | 2003-03-10 | 独立行政法人産業技術総合研究所 | 金属酸化物の製造方法及び微細パターンの形成方法 |
| US6790587B1 (en) | 1999-05-04 | 2004-09-14 | E. I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
| US6890448B2 (en) | 1999-06-11 | 2005-05-10 | Shipley Company, L.L.C. | Antireflective hard mask compositions |
| WO2001098834A1 (en) | 2000-06-21 | 2001-12-27 | Asahi Glass Company, Limited | Resist composition |
| US6447980B1 (en) | 2000-07-19 | 2002-09-10 | Clariant Finance (Bvi) Limited | Photoresist composition for deep UV and process thereof |
| EP1365290B1 (en) | 2001-02-09 | 2007-11-21 | Asahi Glass Company Ltd. | Resist composition |
| US6723435B1 (en) | 2001-08-28 | 2004-04-20 | Nanogram Corporation | Optical fiber preforms |
| JP3737729B2 (ja) * | 2001-09-26 | 2006-01-25 | 株式会社東芝 | 非水電解液電池および非水電解液 |
| US6723488B2 (en) | 2001-11-07 | 2004-04-20 | Clariant Finance (Bvi) Ltd | Photoresist composition for deep UV radiation containing an additive |
| US8865271B2 (en) | 2003-06-06 | 2014-10-21 | Neophotonics Corporation | High rate deposition for the formation of high quality optical coatings |
| US7521097B2 (en) | 2003-06-06 | 2009-04-21 | Nanogram Corporation | Reactive deposition for electrochemical cell production |
| WO2005064403A1 (ja) | 2003-12-26 | 2005-07-14 | Nissan Chemical Industries, Ltd. | ハードマスク用塗布型窒化膜形成組成物 |
| US7491431B2 (en) | 2004-12-20 | 2009-02-17 | Nanogram Corporation | Dense coating formation by reactive deposition |
| US20060248665A1 (en) | 2005-05-06 | 2006-11-09 | Pluyter Johan G L | Encapsulated fragrance materials and methods for making same |
| US8039201B2 (en) | 2007-11-21 | 2011-10-18 | Az Electronic Materials Usa Corp. | Antireflective coating composition and process thereof |
| EP2484633B1 (en) * | 2009-09-28 | 2016-12-21 | Dai-Ichi Kogyo Seiyaku Co., Ltd. | Metal-salt-containing composition, substrate, and method for producing substrate |
| KR101212626B1 (ko) * | 2010-03-05 | 2012-12-14 | 연세대학교 산학협력단 | 금속산화물 박막 및 그 제조 방법, 금속산화물 박막용 용액 |
| WO2012106532A2 (en) * | 2011-02-02 | 2012-08-09 | Advenira, Inc. | Solution derived nanocomposite precursor solutions, methods for making thin films and thin films made by such methods |
| JP5823141B2 (ja) * | 2011-03-09 | 2015-11-25 | 株式会社Adeka | 酸化亜鉛系膜の製造方法 |
| US8795774B2 (en) * | 2012-09-23 | 2014-08-05 | Rohm And Haas Electronic Materials Llc | Hardmask |
| US9315636B2 (en) | 2012-12-07 | 2016-04-19 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds, their compositions and methods |
| US9201305B2 (en) * | 2013-06-28 | 2015-12-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin-on compositions of soluble metal oxide carboxylates and methods of their use |
| JP6053725B2 (ja) * | 2013-07-04 | 2016-12-27 | 国立大学法人京都大学 | 銅系ナノ粒子分散液とその製造方法及びその分散液から製造される銅導体膜が形成された基材 |
| KR102317541B1 (ko) * | 2013-10-07 | 2021-10-27 | 닛산 가가쿠 가부시키가이샤 | 폴리산을 포함하는 메탈함유 레지스트 하층막 형성조성물 |
-
2015
- 2015-12-22 US US14/978,232 patent/US10241409B2/en active Active
-
2016
- 2016-11-15 TW TW105137235A patent/TWI689555B/zh active
- 2016-12-20 CN CN201680057594.7A patent/CN108139673B/zh active Active
- 2016-12-20 KR KR1020187012509A patent/KR102324679B1/ko active Active
- 2016-12-20 JP JP2018527104A patent/JP6838063B2/ja active Active
- 2016-12-20 WO PCT/EP2016/081970 patent/WO2017108822A1/en not_active Ceased
- 2016-12-20 EP EP16828724.1A patent/EP3394675B1/en active Active
-
2018
- 2018-02-19 IL IL257619A patent/IL257619A/en unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2019508509A5 (https=) | ||
| ES2496566T3 (es) | Procedimiento húmedo en húmedo y disolución ácida libre de cromo para el tratamiento de protección frente a la corrosión de superficies de acero | |
| JP2008150708A5 (https=) | ||
| JP2011212748A5 (https=) | ||
| JP2016532739A5 (https=) | ||
| RU2018125586A (ru) | Композиция для получения перовскитов, содержащая несколько растворителей | |
| Zhao et al. | A mathematical model for initiation and growth of anodic titania nanotube embryos under compact oxide layer | |
| CN105733822A (zh) | 用于除去氧化物的清洗组合物及用清洗组合物的清洗方法 | |
| CN105063621B (zh) | 一种镁合金金相腐蚀剂 | |
| TWI488943B (zh) | 蝕刻膏組成物及其應用 | |
| DE102011120870A1 (de) | Oberflächenbehandlung von Magensiumlegierungsgussteilen als Korrosionsschutz | |
| CN101984145A (zh) | 具有可调孔径的双通多孔氧化铝模板的制备方法 | |
| JP3052213B2 (ja) | ステンレス鋼表面の錆除去剤 | |
| CN104451634B (zh) | 铝及铝合金钝化液、制备方法及其使用方法 | |
| JP6295843B2 (ja) | アルミニウム又はアルミニウム合金に皮膜を形成する方法、それに用いる前処理液、およびそれに得られる部材 | |
| CN106521471A (zh) | 一种铝合金表面环保型成膜剂及其制备方法 | |
| JPH04232281A (ja) | 非鉄金属をコーティングするための方法及び組成物 | |
| WO2018158037A1 (de) | Verfahren zur herstellung strukturierter schichten | |
| JP2004137586A (ja) | エッチング液及びエッチング方法 | |
| CN1556247A (zh) | 镁、铝合金弱酸性活化工艺的溶液配方 | |
| DE102011106764A1 (de) | Verfahren zur Herstellung einer haftvermittelnden Schicht auf einer Oberfläche eines Titanwerkstoffs durch anodische Oxidation , Verwendung einer Lösung für die anodische Oxidation und haftvermittelnde Schicht | |
| JPWO2023136260A5 (https=) | ||
| CN106519787A (zh) | 一种缓蚀环境友好型水性脱漆剂及其制备方法 | |
| JP6566959B2 (ja) | 有機被覆を備える基材を除去するための方法 | |
| CN106232871A (zh) | 包括酸浸和钝化的铝的两阶段预处理 |