JPWO2023136260A5 - - Google Patents
Info
- Publication number
- JPWO2023136260A5 JPWO2023136260A5 JP2023574046A JP2023574046A JPWO2023136260A5 JP WO2023136260 A5 JPWO2023136260 A5 JP WO2023136260A5 JP 2023574046 A JP2023574046 A JP 2023574046A JP 2023574046 A JP2023574046 A JP 2023574046A JP WO2023136260 A5 JPWO2023136260 A5 JP WO2023136260A5
- Authority
- JP
- Japan
- Prior art keywords
- cleaning solution
- acid
- semiconductor substrate
- forming
- underlayer film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022004064 | 2022-01-14 | ||
| PCT/JP2023/000437 WO2023136260A1 (ja) | 2022-01-14 | 2023-01-11 | 半導体基板の製造方法、レジスト下層膜の形成方法及び洗浄液 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023136260A1 JPWO2023136260A1 (https=) | 2023-07-20 |
| JPWO2023136260A5 true JPWO2023136260A5 (https=) | 2025-10-21 |
Family
ID=87279192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023574046A Pending JPWO2023136260A1 (https=) | 2022-01-14 | 2023-01-11 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240369931A1 (https=) |
| JP (1) | JPWO2023136260A1 (https=) |
| KR (1) | KR20240137561A (https=) |
| CN (1) | CN118435121A (https=) |
| TW (1) | TW202331416A (https=) |
| WO (1) | WO2023136260A1 (https=) |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4793583B2 (ja) * | 2004-10-14 | 2011-10-12 | 日産化学工業株式会社 | 金属酸化物を含むリソグラフィー用下層膜形成組成物 |
| US9093279B2 (en) * | 2011-07-20 | 2015-07-28 | Nissan Chemical Industries, Ltd. | Thin film forming composition for lithography containing titanium and silicon |
| US9070548B2 (en) | 2012-03-06 | 2015-06-30 | Rohm And Haas Electronic Materials Llc | Metal hardmask compositions |
| US9201305B2 (en) * | 2013-06-28 | 2015-12-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin-on compositions of soluble metal oxide carboxylates and methods of their use |
| KR102317541B1 (ko) * | 2013-10-07 | 2021-10-27 | 닛산 가가쿠 가부시키가이샤 | 폴리산을 포함하는 메탈함유 레지스트 하층막 형성조성물 |
| JP6603487B2 (ja) * | 2015-06-22 | 2019-11-06 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置および基板処理方法 |
| KR102791311B1 (ko) * | 2016-08-12 | 2025-04-04 | 인프리아 코포레이션 | 금속 함유 레지스트로부터의 에지 비드 영역의 금속 잔류물 저감방법 |
| KR101910157B1 (ko) * | 2018-08-06 | 2018-10-19 | 영창케미칼 주식회사 | 유무기 하이브리드 포토레지스트 공정액 조성물 |
| JP2020042217A (ja) * | 2018-09-12 | 2020-03-19 | Jsr株式会社 | 組成物、金属又は半金属含有膜形成用組成物、金属又は半金属含有膜及びその製造方法並びにパターン形成方法 |
| JP7274920B2 (ja) * | 2019-04-11 | 2023-05-17 | 東京応化工業株式会社 | 洗浄液、及び金属レジストを備えた支持体の洗浄方法 |
| JP7294859B2 (ja) * | 2019-04-11 | 2023-06-20 | 東京応化工業株式会社 | 洗浄液、及び金属レジストを備えた支持体の洗浄方法 |
-
2023
- 2023-01-11 JP JP2023574046A patent/JPWO2023136260A1/ja active Pending
- 2023-01-11 CN CN202380015443.5A patent/CN118435121A/zh active Pending
- 2023-01-11 WO PCT/JP2023/000437 patent/WO2023136260A1/ja not_active Ceased
- 2023-01-11 KR KR1020247023031A patent/KR20240137561A/ko active Pending
- 2023-01-13 TW TW112101609A patent/TW202331416A/zh unknown
-
2024
- 2024-07-11 US US18/769,554 patent/US20240369931A1/en active Pending
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