JP2019507373A5 - - Google Patents
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- Publication number
- JP2019507373A5 JP2019507373A5 JP2018534865A JP2018534865A JP2019507373A5 JP 2019507373 A5 JP2019507373 A5 JP 2019507373A5 JP 2018534865 A JP2018534865 A JP 2018534865A JP 2018534865 A JP2018534865 A JP 2018534865A JP 2019507373 A5 JP2019507373 A5 JP 2019507373A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- resist pattern
- composition
- carbon atoms
- atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000004432 carbon atom Chemical group C* 0.000 claims 9
- 238000000034 method Methods 0.000 claims 7
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 5
- -1 polysiloxane Polymers 0.000 claims 5
- 239000011247 coating layer Substances 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 4
- 229920001296 polysiloxane Polymers 0.000 claims 4
- 125000004429 atom Chemical group 0.000 claims 3
- 238000010438 heat treatment Methods 0.000 claims 3
- 239000010410 layer Substances 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000000732 arylene group Chemical group 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 238000004140 cleaning Methods 0.000 claims 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 238000004381 surface treatment Methods 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016020151 | 2016-02-04 | ||
| JP2016020151A JP2017138514A (ja) | 2016-02-04 | 2016-02-04 | 表面処理用組成物およびそれを用いたレジストパターンの表面処理方法 |
| PCT/EP2017/000083 WO2017133830A1 (en) | 2016-02-04 | 2017-01-25 | Surface treatment composition and surface treatment method of resist pattern using the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019507373A JP2019507373A (ja) | 2019-03-14 |
| JP2019507373A5 true JP2019507373A5 (enExample) | 2020-02-06 |
| JP6780004B2 JP6780004B2 (ja) | 2020-11-04 |
Family
ID=58018050
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016020151A Pending JP2017138514A (ja) | 2016-02-04 | 2016-02-04 | 表面処理用組成物およびそれを用いたレジストパターンの表面処理方法 |
| JP2018534865A Active JP6780004B2 (ja) | 2016-02-04 | 2017-01-25 | 表面処理用組成物およびそれを用いたレジストパターンの表面処理方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016020151A Pending JP2017138514A (ja) | 2016-02-04 | 2016-02-04 | 表面処理用組成物およびそれを用いたレジストパターンの表面処理方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20190041757A1 (enExample) |
| JP (2) | JP2017138514A (enExample) |
| KR (1) | KR20180104736A (enExample) |
| CN (1) | CN108604070A (enExample) |
| TW (1) | TW201739842A (enExample) |
| WO (1) | WO2017133830A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018005046A (ja) * | 2016-07-05 | 2018-01-11 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ | 反転パターン形成組成物、反転パターンの形成方法、および素子の形成方法 |
| KR20210015801A (ko) * | 2018-05-25 | 2021-02-10 | 바스프 에스이 | 50 nm 이하의 라인 간격 치수를 갖는 패턴화 재료를 처리할 때 패턴 붕괴를 피하기 위한 용매 혼합물을 포함하는 조성물의 용도 |
| WO2021020091A1 (ja) * | 2019-07-29 | 2021-02-04 | Jsr株式会社 | 組成物、ケイ素含有膜、ケイ素含有膜の形成方法及び半導体基板の処理方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002030118A (ja) * | 2000-07-14 | 2002-01-31 | Tokyo Ohka Kogyo Co Ltd | 新規コポリマー、ホトレジスト組成物、および高アスペクト比のレジストパターン形成方法 |
| DE10129577A1 (de) * | 2001-06-20 | 2003-01-16 | Infineon Technologies Ag | Silylierverfahren für Fotoresists im UV-Bereich |
| KR100618850B1 (ko) * | 2004-07-22 | 2006-09-01 | 삼성전자주식회사 | 반도체 소자 제조용 마스크 패턴 및 그 형성 방법과 미세패턴을 가지는 반도체 소자의 제조 방법 |
| DE102004041610B4 (de) * | 2004-08-27 | 2006-09-07 | Kodak Polychrome Graphics Gmbh | Verfahren zur Herstellung einer Lithographie-Druckplatte |
| US7566525B2 (en) | 2005-06-14 | 2009-07-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for forming an anti-etching shielding layer of resist patterns in semiconductor fabrication |
| US7531296B2 (en) | 2005-08-24 | 2009-05-12 | Taiwan Semiconductor Manufacturing, Co., Ltd. | Method of forming high etch resistant resist patterns |
| US20090253080A1 (en) * | 2008-04-02 | 2009-10-08 | Dammel Ralph R | Photoresist Image-Forming Process Using Double Patterning |
| JP5446648B2 (ja) * | 2008-10-07 | 2014-03-19 | 信越化学工業株式会社 | パターン形成方法 |
| KR101295858B1 (ko) * | 2009-07-23 | 2013-08-12 | 다우 코닝 코포레이션 | 더블 패터닝 방법 및 물질 |
| PL2520440T3 (pl) * | 2009-12-29 | 2018-09-28 | Toyobo Co., Ltd. | Sposób wytwarzania fleksograficznej płyty drukowej oraz fleksograficzna płyta drukowa |
| US8852848B2 (en) * | 2010-07-28 | 2014-10-07 | Z Electronic Materials USA Corp. | Composition for coating over a photoresist pattern |
| WO2014157064A1 (ja) * | 2013-03-28 | 2014-10-02 | 東洋紡株式会社 | フレキソ印刷版の製造方法 |
-
2016
- 2016-02-04 JP JP2016020151A patent/JP2017138514A/ja active Pending
-
2017
- 2017-01-25 US US16/074,843 patent/US20190041757A1/en not_active Abandoned
- 2017-01-25 JP JP2018534865A patent/JP6780004B2/ja active Active
- 2017-01-25 WO PCT/EP2017/000083 patent/WO2017133830A1/en not_active Ceased
- 2017-01-25 KR KR1020187024835A patent/KR20180104736A/ko not_active Withdrawn
- 2017-01-25 CN CN201780008738.4A patent/CN108604070A/zh active Pending
- 2017-02-03 TW TW106103679A patent/TW201739842A/zh unknown
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