JP2019152625A - 電子装置 - Google Patents

電子装置 Download PDF

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Publication number
JP2019152625A
JP2019152625A JP2018039959A JP2018039959A JP2019152625A JP 2019152625 A JP2019152625 A JP 2019152625A JP 2018039959 A JP2018039959 A JP 2018039959A JP 2018039959 A JP2018039959 A JP 2018039959A JP 2019152625 A JP2019152625 A JP 2019152625A
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Japan
Prior art keywords
metal film
contact hole
film
insulating film
electronic device
Prior art date
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Pending
Application number
JP2018039959A
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English (en)
Japanese (ja)
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JP2019152625A5 (enExample
Inventor
早川 裕
Yutaka Hayakawa
裕 早川
久則 与倉
Hisanori Yokura
久則 与倉
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Denso Corp
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Denso Corp
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Publication date
Application filed by Denso Corp filed Critical Denso Corp
Priority to JP2018039959A priority Critical patent/JP2019152625A/ja
Priority to DE112019001185.5T priority patent/DE112019001185T5/de
Priority to PCT/JP2019/008659 priority patent/WO2019172263A1/ja
Priority to CN201980017122.2A priority patent/CN111819428A/zh
Publication of JP2019152625A publication Critical patent/JP2019152625A/ja
Publication of JP2019152625A5 publication Critical patent/JP2019152625A5/ja
Priority to US17/011,062 priority patent/US20200399118A1/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00095Interconnects
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0032Packages or encapsulation
    • B81B7/0045Packages or encapsulation for reducing stress inside of the package structure
    • B81B7/0048Packages or encapsulation for reducing stress inside of the package structure between the MEMS die and the substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
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    • B81B7/0032Packages or encapsulation
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L13/00Devices or apparatus for measuring differences of two or more fluid pressure values
    • G01L13/02Devices or apparatus for measuring differences of two or more fluid pressure values using elastically-deformable members or pistons as sensing elements
    • G01L13/025Devices or apparatus for measuring differences of two or more fluid pressure values using elastically-deformable members or pistons as sensing elements using diaphragms
    • GPHYSICS
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    • GPHYSICS
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    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48475Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball
    • H01L2224/48476Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area
    • H01L2224/48491Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area being an additional member attached to the bonding area through an adhesive or solder, e.g. buffer pad
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    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48599Principal constituent of the connecting portion of the wire connector being Gold (Au)
    • H01L2224/486Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/48638Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48699Principal constituent of the connecting portion of the wire connector being Aluminium (Al)
    • H01L2224/487Principal constituent of the connecting portion of the wire connector being Aluminium (Al) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/48738Principal constituent of the connecting portion of the wire connector being Aluminium (Al) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
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    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8338Bonding interfaces outside the semiconductor or solid-state body
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    • H01L2924/191Disposition
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    • H01L2924/351Thermal stress
    • H01L2924/3512Cracking

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Pressure Sensors (AREA)
  • Measuring Fluid Pressure (AREA)
  • Wire Bonding (AREA)
JP2018039959A 2018-03-06 2018-03-06 電子装置 Pending JP2019152625A (ja)

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JP2018039959A JP2019152625A (ja) 2018-03-06 2018-03-06 電子装置
DE112019001185.5T DE112019001185T5 (de) 2018-03-06 2019-03-05 Elektronische vorrichtung
PCT/JP2019/008659 WO2019172263A1 (ja) 2018-03-06 2019-03-05 電子装置
CN201980017122.2A CN111819428A (zh) 2018-03-06 2019-03-05 电子装置
US17/011,062 US20200399118A1 (en) 2018-03-06 2020-09-03 Electronic device

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JP2020061533A (ja) * 2018-10-12 2020-04-16 トヨタ自動車株式会社 半導体装置

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JP2000195896A (ja) * 1998-12-25 2000-07-14 Nec Corp 半導体装置
JP2001351920A (ja) * 2000-06-07 2001-12-21 Mitsubishi Electric Corp 半導体装置およびその製造方法
JP2003243443A (ja) * 2002-02-13 2003-08-29 Mitsubishi Electric Corp 半導体装置
JP2005207828A (ja) * 2004-01-21 2005-08-04 Denso Corp 圧力センサ
JP2006200925A (ja) * 2005-01-18 2006-08-03 Denso Corp 圧力センサ
JP2006200926A (ja) * 2005-01-18 2006-08-03 Denso Corp 圧力センサ
KR20080105836A (ko) * 2007-06-01 2008-12-04 주식회사 동부하이텍 반도체 장치 형성 방법
JPWO2007052335A1 (ja) * 2005-11-01 2009-04-30 株式会社日立製作所 半導体圧力センサ
JP2011040669A (ja) * 2009-08-18 2011-02-24 Elpida Memory Inc 半導体装置
JP2015210082A (ja) * 2014-04-23 2015-11-24 株式会社デンソー 半導体装置
JP2016025107A (ja) * 2014-07-16 2016-02-08 ルネサスエレクトロニクス株式会社 半導体装置、および半導体装置の製造方法
JP2017017152A (ja) * 2015-06-30 2017-01-19 エスアイアイ・セミコンダクタ株式会社 半導体装置
WO2018037736A1 (ja) * 2016-08-22 2018-03-01 三菱電機株式会社 半導体装置

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Publication number Priority date Publication date Assignee Title
JP2000195896A (ja) * 1998-12-25 2000-07-14 Nec Corp 半導体装置
JP2001351920A (ja) * 2000-06-07 2001-12-21 Mitsubishi Electric Corp 半導体装置およびその製造方法
JP2003243443A (ja) * 2002-02-13 2003-08-29 Mitsubishi Electric Corp 半導体装置
JP2005207828A (ja) * 2004-01-21 2005-08-04 Denso Corp 圧力センサ
JP2006200925A (ja) * 2005-01-18 2006-08-03 Denso Corp 圧力センサ
JP2006200926A (ja) * 2005-01-18 2006-08-03 Denso Corp 圧力センサ
JPWO2007052335A1 (ja) * 2005-11-01 2009-04-30 株式会社日立製作所 半導体圧力センサ
KR20080105836A (ko) * 2007-06-01 2008-12-04 주식회사 동부하이텍 반도체 장치 형성 방법
JP2011040669A (ja) * 2009-08-18 2011-02-24 Elpida Memory Inc 半導体装置
JP2015210082A (ja) * 2014-04-23 2015-11-24 株式会社デンソー 半導体装置
JP2016025107A (ja) * 2014-07-16 2016-02-08 ルネサスエレクトロニクス株式会社 半導体装置、および半導体装置の製造方法
JP2017017152A (ja) * 2015-06-30 2017-01-19 エスアイアイ・セミコンダクタ株式会社 半導体装置
WO2018037736A1 (ja) * 2016-08-22 2018-03-01 三菱電機株式会社 半導体装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020061533A (ja) * 2018-10-12 2020-04-16 トヨタ自動車株式会社 半導体装置
JP7127471B2 (ja) 2018-10-12 2022-08-30 株式会社デンソー 半導体モジュール

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